The present application claims priorities of Chinese patent application No. 200910117993.X filed on Feb. 27, 2009 and Chinese patent application No. 200910150940.8 filed on Jun. 22, 2009. All the contents of the two Chinese patent applications are incorporated herein by reference.
The present invention relates generally to a method and system for detecting a defect of a substrate, and, more specifically, to a method and system for detecting a defect on or in a transparent or semi-transparent and patterned or structured substrate.
In the field of transparent or semi-transparent substrate, the patterned or structured substrate becomes more and more popular as increased demands of improved functions like in solar module industry. Defect detection of products is an important tool for quality control. For instance, various types of defects may be formed by different reasons during the process of glass manufacture, including surface defects such as scratches, stains, and open bubbles, and internal defects such as close bubbles, white, black or other colour inclusions. Tasks of defect detection are not only to detect defects but also to classify these defects since specifications of quality control are different for different types of defects.
Challenge of detecting defects of a patterned or structured substrate is to remove strong influence of patterns or structures on the substrate to detected images which influence results in difficulties in detecting accurately defects. In non-diffusive illumination mode, lights enter the substrate at angles within a certain range. Light intensity of incident lights is modulated by regular patterns or structures on the substrate so that obvious alternating bright and dark patterns occur in raw images collected by image sensor.
Patent application CN1908638 published on Feb. 7, 2007 discloses an optical method and apparatus for detecting defects of patterned glass as an example of such patterned or structured substrate, where an Edge Lighting (EL) mode is used, as shown in
Therefore, it is desirable to provide a method and system capable of detecting with high resolution various a defect on or in transparent or semi-transparent patterned substrate regardless of size thereof Further, it is desirable to provide a method and system capable of classifying with high precision the defected defect on or in the patterned substrate.
An object of the present invention is to provide a method and system for accurately detecting a defect on or in a transparent or semi-transparent patterned or structured substrate. Another object of the present invention is to provide a method and system for classifying the detected defect.
A system for detecting a defect of a transparent or semi-transparent substrate according to the present invent is provided, which comprises: a first illumination component, disposed at one side of the substrate and adapted to emit a diffusive light to the substrate; a first imaging component, disposed at opposite side of the substrate and adapted to scan the substrate by sensing light emitted by the first illumination component and transmitted through the substrate, the first illumination component and the first imaging component constructing a first detection channel; and, a transport module, adapted to produce relative motion between the substrate, and the first illumination component and the first imaging component.
A system for detecting a defect of a transparent or semi-transparent substrate according to the present invention, which comprises: a second illumination component, disposed at one side of the substrate or opposite side of the substrate and adapted to emit a light to the substrate; a second imaging component, disposed at the opposite side of the substrate and adapted to scan the substrate by sensing light derived from scattering through the substrate of the light emitted by the second illumination component; and, a transport module, adapted to produce relative motion between the substrate, and the second illumination component and the second imaging component, wherein the second illumination component and the second imaging component construct a second detection channel.
A system for detecting a defect of a transparent or semi-transparent substrate according to the present invention, which comprises: a third illumination component, adapted to emit a light to the substrate; a third imaging component, disposed at one side of the substrate and adapted to scan the substrate when the third illumination component emits the light to the substrate; a first polarization component, having a first polarization direction and arranged between the third illumination component and the substrate; a second polarization component, having a second polarization direction orthogonal to the first polarization direction and arranged between the third imaging component and the substrate; and, a transport module, adapted to produce relative motion between the substrate, and the third illumination component, the first polarization component, the second polarization component and the third imaging component, wherein the third illumination component, the first polarization component, the second polarization component and the third imaging component construct a third detection channel.
A method for detecting a defect of a transparent or semi-transparent substrate according to the present invention is provided, which comprises: using a first illumination component disposed at one side of the substrate to emit a diffusive light to the substrate; using a first imaging component disposed at opposite side of the substrate to scan the substrate by sensing light emitted by the first illumination component and transmitted through the substrate, the first illumination component and the first imaging component constructing a first detection channel; producing relative motion between the substrate, and the first illumination component and the first imaging component; and, processing data from the first imaging component, to detect and classify the defect of the substrate.
A method for detecting a defect of a transparent or semi-transparent substrate according to the present invention is provided, which comprises: using a second illumination component disposed at one side or opposite side of the substrate to emit a light to the substrate; using a second imaging component disposed at the opposite side of the substrate and adapted to scan the substrate by sensing light derived from scattering through the substrate of the light emitted by the second illumination component; producing relative motion between the substrate, and the second illumination component and the second imaging component; and, processing data from the second imaging component, to detect and classify the defect of the substrate.
