SURFACE-COATED CUTTING TOOL

Information

  • Patent Application
  • 20250128337
  • Publication Number
    20250128337
  • Date Filed
    January 06, 2023
    2 years ago
  • Date Published
    April 24, 2025
    3 months ago
Abstract
A surface-coated cutting tool includes a substrate and a coating layer provided on the substrate, wherein 1) the coating layer includes an alternating layer of A sublayers and B sublayers,2) the A sublayers are each A Al1-aTiaN (where 0.30≤a≤0.70),3) the B sublayers are each Cr1-cM2cN (where M2 is B and/or Si, where 0.01≤c≤0.40),4) the A and B sublayers each have an average thickness of 1 nm or more and 500 nm or less, and5) the alternating layer has an average thickness of 0.3 μm or more and 7.0 μm or less,6) the adjoining A and B sublayers satisfy the relation: 0.1≤TA/TB≤0.8 or 1.2≤TA/TB≤10.0, where TA is the average thickness of the A sublayers and TB is the average thicknesses of the B sublayers.
Description
TECHNICAL FIELD

The present invention relates to surface coated cutting tools (hereinafter referred to as “coated tools”). This application claims priority based on Japanese Patent Application No. 2022-2531 filed on Jan. 11, 2022. The entire description in the Japanese patent application is hereby incorporated by reference.


BACKGROUND ART

Coated cutting tools are known that include substrates such as tungsten carbide (hereinafter referred to as WC) based cemented carbide and coating layers formed on the surfaces of the substrates in order to improve the service life of the tools. Various proposals have also been made regarding the composition and structure of the coating layers to further improve the cutting performance of coated tools.


For example, PTL 1 discloses a coated tool that includes a substrate, first layers comprising (TixAl1-x) (CyN1-y) (where 0.20≤x≤0.60, 0≤y≤0.5) and second layers containing CrN alternately deposited on the surface of the substrate, and a coating layer composed of the topmost first layers. The coated tool demonstrates sufficient durability in a cutting test of SKD 61.


PTL 2 discloses a coated tool comprising a substrate, a bottom layer consisting of TiAlN layers and mixed layers of TiAlN and CrBN alternately laminated on the surface of a substrate, an intermediate layer consisting of a mixture of TiAlN and CrBN on the bottom layer, and a CrBN layer on the intermediate layer. This coated tool has improved cutting performance and durability against steel and non-ferrous workpieces, such as iron or copper alloys, which have low hardness and are prone to welding, and high-hardness steel materials, such as tempered steel having a hardness of about 50 HRC.


CITATION LIST
Patent Literature



  • PTL1: Japanese Patent Application Unexamined Publication No. 2002-275618

  • PTL2: Japanese Patent Application Unexamined Publication No. 2007-63650



SUMMARY OF INVENTION
Technical Problem

An object of the present invention, which has been accomplished in view of the aforementioned circumstances and the aforementioned proposal, is to provide a coated tool having high durability even use in high-speed cutting of difficult-to-cut materials, such as Ti-based alloys.


Solution to Problem

A surface-coated cutting tool according to a first embodiment of the present invention includes a substrate and a coating layer provided on the substrate, wherein

    • 1) the coating layer includes an alternating layer of A sublayers and B sublayers,
    • 2) the A sublayers each have a composition represented by the formula: Al1-aTiaN (where 0.30≤a≤0.70),
    • 3) the B sublayers each have a composition represented by the formula: Cr1-cM2cN (where M2 is at least one selected from the group consisting of B and Si, where 0.01≤c≤0.40),
    • 4) the A sublayers each have an average thickness of 1 nm or more and 500 nm or less and the B sublayers each have an average thickness of 1 nm or more and 500 nm or less,
    • 5) the alternating layer of the A sublayers and the B sublayers has an average thickness of 0.3 μm or more and 7.0 μm or less, and
    • 6) the adjoining A and B sublayers satisfy the relation: 0.1≤TA/TB≤0.8 or 1.2≤TA/TB≤10.0, where TA is the average thickness of the A sublayers and TB is the average thicknesses of the B sublayers.


The surface cutting coated tool according to the first embodiment may satisfy the following condition (1):

    • (1) The alternating layer of the A sublayers and the B sublayers further includes one or more C sublayers with an average thickness of 0.3 μm or more and 2.0 μm or less at any position in the alternating layer, wherein the C sublayers each have a composition represented by the formula: Al1-d-eTidM3eN (where M3 is at least one selected from the group consisting of B and Si, 0.30≤d≤0.70, 0.00≤e≤0.30, and d≠a).


A surface-coated cutting tool according to a second embodiment includes a substrate and a coating layer provided on the substrate, wherein

    • 1) the coating layer includes an alternating layer of A sublayers and B sublayers,
    • 2) the A sublayer each have a composition represented by the formula: Al1-a-bTiaM1bN (where M1 is at least one selected from the group consisting of B and Si, 0.30≤a≤0.70, and 0.01≤b≤0.30).
    • 3) the B sublayers each have a composition represented by the formula: Cr1-cM2cN (where M2 is at least one selected from the group consisting of B and Si, where 0.01≤c≤0.40),
    • 4) the A sublayers each have an average thickness of 1 nm or more and 500 nm or less and the B sublayers each have an average thickness of 1 nm or more and 500 nm or less, and
    • 5) the alternating layer of the A sublayers and the B sublayers has an average thickness of 0.3 μm or more and 7.0 μm or less.


The surface cutting coated tool according to the second embodiment may further satisfy one or more of the following conditions (1) to (2):

    • (1) The alternating layers of the A sublayers and the B sublayers further includes one or more C sublayers with an average thickness of 0.3 μm or more and 2.0 μm or less at any position, wherein the C sublayers each have a composition represented by the formula: Al1-d-eTidM3eN (where M3 is at least one selected from the group consisting of B and Si, 0.30≤d≤0.70, 0.00≤e≤0.30, and d≠a and/or e≠b).
    • (2) the adjoining A and B sublayers satisfy the relation: 0.1≤TA/TB≤10.0, where TA represents the average thickness of the A sublayers and TB represents the average thicknesses of the B sublayers.


Advantageous Effects of Invention

The embodiment of the surface coated cutting tool has high durability in high-speed cutting of difficult-to-cut materials, such as Ti-based alloys.





BRIEF DESCRIPTION OF DRAWINGS


FIG. 1 is a schematic view illustrating a longitudinal section (cross-section perpendicular to the surface of the substrate) of the coating layer of the first embodiment of the invention; and



FIG. 2 is a schematic view illustrating a longitudinal section of the coating layer of the second embodiment of the invention.





DESCRIPTION OF EMBODIMENTS

The present inventor has extensively searched a coated tool having high durability, i.e., excellent cutting performance over a long period of use, even in cutting processes, such as high-speed cutting of Ti-based alloys (wet intermittent cutting with an end mill at a cutting rate of 80 m/min or more) in which a large thermal and mechanical load is applied to the cutting edge and the Ti-based alloy to be cut is adhered to the coated tool. Finally, the inventor has reached the following findings (1) to (3) regarding a reduction in adhesion which is caused by chemical reactions between the elements contained in the Ti-based alloy and the coating layer.

    • (1) Although a coating layer composed of a composite nitride containing Al and Ti can reduce welding or deposition, addition of B and Si, which are less soluble in the Ti-based alloy, to the composite nitride is more desirable for a reduction in welding or deposition.
    • (2) However, crystal grains with a hexagonal crystal structure are formed in the composite nitride containing Al and Ti as the content of B and Si increases, resulting in a decrease in the hardness of the coating layer and insufficient wear resistance of the coating layer.
    • (3) Even if crystal grains with a hexagonal crystal structure of the composite nitride containing Al and Ti are formed, a composite nitride layer mainly composed of Cr, which is difficult to form crystal grains with a hexagonal crystal structure, deposited on the composite nitride containing Al and Ti can prevent the hardness of the coating layer from decreasing and achieve sufficient wear resistance of the coating layer.


The coated tool of the embodiments of the present invention will now be described in detail. Throughout the specification and the claims, a numerical range expressed as “L to M” (L and M are both numerical values) includes the upper limit (M) and the lower limit (L), and in the case that only the upper limit is followed by a unit, the lower limit (L) has also the same unit.


The surface of the substrate is defined by a mean linear line that is arithmetically determined from a roughness curve of the interface between the substrate and the coating sublayer adjoining the substrate. According to this method of determining the mean line, if the diameter of the tool, which is the diameter of the substrate having a curved surface, is sufficiently large in relation to the thickness of the coating layer, the interface between the coating layer and the substrate can be treated as a plane, and the surface of the substrate can be determined in the same way.


High-speed machining of difficult-to-cut materials in the following first and second embodiments refers to wet intermittent machining of Ti-based alloys at a cutting rate of 80 m/min or more with an end mill, wet continuous machining of austenitic stainless steel at a cutting rate of 200 m/min or more with a turning insert, and side cutting of Ni-based alloys at a cutting rate of 45 m/min or more with an end mill, for example.


“Coating layer” is a generic term for layers, i.e., Ai sublayer, Bj sublayer, Ck sublayer (Ck sublayer exists only in the second embodiment and not in the first embodiment), bottom layer, top layer, and any layer that may occur incidentally, lying on the surface of the substrate.


A sublayers, B sublayers, and C sublayers are referred to collectively as an Ai sublayer, a Bj sublayer, and a Ck sublayer, respectively, but no distinct difference in usage is between the A sublayer and the Ai sublayer, between the B sublayer and the Bj layer, and between the C sublayer and the Ck sublayer.


I. First Embodiment


FIG. 1 is a schematic view illustrating a longitudinal section (a section perpendicular to the surface ignoring minute irregularities of the substrate in the case of an insert; or a section perpendicular to the central axis in the case of a shaft tool, such as an end mill or drill) of the coating layer of a coated tool according to the first embodiment of the invention. In this embodiment, the Ai sublayer (3) and the Bj sublayer (4) are alternately deposited (I=1 to m, j=1 to n, m is the number of A sublayers and n is the number of B sublayers, |m−n|≤1) from the substrate (1) to the surface of the coated tool, i.e., the surface of the coating layer. Although FIG. 1 depicts the bottom layer (6) and the top layer (7), these layers may be omitted.


1. Alternating Layer of a Sublayers and B Sublayers

As shown schematically in FIG. 1, the coating layer should preferably be an alternating layer (2) of Ai sublayers (3) and Bj sublayers (4) from the substrate (1) toward the surface of the tool (surface of the coating layer). It should be noted that the alternating layer (2) is not depicted in the white area in FIG. 1.


(1) A Sublayer
(1-1) Composition

Each A sublayer preferably has an average composition represented by Al1-a-bTiaM1bN (where M1 is at least one selected from the group consisting of B and Si, 0.30≤a≤0.70, and 0.00≤b≤0.30). The phrase “M1 is at least one selected from the group consisting of B and Si” means M1=B, M1=Si, or M1=B and Si.


The reasons for determining the values of subscripts a and b in the above-described ranges are as follows: A value of subscript a less than 0.30 leads to a decrease in hardness of A sublayers and insufficient wear resistance due to the formation of hexagonal crystal grains caused by an increase in Al content. A value of subscript a exceeding 0.70 leads to a decrease in the hardness and oxidation resistance of Al sublayer at high temperatures. A more preferred value of subscript a lies between 0.40 and 0.65.


A value of subscript b may be 0.00, in other words, M1 component is not essential. A value of subscript b of 0.01 or more however ensures improved welding resistance of the A sublayers, while a value of subscript b exceeding 0.30 causes brittle A sublayers to form and does not provide sufficient wear resistance. More preferably the value of subscript b ranges from 0.03 to 0.10


In the case that the value of subscript b is 0.00, in other words, no M1 component is contained, the average thickness of the A sublayers and B sublayers should preferably satisfies the relation 0.1≤TA/TB≤0.8 or 1.2≤TA/TB≤10.0 where TA and TB are the average thickness of the A sublayers and B sublayers, respectively.


In accordance with a typical example, described below, of the method of preparing the composition, the composition is prepared such that the ratio of (Al1-a-bTiaM1b) to N is 1:1. However, the ratio may be unintentionally deviated from 1:1 in some cases. This also holds for the other composite nitrides discussed below.


(1-2) Average Thickness

The average thickness per A sublayer, i.e., the average thickness of the Ai layer, should range from 1 nm to 500 nm for the following reasons: An average thickness of less than 1 nm leads to insufficient improvements in wear resistance and chipping resistance of the Ai sublayers, while an average thickness exceeding 500 nm lead to lattice mismatch to adjoining Bj sublayers, and thus large internal strain in the Bj layer causing self-destruction. More preferably the average thickness of the Ai sublayers ranges from 5 nm to 200 nm.


(2) B Sublayer
(2-1) Composition

It is preferred that the B sublayers each have an average composition represented by the formula: Cr1-cM2cN (where M2 is at least one selected from the group consisting of B and Si, where 0.01≤c≤0.40). The phrase “M2 is at least one of B and Si” M2=B, M2=Si, or M2=B+Si.


