with the semiconductor substrates being dipped in baths or vessels

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CPC
H01L21/67057

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67057with the semiconductor substrates being dipped in baths or vessels

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus for processing a substrate and method of processing a sub...
- Patent number 12,354,889
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Muhyeon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet bench and chemical treatment method using the same
- Patent number 12,347,700
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chen Cheng
- B08 - CLEANING
Information Patent Grant
Exhaust piping for a semiconductor processing tool
- Patent number 12,334,365
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Sheng Lien
- B08 - CLEANING
Information Patent Grant
Liquid delivering system for wafer cleaning equipment
- Patent number 12,334,368
- Issue date Jun 17, 2025
- PNC PROCESS SYSTEMS CO., LTD.
- Yilin Shen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Water replenishment control method for semiconductor process device...
- Patent number 12,314,066
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Kaiyue Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Unit for supplying liquid, apparatus and method for treating substr...
- Patent number 12,266,546
- Issue date Apr 1, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 12,255,082
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Yuta Hamashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,237,180
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Jun Young Choi
- B08 - CLEANING
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 12,211,687
- Issue date Jan 28, 2025
- SCREEN Holdings Co., Ltd.
- Shigeru Yamamoto
- B08 - CLEANING
Information Patent Grant
Photoresist removal method and photoresist removal system
- Patent number 12,210,288
- Issue date Jan 28, 2025
- Tencent Technology (Shenzhen) Company Limited
- Zhongping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for operating the same
- Patent number 12,198,953
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jia-Rong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus, failure prediction method fo...
- Patent number 12,191,178
- Issue date Jan 7, 2025
- Ebara Corporation
- Jumpei Fujikata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 12,183,613
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method and carrier
- Patent number 12,159,794
- Issue date Dec 3, 2024
- SCIENTECH CORPORATION
- Chuan-Chang Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,154,797
- Issue date Nov 26, 2024
- Ebara Corporation
- Itsuki Kobata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated semiconductor substrate polishing and cleaning
- Patent number 12,154,810
- Issue date Nov 26, 2024
- GlobalWafers Co., Ltd.
- ShinBae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,094,732
- Issue date Sep 17, 2024
- SCREEN Holdings Co., Ltd.
- Keisuke Miyajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,094,705
- Issue date Sep 17, 2024
- Semes Co., Ltd.
- Jin Woo Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and apparatus cleaning method
- Patent number 12,087,599
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Hidemasa Aratake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bearing assembly for accommodating device for semiconductor apparatus
- Patent number 12,085,124
- Issue date Sep 10, 2024
- ZHICHENG SEMICONDUCTOR EQUIPMENT TECHNOLOGY (KUNSHAN) CO., LTD.
- Bin Hua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for in-situ Marangoni cleaning
- Patent number 12,080,567
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet bench structure
- Patent number 12,074,041
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clamping jig and cleaning device
- Patent number 12,057,328
- Issue date Aug 6, 2024
- Kyocera Corporation
- Hiroshi Hamashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning device
- Patent number 12,051,598
- Issue date Jul 30, 2024
- SK SILTRON CO., LTD.
- Se Geun Ha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method with in-line SPM processing
- Patent number 12,051,599
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Brian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus for supplying gas of water repellent...
- Patent number 12,042,815
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Kotaro Tsurusaki
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Integrated ultrasonics and megasonics cleaning
- Patent number 12,042,827
- Issue date Jul 23, 2024
- YIELD ENGINEERING SYSTEMS, INC.
- Louis Navarro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas tube, gas supply system and manufacturing method of semiconduct...
- Patent number 12,037,687
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Shiung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,033,872
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Keita Hirase
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WAFER CLEANING SYSTEM
- Publication number 20250239466
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Tae Ha YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING APPARATUS AND WAFER CLEANING SYSTEM INCLUDING THE SAME
- Publication number 20250226253
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Tae Woong UM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF PROCESSING A SUBSTRATE
- Publication number 20250218838
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jun Hyun LIM
- B08 - CLEANING
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20250218815
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Seul Gi CHOI
- B08 - CLEANING
Information Patent Application
SYSTEM AND PROCESS FOR POST-CHEMICAL MECHANICAL POLISHING CLEANING
- Publication number 20250218837
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Clinton SAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PROCESSING A SUBSTRATE
- Publication number 20250218816
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Cheol Yong SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20250210391
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Yukiyoshi SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER REPLENISHMENT CONTROL METHOD FOR SEMICONDUCTOR PROCESS DEVICE...
- Publication number 20250172955
- Publication date May 29, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Kaiyue CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250170619
- Publication date May 29, 2025
- SCREEN Holdings Co., Ltd.
- Shinichi TANIGUCHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND TURN-OVER DEVICE THEREOF
- Publication number 20250157841
- Publication date May 15, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Yazhou Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TREATMENT DEVICE AND WAFER TREATMENT METHOD
- Publication number 20250157838
- Publication date May 15, 2025
- SwaySure Technology Co., Ltd.
- Zhibo Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID DELIVERING SYSTEM FOR WAFER CLEANING EQUIPMENT
- Publication number 20250157832
- Publication date May 15, 2025
- PNC PROCESS SYSTEMS CO., LTD.
- Yilin Shen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Selective Dielectric Capping for Hybrid Bonding
- Publication number 20250149474
- Publication date May 8, 2025
- Applied Materials, Inc.
- Prayudi LIANTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR OPERATING THE SAME
- Publication number 20250105037
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Rong XIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087501
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Gentaro Goshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Monitoring Moving and Stepping Silicon Wafers
- Publication number 20250087510
- Publication date Mar 13, 2025
- TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO., LTD.
- Lihui JIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20250087515
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED SEMICONDUCTOR SUBSTRATE POLISHING AND CLEANING METHODS
- Publication number 20250062148
- Publication date Feb 20, 2025
- GLOBALWAFERS CO., LTD.
- ShinBae Park
- B08 - CLEANING
Information Patent Application
ARRAY-TYPE MEGASONIC CLEANING DEVICE FOR CLEANING WAFERS
- Publication number 20250054781
- Publication date Feb 13, 2025
- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
- Xiaoyu XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046628
- Publication date Feb 6, 2025
- EBARA CORPORATION
- Itsuki KOBATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSTURE TURNING APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUD...
- Publication number 20250038029
- Publication date Jan 30, 2025
- SCREEN Holdings Co., Ltd.
- Akihiro IWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEDICATED SULFURIC-PEROXIDE PROCESS MODULE FOR POST-CMP CLEANING PL...
- Publication number 20240412985
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Clinton SAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240413001
- Publication date Dec 12, 2024
- SCREEN Holdings Co., Ltd.
- Shinichi TANIGUCHI
- B08 - CLEANING
Information Patent Application
IN-LIQUID POSTURE TURNING APPARATUS AND SUBSTRATE PROCESSING APPARA...
- Publication number 20240413002
- Publication date Dec 12, 2024
- SCREEN Holdings Co., Ltd.
- Shinichi TANIGUCHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING MODULE AND SUBSTRATE PROCESSING DEVICE PROVIDE...
- Publication number 20240383015
- Publication date Nov 21, 2024
- DAIKIN FINTECH, LTD.
- Yasunori DEGUCHI
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHODS FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20240383093
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Chien HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR IN-SITU MARANGONI CLEANING
- Publication number 20240363373
- Publication date Oct 31, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Wei-Chun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240351074
- Publication date Oct 24, 2024
- SCREEN Holdings Co., Ltd.
- Tadashi MAEGAWA
- B08 - CLEANING
Information Patent Application
GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...
- Publication number 20240327985
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shiung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING BASKET
- Publication number 20240332038
- Publication date Oct 3, 2024
- Tokuyama Corporation
- Koki ICHITSUBO
- B08 - CLEANING

