The present disclosure relates to a process control system. More particularly, the present disclosure relates to a system and a method for detecting fault events in equipment for fabricating semiconductor devices.
In a semiconductor fabrication process, semiconductor devices are formed with sequential semiconductor layers. The semiconductor fabrication process is performed with a wide variety of processing and measuring machines. The processing machine performs various processing functions as defined, for example, by recipes for fabrication of semiconductor device.
Traditionally, fault detection and classification (FDC) matching between different tools is identified by user knowledge. For example, a user identifies an abnormal situation on a FDC chart by his or her experience and knowledge rather than a standard criterion. Furthermore, it is difficult to efficiently identify whether the abnormal situation exists in a great many processing machines simultaneously.
In some aspects, a detection method is provided. The detection method includes: aligning, by a processor, first data with second data according to steps, in which the first data and the second data are associated with equipment for fabricating semiconductor devices; determining, by the processor, a first virtual area according to the first data; determining, by the processor, a second virtual area according to the second data; and displaying, by a display, a result of comparing the first virtual area and the second virtual area, to distinguish whether a fault event exists in the equipment.
In some aspects, a computer-implemented method for detecting a fault event is provided. The computer-implemented method includes: aligning, by a processor, first data with second data at steps, in which the first data and the second data are associated with equipment for fabricating semiconductor devices; converting, by the processor, the first data and the second data into a first virtual area that is associated with the first data and a second virtual area that is associated with the second data; comparing the first virtual area with the second virtual area; and displaying, by an input/output (I/O) module, a result of comparing the first virtual area and the second virtual area via a plurality of indicators, in order to distinguish whether the fault event exists in the equipment.
As discussed above, the methods of the present disclosure improve the efficiency of monitoring fault events in a great many equipments simultaneously.
Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.
The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
The terms used in this specification generally have their ordinary meanings in the art and in the specific context where each term is used. The use of examples in this specification, including examples of any terms discussed herein, is illustrative only, and in no way limits the scope and meaning of the disclosure or of any exemplified term. Likewise, the present disclosure is not limited to various embodiments given in this specification.
Although the terms “first,” “second,” etc., may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used to distinguish one element from another. For example, a first element could be termed a second element, and, similarly, a second element could be termed a first element, without departing from the scope of the embodiments. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.
In this document, the term “coupled” may also be termed as “electrically coupled,” and the term “connected” may be termed as “electrically connected”. “Coupled” and “connected” may also be used to indicate that two or more elements cooperate or interact with each other.
Reference is now made to
The system 100 includes a processor 110, a memory 120, a memory 130, and input/output (I/O) interfaces 140. The processor 110 is coupled to the memory 120, the memory 130, and the I/O interfaces 140. In some embodiments, the processor 110 is implemented with one or more processing units. In various embodiments, the processing units includes a central processing unit (CPU), an application specific integrated circuit (ASIC), a multi-processor, a distributed processing system, and so on. In some embodiments, the processor 110 is implemented with parallel-computing processing units. Various circuits or units to implement the processor 110 are within the contemplated scope of the present disclosure.
In various embodiments, each of the memory 120 and the memory 130 is implemented with one or more data storage units. The memory 120 is coupled to equipment 100A to receive raw data RD. Accordingly, the raw data RD are stored in the memory 120. In some embodiments, the equipment 100A is configured to perform one or more semiconductor fabrication processes on a wafer (not shown) for semiconductor fabrication. In some embodiments, the equipment 100A includes one or more semiconductor manufacturing machines. In some embodiments, one or more semiconductor fabrication processes include etching, deposition, implantation, annealing, etc. In some embodiments, one or more semiconductor manufacturing machines include photolithography steppers, etch machines, deposition machines, polishing machines, rapid thermal anneal machines, ion implantation machines, and the like.
In some embodiments, the raw data RD indicates information regarding operating parameters and/or sensing parameters of the equipment 100A. In some embodiments, the operating parameters and/or sensing parameters include voltages, currents, pressure, gas flows, time, temperature, impurity levels, and so on.
The configurations of the equipment 100A and the raw data RD mentioned above are given for illustrative purposes. Various configurations of the equipment 100A and the raw data RD are within the contemplated scope of the present disclosure. For ease of understanding, only one of the equipment 100A is illustrated in
The memory 130 stores one or more program codes for monitoring the equipment 100A. In some embodiments, the memory 130 stores program codes encoded with a set of instructions for analyzing the raw data RD, so as to distinguish whether a fault event exists in the equipment 100A. In some embodiments, the term “fault event” indicates that the current operating condition of the equipment 100A is different from what is usual or expected. For illustration, in some embodiments, a fault detection and classification (FDC) tool (not shown) is implemented in a form of program codes which are stored in the memory 130 and encoded with a set of instructions. The processor 110 executes the FDC tool to analyze the raw data RD, in order to detect the fault event.
