This application claims priority under 35 U.S.C. § 119 to Korean Patent Application Nos. 10-2022-0161359, filed on Nov. 28, 2022, and 10-2023-0008513, filed on Jan. 20, 2023, in the Korean Intellectual Property Office (KIPO), the contents of which are herein incorporated by reference in their entirety.
Example embodiments relate to a solder reflow apparatus and a method of manufacturing an electronic device using the same. More particularly, example embodiments relate to a solder reflow apparatus using a vapor phase soldering method and a method of manufacturing a semiconductor package using the same.
A convection reflow method, a laser assisted bonding method, a vapor phase soldering method, or the like may be used to solder a solder paste in the field of surface mount technology (SMT). In case of the vapor phase soldering method among them, it may be possible to provide a uniform temperature distribution over the entire substrate such as a printed circuit board (PCB) during saturation of vapor inside an oven, and because the boiling point of a heat transfer fluid is predetermined, there are advantages of preventing overheating by setting the target temperature high.
On the other hand, after electronic components are mounted on a first surface of the substrate and electronic components are on a second surface opposite the first surface of the substrate, a soldering process may be performed on the electronic components on the second surface of the substrate. However, there is a problem in that bumps between the first surface of the substrate and the mounted electronic components are re-melted, causing the mounted electronic components to fall off from the first surface of the substrate.
Example embodiments provide a method of manufacturing an electronic device capable of efficiently mounting electronic components on both sides of a substrate by partially vapor-phase soldering only a desired local region.
According to example embodiments, in a method of manufacturing an electronic device, a substrate having a plurality of mounting regions on which electronic components are respectively mounted is provided, the substrate having a first surface and a second surface opposite the first surface. First electronic components are mounted respectively on the first surface of the board via first bumps. At least one vapor shielding cover is positioned on the first surface of the substrate to cover at least one of the first electronic components. Second electronic components are mounted respectively on the second surface of the substrate via second bumps. The second bumps are soldered with a vapor phase reflow process and during the vapor phase reflow process, the at least one vapor shielding cover is configured to prevent a heat transfer fluid in a vapor state from moving to the at least one first electronic component covered by the at least one vapor shielding cover.
According to example embodiments, in a method of manufacturing an electronic device, first electronic components are mounted on a first surface of a substrate via first bumps. At least one vapor shielding cover is positioned on the first side of the substrate to cover at least one of the first electronic components. Second electronic components are mounted on a second surface of the substrate opposite the first surface via second bumps. The substrate on which the at least one vapor shielding cover is positioned is loaded into a vapor generating chamber that accommodates a heat transfer fluid therein. The heat transfer fluid is heated to form the heat transfer fluid in a vapor phase within the chamber. The second bumps are soldered using heat generated when the heat transfer fluid in the vapor state is brought to contact the surface of the substrate and condenses.
According to example embodiments, in a method of manufacturing an electronic device, first and second electronic components are mounted on a first surface and a second surface of the substrate, respectively, and the first surface is opposite the second surface. A defective electronic component among the first and second electronic components mounted on the first and second surfaces of the substrate is removed. At least one vapor shielding cover is positioned on at least one of the first and second surfaces of the substrate to cover at least one of the remaining first and second electronic components on the first and second surfaces of the substrate. An operable electronic component is mounted on the substrate in place of the defective electronic component via first bumps. The first bumps are soldered with a vapor phase reflow process and during the vapor phase reflow process, the at least one vapor shielding cover is configured to prevent a heat transfer fluid in a vapor state ed from moving to the at least one of the first and second electronic components covered by the at least one vapor shielding cover.
According to example embodiments, first electronic components may be mounted respectively on a first surface of a substrate via first bumps, at least one vapor shielding cover may be positioned on the first surface of the substrate to cover at least one of the first electronic components, second electronic components may be mounted respectively on a second surface of the substrate via second bumps, and the second bumps may be soldered with a vapor phase reflow process.
