This present application claims priority to German Patent Application No. 10 2021 002 293.9, filed Apr. 30, 2021, which is hereby incorporated by reference in its entirety.
The present invention relates to a substrate carrier for accommodating and transporting a substrate, to a changing station comprising such a substrate carrier as well as to a method for treating a substrate.
In a variety of industrial processes, substrates such as, for example, glass plates, wafers etc. are treated, for example coated, in a variety of ways. In order to move the substrates to different process stations, substrate carriers are usually used to accommodate and transport a substrate (or a plurality of substrates). In some processes, such as, for example, coating, it can be crucial that the orientation of the substrate relative to the substrate carrier is clearly defined and precisely maintained. Problems can arise, on the one hand, from any tolerances of the substrates or, on the other hand, from heating problems during a specific process step if the substrate carrier and substrate expand to different extents.
Therefore, various devices for centering a substrate in a substrate carrier have already been described in the prior art, cf., for example, US 2014/0077431 A1 and JP 2010-103226 A. However, the centering devices described therein have certain disadvantages. For example, US 2014/0077431 A1 proposes to clamp the substrate between spring-loaded projections and alignment pins, which entails that an expansion of the substrate (for example during heating) is only possible asymmetrically, namely exclusively in the direction of the springs. While JP 2010-103226 A allows a symmetrical operation in this respect, the force provided for centering is based on the weight force of the substrate, which has several disadvantages. On the one hand, the exact vertical position depends on the substrate width, which results in inaccurate positioning in the case of corresponding tolerances. On the other hand, a certain lateral frictional force will always be effective when lifting the substrates, which is not desirable.
It is therefore an object of the present invention to provide a substrate carrier improved in this respect for accommodating and transporting a substrate. This object is achieved by a substrate carrier according to claim 1.
The substrate carrier according to the invention comprises a centering device adapted to center the substrate along a first axis, wherein the centering device comprises two inwardly preloaded springs opposite each other. The provision of two springs opposite each other enables symmetrical centering, which ensures centering of the substrate with respect to the substrate carrier even at different temperatures and different expansion characteristics of the substrate carrier and the substrate. Furthermore, the inwardly preloaded springs enable a defined centering force that is independent of the weight of the substrate.
The substrate carrier according to the invention is adapted to accommodate and transport any substrates. However, large-area glass substrates with an area of at least 1 m2 and a thickness of preferably less than 5 mm and particularly preferably less than 3 mm are particularly preferred.
The substrate carrier according to the invention is not limited to centering an individual substrate in a substrate carrier. A substrate carrier can be adapted to accommodate a plurality of substrates and then comprises a plurality of the described centering devices and/or locking devices.
With respect to the symmetrical action of force, the two inwardly preloaded springs opposite each other are preferably arranged on a straight line that is parallel to the first axis. The first axis, in turn, is preferably parallel to a side edge of a substrate accommodated in the substrate carrier and preferably oriented substantially horizontally.
In principle, any springs can be used for the centering device, wherein preferably the two springs opposite each other have the same spring rigidity. The springs preferably comprise a contact area which is provided to come into contact with the substrate, wherein the contact area has a radius of curvature of at least 5 mm, preferably at least 10 mm and particularly preferably at least 20 mm. It is self-evident that, due to said curvature of the contact area, not the entire contact area can come into contact with the substrate. Rather, depending on the size of the substrate and the spring position of the spring, only a very small portion of the contact area (for example, a contact point or contact line) will come into contact with the substrate. Therefore, the term contact area refers to the part of the spring that realistically could come into contact with a substrate in the case of different substrate sizes and different spring positions.
During a respective process step, the substrate is clamped in the substrate carrier by means of the opposite springs and is being held in a centered position by the spring forces of the two springs. However, in order to be able to insert the substrate into the substrate carrier, the contact areas of the springs should be moved outwards relative to the contact situation in order to leave sufficient clearance for the insertion of the substrate. For this purpose, it is particularly preferred that each of the springs comprises an accommodating area for a first movement element and that the springs can be moved outwards by means of the first movement elements. The movement elements can be part of a changing station which is described in detail below and by means of which the springs can be opened and closed, preferably automatically.
According to the invention, the substrate carrier can further comprise a substrate that is accommodated in the substrate carrier. In the contact area in the direction of the substrate thickness (i.e., perpendicular to the substrate surface), the springs preferably have an extension that is greater than the thickness of the substrate. Thereby, for example, deformations of the substrate during temperature variations can be compensated for in that the contact area of the respective spring can still make contact with a substrate which is bent upwards or downwards and thus centering is ensured. Preferably, the ratio between the extension of the contact area and the thickness of the substrate is at least 1.5 and particularly preferably at least 2. Preferably, the extension of the spring in the contact area in the direction of the substrate thickness is at least 2 mm, preferably at least 3 mm.
