Claims
- 1. A semiconductor integrated circuit device including a well of a first conductivity type formed on a main surface of a semiconductor substrate, a semiconductor region so formed inside said well as to extend in a first direction x, a first gate formed over said semiconductor substrate through a first insulator film, a second gate formed over said first gate through a second insulator film, and a third gate, wherein:end faces of said third gate are end faces opposing said first gates adjacent to each other between said first gates, and are so formed as to oppose end faces of said first gate existing in parallel with said first direction x through said third insulator film.
- 2. A semiconductor integrated circuit device according to claim 1, which has any of the following constructions:a first construction wherein said first gate is a floating gate, said second gate is a control gate and said third gate is an erase gate; a second construction wherein said first gate is a floating gate, said second gate is a control gate and said third gate is a gate for controlling a split channel; and a third construction wherein said first gate is a floating gate, said second gate is a control gate and said third gate is a gate having the functions of both erase gate and gate for controlling a split channel.
- 3. A semiconductor integrated circuit device according to claim 2, wherein a part of said third gate exists over said semiconductor region of the second conductivity type.
- 4. A semiconductor integrated circuit device according to claim 1, wherein said first gate is a floating gate, said second gate is a control gate and said third gate is an erase head, and wherein the entire surface of said third gate exists over said semiconductor region of the second conductivity type.
- 5. A semiconductor integrated circuit device according to claim 1, wherein said third insulator film is a silicon oxide film doped with nitrogen.
Priority Claims (1)
Number |
Date |
Country |
Kind |
11-200242 |
Jul 1999 |
JP |
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Parent Case Info
This is a divisional of parent application Ser. No. 09/616,072, filed Jul. 13, 2000, now U.S. Pat. No. 6,438,028 the entire disclosure of which is hereby incorporated by reference.
US Referenced Citations (14)
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JP |
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JP |
Non-Patent Literature Citations (2)
Entry |
“A New Flash-Erase EEprom Cell With A Sidewall Select-Gate On Its Source Side” N. Naruke, IEDM-1989, pp. 603-606. |
“Ohyo Butsuri Or Applied Physics” vol. 65, No. 11, pp. 1114-1124. |