The reasons for determining the value of subscript c in the above-described range is as follows: A value of subscript c less than 0.01 leads to an insufficient adhesion reduction brought about by the B sublayers, whereas a value of subscript c exceeding 0.40 leads to formation of brittle B sublayers and thus insufficient wear resistance. It is more preferable that the value of subscript c ranges from 0.05 to 0.20.


The B layers are deposited such that these layers are composed of a single phase and nitrides, such as Si3N4 and BN, do not precipitate. Since these nitrides have low crystallinity and low hardness, unexpected precipitation of nitrides may work as a starting point for destruction.


(2-2) Average Thickness

The average thickness per B layer, i.e., the average thickness of the Bj sublayer, should ranges from 1 nm to 500 nm for the following reasons. An average thickness of less than 1 nm leads to insufficient adhesion resistance of the Bj sublayer, whereas an average thickness exceeding 500 nm leads to large internal strain of the Bj sublayer readily causing self-destruction of the Bj sublayer. The average thickness of the Bj sublayer is more preferable to ranges from 5 nm to 200 nm.


(3) Alternating Layer of Ai Sublayers and Bj Sublayers

It is preferred that A sublayers and B sublayers are alternately deposited. In other words, each Ai sublayer and each Bj sublayer is in contact with each other in the stack. As mentioned above, the average thickness of both the Ai and Bj layers ranges from 1 nm to 500 nm (the average thickness of the Ai sublayers and that of the Bj sublayers may be the same or different), and the average thickness of the alternating layer of Ai sublayers and Bj sublayers should range from 0.3 μm to 7.0 μm.


An average thickness of less than 0.3 μm of the alternating layer of Ai sublayers and Bj sublayers leads to insufficient welding resistance and wear resistance, whereas an average thickness exceeding 7.0 μm leads to large internal distortion causing self-destruction. Preferably, the average thickness should range from 1.0 μm to 5.0 μm.


It is preferred that the average thicknesses TA and TB of the adjoining Ai sublayer and Bj sublayer satisfy the relation: 0.1≤TA/TB≤0.8 or 1.2≤TA/TB≤10.0 in the case that M1 is not contained (b=0.00) whereas the average thicknesses satisfy the relation: 0.1≤b≤0.30 and 0.1≤TA/TB≤10.0 in the case that Ma is contained, for the following reasons: In the case that M1 is not contained, a ratio TA/TB of less than 0.1 or greater than 10.0 leads to lattice mismatch between the Ai and Bj sublayers causing self-destruction of the alternating layer, whereas a ratio TA/TB of greater than 0.8 and less than 1.2 may form an amorphous mixture of the A and B sublayers causing insufficient wear resistance. In the case that M1 is contained, a ratio TA/TB less than 0.1 or greater than 10.0 may lead to lattice mismatch between the Ai sublayer and Bj sublayer causing self-destruction of the alternating layer.


In the first embodiment, the ratio TA/TB is calculated as follows: For example, in the case that a deposit of five sublayers, Aj, Bi, Aj+1, Bi+1, and Aj+2 sublayers, are targets of measurement, the ratio TA/TB represents the average of the four ratios: [Aj]/[Bi], [Aj+1]/[Bi], [Aj+1]/[Bj+1], and [Aj+2]/[Bi+1] where [Aj] represents the average thickness of the Aj sublayers and [Bi] represents the average thickness of the Bi sublayers.


In the alternating layer of the Ai and Bj sublayers, the sublayer closest to the substrate may be either the bottommost Ai or Bj sublayer, while the sublayer closest to the surface of the tool may also be either the topmost Ai or Bj sublayer. In the alternating layer of the Ai and Bj sublayers, the total number (m+n) of layers of the Ai and Bj sublayers is not restricted. The preferred total number ranges from 10 to 100.


(5) Other Layers
(5-1) More Desirable Layer to Exist

Although the aforementioned issue can be adequately solved with only the alternating layer (2) of Ai and Bj sublayers; a bottom layer (6) may be optionally provided between the substrate (1) and the alternating layer (2), and/or a top layer (7) may be optionally provided on the alternating layer or the surface of the tool, in addition to the alternating layer, as shown in FIG. 1.


(5-1-1) Bottom Layer

The bottom layer may be provided to more tightly bond the alternating layer of the Ai and Bj sublayers to the substrate. Examples of the bottom layer include, but are not limited to, composite nitride layers of Al and Ti, composite nitride layers of Al, Ti and Si, and composite nitride layers of Al and Cr (the compositions of these layers may include their nonstoichiometric composition). The average thickness of the bottom layer may be, for example, 0.3 to 5.0 μm. The bottom layer may have the same composition as the Ai sublayer. In the case that the layer adjoining the bottom layer is the bottommost Ai sublayer, the bottom layer is indistinguishable from the adjoining Ai sublayer and thus the bottom layer is in contact with the bottommost Bj sublayer.


(5-1-2) Top Layer

The top layer may be provided on the surface of the alternating layer of the Ai and Bj sublayers, which is the surface of the tool. The top layer may be, for example, a TiN layer. The TiN layer, which has a golden color tone, can be used, for example, as an identification layer to determine whether the coated tool has not been used or has been used from a change in the color tone of the surface of the coated tool. The TiN identification layer may have an average thickness in the range of, for example, 0.1 to 1.0 μm.


(5-2) Layer that May Occur Incidentally


In this embodiment, each layer is deposited such that no layers are formed, besides the A sublayers, the B sublayers, the bottom layer, and the top layer. Unintentional fluctuations in pressure and/or temperature may however occur in the deposition system when the type of the layer to be deposited is changed. In such a case, any layer with a different composition than these layers may be unintentionally or incidentally formed between these layers. This layer is referred to as a layer that may be incidentally formed.


2. Substrate
(1) Material

The substrate of this embodiment may be composed of any conventional material that can achieve the aforementioned object. Examples of such preferable material include cemented carbides, such as WC-based cemented carbide that may further contain Co, Ti, Ta, and Nb, in addition to WC; Cermets containing TiC, TiN, or TiCN as a main component; ceramics, such as titanium carbide, silicon carbide, silicon nitride, aluminum nitride, and aluminum oxide; cBN sinter, and diamond sinter.


(2) Shape

The substrate can be processed into any shape suitable for cutting tools. Examples of such a shape include shapes of inserts, end mills, and drills.


II. Second Embodiment


FIG. 2 is a schematic view illustrating a longitudinal section of the coating layer of a coated tool according to the second embodiment of the invention. The tool includes a substrate (1); an alternating layer (8) of Ai sublayers (3) and Bj sublayers (4) in contact with each other from the substrate (1) toward the surface of the tool (the surface of the coating layer); and one or more Ck sublayers (5) disposed in the alternating layer (where I=1 to m, j=1 to n where m and n are the number of layers, 1≤k≤p where p will be described below). The bottom layer (6) and top layer (7) may be omitted from the configuration shown in FIG. 2.


1. One or More Ck Layers Disposed at any Portion in Alternating Layer of Ai and Bj Sublayers

The coating layer of this embodiment should preferably include one or more Ck sublayers (5) disposed at any position in the alternating layer of Ai sublayers (3) and Bj sublayers (4) extending from the substrate to the surface of the tool or coating layer (9), as shown schematically in FIG. 2. It should be understood that the Ai sublayers (3), the Bj sublayers (4), and Ck sublayer(s) (5) are also present in the white area in FIG. 2.


Since the Ai and Bj sublayers are the same as those described in the first embodiment, redundant description is omitted. Any number of Ck sublayers may be disposed. The number is preferably 15, more preferably 10.


Also in the case that the C sublayer is present, it is preferred that at least five consecutive alternating A and B sublayers, such as A sublayer, B sublayer, A sublayer, B sublayer, A sublayer, B sublayer, A sublayer, B sublayer, A sublayer, B sublayer are present with proviso that the C layer is regarded as not being present.


The coating layer, including one or more Ck sublayers disposed at any position in the alternating layer of Ai and Bj sublayers, preferably has an average thickness in the range of 0.3 μm to 7.0 μm, like the average thickness of the alternating layer of Ai and Bj sublayers.


An average thickness less than 0.3 μm of the coating layer fails to achieve sufficiently high welding resistance and wear resistance, whereas a thickness exceeding 7.0 μm leads to an increase in internal strain causing ready self-destruction of the coating layer.


The preferred range of the ratio TA/TB is the same as in the first embodiment where TA and TB represents the average thicknesses of adjoining Ai and Bj sublayers, respectively. The method of determining the ratio TA/TB is also the same as in the first embodiment where the existence of the Ck sublayer is ignored (assuming that the Ck sublayer does not exist). In the case of a deposition of five layers, for example, Aj, Bi, Aj+1, Bi+1, and Aj+2 layers are used for determination of the ratio.


(1) C Sublayer
(1-1) Composition

The C sublayers preferably have an average composition represented by Al1-d-eTidM3eN (where M3 is at least one selected from the groups consisting of B and Si, 0.30≤d≤0.70, and 0.00≤e≤0.30, where d≠a and/or e≠b. The phrase “M3 is at least one of B and Si” means M3=B, M3=Si, or M3=B+Si.


The values of d and e are determined as in the above ranges for the following reasons: A value of subscript d less than 0.30 leads to formation of hexagonal crystal grains due to an increase in Al content and thus an increase in the hardness of the C sublayers, resulting in insufficient wear resistance. More preferably, the value of subscript d ranges from 0.40 to 0.65.


Although the M3 component may be omitted (e=0.00), the existence of the M component (e>0.00) ensures a further improvement in weld resistance of the C sublayer. A value of subscript e exceeding 0.30 however leads to brittle C sublayers causing insufficient wear resistance. A more preferred value of subscript e ranges from 0.01 to 0.10.


(1-2) Average Thickness

The average thickness per C sublayer, i.e., the average thickness of the Ck sublayer, should ranges from 0.3 μm to 2.0 μm for the following reasons: An average thickness of less than 0.3 μm leads to insufficient wear resistance of the Ck sublayer, whereas an average thickness exceeding 2.0 μm leads to a relatively large thickness of the Ck sublayer in comparison with the alternating layer of Ai and Bj sublayers. Such a thick Ck sublayer causes insufficient welding resistance in the portion containing the Ck sublayer disposed in the alternating layer of Ai and Bj sublayers. The average thickness of the Ck layer should preferably be more than 0.4 μm and less than 1.0 μm.


(2) Position of Disposed Ck Sublayer

It is preferred that the Ck sublayer is disposed at any position in the alternating layer of the Ai and Bj sublayers. The phrase “the Ck layer is disposed at any position” indicates that the Ck sublayer is present between the two adjacent Ai sublayers, between the two adjacent Bj sublayers, between the adjacent Ai and Bj sublayers, between the alternating layer of the Ai and Bj sublayers and the substrate, i.e. adjacent to the substrate (between the bottom layer if present, i.e., adjacent to the bottom layer), or on the alternating layer of Ai and Bj sublayers or between the alternating layer of the Ai and Bj sublayers and the top layer if present. In the case that the Ck sublayer is disposed, three adjacent layers are as follows: AiCkAi+1, BjCkBj+1, AiCkBj, BjCkAi, CkAiBj “on the substrate or bottom layer if present”, CkBjAi “on the substrate or bottom layer if present”, BjAiCk (Ck is in contact with the tool surface or top layer when present), or AiBjCk (Ck is in contact with the alternating laminate of Ai and Bj layers or the top layer if present).


The total number (i+j+k) of Ai, Bj and Ck sublayers may be any number in the case that one or more Ck sublayers are disposed in the alternating layer of Ai and Bj sublayers. A preferred total number is 10 or more and 100 or less. Each C sublayer may be disposed any position in the alternating layer. In the case that three or more Ck sublayers are disposed, the total number of the Ai and Bj sublayers between adjacent Ck sublayers may be the same or different.


The bottommost sublayer, closest to the substrate, may be an Ai, Bj, or Ck sublayer, and the topmost sublayer, closest to, the tool surface may also be an Ai, Bj, or Ck sublayer.


(3) Other Layers

The description of the other layers is basically the same as the first embodiment, with the proviso that “the alternating layer of the Ai and Bj sublayers to the substrate” on the bottom layer should be replaced by “the alternating layer of the Ai and Bj sublayers and one or more interposed Ck sublayers to the substrate”, “the surface of the alternating layer of the Ai and Bj sublayers” on the top layer should be replaced by “the surface of the alternating layer of the Ai and Bj sublayers and one or more interposed Ck sublayers”, and “besides the A sublayers, the B sublayers, the bottom layer, and the top layer” on the layer that may occur incidentally should be replaced by “besides the A sublayers, the B sublayers, the C sublayer(s), the bottom layer, and the top layer”.


2. Substrate

The description of the substrate is the same as in the first embodiment.