The substrate on which the vapor shielding cover is positioned may be loaded into a vapor heating chamber of a solder reflow apparatus using a vapor phase soldering method, and a heat transfer fluid in a vapor state may be brought into contact with the surface of the substrate to reflow the second bumps. In this case, the vapor shielding cover may be configured to block the heat transfer fluid in the vapor state from moving to the at least one of the first electronic components covered by the vapor shielding cover.
Accordingly, it may be possible to reduce or prevent a defect that the first bumps between the first surface of the substrate and the mounted first electronic components are re-melted and the mounted first electronic components fall from the first surface of the substrate. Thus, defects in a reflow process for solders arranged at fine pitches may be reduced and bonding quality may be improved.
Example embodiments will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings.
Hereinafter, example embodiments will be explained in detail with reference to the accompanying drawings.
Referring to
In example embodiments, the solder reflow apparatus 10 may be a vapor phase soldering apparatus configured to solder a solder paste by saturated vapor heated in the vapor generating chamber 100.
The vapor generating chamber 100 may include a lower reservoir having an oven shape to accommodate a heat transfer fluid F and to provide a space 101 filled with vapor that is generated directly above the fluid when the fluid F is boiling. The vapor generating chamber 100 may extend in a vertical direction (Z direction) by a predetermined height. In the vapor generating chamber 100, the heat transfer fluid may boil and the vapor may rise to the top, may condense back to the liquid state at the top, and may flow back to the reservoir at the bottom.
The pressure inside the vapor generating chamber 100 may be maintained at atmospheric pressure. Alternatively, the vapor generating chamber 100 may be connected to an exhaust device such as a vacuum pump to adjust the pressure inside the vapor generating chamber 100. The pressure inside the vapor generating chamber may be maintained at a predetermined pressure in order to change the boiling point of the heat transfer fluid or soldering environments.
The heat transfer fluid F may be a chemical material that is selected to provide the vapor necessary for vapor phase soldering. The heat transfer fluid may be selected in consideration of boiling point, environmental influences, and corrosiveness of the generated vapor. The heat transfer fluid may include an inert organic liquid. For example, the heat transfer fluid may include a perfluoropolyether (PFPEs)-based Galden solution. The boiling point of the Galden solution may be 230° C.
The heater 110 may heat the heat transfer fluid F accommodated in the vapor generating chamber 100 to generate saturated vapors. The heater 110 may include an electrical resistor that is immersed in the heat transfer fluid F on the bottom of the vapor generating chamber 100. Alternatively, the heater 110 may include a resistor in the form of a coil surrounding the reservoir tank.
In addition, a heater (not illustrated) as a portion of a temperature control mechanism may be installed on a sidewall of the vapor generating chamber 100 to control the temperature of the vapor generating chamber 100 during a reflow process.
As illustrated in
The substrate stage 200 may be installed to be movable upward and downward within the vapor generating chamber 100. The lifting driver for moving the substrate stage 200 upward and downward may include various types of actuators such as a transfer rail, a transfer screw, a transfer belt, etc. Both end portions of the substrate stage 200 may be supported by transfer rods 210 respectively, and the substrate stage 200 may be moved up and down by the lifting driver.
As illustrated in
After the article S is loaded, the Galden solution F may be heated by the heater 110 and start to boil. The saturated vapor from the Galden solution may be distributed within the space 101 of the vapor generating chamber 100. At this time, the density of the saturated vapor may vary depending on the height, and thus a temperature gradient may be formed.
For example, the temperature T1 of the vapor generating chamber at a third height H3 may be 100° C., the temperature T2 of the vapor generating chamber at a second height H2 may be 170° C., and the temperature T3 of the vapor generating chamber at a first height H1 may be 230° C. The bumps 40a and 40b may include Sn—Ag—Cu (SAC) solder, Sn—Ag solder, etc. Since the boiling point of the SAC solder is 217ºC, the temperature T3 at the first height H1, which is a reflow section, may be maintained at 230° C.
Hereinafter, a method of performing a vapor phase reflow process using the solder reflow apparatus of
First, an article S for soldering may be loaded into the vapor generating chamber 100, and the heat transfer fluid F in the vapor generating chamber 100 may be heated.
