Patent Grant
8372212
This application is based upon and claims benefit of priority from the Japanese Patent Application No. 2011-82753, filed on Apr. 4, 2011, the entire contents of which are incorporated herein by reference.
Embodiments described herein relate generally to a supercritical drying method for a semiconductor substrate and a supercritical drying apparatus for a semiconductor substrate.
A semiconductor device manufacturing process includes various steps such as a lithography step, a dry etching step, and an ion implantation step. After each step is finished, the following processes are carried out before the operation moves on to the next step: a cleaning process to remove impurities and residues remaining on the wafer surface and clean the wafer surface; a rinsing process to remove the chemical solution residues after the cleaning; and a drying process.
For example, in the wafer cleaning process after the etching step, a chemical solution for the cleaning process is supplied to the wafer surface. Pure water is then supplied, and the rinsing process is performed. After the rinsing process, the pure water remaining on the wafer surface is removed, and the drying process is performed to dry the wafer.
As the methods of performing the drying process, the following methods have been known: a rotary drying method by which pure water remaining on a wafer is discharged by utilizing the centrifugal force generated by rotations; and an IPA drying method by which pure water on a wafer is replaced with isopropyl alcohol (IPA), and the IPA is evaporated to dry the wafer. By those conventional drying methods, however, fine patterns formed on a wafer are brought into contact with one another at the time of drying due to the surface tension of the liquid remaining on the wafer, and as a result, a blocked state might be caused.
To solve such a problem, supercritical drying to reduce the surface tension to zero has been suggested. In the supercritical drying, after the wafer cleaning process, the liquid on the wafer is replaced with a solvent such as IPA to be replaced with a supercritical drying solvent at last. The wafer having its surface wetted with IPA is guided into a supercritical chamber. After that, carbon dioxide in a supercritical state (a supercritical CO2 fluid) is supplied into the chamber, and the IPA is replaced with the supercritical CO2 fluid. The IPA on the wafer is gradually dissolved in the supercritical CO2 fluid, and is discharged together with the supercritical CO2 fluid from the wafer. After all the IPA is discharged, the pressure in the chamber is lowered, and the supercritical CO2 fluid is phase-changed to gaseous CO2. The wafer drying is then ended.
By another known method, a supercritical CO2 fluid is not necessarily used as the drying solvent, and alcohol such as IPA serving as a substitution liquid for the rinse pure water after the cleaning with the chemical solution is put into a supercritical state. The alcohol is then evaporated and discharged, to perform drying. This technique is readily used, because alcohol is advantageously liquid at ordinary temperature and has a lower critical pressure than that of CO2. At high pressure and temperature, however, the alcohol has a decomposition reaction, and the etchant generated through the decomposition reaction performs etching on the metal material existing on the semiconductor substrate. As a result, the electrical characteristics of the semiconductor device are degraded.
According to one embodiment, a supercritical drying method for a semiconductor substrate comprises cleaning the semiconductor substrate with a chemical solution, rinsing the semiconductor substrate with pure water after the cleaning, changing a liquid covering a surface of the semiconductor substrate from the pure water to alcohol by supplying the alcohol to the surface of the semiconductor substrate after the rinsing, guiding the semiconductor substrate having the surface wetted with the alcohol into a chamber, discharging oxygen from the chamber by supplying an inert gas into the chamber, putting the alcohol into a supercritical state by increasing temperature in the chamber to a critical temperature of the alcohol or higher after the discharge of the oxygen, and discharging the alcohol from the chamber by lowering pressure in the chamber and changing the alcohol from the supercritical state to a gaseous state. The chamber contains SUS. An inner wall face of the chamber is subjected to electrolytic polishing.
Embodiments will now be explained with reference to the accompanying drawings.
(First Embodiment)
First, supercritical drying is described.
As shown in
Where the temperature and the pressure are both higher than the critical point, the distinction between the gaseous state and the liquid state is lost, and the substance turns into a supercritical fluid. A supercritical fluid is a fluid compressed at a high density and at a temperature equal to or higher than the critical temperature. A supercritical fluid is similar to a gas in that the diffusibility of the solvent molecules is dominant. Also, a supercritical fluid is similar to a liquid in that the influence of the molecule cohesion cannot be ignored. Accordingly, a supercritical fluid characteristically dissolves various kinds of substances.
A supercritical fluid also has much higher infiltration properties than those of a liquid, and easily infiltrates a microstructure.