III. Determination

Each tool sample is cut into a longitudinal section with a focused ion beam (FIB) system, and the thickness of each layer is measured with a scanning electron microscope (SEM) or transmission electron microscope (TEM). For the alternating layer, at least five sublayers (for TA/TB measurement, five or more consecutive sublayers of the same type, for example, five consecutive layers, such as an A sublayer, a B sublayer, an A sublayer, a B sublayer, an A sublayer, a B sublayer, an A sublayer, a B sublayer, an A sublayer, and a B sublayer) are measured for each of the A and B sublayers. If there are fewer than 5 sublayers, all the sublayers concerned are measured. The thickness of each layer is determined at five points. The sample may be observed at any magnification suitable for measurement of the thickness. For example, A and B sublayers may be observed at 50,000 to 500,000×, and C sublayers and the entire coating layer may be at 10,000 to 10,000×. The average value of the five points shall be the average thickness of each layer. In addition, energy dispersive X-ray analysis (EDS) with SEM or TEM, Auger electron spectroscopy (AES), and electron probe micro analyzer (EPMA) are used for cross-sectional observation, the compositions of A, B, and C sublayers are measured at five locations for each layer, and the average composition is calculated from the average of these measurements.


IV. Production

The coating layers of the first and second embodiments can be produced, for example, by the following PVD process. The second embodiment differs from the first embodiment in that the second embodiment involves the step of forming the C sublayer. The steps of forming the bottom and top layers are not mandatory in either the first or second embodiments.


The arc ion plating (AIP) system is purged with a nitrogen atmosphere. An AlTiM1 alloy target having a composition: Al100-a′-b′Tia′M1b′ (where M1 is at least one selected from the group consisting B and Si, where 20≤a′≤80, and 0≤b′≤40) is prepared for Ai sublayers; a CrM2 alloy target having a composition: Cr100-c′M2c′ (where M2 is at least one selected from the group consisting of B and Si, where 1≤c′≤50) is prepared for Bj sublayers; and an AlTiM3 alloy target having a composition Al100-d′-e′Tid′M3e′ (where M3 is at least one selected from the group consisting of B and Si, where 20≤d′≤80, 0≤e′≤40) is prepared for Ck sublayer(s). For example, an optional AlTi, AlTiSi, or AlCr alloy target is prepared for a bottom layer depending on a desired composite nitride layer; and, for example, an optional Ti target is prepared for a top layer. Arc discharges are sequentially generated between these targets and an anode to deposit a bottom layer, Ai sublayers, Bj sublayers, Ck sublayers, and a top layer each with a predetermined average thickness. The composition of each target is expressed as an integer ratio of atoms.


The above description supports the following features:


(Feature 1)

A surface-coated cutting tool comprising:

    • a substrate and a coating layer disposed on the substrate, wherein
    • 1) the coating layer includes an alternating layer of A sublayers and B sublayers,
    • 2) the A sublayers each have a composition represented by the formula: Al1-a-bTiaN (where 0.30≤a≤0.70),
    • 3) the B sublayers each have a composition represented by the formula: Cr1-cM2cN (where M2 is at least one selected from the group consisting of B and Si, where 0.01≤c≤0.40),
    • 4) the A sublayers each have an average thickness of 1 nm or more and 500 nm or less and the B sublayers each have an average thickness of 1 nm or more and 500 nm or less,
    • 5) the alternating layer of the A sublayers and the B sublayers has an average thickness of 0.3 μm or more and 7.0 μm or less, and
    • 6) the adjoining A and B sublayers satisfy the relation: 0.1≤TA/TB≤0.8 or 1.2≤TA/TB≤10.0, where TA represents the average thickness of the A sublayers and TB represents the average thicknesses of the B sublayers.


(Feature 2)

The surface coated cutting tool according to Feature 1, wherein there is a portion where five or more of the A sublayers and five or more of the B sublayers are continuously present.


(Feature 3)

The surface-coated cutting tool according to Feature 1 or 2, wherein the alternating layer of the A sublayers and the B sublayers further includes one or more C sublayers with an average thickness of 0.3 μm or more and 2.0 μm or less at any position in the alternating layer, wherein the C sublayers each have a composition represented by the formula: Al1-d-eTidM3eN (where M3 is at least one selected from the group consisting of B and Si, 0.30≤d≤0.70, 0.00≤e≤0.30, and d≠a).


(Feature 4)

A surface-coated cutting tool comprising:

    • a substrate and a coating layer disposed on the substrate, wherein
    • 1) the coating layer includes an alternating layer of A sublayers and B sublayers,
    • 2) the A sublayer each have a composition represented by the formula: Al1-a-bTiaM1bN (where M1 is at least one selected from the group consisting of B and Si, 0.30≤a≤0.70, and 0.01≤b≤0.30).
    • 3) the B sublayers each have a composition represented by the formula: Cr1-cM2cN (where M2 is at least one selected from the group consisting of B and Si, where 0.01≤c≤0.40),
    • 4) the A sublayers each have an average thickness of 1 nm or more and 500 nm or less and the B sublayers each have an average thickness of 1 nm or more and 500 nm or less, and
    • 5) the alternating layer of the A sublayers and the B sublayers has an average thickness of 0.3 μm or more and 7.0 μm or less.


(Feature 5)

The surface-coated cutting tool according to Feature 4, wherein the adjoining A and B sublayers satisfy the relation: 0.1≤TA/TB≤10.0, where TA represents the average thickness of the A sublayers and TB represents the average thicknesses of the B sublayers.


(Feature 6)

The surface-coated cutting tool according to Feature 3 or 4, wherein the alternating layer of the A sublayers and the B sublayers further includes one or more C sublayers with an average thickness of 0.3 μm or more and 2.0 μm or less at any position in the alternating layer, wherein the C sublayers each have a composition represented by the formula: Al1-d-eTidM3eN (where M3 is at least one selected from the group consisting of B and Si, 0.30≤d≤0.70, 0.00≤e≤0.30, where d≠a and/or) e≠b.


(Feature 7)

The surface coated cutting tool according to Feature 5 or 6, wherein there is a portion where five or more of the A sublayers and five or more of the B sublayers are continuously present.


(Feature 8)

The surface coated cutting tool according to any one of Features 1 to 7, further comprising a bottom layer directly above the substrate.


(Feature 9)

The surface coated cutting tool according to any one of Features 1 to 8, wherein the top surface of the coating layer is a top layer.


EXAMPLES

The invention will now be described by way of examples that are not to be construed as limiting the invention.


(1) Production of Substrate

Raw powders of WC, TiC, VC, TaC, NbC, Cr3C2, and Co were blended according to the formulations shown in Table 1. Wax was added and the mixture was ball-milled in acetone for 24 hours, dried under reduced pressure, and pressed under a pressure of 98 MPa into a green compact with a predetermined shape.


The green compact was sintered under vacuum to form a sintered round bar with a diameter of 6 mm for forming substrates. The sintered round bar was subjected to a grinding process to produce end mill substrates 1 to 4 made of WC-based cemented carbide and having a four-blade square shape with a cutting edge that has diameter of 6 mm and a length of 13 mm. Each of substrates 1 to 4 was ultrasonically cleaned in acetone and the dried.


(2) Production of Coating Layer

The substrates were mounted along the periphery at a predetermined radial distance from the center axis on a turn table of an AIP system. A target (cathode) of AlTiM1 alloy with a predetermined composition, a target of CrM2 alloy with a predetermined composition, a target of AlTiM3 alloy with a predetermined composition, targets of AlTi, AlTiSi and AlCr alloys, respectively, for a bottom layer, and a Ti target for a top layer were placed in the AIP system.


After bombarding treatment of each of substrates 1 to 4, Examples 1 to 24 and 49 to 76 of coated tools corresponding to the first embodiment were produced through Processes 1) to 5) in Section (2-1), and Examples 25 to 48 and 77 to 100 of coated tools corresponding to the second embodiment were produced through Processes 1′) to 6′) in Section (2-2). These examples are shown in Tables 12 to 27.


(2-1) Example of Coated Tools Corresponding to the First Embodiment
1) Deposition of Bottom Layer

In some examples, the bottom layer was deposited through the following procedure. Nitrogen reaction gas was introduced into the AIP system to create a nitrogen atmosphere of 3.5 Pa for deposition of the bottom layer, as shown in Table 11; the substrate spinning on the rotary table was maintained at 480° C.; a DC bias voltage of −45 V was applied to the substrate; and arc discharges were generated between the anode and targets of AlTi, AlTiSi, and AlCr alloys corresponding to the compositions of the bottom layer to deposit bottom layers on the substrates. In Tables 2 to 9, the compositions of the targets are shown in the form of the integer ratio of each atom with the sum of the ratios being 100, which are different from those of the A, B, and C layers.


2) Deposition of Ai Sublayer

Nitrogen reaction gas was introduced into the AIP system, and an arc discharge was generated between the AlTiCrM1 alloy target and the anode to deposit an Ai sublayer. The nitrogen atmosphere pressure, substrate temperature, and bias voltage were those shown in Tables 2, 3, 6 and 7.


3) Deposition of Bj Sublayer

An arc discharge was generated between the CrM2X alloy target and an anode to deposit a Bj sublayer. The nitrogen atmosphere pressure, substrate temperature, and bias voltage were those shown in Tables 2, 3, 6, and 7.


4) Deposition of Alternating Layer of Ai Sublayers and Bj Sublayers

The depositions of Procedures 2) and 3) were repeated predetermined times to deposit an alternating layer of Ai and Bj sublayers with the number of sublayers shown in Tables 12, 13, 14, 15 and 20 to 23.


5) Deposition of Top Layer

In some examples, a top layer was deposited through the following procedure. Nitrogen reaction gas was introduced into the AIP system, and the nitrogen atmosphere was adjusted to a pressure of 4.0 Pa for deposition of a top layer as shown in Table 11; the temperature of the substrate spinning on the turn table was maintained at 500° C.; a bias voltage of −75 V was applied to generate an arc discharge between the Ti target corresponding to the composition of the top layer. The top layer was thereby deposited.


(2-2) Example of Coated Tools Corresponding to the Second Embodiment
1′) Deposition of Bottom Layer

In some cases, a bottom layer was deposited as in Procedure 1) in the first embodiment.


2′) Deposition of Ai Sublayer

The A sublayers were deposited under the conditions shown in Tables 4, 5, 8 and 9, which corresponds to Procedure 2) of the first embodiment.


3′) Deposition of Bj Sublayer

The B sublayers were deposited under the conditions shown in Tables 4, 5, 8 and 9, which corresponds to Procedure 3) of the first embodiment.


4′) Deposition of One or More Ck Sublayers at any Given Position in Alternating Layer of Ai and Bj Sublayers.

The Ck sublayer was deposited so as to be disposed at any position as described above. The conditions for deposition of Ck sublayers are described in Procedure 5′). In a first mode, the Ck sublayer was deposited on the bottom layer, and then the Ai and Bj sublayers were alternately deposited. In a second mode, Procedures 1) and 2) were repeated by predetermined cycles to form an alternating layer of Ai and Bj sublayers, the Ck sublayer was deposited on the alternating layer, and Procedures 1) and 2) were again repeated by predetermined cycles to form another alternating layer of Ai and Bj sublayers. As a result, the Ck sublayer is between adjacent Ai sublayers, between adjacent Bj sublayers, or between an Ai sublayer and the adjacent Bj sublayer. In this mode, one or more optional Ck sublayers were deposited in the same manner. In a third mode, a Ck sublayer was deposited after the alternating layer of Ai and Bj sublayers. The Ck sublayer or the predetermined number of Ck sublayers were thereby disposed at a predetermined position or positions in the alternating layer shown in Tables 16, 17, 18, 19 and 24 to 27. In the tables, the position of each C sublayer is represented by the ordinal number counting from the bottommost sublayer (the first sublayer) on the substrate or the bottom layer if present toward the coated tool surface.


5′) Deposition of Ck Sublayer

An arc discharge was generated between the AlTiM3 alloy target and the anode under the conditions shown in Tables 4, 5, 8, and 9 on the pressure of the nitrogen atmosphere, substrate temperature, and bias voltage to deposit Ck sublayers with compositions and average thickness per sublayer as shown in Tables 16, 17, 18, 19 and 24 to 27.


6′) Deposition of Top Layer

In some cases, the top layer was deposited under the same conditions as in Procedure 5).


(3) Comparative Examples

For comparison, Substrates 1 to 4 were each ultrasonically cleaned in acetone, dried, mounted along the periphery at a predetermined distance in the radial direction from the center axis on the turn table of the AIP system, and subjected to bombardment treatment, like Examples 1 to 100, under Conditions 1′ to 16′ shown in Table 10. Surface coated inserts 1′ to 16′ (hereinafter referred to as “Comparative Examples 1′ to 16′”) were thereby manufactured as shown in Tables 28 and 29.


The average composition and average thickness were calculated for each of Examples 1 to 100 and Comparative Examples 1′ to 16′ produced as described above, using the method described above (the thickness was measured at five locations of all the C sublayers in the case of less than five C sublayers.