In example embodiments, a substrate 20 on which an electronic component 30b is mounted via a bump 40b may be transferred into the vapor generating chamber 100 through the gate 102 of the vapor generating chamber 100, and then, the article S may be loaded on the substrate stage 200 by the transfer mechanism 104 such as a guide rail or a transfer pusher.
After the article S is loaded onto the substrate stage 200, the Galden solution F may be heated by the heater 110 and start to boil. The saturated vapor from the Galden solution may be distributed within the space 101 of the vapor generating chamber 100. At this time, the vapor may have a density gradient according to the height, and thus, a temperature gradient along the vertical direction within the vapor generating chamber 100 may be formed.
After the article S is preheated at the third height H3, the article may be moved to the second height H2 and activated (soaked). The substrate 20 may be preheated to reduce or prevent various soldering defects and to provide a more solid and conductive joint. There may be a secondary vapor phase which is produced at a cooler temperature than the main vapor layer at the third and second heights H3 and H2. No soldering takes place in this zone, only a temperature rises.
The article S may be moved to the first height H1 so that the solder may be reflowed. When the article S is immersed in the vapor at the first height H1, the vapor may serve as a heat transfer medium. Since the temperature of the vapor and the temperature of the substrate 20 at the first height H1 are different from each other, vapor may be condensed on a surface of the article S to form a layer. The vapor condensing on the surface may transfer latent heat to the surface of the substrate 20 during condensation to reflow a solder paste.
At this time, the vapor under the substrate stage 200 may move through the openings for support wires 202 of the substrate stage 200 to be supplied to the bumps 40b on the substrate 20 and a space around the bumps 40b. Accordingly, the vapor may be sufficiently supplied to the entire surface of the substrate 20 to achieve uniform heat transfer over the entire area of the article S.
As illustrated in
In this case, the vapor shielding cover 50 may include a cover portion 52 extending parallel to the first surface 21a of the substrate 20 above the first electronic components 30a and a support portion 54 extending from the first surface 21a of the substrate 20 to support the cover portion 52. The cover portion 52 and the support portion 54 may be spaced apart from the first electronic components 30a to form an enclosed space V that is isolated from the outside. For example, the cover portion 52 may have a rectangular plate shape, and the support portion 54 may include first to fourth support plates extending vertically from the first to fourth side portions of the cover portion 52.
The cover portion 52 of the vapor shielding cover 50 may be supported on the support wires 202 of the substrate stage 200, and the substrate 20 may be supported on the support portion 54. The substrate 20 may be supported on the vapor shielding cover 50 such that the first surface 21a of the substrate 20 faces the substrate stage 200.
When the article S is immersed in the vapor at the first height H1, the vapor may serves as a heat transfer medium. Since the temperature of the vapor and the temperature of the substrate 20 in the first height H1 are different from each other, vapor may be condensed on a surface of the article S to form a layer. The vapor condensing on the surface may transfer latent heat to the surface of the substrate 20 during condensation to reflow a solder paste. In this case, the vapor shielding cover 50 may block the heat transfer fluid in the vapor state from moving to the first electronic components 30a within the vapor shielding cover 50.
Accordingly, it may be possible to reduce or prevent a defect that the first bumps 40a between the first surface 21a of the substrate 20 and the first electronic components 30a are re-melted and the mounted first electronic components 30a fall from the first surface 21a of the substrate 20. Thus, defects in a reflow process for solders arranged at fine pitches may be reduced and bonding quality may be improved.
Then, after the bumps 40b are soldered, the article S may move to the top of the chamber and then may be cooled. Accordingly, the solder joints may be cooled down and solidified.
Hereinafter, a method of manufacturing an electronic device using the solder reflow apparatus of
Referring to
As illustrated in
The substrate 20 may have first and second side portions S1 and S2 extending in a direction parallel to a second direction (Y direction) parallel to the first surface 21a and facing each other, and third and fourth side portions S3 and S4 extending in a direction parallel to a first direction (X direction) perpendicular to the second direction and facing each other. When viewed from a plan view, the substrate 20 may have a quadrangular shape. The substrate 20 may have a predetermined area (eg, 77.5 mm×240 mm).