Depending on the process, the substrates can be differently oriented in the substrate carrier according to the invention. According to a first variant, the substrate is oriented substantially vertically in the substrate carrier, wherein the substrate rests on the substrate carrier at its lower edge extending parallel to the first axis. In this regard, a substantially vertical orientation encompasses not only a directly vertical arrangement, but also an arrangement that is slightly tilted with respect to the perfectly vertical orientation, i.e., by up to +/−10°. In other words, the substrate (or its surface) accommodated in the substrate carrier can assume an angle between 80° and 100° with respect to the horizontal. Due to the fact that the substrate rests on the substrate carrier at its lower edge, a static friction force exists between the lower edge of the substrate and the substrate carrier. It is preferred that a decentration of the substrate along the first axis by 2 mm, preferably by 1 mm and particularly preferably by 0.5 mm, generates a resultant force of the two springs onto the substrate that is greater than said static friction force. Thus, if the substrate is displaced by a corresponding offset from the position that is central with respect to the substrate carrier (for example, because the different expansion of the substrate carrier and the substrate during heating results in an asymmetric positioning of the substrate in the substrate carrier), the spring forces of the two springs result in a resultant force that is large enough to overcome the static friction force between the substrate and the substrate carrier and, accordingly, to move the substrate back to its central position. It is preferred that the coefficient of static friction is less than 0.2, preferably less than 0.15 and particularly preferably less than 0.1.
If the substrate carrier according to the invention is to be used, for example, as part of a coating process, it is further preferred that the substrate carrier comprises a masking for partially covering the substrate, wherein the masking preferably is an integral part of the substrate carrier. If such a masking is present, the centering of the substrate with respect to the substrate carrier (and then also with respect to the masking) is particularly important, since otherwise edges that are too large or too small may be covered by the masking in edge regions of the substrate.
Furthermore, a plurality of locking devices can be provided at the substrate carrier, which are adapted to hold the substrate in the substrate carrier in a form-fitting and force-free manner. Preferably, at least one such locking device is provided on each edge of the substrate.
In order to center the substrate not only along a first axis but with respect to two axes, preferably arranged perpendicularly to each other, the substrate carrier preferably comprises a further centering device adapted to center the substrate along a second axis, wherein the further centering device comprises two pairs of inwardly preloaded springs opposite each other. Preferably, the further centering device and its springs comprise the same features as discussed above with respect to the first centering device and its springs. However, it is preferred that the further centering device, unlike the first centering device, comprises two pairs of inwardly preloaded springs opposite each other, i.e. a total of four springs. This is intended to prevent the substrate from twisting or tilting relative to the substrate carrier. The provision of two centering devices comprising a total of six springs is in particular advantageous when the substrate is oriented substantially horizontally in the substrate carrier, wherein the substrate rests on the substrate carrier at its side edges. Again, a perfect horizontal orientation is not required, but rather a deviation of up to 20° from the horizontal orientation is tolerated.
Analogous to the vertical orientation discussed above, a static friction force exists between the side edges of the substrate and the substrate carrier in the case of the horizontal orientation, wherein preferably a decentration of the substrate along the first axis or the second axis by 2 mm, preferably by 1 mm and particularly preferably by 0.5 mm, generates a resultant force of the respective springs onto the substrate that is greater than the static friction force. Again, the coefficient of static friction is preferably less than 0.2, more preferably less than 0.15 and particularly preferably less than 0.1.
The present invention further relates to a changing station with a substrate carrier as described above. The changing station is adapted to exchange the substrates in the substrate carrier, i.e., to insert substrates in the substrate carrier and to remove them from the substrate carrier after the respective process. As discussed above, preferably each of the springs comprises an accommodating area for a first movement element. Accordingly, the changing station comprises two or more first movement elements adapted to move the springs outwards. This is preferably done automatically, for example with the aid of an actuator of the changing station.
Furthermore, the changing station can comprise a plurality of locking devices adapted to hold the substrate in the substrate carrier in a form-fitting and force-free manner. Said locking devices can also be moved, preferably automatically, with the aid of an actuator, for example.
The present invention is further directed to a method for treating a substrate. According to the invention, a substrate is first inserted into a substrate carrier as described above, preferably with the aid of the changing station discussed above. Subsequently, while the substrate is in the substrate carrier, the substrate is treated, for example heated, cleaned, polished, coated, loaded, etc.