Tables 12 to 29 show the results of measurement and calculation, where “overall average thickness (μm)” indicates the average thickness (μm) of the sum of the thicknesses of all Ai and Bj sublayers in the first embodiment, and the average thickness (μm) of the sum of the thicknesses of all Ai, Bj and Ck sublayers in the second embodiment. In Tables 28 and 29, “-” indicates not present.











TABLE 1









Composition (mass %)














Substrate
Co
TiC
VC
TaC
NbC
Cr3C2
WC

















1
5.6
0.0
0.0
0.0
0.0
0.7
Balance


2
8.2
0.0
0.4
0.0
0.0
0.5
Balance


3
9.8
4.3
0.0
5.1
2.3
0.0
Balance


4
12.1
0.0
0.0
0.0
0.0
1.0
Balance



















TABLE 2









Conditions for deposition of A sublayer
Conditions for deposition of B sublayer
















Conditions for



Bias
Substrate


Bias
Substrate


deposition of
Substrate
Composition
Pressure
voltage
Temp.
Composition
Pressure
voltage
Temp.


coating layer
#
of target
(Pa)
(V)
(° C.)
of target
(Pa)
(V)
(° C.)




















Condition
1
1
Al63Ti35B1Si1
4.0
−50
500
Cr98B1Si1
4.0
−50
500


of Example
2
2
Al63Ti35B1Si1
4.0
−50
500
Cr94B3Si3
4.0
−50
500



3
3
Al63Ti35B1Si1
4.0
−50
500
Cr80B10Si10
4.0
−50
500



4
4
Al63Ti35B1Si1
4.0
−50
500
Cr60B20Si20
4.0
−50
500



5
1
Al58Ti40B1Si1
4.0
−60
500
Cr98B1Si1
4.0
−60
500



6
2
Al58Ti40B1Si1
4.0
−60
500
Cr94B3Si3
4.0
−60
500



7
3
Al58Ti40B1Si1
4.0
−60
500
Cr80B10Si10
4.0
−60
500



8
4
Al58Ti40B1Si1
4.0
−60
500
Cr60B20Si20
4.0
−60
500



9
1
Al33Ti65B1Si1
4.0
−70
500
Cr98B1Si1
4.0
−70
500



10
2
Al33Ti65B1Si1
4.0
−70
500
Cr94B3Si3
4.0
−70
500



11
3
Al33Ti65B1Si1
4.0
−70
500
Cr80B10Si10
4.0
−70
500



12
4
Al33Ti65B1Si1
4.0
−70
500
Cr60B20Si20
4.0
−70
500



















TABLE 3









Conditions for deposition of A sublayer
Conditions for deposition of B sublayer
















Conditions for



Bias
Substrate


Bias
Substrate


deposition of
Substrate
Composition
Pressure
voltage
Temp.
Composition
Pressure
voltage
Temp.


coating layer
#
of target
(Pa)
(V)
(° C.)
of target
(Pa)
(V)
(° C.)




















Condition
13
1
Al28Ti70B1Si1
6.0
−80
480
Cr98B1Si1
6.0
−80
480


of Example
14
2
Al28Ti70B1Si1
6.0
−80
480
Cr94B3Si3
6.0
−80
480



15
3
Al28Ti70B1Si1
6.0
−80
480
Cr80B10Si10
6.0
−80
480



16
4
Al28Ti70B1Si1
6.0
−80
480
Cr60B20Si20
6.0
−80
480



17
1
Al45Ti45B5Si5
4.0
−50
500
Cr98B1Si1
4.0
−50
500



18
2
Al45Ti45B5Si5
4.0
−50
500
Cr94B3Si3
4.0
−50
500



19
3
Al45Ti45B5Si5
4.0
−50
500
Cr80B10Si10
4.0
−50
500



20
4
Al45Ti45B5Si5
4.0
−50
500
Cr60B20Si20
4.0
−50
500



21
1
Al40Ti40B10Si10
4.0
−50
500
Cr98B1Si1
4.0
−50
500



22
2
Al40Ti40B10Si10
4.0
−50
500
Cr94B3Si3
4.0
−50
500



23
3
Al40Ti40B10Si10
4.0
−50
500
Cr80B10Si10
4.0
−50
500



24
4
Al40Ti40B10Si10
4.0
−50
500
Cr60B20Si20
4.0
−50
500



















TABLE 4









Conditions for deposition of A sublayer
Conditions for











Conditions for

Bias
Substrate
deposition of B sublayer














deposition of
Substrate
Composition
Pressure
voltage
Temp.
Composition
Pressure


coating layer
#
of target
(Pa)
(V)
(° C.)
of target
(Pa)


















Condition
25
1
Al63Ti35B1Si1
4.0
−50
500
Cr98B1Si1
4.0


of Example
26
2
Al63Ti35B1Si1
4.0
−50
500
Cr94B3Si3
4.0



27
3
Al63Ti35B1Si1
4.0
−50
500
Cr80B10Si10
4.0



28
4
Al63Ti35B1Si1
4.0
−50
500
Cr60B20Si20
4.0



29
1
Al58Ti40B1Si1
4.0
−60
500
Cr98B1Si1
4.0



30
2
Al58Ti40B1Si1
4.0
−60
500
Cr94B3Si3
4.0



31
3
Al58Ti40B1Si1
4.0
−60
500
Cr80B10Si10
4.0



32
4
Al58Ti40B1Si1
4.0
−60
500
CreoB20Si20
4.0



33
1
Al33Ti65B1Si1
4.0
−70
500
Cr98B1Si1
4.0



34
2
Al33Ti65B1Si1
4.0
−70
500
Cr94B3Si3
4.0



35
3
Al33Ti65B1Si1
4.0
−70
500
Cr80B10Si10
4.0



36
4
Al33Ti65B1Si1
4.0
−70
500
Cr60B20Si20
4.0













Conditions for




deposition of B sublayer
Conditions for deposition of C sublayer















Conditions for
Bias
Substrate


Bias
Substrate



deposition of
voltage
Temp.
Composition
Pressure
voltage
Temp.



coating layer
(V)
(° C.)
of target
(Pa)
(V)
(° C.)




















Condition
25
−50
500
Al63Ti35B1Si1
4.0
−50
500



of Example
26
−50
500
Al58Ti40B1Si1
4.0
−50
500




27
−50
500
Al33Ti65B1Si1
4.0
−50
500




28
−50
500
Al28Ti70B1Si1
4.0
−50
500




29
−60
500
Al45Ti45B5Si5
4.0
−60
500




30
−60
500
Al40Ti40B10Si10
4.0
−60
500




31
−60
500
Al63Ti35B1Si1
4.0
−60
500




32
−60
500
Al58Ti40B1Si1
4.0
−60
500




33
−70
500
Al33Ti65B1Si1
4.0
−70
500




34
−70
500
Al28Ti70B1Si1
4.0
−70
500




35
−70
500
Al45Ti45B5Si5
4.0
−70
500




36
−70
500
Al40Ti40B10Si10
4.0
−70
500




















TABLE 5









Conditions for




deposition of A sublayer
Conditions for










Sub-
deposition of B sublayer














Conditions for
Sub-

Pres-
Bias
strate

Pres-


deposition of
strate
Composition
sure
voltage
Temp.
Composition
sure


coating layer
#
of target
(Pa)
(V)
(° C.)
of target
(Pa)


















Condition
37
1
Al28Ti70B1Si1
6.0
−80
480
Cr98B1Si1
6.0


of Example
38
2
Al28Ti70B1Si1
6.0
−80
480
Cr94B3Si3
6.0



39
3
Al28Ti70B1Si1
6.0
−80
480
Cr80B10Si10
6.0



40
4
Al28Ti70B1Si1
6.0
−80
480
Cr60B20Si20
6.0



41
1
Al45Ti45B5Si5
4.0
−50
500
Cr98B1Si1
4.0



42
2
Al45Ti45B5Si5
4.0
−50
500
Cr94B3Si3
4.0



43
3
Al45Ti45B5Si5
4.0
−50
500
Cr80B10Si10
4.0



44
4
Al45Ti45B5Si5
4.0
−50
500
Cr60B20Si20
4.0



45
1
Al40Ti40B10Si10
3.0
−50
500
Cr98B1Si1
3.0



46
2
Al40Ti40B10Si10
3.0
−50
500
Cr94B3Si3
3.0



47
3
Al40Ti40B10Si10
3.0
−50
500
Cr80B10Si10
3.0



48
4
Al40Ti40B10Si10
3.0
−50
500
Cr60B20Si20
3.0













Conditions for
Conditions for



deposition of B sublayer
deposition of C sublayer











Sub-

Sub-















Conditions for
Bias
strate

Pres-
Bias
strate



deposition of
voltage
Temp.
Composition
sure
voltage
Temp.



coating layer
(V)
(° C.)
of target
(Pa)
(V)
(° C.)




















Condition
37
−80
480
Al63Ti35B1Si1
6.0
−80
480



of Example
38
−80
480
Al58Ti40B1Si1
6.0
−80
480




39
−80
480
Al33Ti65B1Si1
6.0
−80
480




40
−80
480
Al28Ti70B1Si1
6.0
−80
480




41
−50
500
Al45Ti45B5Si5
4.0
−50
500




42
−50
500
Al40Ti40B10Si10
4.0
−50
500




43
−50
500
Al63Ti35B1Si1
4.0
−50
500




44
−50
500
Al58Ti40B1Si1
4.0
−50
500




45
−50
500
Al33Ti65B1Si1
3.0
−50
500




46
−50
500
Al28Ti70B1Si1
3.0
−50
500




47
−50
500
Al49Ti49B1Si1
3.0
−50
500




48
−50
500
Al40Ti40B10Si10
3.0
−50
500




















TABLE 6









Conditions for
Conditions for



deposition of A sublayer
deposition of B sublayer











Sub-

Sub-
















Conditions for
Sub-

Pres-
Bias
strate

Pres-
Bias
strate


deposition of
strate
Composition
sure
voltage
Temp.
Composition
sure
voltage
Temp.


coating layer
#
of target
(Pa)
(V)
(° C.)
of target
(Pa)
(V)
(° C.)




















Condition
49
1
Al70Ti30
4.0
−50
500
Cr98B2
4.0
−50
500


of Example
50
2
Al70Ti30
4.0
−50
500
Cr87Si13
4.0
−50
500



51
3
Al70Ti30
4.0
−50
500
Cr62B20Si18
4.0
−50
500



52
4
Al70Ti30
4.0
−50
500
Cr50Si50
4.0
−100
500



53
1
Al63Ti37
4.0
−60
500
Cr98B2
4.0
−60
500



54
2
Al63Ti37
4.0
−60
500
Cr85B6Si9
4.0
−60
500



55
3
Al63Ti37
4.0
−60
500
Cr65Si35
4.0
−60
500



56
4
Al48Ti52
4.0
−60
500
Cr52B16Si32
4.0
−60
500



57
1
Al36Ti64
4.0
−70
500
Cr98Si2
4.0
−70
500



58
2
Al36Ti64
4.0
−70
500
Cr87B13
4.0
−70
500



59
3
Al32Ti68
4.0
−70
500
Cr62B20Si18
4.0
−70
500



60
4
Al32Ti68
4.0
−70
500
Cr52B16Si32
4.0
−70
500



















TABLE 7









Conditions for
Conditions for



deposition of A sublayer
deposition of B sublayer











Sub-

Sub-
















Conditions for
Sub-

Pres-
Bias
strate

Pres-
Bias
strate


deposition of
strate
Composition
sure
voltage
Temp.
Composition
sure
voltage
Temp.


coating layer
#
of target
(Pa)
(V)
(° C.)
of target
(Pa)
(V)
(° C.)




















Condition
61
1
Al64Ti31B5
6.0
−80
480
Cr98B2
6.0
−80
480


of Example
62
2
Al64Ti31Si5
6.0
−80
480
Cr87Si13
6.0
−80
480



63
3
Al64Ti30B3Si3
6.0
−80
480
Cr65B18Si17
6.0
−80
480



64
4
Al64Ti31B5
6.0
−80
480
Cr50Si50
6.0
−80
480



65
1
Al54Ti26Si20
4.0
−50
500
Cr98B2
4.0
−50
500



66
2
Al54Ti26B8Si12
4.0
−50
500
Cr85B5Si10
4.0
−50
500



67
3
Al54Ti26B13Si7
4.0
−50
500
Cr85B5Si10
4.0
−50
500



68
4
Al54Ti26B7Si13
4.0
−50
500
Cr85B5Si10
4.0
−50
500



69
1
Al45Ti42Si13
4.0
−50
500
Cr65Si35
4.0
−50
500



70
2
Al45Ti42Si13
4.0
−50
500
Cr50B15Si35
4.0
−100
500



71
3
Al40Ti25B35
4.0
−50
500
Cr98Si2
4.0
−50
500



72
4
Al36Ti29Si17B18
4.0
−50
500
Cr85B15
4.0
−50
500



73
1
Al36Ti29Si35
4.0
−50
500
Cr65B18Si17
4.0
−50
500



74
1
Al36Ti29B35
3.0
−50
500
Cr50B15Si35
3.0
−100
500



75
1
Al63Ti37
4.0
−50
500
Cr65Si35
4.0
−50
500



76
1
Al63Ti37
3.0
−50
500
Cr80B20
3.0
−50
500




















TABLE 8









Conditions for
Conditions for
Conditions for



deposition of A sublayer
deposition of B sublayer
deposition of C sublayer













Sub-

Sub-

Sub-




















Conditions for
Sub-
Composi-
Pres-
Bias
strate
Composi-
Pres-
Bias
strate
Composi-
Pres-
Bias
strate


deposition of
strate
tion of
sure
voltage
Temp.
tion of
sure
voltage
Temp.
tion of
sure
voltage
Temp.


coating layer
#
target
(Pa)
(V)
(° C.)
target
(Pa)
(V)
(° C.)
target
(Pa)
(V)
(° C.)
























