The present invention pertains to the technical field of linear adhesive coating technology in LCD production, in particular the present invention relates to a slit nozzle cleaning device for coaters.
Recently, linear photo resist coater (such as slit nozzle coater) is often used in a photolithography process for manufacturing a semiconductor device such as TFT-LCD modules. In photo resist coating process, photo resist is easy to coagulate. After completion of the photo resist coating, a part of the photo resist remains around the nozzle. When the nozzle tip is not clean, it may seriously affect the product yield. Thus, before the photo resist is coated on the glass substrate, the nozzle will be cleaned, for example by a rubber. However, the rubber has a poor water absorption performance; it cannot remove the photo resist around the nozzle.
The present invention provides a slit nozzle cleaning device for coaters, which can clean up the photo resist around the opening of the nozzle.
The present invention is realized in such a way that: A slit nozzle cleaning device for coaters, the slit nozzle cleaning device for coaters comprising a cleaner, an adhesive removing dissolvent supply unit and a discharge unit, the cleaner is provided with a groove for engaging with the slit nozzle, the side wall of the groove are provided with adhesive removing dissolvent supply through holes, the adhesive removing dissolvent supply unit is in fluid communication with the adhesive removing dissolvent supply through holes so as to supply adhesive removing dissolvent into the groove, the bottom wall of the groove is provided with discharge holes, the discharge unit is in fluid communication with the discharge holes.
Preferably, both side walls of the groove are provided with multiple adhesive removing dissolvent supply through holes.
Preferably, both side walls of the groove are provided with at least one row of adhesive removing dissolvent supply through holes respectively, the at least one row of adhesive removing dissolvent supply through holes are arranged along the longitudinal direction of the cleaner.
Preferably, the discharge holes are not aligned with the photo resist discharge slit of the slit nozzle in vertical direction.
Preferably, the bottom wall of the groove is provided with one row of discharge holes.
Preferably, the bottom wall of the groove is provided with two rows of discharge holes.
Preferably, there is provided with an engagement gap between the groove of the cleaner and the slit nozzle.
Preferably, there is provided with one row of adhesive removing dissolvent supply through holes along the longitudinal direction of the cleaner.
Preferably, there is provided with two rows of adhesive removing dissolvent supply through holes along the longitudinal direction of the cleaner.
Preferably, the length of the cleaner is equal to the length of the slit nozzle.
Preferably, the cleaner is a cleaner made of rubber.
Preferably, the adhesive removing dissolvent supply unit comprises a pressure tank for receiving adhesive removing dissolvent, the pressure tank is in fluid communication with the adhesive removing dissolvent supply through holes via a pipeline.
Preferably, the discharge unit comprises a vacuum pump, the vacuum pump is in fluid communication with the discharge holes via a pipeline.
Preferably, the discharge unit comprises a waste tank, the vacuum pump is in fluid communication with the waste tank.
According to the present invention, the slit nozzle cleaning device for coaters comprises a cleaner, an adhesive removing dissolvent supply unit and a discharge unit, the cleaner is provided with a groove, the side wall of the groove are provided with adhesive removing dissolvent supply through holes, the bottom wall of the groove is provided with discharge holes, thus the residual photo resist around the nozzle will be dissolved by the adhesive removing dissolvent and discharges via the discharge holes. By this way, the photo resist around the opening of the nozzle can be cleaned up.
For more clearly and easily understanding above content of the present invention, the following text will take a preferred embodiment of the present invention with reference to the accompanying drawings for detail description as follows.
The drawings described herein are for illustration purposes only and are not intended to limit the scope of the present disclosure in any way.
The embodiments of the present invention will be described in detail with reference to the accompanying drawings.
As shown in
In addition, the length of the cleaner 200 is equal to the length of the slit nozzle 100. In another embodiment, the length of the cleaner 200 is equal to the width of the glass substrate. By this configuration, when the slit nozzle is back to home point, and the cleaner is raised to engage with the slit nozzle, the cleaning process can be finished in a short time for example in 1 second.
According to the slit nozzle cleaning device for coaters of the present invention, the photo resist around the opening of the nozzle can be cleaned up, the product quality and the product yield can be improved, the cleaning process can be finished in a short time and the tact time of coating process can be shortened.
In the embodiment illustrated in
In the embodiment illustrated in
As shown in
Preferably, the length of the cleaner 200 is equal to or longer than the length of the slit nozzle 100, so as to shorten the cleaning time. In the present embodiment, the cleaner 200 is a cleaner made of rubber.
As shown in
According to the present invention, the slit nozzle cleaning device for coaters comprises a cleaner, an adhesive removing dissolvent supply unit and a discharge unit, the cleaner is provided with a groove, the side wall of the groove are provided with adhesive removing dissolvent supply through holes, the bottom wall of the groove is provided with discharge holes, thus the residual photo resist around the nozzle will be dissolved by the adhesive removing dissolvent and discharges via the discharge holes. The photo resist around the opening of the nozzle can be cleaned up, the product quality and the product yield can be improved, the cleaning process can be finished in a short time and the tact time of coating process can be shortened.
While the present invention has been described with reference to certain embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the scope of the present invention. In addition, many modifications may be made to adapt a particular situation or material to the teachings of the present invention without departing from its scope. Therefore, it is intended that the present invention not be limited to the particular embodiment disclosed, but that the present invention will include all embodiments falling within the scope of the appended claims.
Number | Date | Country | Kind |
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2013 1 0719683 | Dec 2013 | CN | national |
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/CN2014/075116 | 4/10/2014 | WO | 00 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO2015/089961 | 6/25/2015 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
20040213913 | Jung et al. | Oct 2004 | A1 |
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1669680 | Sep 2005 | CN |
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202087472 | Dec 2011 | CN |
103041943 | Apr 2013 | CN |
2005-262127 | Sep 2005 | JP |
2011-167607 | Sep 2011 | JP |
2012135725 | Jul 2012 | JP |
2013192984 | Sep 2013 | JP |
10-2010-0006332 | Jan 2010 | KR |
201210699 | Mar 2012 | TW |
Entry |
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Takagi et al., “JP2005262127A English Machine Translation.pdf”, Sep. 29, 2005—Machine translation from Espacenet.com. |
Cuihua Cao, the International Searching Authority written comments, Sep. 2014, CN. |
Number | Date | Country | |
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20160279656 A1 | Sep 2016 | US |