The present invention relates to a pattern transfer stamper for transferring a fine uneven pattern onto a magnetic disc in manufacturing a magnetic recording medium (e.g. magnetic disc). The invention also relates to a method for manufacturing a magnetic recording medium using a pattern transfer stamper, and a magnetic recording medium.
For instance, as depicted in
As a method for manufacturing a magnetic disc D of a high density, a transferring method called nanoimprinting has been proposed as disclosed in e.g. Patent Document 1. The nanoimprinting is a technique to transfer an uneven pattern to the surface of a resin layer formed on a substrate which is a base. The uneven pattern is formed by pressing a pattern transfer stamper (hereinafter simply referred to as “stamper”) against the resin layer. The surface of the stamper is formed with fine projections or recesses in units of nanometers. The uneven pattern represents e.g. tracks or servo patterns.
Patent Document 1: Japanese Lain-open Patent Publication No. 2005-286222
The guard band pattern portion 88A includes a plurality of linear projections 90 extending in the circumferential direction. The linear projections 90 serve to form guard bands on the surface of the magnetic disc D. The servo pattern portion 89 includes square projections 91 projecting to be substantially rectangular. The square projections 91 form a servo burst portion representing e.g. positional information. In the stamper 86 depicted in
To manufacture the magnetic disc D by nanoimprinting, the stamper 86 depicted in
When the stamper 86 having the shape depicted in
The present invention has been proposed under the circumstances described above. Therefore, an object of the present invention is to provide a pattern transfer stamper capable of transferring an uneven pattern properly and precisely. Another object of the present invention is to provide a method for manufacturing a magnetic recording medium using the pattern transfer stamper. Still another object of the present invention is to provide a magnetic recording medium manufactured by the manufacturing method.
According to a first aspect of the present invention, there is provided a pattern transfer stamper for transferring an uneven pattern to a deformable surface of a member which is a base for manufacturing a disc-shaped magnetic recording medium. The magnetic recording medium includes a data region and a servo region positioned adjacent to the data region in a circumferential direction. The pattern transfer stamper includes at least a data-region-corresponding uneven pattern portion corresponding to the data region of the disc-shaped magnetic recording medium. The data-region-corresponding uneven pattern portion includes linear projections extending in the circumferential direction and spaced from each other in a radial direction. A support projection for supporting an end of at least one of the linear projections is provided to be integrally connected to the end.
Preferably, the support projection extends in the radial direction and is connected to the ends of the plurality of linear projections.
Preferably, the support projection has a width which is larger than the width of the linear projections.
Preferably, the pattern transfer stamper further includes a servo-region-corresponding uneven pattern portion corresponding to the servo region of the disc-shaped magnetic recording medium. The servo-region-corresponding uneven pattern portion includes a plurality of servo-region-corresponding linear projections extending in the radial direction and spaced from each other in the circumferential direction. Of the plurality of servo-region-corresponding linear projections, the servo-region-corresponding linear projection positioned adjacent to the data-region-corresponding uneven pattern portion serves as the support projection.
Preferably, the support projection has a substantially square shape and is connected to the ends of at least two of the linear projections.
Preferably, the support projection has a substantially square shape and is connected to the end of every other linear projection.
Preferably, the pattern transfer stamper further includes a servo-region-corresponding uneven pattern portion corresponding to the servo region of the disc-shaped magnetic recording medium. The servo-region-corresponding uneven pattern portion includes a plurality of rectangular projections having a substantially rectangular shape. Of the plurality of rectangular projections, the rectangular projection positioned adjacent to the data-region-corresponding uneven pattern portion serves as the support projection.
Preferably, the support projection extends obliquely with respect to the radial direction and is connected to the ends of at least two of the linear projections.
Preferably, the pattern transfer stamper further includes a servo-region-corresponding uneven pattern portion corresponding to the servo region of the disc-shaped magnetic recording medium. The servo-region-corresponding uneven pattern portion includes a plurality of servo-region-corresponding linear projections extending obliquely with respect to the radial direction. Of the plurality of servo-region-corresponding linear projections, the servo-region-corresponding linear projection positioned adjacent to the data-region-corresponding uneven pattern portion serves as the support projection.
According to a second aspect of the present invention, there is provided a method for manufacturing a magnetic recording medium. The manufacturing method includes the steps of forming a magnetic layer on a substrate which is a base of the disc-shaped magnetic recording medium, forming a resin layer on the magnetic layer, and forming an uneven pattern by transferring an uneven pattern of the pattern transfer stamper provided according to the first aspect of the present invention onto the resin layer by pressing the uneven surface of the pattern transfer stamper against the resin layer and etching the exposed magnetic layer using the resin layer on the magnetic layer as a mask.