Condition
77
1
Al70Ti37
4.0
−50
500
Cr98B2
4.0
−50
500
Al30Ti70
2.0
−200
500


of Example
78
2
Al70Ti37
4.0
−50
500
Cr85Si15
4.0
−50
500
Al37Ti55B8
4.0
−50
500



79
3
Al70Ti37
4.0
−50
500
Cr60B20Si20
4.0
−50
500
Al37Ti55Si8
4.0
−50
500



80
4
Al70Ti37
4.0
−50
500
Cr50Si50
4.0
−100
500
Al35Ti60B3Si2
4.0
−50
500



81
1
Al63Ti37
4.0
−60
500
Cr98B2
4.0
−60
500
Al63Ti37
4.0
−60
500



82
2
Al63Ti37
4.0
−60
500
Cr85B6Si9
4.0
−60
500
Al58Ti27B15
4.0
−60
500



83
3
Al63Ti37
4.0
−60
500
Cr65Si35
4.0
−60
500
Al58Ti27Si15
4.0
−60
500



84
4
Al63Ti37
4.0
−60
500
Cr50B15Si35
4.0
−60
500
Al58Ti27B8Si7
2.0
−200
500



85
1
Al37Ti63
4.0
−70
500
Cr98Si2
4.0
−70
500
Al63Ti37
2.0
−200
500



86
2
Al37Ti63
4.0
−70
500
Cr85B15
4.0
−70
500
Al45Ti28B27
4.0
−70
500



87
3
Al30Ti70
4.0
−70
500
Cr65B18Si17
4.0
−70
500
Al45Ti28Si27
4.0
−70
500



88
4
Al30Ti70
4.0
−70
500
Cr50B15Si35
4.0
−100
500
Al45Ti28B15Si12
4.0
−70
500



















TABLE 9









Conditions for




deposition of A sublayer
Conditions for










Sub-
deposition of B sublayer














Conditions for
Sub-

Pres-
Bias
strate

Pres-


deposition of
strate
Composition
sure
voltage
Temp.
Composition
sure


coating layer
#
of target
(Pa)
(V)
(° C.)
of target
(Pa)


















Condition
89
1
Al67Ti28B5
6.0
−80
480
Cr98B2
6.0


of Example
90
2
Al67Ti28Si5
6.0
−80
480
Cr85Si15
6.0



91
3
Al67Ti28B2Si3
6.0
−80
480
Cr65B18Si17
6.0



92
4
Al67Ti28B5
6.0
−80
480
Cr50Si50
6.0



93
1
Al55Ti25Si20
4.0
−50
500
Cr98B2
4.0



94
2
Al55Ti25B8Si12
4.0
−50
500
Cr85B6Si9
4.0



95
1
Al50Ti35Si15
3.0
−50
500
Cr65Si35
3.0



96
2
Al50Ti35Si15
3.0
−50
500
Cr50B15Si35
3.0



97
3
Al40Ti25B35
3.0
−50
500
Cr98Si2
3.0



98
4
Al40Ti25B18Si17
3.0
−50
500
Cr85B15
3.0



99
1
Al40Ti25Si35
4.0
−50
500
Cr65B19Si16
4.0



100
2
Al40Ti25B35
4.0
−50
500
Cr50B15Si35
4.0













Conditions for
Conditions for



deposition of B sublayer
deposition of C sublayer











Sub-

Sub-















Conditions for
Bias
strate

Pres-
Bias
strate



deposition of
voltage
Temp.
Composition
sure
voltage
Temp.



coating layer
(V)
(° C.)
of target
(Pa)
(V)
(° C.)




















Condition
89
−80
480
Al31Ti69
6.0
−80
480



of Example
90
−80
480
Al38Ti54B8
6.0
−80
480




91
−80
480
Al38Ti54Si8
6.0
−80
480




92
−100
480
Al38Ti54B5Si3
2.0
−200
480




93
−50
500
Al70Ti30
2.0
−200
500




94
−50
500
Al63Ti22B15
4.0
−50
500




95
−50
500
Al63Ti22Si15
3.0
−50
500




96
−100
500
Al63Ti22B8Si7
3.0
−50
500




97
−50
500
Al63Ti37
3.0
−50
500




98
−50
500
Al43Ti30B27
2.0
−200
500




99
−50
500
Al45Ti30Si25
3.0
−50
500




100
−100
500
Al40Ti30B17Si13
3.0
−50
500





















TABLE 10









Conditions for
Conditions for
Conditions for



deposition of A sublayer
deposition of B sublayer
deposition of C sublayer













Sub-

Sub-

Sub-




















Conditions for
Sub-
Composi-
Pres-
Bias
strate
Composi-
Pres-
Bias
strate
Composi-
Pres-
Bias
strate


deposition of
strate
tion of
sure
voltage
Temp.
tion of
sure
voltage
Temp.
tion of
sure
voltage
Temp.


coating layer
#
target
(Pa)
(V)
(° C.)
target
(Pa)
(V)
(° C.)
target
(Pa)
(V)
(° C.)





















Conditions of
 1′
1
Al60Ti40
4.0
−50
500
Cr70B30
4.0
−50
500
Not formed


Comparative
 2′
2
Al60Ti40
6.0
−75
550
Cr70Si30
6.0
−75
550
Not formed


Examples
 3′
3
Al60Ti40
4.0
−50
500
Cr
4.0
−50
500
Not formed



 4′
4
Al54Ti41Si5
4.0
−50
500
Cr
4.0
−50
500
Not formed



 5′
1
Al60Ti40
4.0
−50
500
Cr
4.0
−50
500
Not formed



 6′
2
Al54Ti41Si5
4.0
−50
500
Cr
4.0
−50
500
Not formed






















 7′
1
Al80Ti20
4.0
−50
500
Cr70Si30
4.0
−50
500
Al60Ti40
4.0
−50
500



 8′
2
Al20Ti80
4.0
−50
500
Cr70Si30
4.0
−50
500
Al60Ti40
4.0
−50
500



 9′
3
Al30Ti30B40
4.0
−50
500
Cr70Si30
4.0
−50
500
Al60Ti40
4.0
−50
500



10′
4
Al60Ti40
4.0
−50
500
Cr
4.0
−50
500
Al60Ti40
4.0
−50
500



11′
1
Al60Ti40
4.0
−50
500
Cr50B50
4.0
−50
500
Al60Ti40
4.0
−50
500



12′
1
Al45Ti45B5Si5
4.0
−50
500
Cr70B15Si15
4.0
−50
500
Al60Ti40
4.0
−50
500



13′
1
Al45Ti45B5Si5
6.0
−75
550
Cr70B15Si15
6.0
−75
550
Al60Ti40
4.0
−50
500



14′
1
Al45Ti45B5Si5
4.0
−50
500
Cr70B15Si15
4.0
−50
500
Al20Ti80
4.0
−50
500



15′
1
Al60Ti40
4.0
−50
500
Cr
4.0
−50
500
Al60Ti40
4.0
−50
500



16′
2
Al60Ti40
4.0
−50
500
Cr
4.0
−50
500
Al60Ti40
4.0
−50
500



















TABLE 11









Conditions of deposition














Bias
Substrate



Composition
Pressure
voltage
Temp.











Layer
of target
(Pa)
(V)
(° C.)















Base layer
AlCrN
Al70Cr30
3.5
−45
480



AlTiN
Al60Ti40
3.5
−45
480



AlTiSiN
Al54Ti41Si5
3.5
−45
480


Top layer
TiN
Ti
4.0
−75
500



















TABLE 12









Condition












of





Deposition
Composition of A
Composition of










Type
#
sublayer
B sublayer














Examples
1
1
Al0.61Ti0.37B0.01Si0.01N
Cr0.98B0.01Si0.01N



2
2
Al0.61Ti0.37B0.01Si0.01N
Cr0.95B0.02Si0.03N



3
3
Al0.61Ti0.37B0.01Si0.01N
Cr0.83B0.08Si0.09N



4
4
Al0.61Ti0.37B0.01Si0.01N
Cr0.60B0.20Si0.20N



5
5
Al0.57Ti0.41B0.01Si0.01N
Cr0.98B0.01Si0.01N



6
6
Al0.57Ti0.41B0.01Si0.01N
Cr0.95B0.02Si0.03N



7
7
Al0.57Ti0.41B0.01Si0.01N
Cr0.82B0.09Si0.09N



8
8
Al0.57Ti0.41B0.01Si0.01N
Cr0.64B0.18Si0.18N



9
9
Al0.32Ti0.66B0.01Si0.01N
Cr0.98B0.01Si0.01N



10
10
Al0.32Ti0.66B0.01Si0.01N
Cr0.94B0.03Si0.03N



11
11
Al0.32Ti0.66B0.01Si0.01N
Cr0.80B0.10Si0.10N



12
12
Al0.32Ti0.66B0.01Si0.01N
Cr0.62B0.19Si0.19N



















TABLE 13









A and B sublayers













Overall

Bottom layer
Top layer


















Condi-
Aveage thickness
Number of
average
Layer in


Average

Average



tion
per sublayer (nm)
sublayers
thick-
contact with


thick-

thick-


















of depo-
A sub-
B sub-
A sub-
B sub-
ness
substrate or
ness

ness



















Type
sition #
layer
layer
layer
layer
(μm)
bottom layer
TA/TB
Material
(μm)
Material
(μm)























Exam-
1
1
2
2
80
81
0.3
B sublayer
1.0
AlTiN
2.0
TiN
0.3


ples
2
2
5
5
30
31
0.3
B sublayer
1.0
Not
0.0
Not
0.0












formed

formed



3
3
4
100
50
50
5.2
A sublayer
less
Not
0.0
Not
0.0











than 0.1
formed

formed



4
4
198
192
5
5
2.0
B sublayer
1.0
AlTiSiN
1.5
Not
0.0














formed



5
5
490
486
3
3
2.9
B sublayer
1.0
Not
0.0
TiN
0.2












formed



6
6
2
2
80
81
0.3
B sublayer
1.0
AlTiSiN
1.6
TiN
0.4



7
7
5
6
50
49
0.5
A sublayer
0.8
Not
0.0
Not
0.0












formed

formed



8
8
50
52
10
10
1.0
A sublayer
1.0
AlCrN
2.0
Not
0.0














formed



9
9
198
190
18
17
6.8
A sublayer
1.0
Not
0.0
Not
0.0












formed

formed



10
10
490
494
3
3
3.0
A sublayer
1.0
AlTiN
0.6
Not
0.0














formed



11
11
120
12
10
11
1.3
B sublayer
10.0
AlTiSiN
1.7
Not
0.0














formed



12
12
10
98
10
11
1.2
B sublayer
0.1
AlTiSiN
1.5
TiN
0.1



















TABLE 14









Condition












of





Deposition
Composition of A
Composition of










Type
#
sublayer
B sublayer














Examples
13
13
Al0.28Ti0.70B0.01Si0.01N
Cr0.98B0.01Si0.01N



14
14
Al0.28Ti0.70B0.01Si0.01N
Cr0.94B0.03Si0.03N



15
15
Al0.28Ti0.70B0.01Si0.01N
Cr0.85B0.06Si0.09N



16
16
Al0.28Ti0.70B0.01Si0.01N
Cr0.68B0.16Si0.16N



17
17
Al0.43Ti0.47B0.05Si0.05N
Cr0.98B0.01Si0.01N



18
18
Al0.43Ti0.47B0.05Si0.05N
Cr0.96B0.02Si0.02N



19
19
Al0.43Ti0.47B0.05Si0.05N
Cr0.84B0.08Si0.08N



20
20
Al0.43Ti0.47B0.05Si0.05N
Cr0.61B0.19Si0.20N



21
21
Al0.41Ti0.42B0.08Si0.09N
Cr0.98B0.01Si0.01N



22
22
Al0.40Ti0.44B0.07Si0.09N
Cr0.95B0.02Si0.03N



23
23
Al0.40Ti0.44B0.07Si0.09N
Cr0.86B0.06Si0.08N



24
24
Al0.40Ti0.44B0.07Si0.09N
Cr0.66B0.17Si0.17N



















TABLE 15









A and B sublayers













Overall

Bottom layer
Top layer


















Condi-
Aveage thickness
Number of
average
Sublayer in


Average

Average



tion
per sublayer (nm)
sublayers
thick-
contact with


thick-

thick-


















of depo-
A sub-
B sub-
A sub-
B sub-
ness
substrate or
ness

ness



















Type
sition #
layer
layer
layer
layer
(μm)
bottom layer
TA/TB
Material
(μm)
Material
(μm)























