Claims
- 1. A method for inspecting a sample with a probe beam, said probe beam being focused to a spot onto the sample surface, said spot having a generally elliptical shape with a long and a short axis, with the properties of the probe beam being measured after interaction with the sample, said method for minimizing the area adjacent to the edge of the sample which cannot be accurately inspected comprising the step of:
positioning the sample with respect to the probe beam so that the probe beam spot is adjacent the edge of the sample with the short axis being substantially perpendicular to the sample edge.
- 2. A method as recited in claim 1 further including the step of repositioning the sample with respect to the probe beam so that the probe beam spot falls on a different edge location on the sample, said repositioning step including rotating the sample with respect to the probe beam so that the probe beam spot is again positioned adjacent the edge of the sample with the short axis being substantially perpendicular to the sample edge.
- 3. A method of inspecting a generally circular wafer with a probe beam, said probe beam being focused to a spot onto the sample surface, said spot having a generally elliptical shape with a long and a short axis, with the properties of the probe beam being measured after reflection from the sample, said wafer being supported on a movable stage for adjusting the position of the wafer with respect to the probe beam, said stage being capable of both rotational and linear movement, said method comprising the step of:
sequentially positioning the wafer at a plurality of positions with respect to the probe beam to permit inspection of various areas on the wafer surface, and wherein when the area to be inspected is close to the edge of the wafer, rotationally positioning the wafer so that short axis of the elliptical probe beam spot is substantially perpendicular to the edge of the wafer.
PRIORITY INFORMATION
[0001] The present application claims the benefit of U.S. Provisional Application Serial No. 60/298,711 filed Jun. 15, 2001, STAGE ROTATION SYSTEM TO IMPROVE EDGE MEASUREMENTS, which is incorporated herein by reference.
Provisional Applications (1)
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Number |
Date |
Country |
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60298711 |
Jun 2001 |
US |