According to a third aspect of the present invention, there is provided a method for manufacturing a magnetic recording medium. The method includes the steps of transferring an uneven pattern of the pattern transfer stamper provided according to the first aspect of the present invention onto a deformable substrate which is a base of the disc-shaped magnetic recording medium by pressing the uneven surface of the pattern transfer stamper against the substrate, and forming a pattern of presence/absence of a magnetic member by forming a magnetic layer in recesses of the uneven pattern.
According to a fourth aspect of the present invention, there is provided a magnetic recording medium manufactured by the method provided according to the second or the third aspect of the present invention.
Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.
As depicted in
The servo region 82 is provided adjacent to the data region 81 in the circumferential direction. The servo region 82 is utilized for detecting tracks 2. The servo region 82 is formed with a servo pattern 4. The servo pattern 4 represents servo information such as positional information of the tracks 2.
The tacks 3 and the servo pattern 4 are formed by transferring an uneven pattern by the stamper 1. Specifically, to manufacture the magnetic disc D, the stamper 1 is pressed against the base member (e.g. a resin layer) of the magnetic disc D. By this operation, a fine uneven pattern corresponding to the tracks 3 and the servo pattern 4 is transferred onto the resin layer. For this purpose, the stamper 1 has an uneven surface 10 (see
The tracks 3 and the servo pattern 4 can be formed individually. Thus, the stamper 1 may have only the projection or recesses corresponding to the uneven pattern of the track 3 and may not have the projections or recesses corresponding to the uneven pattern of the servo pattern 4. That is, a stamper having only the projections or recesses corresponding to the uneven pattern of the tracks 3 is used to transfer the uneven pattern of the tracks 3. Then, another stamper having only the projections or recesses corresponding to the uneven pattern of the servo pattern 4 is used to transfer the uneven pattern of the servo pattern 4. In this case, the servo pattern 4 may be later formed on the magnetic disc D by a technique other than nanoimprinting. For instance, the servo pattern may be magnetically formed using a servo track writer.
The stamper 1 may include e.g. an Ni substrate or an SiO2 substrate. The uneven surface 10 of the stamper 1 has substantially the same size as that of the disc surface of the magnetic disc D. The stamper 1 is formed by performing application of a resist, light exposure by electronic beams, development and plating or etching with respect to a surface of a material substrate.
Preferably, as depicted in
The servo pattern portion 12 is provided with an uneven pattern corresponding to the servo region 82 of the magnetic recording medium. As depicted in
A support projection 15 for supporting the ends 11b of the linear support projections 11a of the guard band pattern portion 11 is provided to be integrally connected to the ends. The support projection 15 extends in the radial direction. The support projection 15 is connected to an end 11b of each of the linear projections 11a. The width W1 of the support projection 15 is substantially equal to the width A of the linear projections 11a.
Though not illustrated in
By the pressing with the stamper 1, the resin layer 33 is formed with a fine uneven pattern corresponding to the uneven surface 10 of the stamper. For instance, by the linear projections 11a of the stamper 1, a plurality of recesses 16 extending in the circumferential direction are formed at the surface of the resin layer 33. By the support projection 15 of the stamper 1, a recess 17 extending in the radial direction is formed at the surface of the resin layer 33. The recesses 16 communicate with each other via the recess 17. Further, by the square projections 13a of the stamper 1, a plurality of square recesses 18 formed on the surface of the resin layer 33.
As described above, according to the first embodiment, the support projection 15 is provided to be integrally connected to the ends 11b of the linear projections 11a, so that the linear projections 11a are connected to each other via the support projection 15. Thus, the ends 11b of the linear projections 11a are supported by the support projection 15, so that the ends 11b and the nearby portion are rigid. Thus, even when the stamper 1 is repetitively used in nanoimprinting, the ends 11b of the linear projections 11a are prevented from being deformed to be bent in the radial direction, damaged or broken.
Therefore, according to the first embodiment, the provision of the support projection 15 in the stamper 1 ensures that recesses 16 having a proper shape are formed in the resin layer 33. Thus, the uneven pattern is transferred properly and precisely. As will be described later, the resin layer 33 is used as a mask for etching. Owing to the provision of the recesses 16, the etching is performed precisely, so that tracks 2 are formed properly.