Exam-
13
13
60
152
20
20
4.2
A sublayer
0.4
AlTiN
2.1
TiN
0.6


ples
14
14
178
50
3
3
0.7
B sublayer
3.6
AlCrN
2.0
TiN
0.9



15
15
80
11
20
20
1.8
A sublayer
7.3
Not
0.0
Not
0.0












formed

formed



16
16
40
40
5
5
0.4
A sublayer
1.0
AlTiSiN
2.1
Not
0.0














formed



17
17
220
20
10
10
2.4
B sublayer
11.0
AlTiSiN
2.2
Not
0.0














formed



18
18
50
50
16
15
1.6
A sublayer
1.0
AlTiSiN
2.0
Not
0.0














formed



19
19
30
30
50
48
2.9
A sublayer
1.0
AlTiSiN
1.9
Not
0.0














formed



20
20
100
110
8
8
1.7
B sublayer
0.9
AlTiSiN
1.8
Not
0.0














formed



21
21
110
110
8
8
1.8
B sublayer
1.0
AlTiSiN
1.5
Not
0.0














formed



22
22
320
300
4
4
2.5
A sublayer
1.1
AlTiSiN
0.6
Not
0.0














formed



23
23
340
330
4
4
2.7
B sublayer
1.0
AlTiSiN
0.5
Not
0.0














formed



24
24
20
120
16
16
2.2
A sublayer
0.2
AlTiSiN
1.1
Not
0.0














formed





















TABLE 16









Condition






of



Deposition
Composition of A
Composition of B
Composition of C











Type
#
sublayer
sublayer
sublayer















Examples
25
25
Al0.61Ti0.37B0.01Si0.01N
Cr0.98B0.01Si0.01N
Al0.63Ti0.35B0.01Si0.01N



26
26
Al0.61Ti0.37B0.01Si0.01N
Cr0.94B0.03Si0.03N
Al0.58Ti0.40B0.01Si0.01N



27
27
Al0.61Ti0.37B0.01Si0.01N
Cr0.66B0.17Si0.17N
Al0.33Ti0.65B0.01Si0.01N



28
28
Al0.61Ti0.37B0.01Si0.01N
Cr0.86B0.07Si0.07N
Al0.28Ti0.70B0.01Si0.01N



29
29
Al0.56Ti0.42B0.01Si0.01N
Cr0.98B0.01Si0.01N
Al0.45Ti0.45B0.05Si0.05N



30
30
Al0.56Ti0.42B0.01Si0.01N
Cr0.94B0.03Si0.03N
Al0.40Ti0.42B0.09Si0.09N



31
31
Al0.56Ti0.42B0.01Si0.01N
Cr0.84B0.08Si0.08N
Al0.61Ti0.37B0.01Si0.01N



32
32
Al0.56Ti0.42B0.01Si0.01N
Cr0.69B0.15Si0.16N
Al0.56Ti0.42B0.01Si0.01N



33
33
Al0.30Ti0.68B0.01Si0.01N
Cr0.98B0.01Si0.01N
Al0.33Ti0.65B0.01Si0.01N



34
34
Al0.30Ti0.68B0.01Si0.01N
Cr0.94B0.03Si0.03N
Al0.28Ti0.70B0.01Si0.01N



35
35
Al0.30Ti0.68B0.01Si0.01N
Cr0.82B0.09Si0.09N
Al0.43Ti0.47B0.05Si0.05N



36
36
Al0.30Ti0.68B0.01Si0.01N
Cr0.63B0.18Si0.19N
Al0.41Ti0.41B0.08Si0.10N


















TABLE 17









A, B, and C sublayers















Aveage thickness



Overall



Condi-
per sublayer



average














tion
A sub-
B sub-
C sub-
Number of sublayers
thick-
















of depo-
layer
layer
layer
A sub-
B sub-
C sub-
ness















Type
sition #
(nm)
(nm)
(μm)
layer
layer
layer
(μm)



















Exam-
25
25
2
2
0.4
80
81
1
0.7


ples



26
26
4
5
1.0
30
31
1
1.3



27
27
46
50
1.9
20
20
1
3.8



28
28
182
192
0.3
5
5
1
2.2



29
29
496
486
0.4
5
5
1
5.3



30
30
3
2
0.3
148
146
1
1.1



31
31
5
6
0.6
50
49
1
1.1



32
32
50
52
0.6
10
9
1
1.6



33
33
178
190
0.8
16
15
1
6.5



34
34
498
494
0.8
4
4
1
4.7



35
35
120
12
0.4
10
11
1
1.8



36
36
10
98
0.4
10
11
1
1.6














A, B, and C sublayers
Bottom layer
Top layer















Sublayer in



Average

Average



contact with
Position


thick-

thick-



substrate or
of C


ness

ness














Type
bottom layer
sublayer
TA/TB
Material
(μm)
Material
(μm)


















Exam-
25
B sublayer
2nd
1.0
AlTiN
1.9
TiN
0.3


ples


Sublayer



26
B sublayer
5th
0.8
AlTiSiN
1.9
TiN
0.4





Sublayer



27
A sublayer
31st
0.9
Not
0.0
Not
0.0





sublayer

formed

formed



28
A sublayer
5th
0.9
AlTiSiN
1.4
Not
0.0





Sublayer



formed



29
B sublayer
5th
1.0
Not
0.0
TiN
0.2





Sublayer

formed



30
A sublayer
140th
1.5
AlTiSiN
1.6
TiN
0.3





sublayer



31
A sublayer
46th
0.8
Not
0.0
Not
0.0





sublayer

formed

formed



32
A sublayer
9th
1.0
AlCrN
2.2
Not
0.0





Sublayer



formed



33
A sublayer
15th
0.9
Not
0.0
Not
0.0





Sublayer

formed

formed



34
A sublayer
4th
1.0
AlTiN
0.6
Not
0.0





Sublayer



formed



35
B sublayer
5th
10.0
AlTiSiN
1.7
Not
0.0





Sublayer



formed



36
B sublayer
5th
0.1
AlTiSiN
1.5
TiN
0.1





Sublayer





















TABLE 18









Condition






of



Deposition
Composition of A
Composition of B
Composition of C











Type
#
sublayer
sublayer
sublayer















Examples
37
37
Al0.28Ti0.70B0.01Si0.01N
Cr0.98B0.01Si0.01N
Al0.62Ti0.36B0.01Si0.01N



38
38
Al0.28Ti0.70B0.01Si0.01N
Cr0.95B0.02Si0.03N
Al0.56Ti0.42B0.01Si0.01N



39
39
Al0.28Ti0.70B0.01Si0.01N
Cr0.85B0.06Si0.09N
Al0.30Ti0.68B0.01Si0.01N



40
40
Al0.28Ti0.70B0.01Si0.01N
Cr0.68B0.15Si0.17N
Al0.28Ti0.70B0.01Si0.01N



41
41
Al0.44Ti0.46B0.05Si0.05N
Cr0.98B0.01Si0.01N
Al0.44Ti0.46B0.05Si0.05N



42
42
Al0.44Ti0.46B0.05Si0.05N
Cr0.94B0.03Si0.03N
Al0.38Ti0.48B0.06Si0.08N



43
43
Al0.44Ti0.46B0.05Si0.05N
Cr0.85B0.06Si0.09N
Al0.63Ti0.35B0.01Si0.01N



44
44
Al0.44Ti0.46B0.05Si0.05N
Cr0.66B0.16Si0.18N
Al0.56Ti0.42B0.01Si0.01N



45
45
Al0.39Ti0.46B0.07Si0.08N
Cr0.98B0.01Si0.01N
Al0.33Ti0.65B0.01Si0.01N



46
46
Al0.39Ti0.46B0.07Si0.08N
Cr0.94B0.03Si0.03N
Al0.28Ti0.70B0.01Si0.01N



47
47
Al0.39Ti0.46B0.07Si0.08N
Cr0.85B0.06Si0.09N
Al0.43Ti0.55B0.01Si0.01N



48
48
Al0.39Ti0.46B0.07Si0.08N
Cr0.66B0.15Si0.19N
Al0.38Ti0.51B0.05Si0.06N


















TABLE 19









A, B, and C sublayers















Aveage thickness



Overall



Condi-
per sublayer



average














tion
A sub-
B sub-
C sub-
Number of sublayers
thick-
















of depo-
layer
layer
layer
A sub-
B sub-
C sub-
ness















Type
sition #
(nm)
(nm)
(μm)
layer
layer
layer
(μm)



















Exam-
37
37
60
260
0.4
3
3
1
1.4


ples



38
38
5
5
0.4
3
3
1
0.4



39
39
5
5
0.3
2
2
1
0.3



40
40
320
36
0.4
10
10
1
4.0



41
41
24
20
0.4
30
29
2
2.1



42
42
26
20
0.4
30
31
3
2.6



43
43
20
25
0.3
78
78
4
4.7



44
44
50
50
0.5
16
15
3
3.1



45
45
100
110
1.8
8
8
1
3.5



46
46
12
110
1.8
8
8
1
2.8



47
47
290
30
0.3
5
5
1
1.9



48
48
340
330
0.3
4
4
1
3.0














A, B, and C sublayers
Bottom layer
Top layer















Sublayer in



Average

Average



contact with
Position


thick-

thick-



substrate or
of C


ness

ness














Type
bottom layer
sublayer
TA/TB
Material
(μm)
Material
(μm)


















Exam-
37
A sublayer
3rd
0.2
AlTiN
2.1
TiN
0.6


ples


sublayer



38
B sublayer
3rd
1.0
AlCrN
2.0
TiN
0.9





sublayer



39
A sublayer
2nd
1.0
Not
0.0
Not
0.0





sublayer

formed

formed



40
B sublayer
10th
8.9
AlTiSiN
0.3
Not
0.0





sublayer



formed



41
A sublayer
21st, 40th
1.2
AlTiSiN
0.6
Not
0.0





sublayers



formed



42
B sublayer
14th,
1.3
AlTiSiN
0.5
Not
0.0





30th, 46th



formed





sublayers



43
B sublayer
13th, 30th,
0.8
AlTiSiN
0.5
Not
0.0





46th, 62nd



formed





sublayers



44
A sublayer
10th,
1.0
AlTiSiN
0.4
Not
0.0





21st, 28th



formed





sublayers



45
A sublayer
4th
0.9
AlTiSiN
0.5
Not
0.0





sublayer



formed



46
A sublayer
4th
0.1
AlTiSiN
0.4
Not
0.0





sublayer



formed



47
B sublayer
5th
9.7
AlTiSiN
0.3
Not
0.0





sublayer



formed



48
A sublayer
4th
1.0
AlTiSiN
0.3
Not
0.0





sublayer



formed




















TABLE 20









Condition





of



deposition
Composition of A
Composition of B










Type
#
sublayer
sublayer














Examples
49
49
Al0.67Ti0.33N
Cr0.99B0.01N



50
50
Al0.67Ti0.33N
Cr0.90Si0.10N



51
51
Al0.67Ti0.33N
Cr0.70B0.15Si0.15N



52
52
Al0.67Ti0.33N
Cr0.60Si0.40N



53
53
Al0.60Ti0.40N
Cr0.99B0.01N



54
54
Al0.60Ti0.40N
Cr0.90B0.03Si0.07N



55
55
Al0.60Ti0.40N
Cr0.70Si0.30N



56
56
Al0.50Ti0.50N
Cr0.60B0.10Si0.30N



57
57
Al0.35Ti0.65N
Cr0.99Si0.01N



58
58
Al0.35Ti0.65N
Cr0.90B0.10N



59
59
Al0.32Ti0.68N
Cr0.70B0.15Si0.15N



60
60
Al0.32Ti0.68N
Cr0.60B0.10Si0.30N



















TABLE 21









A and B sublayers













Overall

Bottom layer
Top layer


















Condi-
Aveage thickness
Number of
average



Average

Average



tion
per sublayer (nm)
sublayers
thick-



thick-

thick-


















of depo-
A sub-
B sub-
A sub-
B sub-
ness
Position of
ness

ness



















Type
sition #
layer
layer
layer
layer
(μm)
C sublayer
TA/TB
Material
(μm)
Material
(μm)