In some embodiments, the memory 130 is a non-transitory computer readable storage medium encoded with, i.e., storing, a set of executable instructions. For illustration, the memory 130 stores executable instructions for performing operations including, for example, operations S210, S220, S230, S240 and S250 illustrated in
The I/O interfaces 140 receive inputs or commands from various control devices (not shown), which, for example, are operated by a process engineer and/or a maintenance engineer. Accordingly, the system 100 is able to be operated with the commands or recipe received by the I/O interfaces 140. In some embodiments, the I/O interfaces 140 include a display configured to display the status of executing the program codes. In some embodiments, the I/O interfaces 140 include a display configured to display a result of analyzing the raw data RD, as illustrated in
Reference is now made to
In operation S210, the raw data RD are continuously gathered to generate first data D1 and second data D2, in which the first data D1 and the second data D2 correspond to different time intervals.
Reference is now made to
The amount of the predetermined time interval given above is for illustrative purposes only. Various amounts of the predetermined time interval are within the contemplated scope of the present disclosure. For ease of understanding, the first data D1 and the second data D2 are illustrated in a form of a curve which indicates the response of the equipment 100A relative to the an external command or a recipe. Various forms of the first data D1 and the second data D2 are within the contemplated scope of the present disclosure.
With continued reference to
As shown in
Reference is now made to
In some other embodiments, operation S220 is performed without considering data gathered at the first step ST1. Alternatively stated, in such embodiments, the first data D1 and the second data D2 are aligned with each other at each step ST2-STN, in which N is an integer that greater than 2. In some embodiments, the step ST1 indicates a buffering time or precondition time for the equipment 100A to respond to an external command or a recipe. In some situations, during the buffering time, the equipment 100A is preparing to perform the semiconductor fabrication processes on a wafer (not shown). For example, as shown in
With continued reference to
Reference is now made to
In some embodiments, the processor 110 is able to analyze the first data D1 in
Reference is now made to
The determination process of the first virtual area V1 and the second virtual area V2 are given for illustrative purposes only. Various determination processes of the first virtual area V1 and the second virtual area V2 are within the contemplated scope of the present disclosure. Taking the first virtual area V1 as an example, in some other embodiments, the processor 110 performs an integral operation according to the first data D1, the upper limit value UL1, and the lower limit value LL1 to generate the first virtual area V1.
With continued reference to
Reference is now made to
In some embodiments, to perform operation S250, the processor 110 compares the upper limit value UL1 and the lower limit value LL1 with the upper limit value UL2 and the lower limit value LL2. For example, as shown in
Furthermore, in case 2, the upper limit value UL2 is between the upper limit value UL1 and the lower limit value LL1, and the lower limit value UL2 is less than the lower limit value UL1. Accordingly, the second virtual area V2 is determined to be partially overlapped with the first virtual area V1. Under this condition, it indicates that a difference is present between the raw data RD gathered in first 24 hours and the raw data RD gathered in the next 24 hours. In some embodiments, it is determined that there is a fault events exist in the equipment 100A, in a condition that an intersection area IA between the second virtual area V2 and the first virtual area V1 is larger than a predetermined area. In some embodiments, the predetermined area is set according to practical requirements, which includes, for example, tolerance of variation, process accuracy, etc. In some embodiments, an indicator ID2 is configured to be displayed as a second color pattern P2, in a condition that the case 2 is determined.
Moreover, in case three, both of the upper limit value UL2 and the lower limit value UL2 are less than the lower limit value UL1. Accordingly, the second virtual area V2 is separated from the first virtual area V1. Under this condition, it indicates that a huge difference is present in the raw data RD gathered in first 24 hours and the raw data RD gathered in next 24 hours. As a result, it is determined that there is a fault event existing in the equipment 100A. In some embodiments, an indicator ID3 is configured to be displayed as a third color pattern P3, in a condition that the case 3 is determined.
In some embodiments, the first color pattern P1, the second color pattern P2, and the third color pattern P3 are assigned to different colors. For example, colors that are assigned to the first color pattern P1, the second color pattern P2, and the third color pattern P3 are getting darker. With such an arrangement, it will be more efficient to distinguish whether a fault event exists.
The arrangements of the first color pattern P1, the second color pattern P2, and the third color pattern P3 given above are for illustrative purposes only. Various arrangements of the first color pattern P1, the second color pattern P2, and the third color pattern P3 are within the contemplated scope of the present disclosure.
Reference is now made to
In some embodiments, the processor 100 performs a monitoring tool (not shown) carried in the memory 130, to display the comparison results of the first virtual area V1 and the second virtual area V2 through the I/O interface 140. For example, as shown in
One of ordinary skill in the art would recognize that an order of operations in the method 200 in
In some embodiments, the term “tool” can be implemented as software carried in the memory 130 in
In some embodiments, the method 200 in
As discussed above, the system 100 and the method 200 of the present disclosure improve the efficiency of monitoring fault events in a great many equipments simultaneously.
It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations of this disclosure provided they fall within the scope of the following claims.