SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Abstract

In a substrate processing apparatus of the present invention, a buffer bath is provided at any point in a supplying passage of a processing solution supplying part, and a micro bubble generator is provided in the buffer bath. When a substrate is processed, large quantities of micro bubbles can be generated and stored in the buffer bath, and the micro bubbles can be supplied from the buffer bath to a processing bath. This enables the large quantities of micro bubbles to be supplied to the surrounding of the substrate, while the use of the small micro bubble generator avoids an increase in the size of the substrate processing apparatus.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagram illustrating the construction of a substrate processing apparatus according to a first preferred embodiment of the present invention;

FIG. 2 is a longitudinal section of a micro bubble generator taken on a plane parallel to a direction to discharge micro bubble water;

FIG. 3 is a longitudinal section of the micro bubble generator taken along the line III-III in FIG. 2;

FIG. 4 is a flow chart illustrating the flow of a substrate processing by the substrate processing apparatus;

FIG. 5 is a diagram illustrating the construction of a substrate processing apparatus according to a second preferred embodiment of the present invention;

FIGS. 6 to 8 are diagrams, each illustrating the condition of micro bubble water stored in a buffer bath, and the operation of an optical sensor; and

FIGS. 9 and 10 are diagrams, each illustrating the construction of a substrate processing apparatus of single wafer processing according to the present invention.

Claims

1. A substrate processing apparatus that performs a predetermined process of a substrate by using a processing solution, comprising: a processing bath for storing a processing solution;a holding part for holding a substrate in said processing bath;a processing solution supplying part for supplying a processing solution to said processing bath;a buffer bath for storing a processing solution at any point in a supplying passage of said processing solution supplying part; anda micro bubble generating part for generating micro bubbles into a processing solution stored in said buffer bath.

2. The substrate processing apparatus according to claim 1, wherein said processing solution supplying part has a first feeding passage for feeding a processing solution through said buffer bath, and a second feeding passage for feeding a processing solution without passing through said buffer bath, so that a processing solution containing micro bubbles fed from said first feeding passage can be joined with a processing solution fed from said second feeding passage so as to be supplied together.

3. The substrate processing apparatus according to claim 2, further comprising: a flow rate regulating part for regulating a flow rate of a processing solution fed from either or both of said first feeding passage and said second feeding passage.

4. The substrate processing apparatus according to claim 3, wherein an amount of a processing solution supplied to said buffer bath is substantially identical with an amount of a processing solution pumped from said buffer bath.

5. The substrate processing apparatus according to claim 4, wherein said micro bubble generating part has a micro bubble generator provided with a container having an internal side surface in substantially conical shape, a processing solution introducing part for introducing a processing solution along said internal side surface of said container, a gas introducing part for introducing a predetermined gas into said container, and a discharging part for discharging a processing solution and a gas from a convergent side of said container, said micro bubble generator generating micro bubbles in a processing solution by discharging into said discharging part a two-layer rotating flow formed of a processing solution and a gas, said two-layer rotating flow being caused within said container.

6. The substrate processing apparatus according to claim 5, wherein said micro bubble generating part has a plurality of said micro bubble generators in said buffer bath.

7. The substrate processing apparatus according to claim 6, wherein said processing solution supplying part has a non-pulsation pump for pumping and feeding a processing solution stored in said buffer bath to a substrate.

8. The substrate processing apparatus according to claim 7, further comprising: an ultrasonic vibration supplying part for supplying ultrasonic vibration to a substrate being processed by a processing solution.

9. The substrate processing apparatus according to claim 8, further comprising: an optical sensor for projecting and receiving light through a processing solution in said buffer bath.

10. The substrate processing apparatus according to claim 9, further comprising: a controller for controlling said micro bubble generating part based on a detection signal of said optical sensor.

11. A substrate processing apparatus that performs a predetermined process of a substrate by using a processing solution, comprising: a holding part for holding a substrate;a processing solution supplying part for supplying a processing solution to a substrate held by said holding part;a buffer bath for storing a processing solution at any point in a supplying passage of said processing solution supplying part; anda micro bubble generating part for generating micro bubbles into a processing solution stored in said buffer bath.

12. The substrate processing apparatus according to claim 11, wherein said processing solution supplying part has a first feeding passage for feeding a processing solution through said buffer bath, and a second feeding passage for feeding a processing solution without passing through said buffer bath, so that a processing solution containing micro bubbles fed from said first feeding passage can be joined with a processing solution fed from said second feeding passage so as to be supplied together.

13. The substrate processing apparatus according to claim 12, further comprising: a flow rate regulating part for regulating a flow rate of a processing solution fed from either or both of said first feeding passage and said second feeding passage.

14. The substrate processing apparatus according to claim 13, wherein an amount of a processing solution supplied to said buffer bath is substantially identical with an amount of a processing solution pumped from said buffer bath.

15. The substrate processing apparatus according to claim 14, wherein said micro bubble generating part has a micro bubble generator provided with a container having an internal side surface in substantially conical shape, a processing solution introducing part for introducing a processing solution along said internal side surface of said container, a gas introducing part for introducing a predetermined gas into said container, and a discharging part for discharging a processing solution and a gas from a convergent side of said container, said micro bubble generator generating micro bubbles in a processing solution by discharging into said discharging part a two-layer rotating flow formed of a processing solution and a gas, said two-layer rotating flow being caused within said container.

16. The substrate processing apparatus according to claim 15, wherein said micro bubble generating part has a plurality of said micro bubble generators in said buffer bath.

17. The substrate processing apparatus according to claim 16, wherein said processing solution supplying part has a non-pulsation pump for pumping and feeding a processing solution stored in said buffer bath to a substrate.

18. The substrate processing apparatus according to claim 17, further comprising: an ultrasonic vibration supplying part for supplying ultrasonic vibration to a substrate being processed by a processing solution.

19. The substrate processing apparatus according to claim 18, further comprising: an optical sensor for projecting and receiving light through a processing solution in said buffer bath.

20. The substrate processing apparatus according to claim 19, further comprising: a controller for controlling said micro bubble generating part based on a detection signal of said optical sensor.

21. A substrate processing method of processing a substrate by using a processing solution, comprising the steps of: (a) storing a processing solution in a buffer bath;(b) generating, after said step (a), micro bubbles in a processing solution within said buffer bath; and(c) supplying, after said step (b), a processing solution within said buffer bath to a substrate.