A method for detecting a defect of a transparent or semi-transparent substrate according to the present invention, which comprises: using a third illumination component to emit a light to the substrate; using a third imaging component disposed at one side of the substrate to scan the substrate when the third illumination component emits the light to the substrate; arranging a first polarization component having a first polarization direction between the third illumination component and the substrate; arranging a second polarization component having a second polarization direction orthogonal to the first polarization direction between the third imaging component and the substrate; producing relative motion between the substrate, and the third illumination component, the first polarization component, the second polarization component and the third imaging component; and, processing data from the third imaging component, to detect and classify the defect of the substrate.
The above and the other features of the present invention will be understood better from the following detailed description of exemplified embodiments of the present invention with reference to the accompanying drawings.
It is to be understood that the figures and descriptions of the present invention may have been simplified to illustrate elements that are relevant for a clear understanding of the present invention, while eliminating, for purposes of clarity, other elements found in a typical defect detection system. Those of ordinary skilled in the art will recognize that other elements may be desirable and/or required in order to implement the present invention. However, because such elements are well known in the art, and because they do not facilitate a better understanding of the present invention, a discussion of such elements is not provided herein. It is also to be understood that the drawings included herewith only provide diagrammatic representations of the presently preferred structures of the present invention and that structures falling within the scope of the present invention may include structures different than those shown in the drawings. Reference will now be made to the drawings wherein like structures are provided with like reference designations.
Below, embodiments of the present invention will be explained in details in conjunction with the drawings.
As stated above, the key to detect local defects in a patterned or structured substrate is to remove the influence of pattern or structure and highlight the defects from background. Close and diffusive illumination of the substrate proposed in the first embodiment of the present invention solves the above-mentioned problem. As stated above, in other illumination modes, incident light enters the substrate in a certain angle range. Due to regular shape of pattern of the substrate, modulation of incident light in a certain angle range by these patterns causes alternating of bright and dark patterns in raw images collected by an image sensor. In contrast, in diffusive illumination mode of the present invention, ideally, if the incident light of a diffusive light source is any directional, each region of the substrate would be illuminated by light at each angle over entire space. Although, in practice, the incident angle of diffusive light source is limited, and absolutely uniform light distribution on the substrate is impossible, light rays emitted by a diffusive light source when being located very close to the substrate have a relatively uniform distribution over an enough wide region. Uniform illumination weakens modulation of pattern or structure of the substrate significantly, thereby highlighting defects from background. That is to say, a diffusive illumination source is disposed relative to the substrate in a way of providing substantially uniform illumination.
In the present embodiment, the substrate 120 may be patterned or structured glass, plastic, or any other transparent or semi-transparent material such as a patterned substrate used in a photovoltaic cell or a photovoltaic module, and is not limited to the form of a sheet having substantially parallel surfaces, but can be extended to the form of a cylinder curved in a plane vertical to transporting direction of the substrate. Unless otherwise specified, as used therein, the term “two opposite sides of the substrate” refers to two sides along a normal to surface of the substrate, i.e. two sides above and under the substrate 120 as illustrated in
The transport module 130 is used to produce relative motion between the transparent substrate 120, and the imaging module 160 and the illumination module 140. For example, as shown in
The imaging lens 164 is used for collecting light and imaging the light onto the photosensitive plane of the image sensor 162. The imaging component 161 has a numerical aperture defining the acceptance angle over which an imaging component is capable of receiving light, and is largely controlled by the imaging lens 164 and any other aperture-limiting elements included in the imaging component, such as iris. The image sensor 162 is used to sense light imaged on photosensitive planes thereof and converting the light into an electrical signal. In the embodiment of the present invention, the image sensor 162 is line scanning camera, such as CCD line scanning sensor, CMOS line scanning sensor, or any other sensor type capable of converting light into an electrical signal. Line scanning cameras are readily commercially available and may be used to scan the substrate 120 one scan at a time at a rate of several hundred or even several hundred of hundreds scans per second. Scanning lines of the first, second, third and forth imaging component 161-1, 161-2, 161-3, and 161-4 on the substrate 120 are substantially parallel and typically normal to the moving direction of the substrate 120. The imaging component 161 focuses on the illuminated portion of the surface on the substrate 120. It is should be noted that, in practice, the focus lines on the surface of the substrate 120 of the four imaging components 161-1, 161-2, 161-3, and 161-4 do not necessarily coincide with each other strictly, particularly in case of low real-time detection performance requirement. It should be noted that number of imaging components 161 is not limited to four as described above, but may be set to be less than 3 (even, 1) or more than 5 depending on width of the substrate, numerical aperture of imaging component, detection precision, as well as estimated maximum number or minimum detection size of defects on the substrate, etc.