The substrate 20 may include a mounting region MR on which at least one electronic component is mounted and a cutting region CR surrounding the mounting region MR. A plurality of semiconductor chips as the electronic components may be mounted on the mounting regions MR of the substrate 20 respectively. For example, the semiconductor chip may include a logic semiconductor device and/or a memory device. The logic semiconductor device may be an ASIC as a host such as a CPU, GPU, or SoC. The memory device may include a high bandwidth memory (HBM) device. Alternatively, the electronic component may include a passive element such as a capacitor.
For example, tens to hundreds of semiconductor chips may be arranged in a matrix form on the substrate 20. As described below, the semiconductor chips may be mounted on the double sides, that is, the first surface 21a and the second surface 21b of the substrate 20.
As illustrated in
The solder paste 24 may be printed onto the first substrate pads 22a on the first surface 21a of the substrate 20. For example, the solder paste 24 may be printed by a stencil printer. A stencil may be a metal foil having a plurality of openings corresponding to an array of bumps that are subsequently placed. During printing, the solder paste 24 may be printed to fill the openings of the stencil. The solder paste 24 may include solder power and flux. The flux may include resin, solvent, activator, antioxidant, etc.
Alternatively, the solder paste may be coated on a surface of the bump formed on the semiconductor chip.
As illustrated in
A plurality of input/output pads 32 may be formed on a first surface 31a of the first electronic component 30a. The first bumps 40a may be respectively formed on the input/output pads 32. Although not illustrated in the figures, after forming an under bump metal (UBM) on the input/output pad 32, the first bump 40a may be formed on the under bump metal.
As illustrated in
For example, the first bumps 40a may be reflowed with a convection reflow process. While the substrate 20 on which the first electronic components 30a are mounted is sequentially moved to first to third heating chambers of a solder reflow apparatus for the convection reflow process, the solder paste 24 may be heated in each heating chamber and the first bumps 40a may be reflowed to form solder bumps between the first substrate pads 22a and the input/output pads 32.
Alternatively, the first bumps 40a may be reflowed by a vapor phase reflow process. The substrate 20 on which the first electronic components 30a are mounted may be loaded into the vapor heating chamber 100 of the solder reflow apparatus 10 of
Then, a vapor shielding cover 50 may be positioned on the first surface 21a of the substrate 20 to cover the first electronic components 30a (S30).
As illustrated in
The vapor shielding cover 50 may be a cover for a strip to cover all of the first electronic components 30a on the first surface 21a of the substrate 20. The vapor shielding cover 50 may includes a cover portion 52 extending parallel to the first surface 21a of the substrate 20 above the first electronic components 30a and a support portion 54 extending from the first surface 21a of the substrate 20 to support the cover portion 52. The cover portion 52 and the support portion 54 may be spaced from the first electronic components 30a to form an enclosed space V that is isolated from the outside. For example, the cover portion 52 may have a rectangular plate shape, and the support portion 54 may include first to fourth support plates extending vertically from the first to fourth side portions of the cover portion 52.
The vapor shielding cover 50 may be detachably attached to the first surface 21a of the substrate 20 by an adhesive member such as solder paste, thermal tape, or an adhesive film. Alternatively, the vapor shielding cover 50 may be placed in close contact with the surface of the substrate 20 without the adhesive member. In addition, the support portion 54 of the vapor shielding cover 50 may have a stepped portion that is in contact with the surface of the substrate 20. The side portions of the substrate 20 may be seated and supported on the stepped portion of the vapor shielding cover 50 without the adhesive member.
For example, the vapor shielding cover 50 may include glass, plastic, ceramic, or a metal material such as aluminum. In this embodiment, the vapor shielding cover 50 manufactured in the form of a metal can may be positioned on the first surface 21a of the substrate 20. The area and thickness of the cover portion of the vapor shielding cover 50 may be determined in consideration of the sizes and amount of heat of the electronic components to be covered.
Then, the second electronic components 30b may be respectively mounted on the second surface 21b of the substrate 20 (S40).