Exam-
49
49
1
2
150
150
0.45
A sublayer
0.5
AlTiN
1.5
Not
0.0


ples











formed



50
50
5
7
84
84
1.01
A sublayer
0.7
AlTiN
1.2
Not
0.0














formed



51
51
198
150
13
12
4.37
A sublayer
1.3
AlTiN
0.3
Not
0.0














formed



52
52
495
395
7
7
6.23
B sublayer
1.3
Not
0.0
Not
0.0












formed

formed



53
53
12
197
4
4
0.84
B sublayer
0.1
AlTiSiN
0.8
Not
0.0














formed



54
54
12
108
4
4
0.48
B sublayer
0.1
AlTiSiN
1.5
Not
0.0














formed



55
55
132
15
10
10
1.47
A sublayer
8.8
AlTiSiN
1.2
Not
0.0














formed



56
56
115
12
10
10
1.27
A sublayer
9.6
AlTiSiN
1.0
Not
0.0














formed



57
57
4
2
150
150
0.90
B sublayer
2.0
AlTiSiN
2.0
TiN
0.2



58
58
6
9
84
84
1.26
A sublayer
0.7
AlCrN
1.5
TiN
0.3



59
59
150
195
13
12
4.29
A sublayer
0.8
AlTiN
0.3
TiN
0.3



60
60
480
360
6
5
4.68
A sublayer
1.3
AlTiN
0.2
Not
0.0














formed




















TABLE 22









Condition





of



deposition
Composition of A
Composition of B










Type
#
sublayer
sublayer














Examples
61
61
Al0.64Ti0.33B0.03N
Cr0.99B0.01N



62
62
Al0.64Ti0.33Si0.03N
Cr0.90Si0.10N



63
63
Al0.64Ti0.33B0.01Si0.02N
Cr0.70B0.15Si0.15N



64
64
Al0.64Ti0.33B0.03N
Cr0.60Si0.40N



65
65
Al0.52Ti0.33Si0.15N
Cr0.99B0.01N



66
66
Al0.52Ti0.33B0.05Si0.10N
Cr0.90B0.03Si0.07N



67
67
Al0.52Ti0.33B0.10Si0.05N
Cr0.90B0.03Si0.07N



68
68
Al0.52Ti0.33B0.05Si0.10N
Cr0.90B0.07Si0.03N



69
69
Al0.45Ti0.45Si0.10N
Cr0.70Si0.30N



70
70
Al0.45Ti0.45Si0.10N
Cr0.60B0.10Si0.30N



71
71
Al0.39Ti0.33B0.28N
Cr0.99Si0.01N



72
72
Al0.39Ti0.33Si0.14B0.14N
Cr0.90B0.10N



73
73
Al0.39Ti0.33Si0.28N
Cr0.70B0.15Si0.15N



74
74
Al0.39Ti0.33B0.28N
Cr0.60B0.10Si0.30N



75
75
Al0.60Ti0.40N
Cr0.70Si0.30N



76
76
Al0.60Ti0.40N
Cr0.85B0.15N



















TABLE 23









A and B sublayers













Overall

Bottom layer
Top layer


















Condi-
Aveage thickness
Number of
average



Average

Average



tion
per sublayer (nm)
sublayers
thick-



thick-

thick-


















of depo-
A sub-
B sub-
A sub-
B sub-
ness
Position of
ness

ness



















Type
sition #
layer
layer
layer
layer
(μm)
C sublayer
TA/TB
Material
(μm)
Material
(μm)























Exam-
61
61
13
190
8
8
1.62
A sublayer
0.1
Not
0.0
Not
0.0


ples









formed

formed



62
62
12
110
8
9
1.09
B sublayer
0.1
Not
0.0
Not
0.0












formed

formed



63
63
130
12
10
10
1.42
A sublayer
10.8
Not
0.0
TiN
0.0












formed



64
64
110
12
10
10
1.22
A sublayer
9.2
Not
0.0
TiN
0.0












formed



65
65
21
35
50
51
2.84
B sublayer
0.6
AlTiN
0.5
Not
0.0














formed



66
66
32
18
51
51
2.55
B sublayer
1.8
AlTiN
0.5
Not
0.0














formed



67
67
21
18
49
48
1.89
B sublayer
1.2
AlTiN
0.6
Not
0.0














formed



68
68
20
20
48
48
1.92
B sublayer
1.0
AlTiN
0.7
Not
0.0














formed



69
69
22
25
40
41
1.91
B sublayer
0.9
AlTiN
1.2
TiN
0.2



70
70
21
20
41
40
1.66
A sublayer
1.1
AlTiN
1.3
TiN
0.3



71
71
120
110
10
11
2.41
B sublayer
1.1
AlCrN
0.3
TiN
0.3



72
72
195
148
5
5
1.72
A sublayer
1.3
AlCrN
0.5
TiN
0.3



73
73
481
372
2
2
1.71
A sublayer
1.3
AlTiSiN
0.6
TiN
0.2



74
74
5
2
101
102
0.71
B sublayer
2.5
AlTiSiN
1.7
TiN
0.0



75
75
17
25
48
48
2.02
B sublayer
0.7
AlTiSiN
0.9
Not
0.0














formed



76
76
26
19
47
47
2.12
B sublayer
1.4
AlTiSiN
0.7
Not
0.0














formed





















TABLE 24









Condition






of



deposition
Composition of A
Composition of B
Composition of C











Type
#
sublayer
sublayer
sublayer















Examples
77
77
Al0.67Ti0.33N
Cr0.99B0.01N
Al0.35Ti0.65N



78
78
Al0.67Ti0.33N
Cr0.90Si0.10N
Al0.35Ti0.60B0.05N



79
79
Al0.67Ti0.33N
Cr0.70B0.15Si0.15N
Al0.35Ti0.60Si0.05N



80
80
Al0.67Ti0.33N
Cr0.60Si0.40N
Al0.35Ti0.60B0.03Si0.02N



81
81
Al0.60Ti0.40N
Cr0.99B0.01N
Al0.67Ti0.33N



82
82
Al0.60Ti0.40N
Cr0.90B0.03Si0.07N
Al0.60Ti0.30B0.10N



83
83
Al0.60Ti0.40N
Cr0.70Si0.30N
Al0.60Ti0.30Si0.10N



84
84
Al0.60Ti0.40N
Cr0.60B0.10Si0.30N
Al0.60Ti0.30B0.05Si0.05N



85
85
Al0.35Ti0.65N
Cr0.99Si0.01N
Al0.60Ti0.40N



86
86
Al0.35Ti0.65N
Cr0.90B0.10N
Al0.40Ti0.40B0.20N



87
87
Al0.32Ti0.68N
Cr0.70B0.15Si0.15N
Al0.40Ti0.40Si0.20N



88
88
Al0.32Ti0.68N
Cr0.60B0.10Si0.30N
Al0.40Ti0.40B0.10Si0.10N


















TABLE 25









A, B, and C sublayers
















Aveage thickness



Overall




Condi-
per sublayer



average
Sublayer in















tion
A sub-
B sub-
C sub-
Number of sublayers
thick-
contact with

















of depo-
layer
layer
layer
A sub-
B sub-
C sub-
ness
substrate or
















Type
sition #
(nm)
(nm)
(μm)
layer
layer
layer
(μm)
bottom layer




















Exam-
77
77
3
1
1950
150
150
1
2.55
A sublayer


ples



78
78
4
7
980
84
84
1
1.90
A sublayer



79
79
150
195
408
13
12
1
4.70
B sublayer



80
80
495
390
310
6
6
1
5.62
B sublayer



81
81
12
197
308
4
4
1
1.14
B sublayer



82
82
12
108
1980
4
5
2
4.55
B sublayer



83
83
132
14
997
10
10
1
2.46
A sublayer



84
84
115
12
405
10
10
1
1.68
A sublayer



85
85
2
3
305
150
150
11
4.11
B sublayer



86
86
6
10
580
84
84
3
3.08
A sublayer



87
87
210
160
670
13
12
1
5.32
A sublayer



88
88
320
482
302
6
7
1
5.60
B sublayer













Bottom layer
Top layer













A, B, and C sublayers

Average

Average














Position


thick-

thick-



of C


ness

ness















Type
sublayer
TA/TB
Material
(μm)
Material
(μm)




















Exam-
77
152nd
3.0
AlTiN
1.4
Not
0.0



ples

sublayers



formed




78
84th
0.6
AlTiN
1.2
Not
0.0





sublayers



formed




79
12th
0.8
AlTiN
0.3
Not
0.0





sublayers



formed




80
3rd
1.3
Not
0.0
Not
0.0





sublayers

formed

formed




81
4th
0.1
AlTiSiN
0.6
Not
0.0





sublayers



formed




82
4th, 9th
0.1
AlTiSiN
1.5
Not
0.0





sublayers



formed




83
10th
9.4
AlTiSiN
1.0
Not
0.0





sublayers



formed




84
16th
9.6
AlTiSiN
1.0
Not
0.0





sublayers



formed




85
3rd, 12th,
0.7
AlTiSiN
1.9
TiN
0.2





15th, 18th,





24th, 27th,





45th, 60th,





77th, 102nd,





135th





sublayers




86
101st,
0.6
AlCrN
1.3
TiN
0.3





121st, 138th





sublayers




87
13th
1.3
AlTiN
0.2
TiN
0.3





sublayers




88
6th
0.7
AlTiN
0.2
Not
0.0





sublayers



formed






















TABLE 26









Condition






of



deposition
Composition of A
Composition of B
Composition of C











Type
#
sublayer
sublayer
sublayer















Examples
89
89
Al0.64Ti0.33B0.03N
Cr0.99B0.01N
Al0.35Ti0.65N



90
90
Al0.64Ti0.33Si0.03N
Cr0.90Si0.10N
Al0.35Ti0.60B0.05N



91
91
Al0.64Ti0.33B0.01Si0.02N
Cr0.70B0.15Si0.15N
Al0.35Ti0.60Si0.05N



92
92
Al0.64Ti0.33B0.03N
Cr0.60Si0.40N
Al0.35Ti0.60B0.03Si0.02N



93
93
Al0.52Ti0.33Si0.15N
Cr0.99B0.01N
Al0.67Ti0.33N



94
94
Al0.52Ti0.33B0.05Si0.10N
Cr0.90B0.03Si0.07N
Al0.60Ti0.30B0.10N



95
95
Al0.45Ti0.45Si0.10N
Cr0.70Si0.30N
Al0.60Ti0.30Si0.10N



96
96
Al0.45Ti0.45Si0.10N
Cr0.60B0.10Si0.30N
Al0.60Ti0.30B0.05Si0.05N



97
97
Al0.39Ti0.33B0.28N
Cr0.99Si0.01N
Al0.60Ti0.40N



98
98
Al0.39Ti0.33B0.14Si0.14N
Cr0.90B0.10N
Al0.40Ti0.40B0.20N



99
99
Al0.39Ti0.33Si0.28N
Cr0.70B0.15Si0.15N
Al0.40Ti0.40Si0.20N



100
100
Al0.39Ti0.33B0.28N
Cr0.60B0.10Si0.30N
Al0.40Ti0.40B0.10Si0.10N


















TABLE 27









A, B, and C sublayers
















Aveage thickness



Overall




Condi-
per sublayer



average
Sublayer in















tion
A sub-
B sub-
C sub-
Number of sublayers
thick-
contact with

















of depo-
layer
layer
layer
A sub-
B sub-
C sub-
ness
substrate or
















Type
sition #
(nm)
(nm)
(μm)
layer
layer
layer
(μm)
bottom layer




















Exam-
89
89
13
190
730
8
8
2
3.08
A sublayer


ples
90
90
12
110
1521
8
9
2
4.13
B sublayer



91
91
110
12
404
10
10
9
4.86
A sublayer



92
92
100
12
410
10
10
9
4.81
A sublayer



93
93
21
32
480
48
48
5
4.94
B sublayer



94
94
30
18
420
48
48
5
4.40
A sublayer



95
95
28
20
407
47
46
3
3.46
A sublayer



96
96
28
20
975
49
48
1
3.31
A sublayer



97
97
140
110
606
10
11
2
3.82
B sublayer



98
98
195
190
610
5
5
2
3.15
A sublayer



99
99
481
472
530
2
2
3
3.50
C sublayer



100
100
2
2
525
101
102
3
1.98
B sublayer













Bottom layer
Top layer













A, B, and C sublayers

Average

Average














Position


thick-

thick-



of C


ness

ness















Type
sublayer
TA/TB
Material
(μm)
Material
(μm)




