As illustrated in
It should be noted that, in the present embodiment, the first light source 142 may be semiconductor light sources, such as LED (light emit diode) or LD (laser diode), fluorescent lights, and halogen lights. Further, in the present embodiment, light sources may be of any spectral range as long as the image sensors 162 may be photosensitive to light emitted by the light sources. Further, in the present embodiment, light sources are not limited to monochromatic ones. Polychromatic light source having a wide spectral range is possible, such as a white light source. In addition, a diffusive light source may be easily made a large size; for example, a LED array of several meter length may be commercially available. Thus, the defect detection technology of the present embodiment may be applied to such substrates as ones of great width. In the present embodiment, length of the first light source 142 and the diffuser 144 is equal to or slightly larger than the width of the substrate 120 in X direction.
Although in the present embodiment a single long diffusive light source is used as a first light source 142 and is aligned in Z direction to the linearly disposed four imaging component 161-1, 161-2, 161-3, and 161-4, a plurality of short diffusive light source may be used to illuminate the substrate 120 in the present embodiment. For example, four diffusive illumination component 141-1, 141-2, 141-3, and 141-4 which are aligned in Z direction to the four imaging component 161-1, 161-2, 161-3, and 161-4 respectively may be used. Further, the plurality of illumination components may be placed in a line in X direction (similar to the case of using a single long diffusive light source), or may be spaced each other in Z direction but being aligned to the respective imaging components. In the latter case, the four imaging components and respective diffusive illumination components operate at positions of different Z values on the substrate at the same time. Exact positions of defects on the substrate may be determined by subsequent image processing in consideration of distances between the diffusive illumination components.
Preferably, in the present embodiment, for purpose of providing as uniform as possible illumination of the substrate 120, the diffusive illumination module 141 is disposed very close to the substrate 120. The experimental results demonstrate that the closer between the diffusive illumination module 141 and the substrate 120 are, the better influence of the patterns is removed and the higher detection precision is.
Referring back to
The operation of defect detection system 100 in
In the embodiment shown in
The collimated illumination component 441 comprises a second light source 442 and a collimation optical element 444 (for example, one or more lenses). The light emitted by the second light source 442 becomes collimated light through the collimation optical element 444 and then impinges onto the substrate 120 in the direction indicated by Arrow 443. The collimated illumination component 441 is disposed such that the second light source 442 provides dark field illumination of substrate 120 relative to the four imaging components 161-1, 161-2, 161-3 and 161-4. As shown in
In the present embodiment, the two illumination components, the collimated illumination component 441 and the diffusive illumination component 141, are not switched on simultaneously, but used to illuminate the substrate 120 alternately. The four imaging components 161-1, 161-2, 161-3 and 161-4 work both when the collimated illumination component 441 switches on and when the diffusive illumination component 141 switches on. Therefore, the operation of the defect detection system of the two-channel configuration in
Specifically, the controlling module 190 is used to sense displacement of the substrate 120 and calculate a period over which the substrate 120 moves a certain displacement
as a working period, where P denotes pixel width of image sensor in imaging component, and M denotes imaging magnification of the image sensor. All of channel detections should be performed in one working period. The controlling module 190 then divides one working period into n equal or unequal parts based on number of groups n (n is a positive integral which is 2 or more) of detection channels which do not work simultaneously, resulting in trigger pulse sequence Ti (i is a positive integral) shown in
Now controlling operation of the controlling module 190 with respect to each of light sources and imaging components is described referring to trigger pulse sequences shown in
After a certain delay of leading edge of pulse 2, the second light source 442 switches on and illuminates the substrate 120 for a certain pulse width. The four image sensors 162 begin to work after the second light source 442 switches on. The second light source 442 then switches off before leading edge of pulse 3 comes while the four image sensors 162 are closed. During period of the second light source 442 being on, the first light source 142 keeps off, and the four imaging components 161 capture light reflected from the substrate 120, and send obtained data to the image processing module 180. The imaging processing module 180 then stores data received from each of the imaging sensors 162-1, 162-2, 162-3, and 162-4 in an array for respective imaging sensor in the buffer 182.
Similarly, during odd-numbered pulse period T2j−1 (j is a positive integral), the first light source 142 works, and data obtained from the first detection channel is stored in the buffer 182 of the image processing module 180; while during even-numbered pulse period T2j, the second light source 442 works, and data obtained from the second detection channel is stored in the buffer 182.