Prior to the insertion of the substrate into the substrate carrier, the springs of the centering device are moved outwards, preferably automatically. If the substrate carrier comprises the locking devices discussed above, which are adapted to hold the substrate in the substrate carrier in a form-fitting and force-free manner, the locking devices preferably are also opened, preferably automatically, prior to the insertion of the substrate into the substrate carrier. In this state, i.e. with the locking devices open and the springs moved outwards, the substrate can be inserted into the substrate carrier without any problems. After the insertion of the substrate, the springs of the centering device are then moved inwards, preferably automatically, and, as the case may be, the locking devices are closed, preferably automatically. The substrate is then held in the substrate carrier in a form-fitting and force-free manner and positioned in a central position by the springs of the centering device. The treatment of the substrate can then take place in this state.
After the process step (or, if applicable, a plurality of process steps), the substrate is removed again from the substrate carrier. Both the insertion and the removal of the substrate are preferably performed with the changing station discussed above.
Analogous to the procedure of the insertion, the springs of the centering device are moved outwards, preferably automatically, prior to the removal of the substrate, and the optional locking devices are opened, preferably automatically, prior to the removal of the substrate.
As mentioned above, the invention is particularly advantageous when the substrate carrier and the substrate behave differently during heating or cooling. It is therefore preferred that the substrate carrier and/or the substrate is heated from a first temperature to a second temperature between the introduction of the substrate and the treatment of the substrate and/or during the treatment of the substrate. In this regard, the first temperature is preferably in a range below 100° C., more preferably below 80° C. and particularly preferably below 70° C., and the second temperature is preferably in a range above 120° C., more preferably above 150° C. and particularly preferably above 180° C.
Between the insertion of the substrate into the substrate carrier and the treatment of the substrate and/or during the treatment of the substrate, the substrate is preferably held in the substrate carrier, preferably automatically, in a form-fitting and force-free manner by a plurality of locking devices.
According to a first variant, the substrate can be oriented substantially vertically during the treatment step and preferably also during the insertion of the substrate into the substrate carrier and/or during the removal of the substrate from the substrate carrier. In this case, the centering device is preferably located in the lower half and particularly preferably in the lower third of the substrate. It is further preferred that then essentially no frictional forces act between the substrate and the substrate carrier during the step of the insertion of the substrate into the substrate carrier and/or during the step of the removal of the substrate from the substrate carrier. This can be achieved, for example, in that during the insertion of the substrate into the substrate carrier the substrate is inserted into the substrate carrier in a manner inclined with respect to a plane defined by the substrate carrier such that first the lower edge of the substrate rests on a lower side of the substrate carrier and subsequently the substrate is tilted, preferably without friction, into the plane of the substrate carrier. This is preferably done by means of a robot. A relatively small inclination of the substrate with respect to the plane defined by the substrate carrier can be sufficient, for example an angle of at least 1°, preferably at least 5° or particularly preferably at least 15°. Analogously, it is preferred that during the removal of the substrate from the substrate carrier, the substrate is first tilted out of the plane defined by the substrate carrier so that only the lower edge of the substrate rests on a lower side of the substrate carrier, and subsequently the substrate is removed in the tilted state, preferably without friction. This is also preferably done by means of a robot.
In the following, the present invention is explained in more detail with reference to the Figures, in which
In the illustrated preferred embodiment, the substrate 2 is oriented substantially vertically in the substrate carrier 1 so that the substrate 2 rests on the substrate carrier 1 at its lower edge, which extends parallel to the first axis between the two springs 3. In such an arrangement, the vertical orientation of the substrate 2 with respect to the substrate carrier 1 is actually defined by the fact that the substrate 2 rests on the substrate carrier at its lower edge. A centration takes place only in the horizontal direction, i.e., along the first axis extending between the two springs 3. For this purpose, at least two springs 3 opposite each other are required at the respective vertical side edges of the substrate 2, which are preferably each arranged at the same height with respect to the lower edge of the substrate 2. Preferably, the springs 3 of the centering device are located in the vicinity of the lower edge, as shown in
In
As soon as the substrate 2 has been inserted into the substrate carrier 1, the pin 9a is moved to the left along the elongated hole 8 on a circular path (cf.
In
In
A corresponding actuator 13 and corresponding engagement elements or pins 12a and 12b can be provided for opening and closing the locking devices 4 (cf.
As already explained, the ratio between D1 and D2 is preferably at least 1.5 and particularly preferably at least 2.
The advantage of this feature can be seen in
The substrate carrier according to the invention enables, i.a., a frictionless removal of a substrate from the substrate carrier, which will be explained with reference to the schematic cross-sectional views of
Instead of a vertical orientation of the substrate, the substrate can also be oriented substantially horizontally in the substrate carrier, as exemplarily shown in
In the preferred embodiments shown, the springs are configured as leaf springs. However, other types of springs can also be used in the context of the present invention. However, it is preferred that the spring can be easily assembled and disassembled by simply clipping it on.
Number | Date | Country | Kind |
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10 2021 002 293.9 | Apr 2021 | DE | national |