Claims
- 1. A photosensitive resin composition comprising
- (i) an urethane oligomer;
- (ii) a monomer having at least one ethylenically unsaturated group; and
- (iii) a photopolymerization initiator;
- wherein said urethane oligomer is the reaction product of a polyol, a hydroxy-functionalized acrylate or methacrylate, and a mixture of 2,4-toluene diisocyanate and 2,6-toluene diisocyanate in a weight ratio of, 65 to 35 respectively, and wherein said polyol is a mixture of a poly (alkylene oxide) diol and a polyester diol.
- 2. The composition of claim 1 wherein said hydroxy-functionalized acrylate or methacrylate is selected from the group consisting of polypropylene glycol monomethacrylate, hydroxypropyl methacrylate and acrylated caprolactone dimer.
- 3. The composition of claim 1 wherein said monomer (ii) is selected from the group consisting of laurylmethacrylate, polypropyleneglycol monomethacrylate, phenoethoxymethacrylate, trimethylolpropane trimethacrylate, tetraethyleneglycol dimethacrylate and propoxylated trimethylolpropane trimethacrylate.
- 4. The composition of claim 1 wherein said polyol is selected from the group consisting of polyether diol and polyester diol, said hydroxy-functionalized acrylate or methacrylate is selected from the group consisting of polypropylene glycol monomethacrylate, hydroxypropyl methacrylate and acrylated caprolactamdimer, and said monomer (ii) is selected from the group consisting of laurylmethacrylate, polypropyleneglycol monomethacrylate, phenoethoxymethacrylate, trimethylolpropane trimethacrylate and tetraethyleneglycol dimethacrylate.
Parent Case Info
This application is a continuation of application Ser. No. 08/355,121, filed Dec. 13, 1994, now abandoned.
US Referenced Citations (20)
Non-Patent Literature Citations (1)
Entry |
Encyclopedia of Polymer Science and Engineering, vol. 13, "Polyurethanes", pp. 243-253, 299-303 (John Wiley & Sons, Inc. New York, NY, 1988). |
Continuations (1)
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Number |
Date |
Country |
Parent |
355121 |
Dec 1994 |
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