with the semiconductor substrates being dipped in baths or vessels

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for processing a substrate and method of processing a sub...

Wet bench and chemical treatment method using the same

Exhaust piping for a semiconductor processing tool

Liquid delivering system for wafer cleaning equipment

Water replenishment control method for semiconductor process device...

Unit for supplying liquid, apparatus and method for treating substr...

Substrate processing method

Apparatus for treating substrate

Substrate treatment apparatus and substrate treatment method

Photoresist removal method and photoresist removal system

System and method for operating the same

Semiconductor manufacturing apparatus, failure prediction method fo...

Substrate processing system and substrate processing method

Wafer processing method and carrier

Substrate processing method and substrate processing apparatus

Automated semiconductor substrate polishing and cleaning

Film processing method

Substrate processing method and substrate processing apparatus

Substrate treating method and substrate treating apparatus

Substrate processing apparatus and apparatus cleaning method

Bearing assembly for accommodating device for semiconductor apparatus

Systems and methods for in-situ Marangoni cleaning

Wet bench structure

Clamping jig and cleaning device

Wafer cleaning device

Cleaning method with in-line SPM processing

Substrate processing apparatus for supplying gas of water repellent...

Integrated ultrasonics and megasonics cleaning

Gas tube, gas supply system and manufacturing method of semiconduct...

Substrate processing apparatus and substrate processing method

Patents Applicationslast 30 patents

WAFER CLEANING SYSTEM

WAFER CLEANING APPARATUS AND WAFER CLEANING SYSTEM INCLUDING THE SAME

APPARATUS AND METHOD OF PROCESSING A SUBSTRATE

APPARATUS FOR TREATING SUBSTRATE

SYSTEM AND PROCESS FOR POST-CHEMICAL MECHANICAL POLISHING CLEANING

APPARATUS OF PROCESSING A SUBSTRATE

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

WATER REPLENISHMENT CONTROL METHOD FOR SEMICONDUCTOR PROCESS DEVICE...

SUBSTRATE PROCESSING SYSTEM

SUBSTRATE CLEANING APPARATUS AND TURN-OVER DEVICE THEREOF

WAFER TREATMENT DEVICE AND WAFER TREATMENT METHOD

LIQUID DELIVERING SYSTEM FOR WAFER CLEANING EQUIPMENT

Selective Dielectric Capping for Hybrid Bonding

SYSTEM AND METHOD FOR OPERATING THE SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

System and Method for Monitoring Moving and Stepping Silicon Wafers

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

AUTOMATED SEMICONDUCTOR SUBSTRATE POLISHING AND CLEANING METHODS

ARRAY-TYPE MEGASONIC CLEANING DEVICE FOR CLEANING WAFERS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

POSTURE TURNING APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUD...

DEDICATED SULFURIC-PEROXIDE PROCESS MODULE FOR POST-CMP CLEANING PL...

SUBSTRATE PROCESSING APPARATUS

IN-LIQUID POSTURE TURNING APPARATUS AND SUBSTRATE PROCESSING APPARA...

SUBSTRATE PROCESSING MODULE AND SUBSTRATE PROCESSING DEVICE PROVIDE...

APPARATUS AND METHODS FOR CHEMICAL MECHANICAL POLISHING

SYSTEMS AND METHODS FOR IN-SITU MARANGONI CLEANING

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...

CLEANING BASKET