(A) Field of the Invention
The present invention relates to a system and method for constructing variations from an integrated circuit layout, and more particularly, to a system and method for manipulating an integrated circuit layout allowing for reuse and migration.
(B) Description of the Related Art
Semiconductor circuits or chips have become widely used in articles for daily use. A typical electronic circuit design is initially conceived and tested schematically by a circuit design engineer; with a number of components and devices connected together to yield a circuit with desired performance characteristics. Once the circuit has been designed, it must be reconfigured from schematic form into a geometric layout form. This is typically a job for a physical design engineer, working in concert with the circuit design engineer to create a graphic layout specifying a suitable semiconductor implementation of the circuit. The geometric layout of the device, which specifies all of the semiconductor device layout parameters, is then submitted to a foundry for fabrication of the chip.
Configuring the geometric layout from the schematic form for an electronic circuit is a very complicated task, and is governed by a large number of geometric rules. A geometric layout of a semiconductor device contains geometric features such as polygons to indicate the proper size, shape, location and separation of a certain physical feature of the circuit, distinguishing it from other physical features, or to indicate proper isolation and separation among the circuit elements. The geometric layout of a typical semiconductor device contains multiple drawing layers, each layer having one or more polygons. Generally, the more complicated the device is, the more layers and polygons the layout includes.
In addition, to layout another semiconductor device, the circuit design engineer and the physical design engineer have to restart the complicated task. Even the circuit design of the semiconductor device is to be fabricated by a new fabrication process rather than a predetermined process; the circuit design engineer and the physical design engineer have to modify the parameters of the circuit layout to meet constraints of the new fabrication process, which is time-consuming and error prone. In other words, the prior art consumes a lot of effort for the existing layout to be reused or migrated to a different fabrication process.
A system for manipulating an integrated circuit layout allowing for reuse and migration comprises an object extractor for identifying primitive objects in a geometric layout to generate a first symbolic layout based on the criteria of a technology file, a nester for nesting a plurality of primitive objects to generate a first virtual device in the first symbolic layout, a recognizer for associating first virtual devices in first symbolic layout to generate a second symbolic layout, an optimizer for optimizing the second symbolic layout to generate a third symbolic layout. The object extractor is configured to identify the primitive object in the geometric layout based on the primitive object model that was taken from the technology file, which identifies the parameters and constraints of primitive objects.
A method for manipulating an integrated circuit layout allowing for reuse and migration comprises steps of receiving a geometric layout, identifying primitive objects in the geometric layout to generate a first symbolic layout based on the criteria of a technology file, nesting a plurality of primitive objects to generate a first virtual device in the first symbolic layout, and associating first virtual devices in the first symbolic layout to generate a second symbolic layout. The method may further comprise a step of including additional primitive objects to the first virtual device to generate a second virtual device after the step of associating the first virtual device in the second symbolic layout, and a step of associating the second virtual devices in the second symbolic layout.
In addition, the method may further comprise a step of adding new constraints and parameters or a step of modifying the parameters and the constraints of the first/second virtual device to generate a third virtual device, and a step of optimizing the second symbolic layout including first/second virtual devices to generate the third symbolic layout based on the third virtual device. Consequently, the second symbolic layout can be reused to generate the third symbolic layout. Further, the method may comprise a step of updating the parameter and the constraint of the first/second virtual device based on rules of a predetermined fabrication process to generate a fourth virtual device, and a step of optimizing a second symbolic layout including the first/second virtual devices to generate a third symbolic layout based on the fourth virtual device. As a result, the second symbolic layout can be used to generate a third symbolic layout for migrating to a new fabrication process.
The primitive objectives and advantages of the present invention will become apparent upon reading the following description and upon reference to the accompanying drawings in which:
a) to
a) and
a) shows some layer information of a technology file. The present method categorizes the process layer information based on the property of the layer information, such as the composition or function of the layer, into several layer classes, as shown in
On the other hand, a nesting step can be performed to group a plurality of primitive objects to generate a first virtual device, and an associating step can then be performed to associate the first virtual device within the first symbolic layout. The method may further comprise a step of including additional primitive objects to the first virtual device to generate a second virtual device after the step of associating the first virtual device in the second symbolic layout, and a step of associating the second virtual device in the second symbolic layout. That is, repeating the nesting step and the associating step. In addition, users may add new parameters and constraints to the virtual device. Finally, the second symbolic layout is optimized to generate the third symbolic layout based on the virtual devices and the embedded parameters and constraints.
The above-described embodiments of the present invention are intended to be illustrative only. Numerous alternative embodiments may be devised by those skilled in the art without departing from the scope of the following claims.
Number | Name | Date | Kind |
---|---|---|---|
5212653 | Tanaka | May 1993 | A |
6009251 | Ho et al. | Dec 1999 | A |
6449757 | Karniewicz | Sep 2002 | B1 |
6457163 | Yang | Sep 2002 | B1 |
6802050 | Shen et al. | Oct 2004 | B2 |
6804809 | West et al. | Oct 2004 | B1 |
6920620 | Hsiao et al. | Jul 2005 | B2 |
7124382 | Eccles et al. | Oct 2006 | B1 |
20030005399 | Igarashi et al. | Jan 2003 | A1 |
20030135831 | Hsiao et al. | Jul 2003 | A1 |
20040243949 | Wang et al. | Dec 2004 | A1 |
20040250233 | Sinha et al. | Dec 2004 | A1 |
20050086626 | Sato et al. | Apr 2005 | A1 |
20050183053 | Ishizuka | Aug 2005 | A1 |
20050209829 | Binzer et al. | Sep 2005 | A1 |
20060036978 | Fukuzono et al. | Feb 2006 | A1 |
Number | Date | Country | |
---|---|---|---|
20060259882 A1 | Nov 2006 | US |