A supercritical fluid can dry a microstructure without breaking the microstructure by transiting from a supercritical state directly to a gaseous phase, so that the boundary between the gaseous phase and the liquid phase does not appear, or a capillary force (surface tension) is generated. Supercritical drying is to dry a substrate by using the supercritical state of such a supercritical fluid.
Referring now to
A ring-like flat stage 13 that holds a semiconductor substrate W to be subjected to supercritical drying is provided in the chamber 11.
A pipe 14 is connected to the chamber 11, so that an inert gas such as a nitrogen gas, a carbon dioxide gas, or a rare gas (such as an argon gas) can be supplied into the chamber 11. A pipe 16 is connected to the chamber 11, so that the gas or supercritical fluid in the chamber 11 can be discharged to the outside via the pipe 16.
The pipe 14 and the pipe 16 are made of the same material (SUS) as that of the chamber 11. A valve 15 and a valve 17 are provided on the pipe 14 and the pipe 16, respectively, and the valve 15 and the valve 17 are closed so that the chamber 11 can be hermetically closed.
Electrolytic polishing is performed on the surfaces (the inner wall faces) of the chamber 11.
As can be seen from
The surface portions of the chamber 11 are made of an oxide film containing Fe2O3 or Cr2O3. Cr2O3 is more chemically stable than Fe2O3. Therefore, by increasing the chromium (Cr) density by the electrolytic polishing, the corrosion resistance of the surface of the chamber 11 can be increased.
Electrolytic polishing is also performed at least on a portion of the inner wall face of the pipe 14 located between the chamber 11 and the valve 15, and at least on a portion of the inner wall face of the pipe 16 located between the chamber 11 and the valve 17. That is, electrolytic polishing is performed on the portions with which the supercritical fluid is brought into contact at the time of the later described supercritical drying.
Referring now to the flowchart shown in
(Step S101) A semiconductor substrate to be processed is guided into a cleaning chamber (not shown). A chemical solution is supplied to the surface of the semiconductor substrate, and a cleaning process is performed. As the chemical solution, sulfuric acid, hydrofluoric acid, hydrochloric acid, hydrogen peroxide, or the like can be used.
Here, the cleaning process includes a process to remove a resist from the semiconductor substrate, a process to remove particles and metallic impurities, and a process to remove films formed on the substrate by etching. A fine pattern including a metal film such as a tungsten film is formed on the semiconductor substrate. The fine pattern may be formed prior to the cleaning process, or may be formed through the cleaning process.
(Step S102) After the cleaning process in step S101, pure water is supplied onto the surface of the semiconductor substrate, and a pure-water rinsing process is performed by washing away the remained chemical solution from the surface of the semiconductor substrate with the pure water.
(Step S103) After the pure-water rinsing process in step S102, the semiconductor substrate having the surface wetted with the pure water is immersed into a water-soluble organic solvent, and a liquid substitution process is performed to change the liquid on the semiconductor substrate surface from the pure water to the water-soluble organic solvent. The water-soluble organic solvent is alcohol, and isopropyl alcohol (IPA) is used here.
(Step S104) After the liquid substitution process in step S103, the semiconductor substrate is taken out of the cleaning chamber in such a manner that the surface remains wetted with the IPA and is not dried naturally. The semiconductor substrate is then guided into the chamber 11 illustrated in
(Step S105) The lid of the chamber 11 is closed, and the valve 15 and the valve 17 are opened. An inert gas such as a nitrogen gas is then supplied into the chamber 11 via the pipe 14, and oxygen is purged from the chamber 11 via the pipe 16.
The period of time to supply the inert gas into the chamber 11 is determined by the volume of the chamber 11 and the amount of IPA in the chamber 11. Alternatively, the oxygen density in the exhaust air from a glove box (not shown) provided on the chamber 11 may be monitored, and the inert gas may be supplied until the oxygen density becomes a predetermined value (100 ppm, for example) or lower.
(Step S106) After oxygen is purged from the chamber 11, the valve 15 and the valve 17 are closed to put the inside of the chamber 11 into a hermetically-closed state. The heater 12 is then used to heat the IPA covering the surface of the semiconductor substrate in the hermetically-closed chamber 11. As the IPA that is heated and is evaporated increases in volume, the pressure in the chamber 11 that is hermetically closed and is constant in volume increases as indicated by the IPA vapor pressure curve shown in
The actual pressure in the chamber 11 is the total sum of the partial pressures of all the gas molecules existing in the chamber 11. In this embodiment, however, the partial pressure of the gaseous IPA is described as the pressure in the chamber 11.
