Number | Date | Country | Kind |
---|---|---|---|
93111010 | Jul 1993 | EPX |
This is a continuation of application Ser. No. 08/263,479 filed Jun. 22, 1994, now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
3850640 | Babbit et al. | Nov 1974 | |
3861924 | Mackey et al. | Jan 1975 | |
4367283 | Nakayama et al. | Jan 1983 | |
4388402 | Mukunoki et al. | Jun 1983 | |
4391903 | Sysak | Jul 1983 | |
4460679 | Schadt, III | Jul 1984 | |
4585730 | Cho | Apr 1986 | |
4596766 | Nemori et al. | Jun 1986 | |
4649102 | Mukunoki et al. | Mar 1987 | |
4847186 | Mukunoki et al. | Jul 1989 | |
4891307 | Mukunoki et al. | Jan 1990 | |
4891308 | Cho | Jan 1990 | |
4960687 | Cho | Oct 1990 | |
4962081 | Harrison et al. | Oct 1990 | |
4977059 | Liang et al. | Dec 1990 | |
5045441 | Takamuki et al. | Sep 1991 |
Number | Date | Country |
---|---|---|
0245090A2 | Nov 1987 | EPX |
0300259A1 | Jan 1989 | EPX |
0391176A1 | Oct 1990 | EPX |
0391402A1 | Oct 1990 | EPX |
0276743 | Mar 1990 | DEX |
0288250 | Mar 1991 | DEX |
4034870 | May 1992 | DEX |
3223639 | Sep 1988 | JPX |
2246870 | Feb 1992 | GBX |
Entry |
---|
Abstract of Japanese Patent No. 63 223 639, published Mar. 12, 1987. |
Abstract of German Patent No. 40 34 870 A, published May 7, 1992. |
Abstract of German Patent No. 276 7430A, published on Mar. 7, 1990. |
Abstract of Japanese Patent, Application No. 62-32994, published Feb. 17, 1987, involving Sivler Halide Photographic Sensitive Material Sensitive Material invented by Haruhiko Sakuma. |
Number | Date | Country | |
---|---|---|---|
Parent | 263479 | Jun 1994 |