It should be noted that a plurality of imaging components of the present embodiment is not limited to the illustrated case in which all of imaging components capture images when the collimated illumination component 441 switches on, but may be extended to the case in which one or more among said plurality of imaging components work(s) when the collimated illumination component 441 switches on based on analysis results of raw images obtained from the first detection channel. For example, if a defect of bubble type in imaging region of the third imaging component 161-3 in raw images obtained from the first detection channel cannot be determined to be open bubble or close bubble, the controlling module 190 performs controlling so that only the third imaging component 161-3 is triggered to capture images when the collimated illumination component 441 switches on. In addition, although the first channel and the second channel share the imaging components 161, the present invention is not limited thereto, but one or more imaging components other than the imaging components 161 in the first channel are provided for the second channel.
Further, although the second detection channel is described to be of a dark field reflection mode in above embodiment, those skilled in the art may contemplate the second detection channel of dark field transmission mode by placing the light sources relative to the imaging components. I.e., in the second detection channel, the illumination component 441 and the imaging component 161 may also be set at two sides of the substrate 120 respectively, and the imaging component 161 scans the substrate 120 by sensing the light derived from scattering through the substrate 120 of the light emitted by the illumination component 441.
Those skilled in the art will understand that in the second embodiment, the angle at which the collimated illumination component 441 emits light is set such that in images that are formed by the imaging components 161 based on light derived from that the substrate 120 scatters the light emitted by the collimated illumination component 441, the open bubble of the substrate 120 is not visible and the close bubble of the substrate 120 is visible, but the present invention is not so limited. In other some embodiments of the present invention, the collimated illumination component 441 may also be set such that in the images that are formed by the imaging components 161 based on the light derived from that the substrate 120 scatters the light emitted by the collimated illumination component 441, the open bubble of the substrate 120 is visible and the close bubble of the substrate 120 is not visible.
Those skilled in the art will understand that in the second embodiment and modifications thereof, the collimated illumination component 441 is set such that in the images that are formed by the imaging components 161 based on the light derived from that the substrate 120 scatters the light emitted by the collimated illumination component 441, one of the open bubble and the close bubble of the substrate 120 is visible and the other is not visible, but the present invention is not so limited. In other some embodiments of the present invention, an illumination component with a radiation angle may also be used, so that in the images that are formed by the imaging components 161 based on the light derived from that the substrate 120 scatters the light emitted by the illumination component with the radiation angle, the open bubble and the close bubble of the substrate 120 are visible. Under the condition that the open bubble and the close bubble of the substrate 120 are visible, lightness and other features (e.g., roughness) may be used to determine that a defect appearing the images is the open bubble or the close bubble of the substrate 120.
Even if the substrate is subjected to washing process prior to inspection of defects, there are still foreign bodies such as dusts on surfaces of the substrate. Those foreign bodies such as dusts on surfaces of the substrate may result in misclassification of the defects detection system as real defects. It will undoubtedly increase fake defects rate of inspection (i.e. the probability of categorizing fake defects as real defects) and consequently increase waste of qualified product. In order to removing influences of the dusts and to further accurately identify inclusions, bubbles and other stress or optical-distortion type defects, a third embodiment of the present invention provides a solution for detecting stress or optical-distortion type defects of the substrate based on change of polarization characteristic of detection light resulting from presence of the defects. When the substrate is illuminated by a linear-polarization light, if the substrate is of uniform optical characteristic, i.e. no stress or optical-distortion type defects, light transmit through the substrate has substantially uniform polarization characteristic. At this point, an image with total extinction may be obtained by use of a polarizer disposed before the imaging component and of a polarization direction orthogonal to that of the linear-polarization light. While, if there are stress or optical-distortion type defects in an area of the substrate, the polarization characteristic of light transmit through the area is different from that of light transmit through other areas. As a result, a total extinction would not be seen with respect to the light transmit through the area having stress or optical-distortion type defects. In other words, in the image of the substrate captured by the imaging component, areas having the type of defects appear as bright areas while the surrounding areas thereof appear as dark background.
As used therein, the term “stress type of defects” means defects which result in local stress in the substrate. The present inventors demonstrate experimentally that the inclusions (white, black or other color inclusions) or recrystallization will result in stress in the substrate. As used therein, the term “optical-distortion type of defects” means defects whose presence result in changes of propagation direction of light, such as knots.