As shown in
Before the IPA is put into the supercritical state, the liquid IPA covering the surface of the semiconductor substrate is not evaporated. That is, the semiconductor substrate remains wetted with the liquid IPA, and the gaseous IPA and the liquid IPA are made to coexist in the chamber 11.
The temperature Tc, the pressure Pc, and the volume of the chamber 11 are assigned to respective variables in the gas state equation (PV=nRT, where P represents pressure, V represents volume, n represents molar number, R represents gas constant, and T represents temperature), to determine the amount nc (mol) of the IPA in the gaseous state in the chamber 11 when the IPA reaches the supercritical state.
Before the inert gas supply is started in step S105, nc (mol) or more of liquid IPA needs to exist in the chamber 11. If the amount of IPA existing on the semiconductor substrate to be guided into the chamber 11 is smaller than nc (mol), liquid IPA is supplied into the chamber 11 from a chemical solution supply unit (not shown), so that nc (mol) or more of liquid IPA exists in the chamber 11.
Where oxygen exists in the chamber 11, the metal film on the semiconductor substrate is oxidized by the oxygen. As the IPA in the chamber 11 has a decomposition reaction, with the catalyst being the iron (Fe) of the SUS forming the chamber 11, the etchant generated by the decomposition reaction performs etching on the oxidized metal film on the semiconductor substrate.
In this embodiment, however, an inert gas is supplied in step S105, so that the oxygen density in the chamber 11 is made extremely low. Accordingly, in drying operations, oxidation of the metal film on the semiconductor substrate can be prevented.
The inner walls of the chamber 11, the pipe 14, and the pipe 16 with which the supercritical IPA is in contact are surfaces that are made to have high Cr densities and be chemically stable by virtue of the electrolytic polishing. Accordingly, decomposition reactions of the IPA using the surfaces of the chamber 11 as the catalyst can be prevented.
As described above, by preventing oxidation of the metal film on the semiconductor substrate and decomposition reactions of the IPA, etching of the metal film on the semiconductor substrate can be prevented.
(Step S107) After the heating in step S106, the valve 17 is opened to discharge the supercritical IPA from the chamber 11 and lower the pressure in the chamber 11. When the pressure in the chamber 11 becomes equal to or lower than the critical pressure Pc of IPA, the phase of the IPA changes from the supercritical fluid to a gas.
(Step S108) After the pressure in the chamber 11 is lowered to atmospheric pressure, the chamber 11 is cooled down, and the semiconductor substrate is taken out of the chamber 11.
After the pressure in the chamber 11 is lowered to atmospheric pressure, the semiconductor substrate may be transported into a cooling chamber (not shown) while remaining hot, and may be then cooled down. In that case, the chamber 11 can be always maintained in a certain high-temperature state. Accordingly, the period of time required for the semiconductor substrate drying operation can be shortened.
As described above, in this embodiment, when a supercritical drying operation is performed so that alcohol such as IPA serving as a replacement solution for rinse pure water is put into a supercritical state, etching of the metal material existing on the semiconductor substrate can be prevented, and accordingly, degradation of the electrical characteristics of the semiconductor device can be prevented.
In this experiment, a tungsten film of 100 nm in thickness was formed on each semiconductor substrate, and the temperature in each chamber was increased to 250° C. Each semiconductor substrate was then left in supercritical IPA for six hours. The polishing amount of each chamber in the electrolytic polishing process was 1.5 μm. Nitrogen was used as the inert gas.
In the cases where the electrolytic polishing was not performed on the chamber, all the tungsten film on the semiconductor substrate was removed by the supercritical drying operation, regardless of whether the oxygen purge was performed. The tungsten etching rate became too high to be measured.
In the case where the electrolytic polishing was performed on the chamber but the oxygen purge (step S105 of
In the case where the electrolytic polishing was performed on the chamber and the oxygen purge (step S105 of
As can be seen from the experiment results shown in
As described above, by the supercritical drying method according to this embodiment, etching of the metal material existing on the semiconductor substrate can be restrained, and degradation of the electrical characteristics of the semiconductor device can be prevented.