It is to be noted that the width W1 of the support projection 15 may be larger than the width A of the linear projections 11a. With this arrangement, the support projection 15 supports the ends 11b of the linear projections 11a more firmly. Alternatively, the width W1 of the support projection 15 may be smaller than the width A of the linear projections 11a if the support projection 15 can support the linear projections 11a.
To manufacture the magnetic disc D, the stamper 1 is pressed against the base member of the magnetic disc D, so that the pressure concentrates in the radial direction of the stamper 1. The support projection 15 and the linear projections 11a support each other. When the width W1 of the support projection 15 is small, the area occupied by the support projection 15 on the magnetic disc D is small, so that the density of the magnetic disc D can be increased. For these reasons, when the support projection 15 is provided individually on the stamper 1, it is preferable that the width W1 of the support projection 15 is smaller than the width A of the linear projections 11a.
A method for manufacturing a magnetic disc D using the stamper 1 will be described below. In manufacturing a magnetic disc D, e.g. a pattern transfer apparatus 20 as depicted in
For instance, the pattern transfer apparatus 20 is set in a working chamber 21. The pattern transfer apparatus 20 includes the stamper 1, an upper holder 24, a lower panel 25, a lower elevating member 26 and a drive motor 27. The upper holder 24 holds the stamper 1 and the upper panel 22 horizontally. The upper holder further holds an upper unit 23. The lower panel 25 holds the upper holder 24 and the magnetic disc D horizontally. The lower elevating member 26 moves vertically while holding the lower panel 25. The drive motor 27 causes the vertical movement of the lower elevating member 26. In the working chamber 21, a vacuum pump for reducing the pressure in the working chamber 21 is provided. For instance, the vacuum pump 28 has the ability to reduce the pressure in the working chamber 21 to about 1 Torr.
The upper panel 22 is made of e.g. quartz glass and transmits the light for positioning. The upper unit 23 incorporates a mechanism (e.g. an illuminator or a photodetector) (not illustrated) for properly positioning the stamper 1 relative to the magnetic disc D within a horizontal plane. Thus, it is preferable that the stamper 1 is made of an SiO2 substrate which transmits light.
The lower panel 25 incorporates a heater 29 for heating the stamper 1 and the magnetic disc D in contact with these. A heater for heating the stamper 1 and the magnetic disc D may be provided in the upper panel 25. When the lower elevating member 26 is moved vertically by the drive motor 27, the lower panel 25 moves vertically along with the elevating member. As a result, the magnetic disc D held horizontally by the lower panel 25 moves toward or away from the stamper 1 held at a predetermined height from the floor. In the state in which the magnetic disc is held in close contact with the uneven surface 10 of the stamper 1, the stamper 1 and the magnetic disc D are pressed against each other.
First, in the manufacturing process, a base member of the magnetic disc D as depicted in
As depicted in
Then, under the vacuum condition, pressure application and heating are performed with respect to the uneven surface 10 of the stamper 1 and the resin layer 33. Specifically, as depicted in
Then, after the lapse of a predetermined cooling period, the vacuum of the working chamber 21 is eliminated. Then, as depicted in
In this way, the uneven pattern corresponding to the uneven surface 10 of the stamper 1 is transferred onto the resin layer 33. As noted before, the stamper is formed with the support projection 15 connected to the ends 11b of the linear projections 11a. Thus, even when the stamper 1 is repetitively used, the ends 11b of the linear projections 11a are prevented to be bent. Thus, the uneven pattern corresponding to the uneven surface 10 is formed on the resin layer 33 without a transfer defect. Thus, the fine uneven pattern is properly transferred onto the resin layer 33.
After the uneven pattern is transferred, portions of the resin layer 33 which are not necessary as a mask remain. As depicted in
Then, etching is performed with respect to the magnetic film 32 using the resin layer 33 as a mask. As depicted in
Thereafter, as depicted in
First, in this manufacturing process, a deformable resin substrate 36 is prepared as the base member of the magnetic disc D. As depicted in
Then, under the vacuum condition, pressure application and heating are performed with respect to the uneven surface 10 and the resin layer 36. Specifically, as depicted in
Then, after the lapse of a predetermined cooling period, the vacuum of the working chamber 21 is eliminated. Then, as depicted in
Thereafter, as depicted in
Each of the square projections 13a is integrally connected to the ends 11b of two adjacent linear projections 11a of the guard band pattern portion 11. Of the square projections 13a of the servo burst pattern portion 13, those formed adjacent to the guard band pattern 11 are connected to the linear projections 11a.