In example embodiments, the structure of
As illustrated in
As illustrated in
Then, a vapor phase reflow soldering may be performed on the second electronic components 30b (S50).
As illustrated in
In example embodiments, after the substrate 20 is loaded onto the substrate stage 200, the Galden solution F may be heated by the heater 110 and start to boil. The saturated vapor from the Galden solution may be distributed within the space 101 of the vapor generating chamber 100. At this time, the vapor may have a density gradient according to the height, and thus, a temperature gradient along the vertical direction within the vapor generating chamber 100 may be formed.
After the substrate 20 is preheated at the third height H3, the substrate may be moved to the second height H2 and activated (soaked). The substrate 20 may be preheated to reduce or prevent various soldering defects and to provide a more solid and conductive joint. There may be a secondary vapor phase which is produced at a cooler temperature than the main vapor layer at the third and second heights H3 and H2. No soldering takes place in this zone, only a temperature rises.
The substrate 20 may be moved to the first height H1 so that the bump 40b may be reflowed. When the substrate 20 is immersed in the vapor at the first height H1, the vapor may serve as a heat transfer medium. Since the temperature of the vapor and the temperature of the substrate 20 at the first height H1 are different from each other, vapor may be condensed on a surface of the article S to form a layer. The vapor condensing on the surface may transfer latent heat to the second surface 21b of the substrate 20 during condensation to reflow a solder paste.
Referring again to
When the substrate 20 is immersed in vapor at the first height H1, the vapor may serves as a heat transfer medium. Since the temperature at the first height H1 and the temperature of the substrate 20 are different, vapor may be condensed on the surface of the substrate 20 to form a layer. During condensation, the vapor may transfer latent heat to the second surface 21b of the substrate 20 to reflow the solder paste to solder the second bumps 40b. In this case, the vapor shielding cover 50 may block the heat transfer fluid in the vapor state from moving to the first electronic components 30a surrounded by the vapor shielding cover 50.
Accordingly, it may be possible to reduce or prevent a defect that the first bumps 40a between the first surface 21a of the substrate 20 and the first electronic components 30a are re-melted and the mounted first electronic components 30a fall from the first surface 21a of the substrate 20. Thus, defects in a reflow process for solders arranged at fine pitches may be reduced and bonding quality may be improved.
Then, after the second bumps 40b are soldered, the substrate 20 may move to the top of the chamber and then may be cooled. Accordingly, the solder joints may be cooled down and solidified.
After the substrate 20 on which the first and second electronic components 30a and 30b are mounted is unloaded from the solder reflow apparatus 10 of
Then, rework of defective electronic component may be performed (S60).
In example embodiments, in the rework step, a defective electronic component among the first and second electronic components 30a and 30b mounted on the first and second surfaces 21a and 21b of the substrate 20 may be removed and a different electronic component may be mounted. The different electronic component may be a new or operable electronic component that is not defective. A method of manufacturing an electronic device using the rework step will be described with reference to
Then, a molding member 60 may be formed on the double sides of substrate 20 to cover the mounted first and second electronic components 30a and 30b.
As illustrated in
In example embodiments, the first and second molding members 60a and 60b may be formed by a transfer molding apparatus. The substrate 20 may be positioned in a molding space of a mold of the molding apparatus, and a sealing material may flow at high temperature and under high pressure when a lower mold and an upper mold are clamped, so that the liquid sealing material flows inside the molding space and is solidified to form the first and second molding members covering the first and second electronic components 30a and 30b. For example, the sealing material may include an epoxy mold compound (EMC).
Then, the substrate 20 may be sawed by a sawing process to complete semiconductor packages 70.
As illustrated in
Hereinafter, a method of manufacturing an electronic device using the rework step will be described.
Referring to
First, processes the same as or similar to the processed described with reference to
As illustrated in
Then, first and second vapor shielding covers 50a and 50b may be positioned on the first and second surfaces 21a and 21b of the substrate 20 to cover the remaining electronic components 30a and 30b (S110).