(Second Embodiment)
In the above described first embodiment, the Cr density in the oxide film at the surface portions of the SUS forming the chamber 11 is increased by the electrolytic polishing, so that the surfaces of the chamber 11 are put into a chemically-stabilized state, as shown in
IPA is supplied into the chamber 11, and the IPA is put into a supercritical state. The chamber 11 is then exposed to the supercritical IPA for a predetermined period of time. In this manner, the oxide film at the surface portions of the chamber 11 can be made thicker. For example, the inside of the chamber 11 is heated to 250° C., and the inner walls of the chamber 11 are exposed to the supercritical IPA for approximately six hours. In this manner, the film thickness of the oxide film at the surface portions of the chamber 11 can be increased from approximately 3 nm to approximately 7 nm. At this point, the film thickness of the oxide film is also increased from approximately 3 nm to approximately 7 nm at least at the surface portion of the inner wall of the pipe 14 located between the chamber 11 and the valve 15, and at least at the surface portion of the inner wall of the pipe 16 located between the chamber 11 and the valve 17.
In this experiment, a tungsten film of 100 nm in thickness was formed on each semiconductor substrate, and the temperature in each chamber was increased to 250° C. Each semiconductor substrate was then left in supercritical IPA for six hours. Nitrogen was used as the inert gas.
In the case where a chamber not exposed to supercritical IPA (a chamber not having the thickness of the oxide film increased) was used, all the tungsten film on the semiconductor substrate was removed by the supercritical drying operation. The tungsten etching rate became too high to be measured.
In the case where a chamber exposed to supercritical IPA for six hours was used, the tungsten etching rate was approximately 0.17 nm/minute. This result indicates that the tungsten etching rate can be greatly lowered, compared with the case where a chamber not exposed to supercritical IPA was used. This is supposedly because the chamber surfaces were put into a chemically-stabilized state as the film thickness of the oxide film at the surface portions was increased to approximately 7 nm, and decomposition reactions of IPA using the chamber surfaces as the catalyst were prevented.
In the case where a chamber exposed to supercritical IPA for 12 hours was used, the tungsten etching rate became even lower. This is supposedly because the oxide film in the chamber surfaces became even thicker, and the chamber surfaces were put into a more chemically-stabilized state. In the case where a chamber exposed to supercritical IPA for 18 hours was used, etching was hardly performed on the tungsten film on the semiconductor substrate, and the etching rate was almost 0 nm/minute.
As described above, etching of the metal material existing on a semiconductor substrate during a supercritical drying operation can be prevented by using a chamber having the oxide film made thicker at the surface portions and purging oxygen from the chamber with the use of an inert gas prior to the heating of IPA.
In the above described second embodiment, the chamber 11 is exposed to supercritical IPA, or the film thickness of the oxide film at the surface portions is increased by a “dummy run” of a supercritical drying operation. However, some other technique may be used. For example, the oxide film at the surface portions of the SUS forming the chamber 11 can be made thicker by performing oxidation using an ozone gas. Alternatively, alcohol other than IPA may be put into a supercritical state, and the chamber 11 may be exposed to the supercritical alcohol, to increase the thickness of the oxide film at the surface portions.
Also, in the above described second embodiment, the film thickness of the oxide film at the surface portions of the inner walls of the chamber 11 is increased to approximately 7 nm. However, the film thickness of the oxide film may be made equal to or greater than 7 nm.
In the above described embodiments, the metal film formed on each semiconductor substrate is a tungsten film. However, the same effects as those described above can be achieved in cases where a metal film made of molybdenum or the like having electrochemical characteristics similar to those of tungsten.
While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the inventions. Indeed, the novel methods and systems described herein may be embodied in a variety of other forms; furthermore, various omissions, substitutions and changes in the form of the methods and systems described herein may be made without departing from the spirit of the inventions. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the inventions.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2011-082753 | Apr 2011 | JP | national |
| Number | Name | Date | Kind |
|---|---|---|---|
| 20110289793 | Hayashi et al. | Dec 2011 | A1 |
| 20110314689 | Okuchi et al. | Dec 2011 | A1 |
| 20120118332 | Sato et al. | May 2012 | A1 |
| 20120240426 | Hayashi et al. | Sep 2012 | A1 |
| Number | Date | Country |
|---|---|---|
| 2006-332215 | Dec 2006 | JP |
| Entry |
|---|
| Sato, Y. et al., “Supercritical Drying Method for Semiconductor Substrate,” U.S. Appl. No. 13/052,232, filed Mar. 21, 2011. |
| Hayashi, H. et al., “Supercritical Drying Device and Method,” U.S. Appl. No. 13/160,350, filed Jun. 14, 2011. |
| Number | Date | Country | |
|---|---|---|---|
| 20120247516 A1 | Oct 2012 | US |