The length D of each side of the square projection 13a is larger than the distance L between two adjacent linear projections 11a so that the square projection 13a is connected to the ends 11b of the two adjacent linear projections 11a. In this way, in the second embodiment, the non-patterned portion 14 of the first embodiment (see
In the second embodiment, the square projection 13a serving as a support member connects the ends 11b of two adjacent linear projections 11a to each other. Thus, the ends 11b of the two adjacent linear projections 11a are supported to be rigid. Alternatively, the square projection 13a may be arranged to connect the ends 11b of three or more linear projections 11a to each other.
Although the ends 11b of two linear projections 11a are not connected to each other in the arrangement of the third embodiment, the end 11b of every other linear projection 11a and the nearby portion can be made rigid.
The preamble pattern portion 16 is formed in the servo pattern portion 12 and corresponds to a preamble portion (not illustrated) in the servo region 82 of the magnetic disc D. The preamble portion represents clock information for reading the data of the tracks 2. The preamble pattern portion 16 is formed with a plurality of linear projections 16a extending in the radial direction.
In the fourth embodiment, of the linear projections 16a of the preamble pattern 16, the one arranged adjacent to the guard band pattern portion 11 is connected to the ends 11b of the linear projections 11a of the guard band pattern portion 11. Thus, the ends 11b of the linear projections 11a are supported to be rigid.
The phase difference signal pattern portion 17 is formed in the servo pattern portion 12 and corresponds to a phase difference signal portion (not illustrated) in the servo region 82 of the magnetic disc D. The phase difference signal portion represents positional information or sector information. The phase difference signal pattern portion 17 is provided with a plurality of linear projections 17a extending obliquely with respect to the circumferential direction.
In the fifth embodiment, the linear projections 17a are so formed that an end of each linear projection 17a connects the ends 11b of two adjacent linear projections 11a of the guard band pattern portion 11 to each other. That is, of the linear projections 17a of the phase difference signal pattern portion 17, the ends of the linear projections 17a which are adjacent to the guard band pattern portion 11 are connected to the linear projections 11a. With this arrangement, the ends 11b of adjacent two linear projections 11a are supported to be rigid by the linear projection 17a. Alternatively, the linear projection 17a may be arranged to connect the ends 11b of three or more linear projections 11a to each other.
For instance, in the fourth embodiment (see
In the sixth embodiment, however, the width W2 of the linear projection 16b is made smaller than the width W3 of the linear projections 16a. With this arrangement, when the stamper 1E (see
Since the height of the linear projection 18a is lower than that of the linear projections 11a in the seventh embodiment, resin or air readily flows between the guard band pattern portion 11 (recesses 11c formed between the linear projections 11a) and the servo pattern portion 12 (recess 18b) when the stamper 1F (see
It is difficult to manufacture the stamper 1F of the seventh embodiment by a conventional etching technique, because the linear projection 18a and the linear projections 16a differ from each other in height. Preferably, therefore, the stamper 1F is manufactured by the method described below.
First, application of a resist, light exposure by electronic beams and development are performed with respect to a surface of a material substrate of the stamper 1F prepared in advance. A first etching step is performed using the applied resist as a mask. Then, resist is applied again. In this process, the recesses formed by the first etching process are filled with the resist applied later. Then, light exposure and development are performed. Then, a second etching step is performed on the conditions different from those of the first etching (e.g. different etching time) using the resist as a mask. By this process, a stepped portion is formed on the material substrate of the stamper 1F so that the linear projection 18a and the linear projections 16a having different heights are formed.
The present invention is not limited to the foregoing embodiments. For instance, the object to which the uneven pattern is to be transferred is not limited to a discrete track media. The present invention is also effective in making another stamper by transferring the uneven pattern of the stamper 1 by nanoimprinting. Further, in duplicating a stamper by a technique other than nanoimprinting, such as plating, a force opposite from that of nanoimprinting is applied to the stamper 1 in removing the duplicated stamper from the stamper 1. This causes the deformation or damage of the stamper similarly to the problem which the present invention aims to solve. Thus, the present invention is also effective for such duplication. The stamper 1 of the foregoing embodiments is applicable to other situations where a fine uneven pattern needs to be formed.
This application is a U.S. Continuation of International Application Serial No. PCT/JP2006/320936, filed Oct. 20, 2006.
Number | Date | Country | |
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Parent | PCT/JP2006/320936 | Oct 2006 | US |
Child | 12425971 | US |