Claims
- 1. A pattern fabrication apparatus comprising a beam path along which a beam selectively travels to selectively bombard a target substrate, the apparatus further comprising:
a beam source producing the beam at an origin of the beam path; a beam spreader in the beam path that spreads the beam; a mask in the beam path inducing a pattern on the beam; and a lens in the beam path that can focus the beam onto the target substrate.
- 2. The apparatus of claim 1 wherein the beam source is a particle beam source.
- 3. The apparatus of claim 2 wherein the particle beam source produces heavy atoms.
- 4. The apparatus of claim 2 wherein the beam source is an electron gun and the lens is a magnetic lens.
- 5. The apparatus of claim 1 wherein the beam source is an electromagnetic radiation source.
- 6. The apparatus of claim 5 wherein the beam source is a laser.
- 7. The apparatus of claim 5 wherein the beam source is a maser.
- 8. The apparatus of claim 1 wherein the beam source produces ultrasound.
- 9. A belt fabrication apparatus comprising a beam path along which a beam selectively travels to selectively bombard a target substrate support sheet, the apparatus further comprising:
a beam source producing the beam at an origin of the beam path; a beam spreader in the beam path that spreads the beam; a mask in the beam path inducing a pattern on the beam; and a lens in the beam path that can focus the beam onto the target substrate.
- 10. The apparatus of claim 9 wherein the beam source is a particle beam source.
- 11. The apparatus of claim 10 wherein the beam source is an electron gun and the lens is a magnetic lens.
- 12. The apparatus of claim 9 wherein the beam source is an electromagnetic radiation source.
- 13. The apparatus of claim 12 wherein the beam source is a laser.
- 14. The apparatus of claim 13 wherein the laser produces ultraviolet radiation.
- 15. The apparatus of claim 12 wherein the beam source is a maser.
- 16. The apparatus of claim 9 wherein the beam source produces ultrasound.
- 17. A belt fabrication apparatus comprising a beam path along which a laser beam selectively travels to selectively bombard a target substrate support sheet, the apparatus further comprising:
a laser producing the beam at an origin of the beam path; a first lens in the beam path that spreads the beam; at least one mask in the beam path inducing a pattern on the beam; and a second lens in the beam path that can focus the beam onto the target substrate.
- 18. The apparatus of claim 17 wherein the mask is a template opaque to the laser radiation and in contact with a target.
- 19. The apparatus of claim 17 wherein the laser emits in the UV spectrum.
- 20. The apparatus of claim 19 wherein the first and second lenses comprise fused silica.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application is based on a Provisional Patent Application No. 60/256,154, filed Dec. 15, 2000. In addition, this application is related to U.S. patent applications Ser. Nos. 09/683,326 and 09/683,329 filed with this application on Dec. 14, 2001.
Provisional Applications (1)
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Number |
Date |
Country |
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60256154 |
Dec 2000 |
US |