The three-channel configuration illustrated in
As illustrated in
Although the illumination component for polarization detection 741 illustrated in
As illustrated in
In the present embodiment, unlike the embodiments shown in
In the present embodiment, the three illumination components, i.e., the collimated illumination component 441, the diffusive illumination component 141 and the illumination component for polarization detection 741, are not switched on simultaneously, but used to illuminate the substrate 120 alternately. The four imaging components 161-1, 161-2, 161-3 and 161-4 work when the collimated illumination component 441 switches on, when the diffusive illumination component 141 switches on, or when the illumination component for polarization detection 741 switches on. Therefore, the operation of the defect detection system of the three-channel configuration in
Specifically, the controlling module 190 is used to sense displacement of the substrate 120 and calculate a period over which the substrate 120 moves a certain displacement
as a working period, where P denotes pixel width of image sensor in imaging component, and M denotes imaging magnification of the image sensor. All of channel detections should be performed once in one working period. The controlling module 190 then divides one working period into n equal or unequal parts based on number of groups n (n is a positive integral which is 3 or more) of detection channels which do not work simultaneously, resulting in trigger pulse sequence Ti (i is a positive integral) shown in
Now controlling operation of the controlling module 190 with respect to each of light sources and imaging components is described referring to trigger pulse sequences shown in
After a certain delay of leading edge of pulse 2, the second light source 442 switches on and illuminates the substance for a certain pulse width. The four image sensors 162 begin to work after the second light source 442 switches on. The second light source 442 then switches off before leading edge of pulse 3 comes while the four image sensors 162 are closed. During period of the second light source 442 being on, the first and third light sources 142 and 742 keep off, and the four imaging components 161 capture light reflected from the substrate 120, and send obtained data to the image processing module 180. The imaging processing module 180 then stores data received from each of the imaging sensors 162-1, 162-2, 162-3, and 162-4 in an array for respective imaging sensor in the buffer 182.
After a certain delay of leading edge of pulse 3, the third light source 742 switches on and illuminates the substrate 120 for a certain pulse width. The four image sensors 162 begin to work after the third light source 742 switches on. The third light source 742 then switches off before leading edge of pulse 4 comes while the four image sensors 162 are closed. During period of the third light source 742 being on, the first and second light sources 142 and 442 keep off, and the four imaging components 161 capture light transmit through the substrate 120, and send obtained data to the image processing module 180. The imaging processing module 180 then stores data received from each of the imaging sensors 162-1, 162-2, 162-3, and 162-4 in an array for respective imaging sensor in the buffer 182.
Although
Those skilled in the art will understand that in the third detection channel, the illumination component 741 and the imaging component 161 are set at two sides of the substrate 120 respectively, and the imaging component 161 scans the substrate 120 by sensing the light emitted by the illumination component 741 and transmitted through the first polarization component 730, the substrate 120 and the second polarization component 750, but the present invention is not so limited. In other some embodiments of the present invention, the angle at which the illumination component emits light is set such that the imaging component 161 scans the substrate 120 by sensing the light that is derived from scattering through the substrate 120 of the light emitted by the illumination component 741 and transmitted through the first polarization component 730 and is then transmitted through the second polarization component 750.
Those skilled in the art will understand that in the third detection channel, the illumination component 741 and the imaging component 161 are set at two sides of the substrate 120 respectively, but the present invention is not so limited. In other some embodiments of the present invention, both of the illumination component 741 and the imaging component 161 are also set at one and the same side of the substrate 120. Under the condition that the illumination component 741 and the imaging component 161 are set at one and the same side of the substrate 120, the first polarization component 730 is set between the illumination component 741 and the substrate 120, the second polarization component 750 is set between the imaging component 161 and the substrate 120, and the imaging component 161 scans the substrate 120 by sensing the light that is derived from scattering through the substrate 120 of the light emitted by the illumination component 741 and transmitted through the first polarization component 730 and is then transmitted through the second polarization component 750.
The foregoing description of all aspects of the present invention is given for the purpose of illustration and explanation. It is not intended to exhaustively describe or limit the present invention to the disclosed precise forms, while many variations and changes are apparent. For example, in defect detection system of the present invention, number of detection channel is not limited to three, number of imaging components is not limited to four, and more than two light sources may be used. Further, although the polarization detection configuration is described with respect to the inclusions by way of example, those skilled in the art will understand based on the principle of the polarization detection that the above detection configuration of the present invention may also be used to detect other stress type or optical-distortion type of defects than inclusions. Therefore, it should be comprehended that the present invention is not limited to the disclosed specific embodiments but is intended to cover all possible modifications and variations defined by the appending claims.
Number | Date | Country | Kind |
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200910117993.X | Feb 2009 | CN | national |
200910150940.8 | Jun 2009 | CN | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/CN10/70790 | 2/26/2010 | WO | 00 | 8/26/2011 |