Exam-
89
5, 10th
0.1
Not
0.0
Not
0.0



ples

sublayers

formed

formed




90
5, 10th
0.1
Not
0.0
Not
0.0





sublayers

formed

formed




91
3rd, 6th,
9.2
Not
0.0
TiN
0.0





9th, 12th,

formed





15th, 18th,





21st, 24th,





27th





sublayers




92
3rd, 6th,
8.3
Not
0.0
TiN
0.0





9th, 12th,

formed





15th, 18th,





21st, 24th,





27th





sublayers




93
18th, 36th,
0.7
AlTiN
0.3
Not
0.0





52dn, 66th,



formed





83rd





sublayers




94
17th, 34th,
1.7
AlTiN
0.3
Not
0.0





50th, 63rd,



formed





85th





sublayers




95
15th,
1.4
AlTiN
1.1
TiN
0.2





34th, 52nd





sublayers




96
13th
1.4
AlTiN
1.2
TiN
0.3





sublayer




97
8th, 16th
1.3
AlCrN
0.3
TiN
0.3





sublayers




98
3rd, 7th
1.0
AlCrN
0.5
TiN
0.3





sublayers




99
1st,
1.0
AlTiSiN
0.5
TiN
0.2





4th, 7th





sublayers




100
51st,
1.0
AlTiSiN
1.6
TiN
0.0





105th, 160th





sublayers






















TABLE 28









Condition






of



deposition
Composition of A
Composition of B
Composition of C











Type
#
sublayer
sublayer
sublayer















Comparative
1′
1′
Al0.57Ti0.43N
Cr0.81B0.19N



Examples
2′
2′
Al0.57Ti0.43N
Cr0.78Si0.22N




3′
3′
Al0.57Ti0.43N
CrN




4′
4′
Al50Ti0.47Si0.03N
CrN




5′
5′
Al0.57Ti0.43N
CrN




6′
6′
Al50Ti0.47Si0.03N
CrN




7′
7′
Al0.77Ti0.23N
Cr0.78Si0.22N
Al0.57Ti0.43N



8′
8′
Al0.17Ti0.83N
Cr0.78Si0.22N
Al0.57Ti0.43N



9′
9′
Al0.30Ti0.38B0.32N
Cr0.78Si0.22N
Al0.56Ti0.44N



10′ 
10′ 
Al0.57Ti0.43N
CrN
Al0.57Ti0.43N



11′ 
11′ 
Al0.57Ti0.43N
Cr0.58B0.42N
Al0.55Ti0.45N



12′ 
12′ 
Al0.42Ti0.54B0.02Si0.02N
Cr0.77B0.11Si0.12N
Al0.55Ti0.45N



13′ 
13′ 
Al0.40Ti0.55B0.02Si0.03N
Cr0.79B0.10Si0.11N
Al0.56Ti0.44N



14′ 
14′ 
Al0.42Ti0.54B0.02Si0.02N
Cr0.77B0.11Si0.12N
Al0.18Ti0.82N



15′ 
15′ 
Al0.57Ti0.43N
CrN
Al0.57Ti0.43N



16′ 
16′ 
Al0.57Ti0.43N
CrN
Al0.57Ti0.43N


















TABLE 29









A, B, and C sublayers















Aveage thickness



Overall



Condi-
per sublayer



average














tion
A sub-
B sub-
C sub-
Number of sublayers
thick-
















of depo-
layer
layer
layer
A sub-
B sub-
C sub-
ness















Type
sition #
(nm)
(nm)
(μm)
layer
layer
layer
(μm)



















Compar-
 1′
 1′
2060
1980
0.0
1
1
0
4.0


ative
 2′
 2′
1110
1180
0.0
1
1
0
2.3


Exam-
 3′
 3′
100
110
0.0
8
8
0
1.7


ples
 4′
 4′
110
110
0.0
8
8
0
1.8



 5′
 5′
120
110
0.0
14
14
0
3.2



 6′
 6′
120
120
0.0
13
13
0
3.1



 7′
 7′
20
20
0.4
30
30
3
2.4



 8′
 8′
20
20
0.4
30
31
3
2.5



 9′
 9′
50
50
0.5
16
15
3
3.1



10′
10′
50
50
0.5
16
16
3
3.2



11′
11′
100
110
1.8
8
8
1
3.5



12′
12′
580
40
0.3
4
4
1
2.8



13′
13′
40
550
0.3
6
6
1
3.9



14′
14′
30
30
1.1
120
120
4
11.7



15′
15′
100
110
0.1
8
8
1
1.8



16′
16′
100
110
0.1
8
8
1
1.8














A, B, and C sublayers
Base layer
Top layer















Sublayer in



Average

Average



contact with
Position


thick-

thick-



substrate or
of C


ness

ness














Type
bottom layer
sublayer
TA/TB
Material
(μm)
Material
(μm)


















Compar-
 1′
B sublayer

1.0
AlTiN
0.3
TiN
0.2


ative
 2′
A sublayer

0.9
AlTiN
1.2
TiN
0.3


Exam-
 3′
B sublayer

0.9
AlTiN
1.5
TiN
0.3


ples
 4′
B sublayer

1.0
AlTiSiN
1.6
TiN
0.3



 5′
A sublayer

1.1
Not
0.0
Not
0.0







formed

formed



 6′
A sublayer

1.0
Not
0.0
Not
0.0







formed

formed



 7′
A sublayer
9th,
1.0
AlTiSiN
1.0
Not
0.0





13th, 23rd



formed





sublayers



 8′
B sublayer
9th,
1.0
AlTiSiN
1.2
Not
0.0





13th, 23rd



formed





sublayers



 9′
A sublayer
9th,
1.0
AlTiSiN
0.5
Not
0.0





12th, 20th



formed





sublayers



10′
A sublayer
4th,
1.0
AlTiN
0.4
TiN
0.2





8th, 12th





sublayers



11′
A sublayer
9th
0.9
AlTiN
0.5
TiN
0.3





sublayer



12′
A sublayer
5th
14.5
AlTiSiN
0.5
Not
0.0





sublayer



formed



13′
B sublayer
7th
0.1
AlTiSiN
0.4
Not
0.0





sublayer



formed



14′
B sublayer
4th, 9th,
1.0
AlTiSiN
1.1
Not
0.0





14th, 19th



formed





sublayers



15′
A sublayer
9th
0.9
Not
0.0
Not
0.0





sublayer

formed

formed



16′
B sublayer
9th
0.9
Not
0.0
Not
0.0





sublayer

formed

formed









Each of the inserts of Examples 1 to 100 and Comparative Examples 1′ to 16′ was fixed to a milling chuck with a fixture, and subjected to a wet continuous cutting test against a Ti-based alloys under the following cutting conditions to measure the worn width of the flank face of the cutting edges in units of 10 μm.


<Cutting Conditions>





    • Workpiece: Ti-6Al-4V plate of 250 mm by 100 mm in flat dimension and 60 mm thick
      • Cutting speed: 100 m/min
      • Rotation speed: 5500 min−1
      • Depth of cut: axial depth (ae) 0.3 mm, radial depth (ap) 6 mm
      • Feed rate (per tooth): 0.08 mm/tooth
      • Cutting length: 200 m
      • Cutting fluid: water-soluble coolant





Tables 21 to 28 show the results of cutting tests on Examples 1 to 100 and Comparative Examples 1′ to 16′.











TABLE 30









Worn width of



flank wear










Type
(μm)












Examples
 1
 810



 2
 930



 3
 770



 4
 530



 5
 920



 6
 930



 7
 900



 8
 680



 9
 900



10
 680



11
 510



12
 750


Comparative
 1′
*125


Examples
 2′
*125



 3′
1320



 4′
1290



 5′
1260



 6′
1230



 7′
*100



 8′
*100



 9′
 *75



10′
*100



11′
*125



12′
1510



13′
1600



14′
*125



15′
1290



16′
1260


















TABLE 31









Worn width of



flank wear










Type
(μm)












Examples
13
520



14
850



15
740



16
730



17
730



18
510



19
530



20
570



21
520



22
750



23
750



24
580


















TABLE 32









Worn width of



flank wear










Type
(μm)












Examples
25
920



26
850



27
880



28
650



29
950



30
940



31
940



32
620



33
900



34
910



35
550



36
540


















TABLE 33









Worn width of



flank wear










Type
(μm)












Examples
37
840



38
840



39
950



40
740



41
520



42
530



43
820



44
550



45
760



46
790



47
720



48
850


















TABLE 34









Worn width of



flank wear










Type
(μm)












Examples
49
950



50
670



51
680



52
920



53
840



54
660



55
730



56
670



57
760



58
660



59
740



60
780


















TABLE 35









Worn width of



flank wear










Type
(μm)












Examples
61
880



62
670



63
870



64
690



65
670



66
670



67
760



68
770



69
890



70
880



71
900



72
780


















TABLE 36









Worn width of



flank wear










Type
(μm)












Examples
73
930



74
940



75
550



76
550



77
860



78
670



79
870



80
680



81
770



82
670



83
770



84
680


















TABLE 37









Worn width of



flank wear










Type
(μm)












Examples
85
940



86
670



87
600



88
940



89
860



90
750



91
760



92
620



93
670



94
660



95
560



96
550



97
560



98
560



99
870



100
860









In Table 30, asterisk (*) in Comparative Examples indicates the cutting distance (m) until the end of service life due to delamination, welding, chipping, or wear.


The results shown in Tables 30 to 37 indicate that Examples 1 to 100 all have high durability, without delamination, welding, chipping or wear of the coating layer, even in high-speed cutting of Ti-based alloys.


In contrast, tools in Comparative Examples 1′ to 16′ all had short tool life due to delamination, welding, chipping or wear of the coating layer caused by thermal and mechanical loads during high-speed cutting of Ti-based alloys.


The coated tools of the present invention are expected to exhibit high durability even use in cutting materials, such as Ti-based alloys, Ni-based heat-resistant alloys, and stainless steels, which also have high weldability and are subject to large thermal and mechanical loads to the cutting edge.


The disclosed embodiments are in all respects illustrative only and are not restrictive. The scope of the invention is indicated by the claims, not the embodiments, and is intended to include all variations within the meaning and scope of the claims and equivalents.


REFERENCE NUMERALS






    • 1 substrate


    • 2 alternating layer of Ai and Bj sublayers


    • 3 Ai sublayer


    • 4 Bj sublayer


    • 5 Ck sublayer


    • 6 bottom layer


    • 7 top layer


    • 8 alternating layer of Ai and Bj sublayers with Ck sublayer disposed therebetween




Claims
  • 1. A surface-coated cutting tool comprising: a substrate and a coating layer disposed on the substrate, wherein1) the coating layer includes an alternating layer of A sublayers and B sublayers,2) the A sublayers each have a composition represented by the formula: Al1-aTiaN (where 0.30≤a≤0.70),3) the B sublayers each have a composition represented by the formula: Cr1-cM2cN (where M2 is at least one selected from the group consisting of B and Si, where 0.01≤c≤0.40),4) the A sublayers each have an average thickness of 1 nm or more and 500 nm or less and the B sublayers each have an average thickness of 1 nm or more and 500 nm or less,5) the alternating layer of the A sublayers and the B sublayers has an average thickness of 0.3 μm or more and 7.0 μm or less, and6) the adjoining A and B sublayers satisfy the relation: 0.1≤TA/TB≤0.8 or 1.2≤TA/TB≤10.0, where TA represents the average thickness of the A sublayers and TB represents the average thicknesses of the B sublayers.
  • 2. The surface-coated cutting tool according to claim 1, wherein the alternating layer of the A sublayers and the B sublayers further includes one or more C sublayers with an average thickness of 0.3 μm or more and 2.0 μm or less at any position in the alternating layer, wherein the C sublayers each have a composition represented by the formula: Al1-d-eTidM3eN (where M3 is at least one selected from the group consisting of B and Si, 0.30≤d≤0.70, 0.00≤e≤0.30, and d≠a).
  • 3. A surface-coated cutting tool comprising: a substrate and a coating layer disposed on the substrate, wherein1) the coating layer includes an alternating layer of A sublayers and B sublayers,2) the A sublayer each have a composition represented by the formula: Al1-a-bTiaM1bN (where M1 is at least one selected from the group consisting of B and Si, 0.30≤a≤0.70, and 0.01≤b≤0.30).3) the B sublayers each have a composition represented by the formula: Cr1-cM2cN (where M2 is at least one selected from the group consisting of B and Si, where 0.01≤c≤0.40),4) the A sublayers each have an average thickness of 1 nm or more and 500 nm or less and the B sublayers each have an average thickness of 1 nm or more and 500 nm or less, and5) the alternating layer of the A sublayers and the B sublayers has an average thickness of 0.3 μm or more and 7.0 μm or less.
  • 4. The surface-coated cutting tool according to claim 3, wherein the adjoining A and B sublayers satisfy the relation: 0.1≤TA/TB≤10.0, where TA represents the average thickness of the A sublayers and TB represents the average thicknesses of the B sublayers.
  • 5. The surface-coated cutting tool according to claim 3 or 4, wherein the alternating layer of the A sublayers and the B sublayers further includes one or more C sublayers with an average thickness of 0.3 μm or more and 2.0 μm or less at any position in the alternating layer, wherein the C sublayers each have a composition represented by the formula: Al1-d-eTidM3eN (where M3 is at least one selected from the group consisting of B and Si, 0.30≤d≤0.70, 0.00≤e≤0.30, and d≠a and/or e≠b).
Priority Claims (1)
Number Date Country Kind
2022-002351 Jan 2022 JP national
PCT Information
Filing Document Filing Date Country Kind
PCT/JP2023/000161 1/6/2023 WO