As illustrated in
The first vapor shielding cover 50a may be spaced apart from the first electronic components 30a to form an enclosed space Va that is isolated from the outside, and the second vapor shielding cover 50b may be spaced apart from the second electronic components 30b to form an enclosed space Vb that is isolated from the outside. The portion of the substrate 20 from which the defective electronic component 30f is removed may be exposed by the first and second vapor shielding covers 50a and 50b.
Then, a replacement or operable electronic component 30g may be mounted on the substrate 20 in place of the defective electronic component (S120).
As illustrated in
In particular, a solder paste 24 may be coated on each of a plurality of first substrate pads 22a on the first surface 21a of the substrate 20. The solder paste 24 may be printed on the first substrate pad 22a of the substrate 20. For example, the solder paste 24 may be printed by a stencil printer.
The third bumps 40g may be formed on the third electronic component 30g to be mounted on the first surface 21a of the substrate 20, and the third electronic component 30g may be mounted on the first surface 21a of the substrate 20 such that the third bumps 40g are interposed between the input/output pads 32 of the third electronic component 30g and the solder paste 24.
Then, soldering of the third electronic component 30g may be performed using a vapor phase reflow process (S130).
As illustrated in
The second vapor shield member 50b may be supported on the support wires 202 of the substrate stage 200, and the substrate 20 may be supported on the second vapor shield member 50b. The substrate 20 may be supported on the second vapor shielding cover 50b such that the second surface 21b of the substrate 20 faces the substrate stage 200.
When the substrate 20 is immersed in the vapor at the first height H1, the vapor may serve as a heat transfer medium. Since the temperature at the first height H1 and the temperature of the substrate 20 are different, vapor may be condensed on the surface of the substrate 20 to form a layer. During condensation, the vapor may transfers latent heat to the first surface 21a of the substrate 20 to reflow the solder paste, to thereby solder the third bumps 40g. At this time, the first and second vapor shielding covers 50a and 50b may block the heat transfer fluid in the vapor state from moving to first and second electronic components 30a and 30b surrounded by the first and second vapor shielding covers 50a and 50b.
Accordingly, it may be possible to reduce or prevent a defect that the first and second bumps 40a and 40b between the first and second surfaces 21a and 21b of the substrate 20 and the mounted first and second electronic components 30a and 30b are re-melted and the mounted first and second electronic components 30a and 30b fall from the first and second surfaces 21a and 21b of the substrate 20. Thus, defects in a reflow process for solders arranged at fine pitches may be reduced and bonding quality may be improved.
Referring to
The plurality of vapor shielding covers 51a may be respectively positioned on the mounting regions MR on the first surface 21a of the substrate 20. The plurality of vapor shielding covers 51a may be spaced apart from each other.
Referring to
The plurality of vapor shielding members 51a may be positioned to cover only some of the first electronic components 30a on the first surface 21a of the substrate 20, respectively.
Referring to
The first cover 50c may cover a first electronic component 30c having a third height, and the second cover 50d may cover a second electronic component 30d having a fourth height greater than the third height. The first cover 50c and the second cover 50d may be spaced apart from each other. Alternatively, the first cover 50c and the second cover 50d may be integrally formed with each other.
The first and second covers 50c and 50d may cover electronic components such as semiconductor chips, and may not cover an electronic component such as a passive element 30e.
Through the above processes, a semiconductor package including a logic device or a memory device and a semiconductor module including the same may be manufactured. The semiconductor package may include logic devices such as central processing units (CPUs), main processing units (MPUs), or application processors (APs), or the like, and volatile memory devices such as DRAM devices, HBM devices, or non-volatile memory devices such as flash memory devices, PRAM devices, MRAM devices, ReRAM devices, or the like.
The foregoing is illustrative of example embodiments and is not to be construed as limiting thereof. Although a few example embodiments have been described, those skilled in the art will readily appreciate that many modifications are possible in example embodiments without materially departing from the novel teachings and advantages of the present invention. Accordingly, all such modifications are intended to be included within the scope of example embodiments as defined in the claims.
Number | Date | Country | Kind |
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10-2022-0161359 | Nov 2022 | KR | national |
10-2023-0008513 | Jan 2023 | KR | national |