Systems and methods for providing a beam of charged particles

TECHNICAL FIELD

The disclosed embodiments generally relate to particle beam generation, including proton beam generation, and particularly to particle beam generation via interactions between an electromagnetic radiation beam and a particle-generating target for generating charged particles, such as ions (including protons) and/or electrons.

BACKGROUND

Aspects of this disclosure include many systems, subsystems, components and subcomponents. Background details already known are not repeated herein. Such background information may include information contained in the following materials:

- U.S. Pat. No. 8,229,075 to Cowan et al., titled “Targets and Processes for Fabricating Same,” issued Jul. 24, 2012;
- U.S. Pat. No. 8,389,954 to Zigler et al., titled “System for Fast Ions Generation and a Method Thereof,” issued Mar. 5, 2013;
- U.S. Pat. No. 8,530,852 to Le Galloudec, titled “Micro-Cone Targets for Producing High Energy and Low Divergence Particle Beams,” issued Sep. 10, 2013;
- U.S. Pat. No. 8,750,459 to Cowan et al., titled “Targets and Processes for Fabricating Same,” issued Jun. 10, 2014;
- U.S. Pat. No. 9,236,215 to Zigler et al., titled “System for Fast Ions Generation and a Method Thereof,” issued Jan. 12, 2016;
- U.S. Pat. No. 9,345,119 to Adams et al., titled “Targets and Processes for Fabricating Same,” issued May 17, 2016; and
- U.S. Pat. No. 9,530,605 to Nahum et al., titled “Laser Activated Magnetic Field Manipulation of Laser Driven Ion Beams,” issued Dec. 27, 2016.

Particle radio-therapy conducted with ions may be used to treat disease. In one form of particle therapy, called proton therapy, a tumor is treated by irradiating it with protons (e.g., hydrogen ions). Proton therapy has advantages over conventional photon-based therapies (e.g., x-ray and gamma ray therapies) in part due to the way protons and photons interact with a patient's tissue.

FIG. 1 shows the radiation dose as a function of tissue depth for both photon and proton therapies. Before a particle can irradiate the treatment volume 106 defined by the patient's treatment plan, it typically must traverse the patient's skin and other healthy tissue before reaching the treatment volume 106 of the patient. In doing so, the particles can damage healthy tissue, an undesirable side-effect of the treatment. As shown in curve 102 of FIG. 1, photons (e.g., x-rays) deliver most of their energy to the regions near the patient's skin. For tumors deeper in the patient's body, this interaction may damage healthy tissue. Additionally, some photons traverse the patient's body beyond the treatment volume 106, irradiating yet more healthy tissue behind the tumor before ultimately exiting the other side of the patient's body. Although the radiation doses to these other healthy tissues is lower than the dose delivered near the patient's skin, it is still undesirable.

Unlike photons, protons, exhibit a very desirable interaction with the patient's tissue. As shown by curve 104 in FIG. 1, the peak interaction of protons with the patient's tissue occurs deeper within the patient and may cease abruptly after the peak interaction. Additionally, protons interact with surface tissues much less than photons, meaning that the majority of the ion beam's energy can be delivered to the treatment volume 106, and the irradiation of healthy tissue can be reduced. Taking advantage of these benefits, proton therapy thus allows more precise administration of energy to unhealthy tissue in patients while avoiding damage to healthy tissue. For example, proton therapy may reduce damage to surrounding healthy tissue by 2 to 6 times when compared to x-ray therapy, thereby improving patient survival and quality of life. Protons may reduce the lifetime risk of secondary cancer in children by 97%, compared to x-rays.

Commercial proton therapy centers are currently rare due to disadvantages in existing proton therapy systems, which generate ion beams by using large and costly particle accelerators. Accelerator-based systems can be massive and are not scalable. As an example, FIG. 2 shows an approximate size comparison of an accelerator-based proton therapy system against a football field. The energy requirements and maintenance costs inherent in operating an accelerator-based system are also immense. Taken together, these disadvantages lead to exorbitant construction and maintenance costs associated with proton therapy. In addition to the extravagant costs associated with accelerator-based ion beam generation, adjusting certain properties of the ion beam (e.g., the beam energy and beam flux) can be cumbersome and time-consuming in such systems. This leads to longer treatment times and low patient throughput, further increasing the cost of individual treatments as fewer patients share the cost burden. Accordingly, few proton therapy centers currently exist, and patients often receive inferior treatments due, in part, to unavailability of proton therapy.

The present disclosure includes alternative approaches to proton therapy. Although the embodiments disclosed herein contemplate the medical application of ion beam therapy, a person of ordinary skill in the art would understand that the novel particle-beam generating methods and systems described below can be used in any application where a beam of charged particles is desired.

SUMMARY

In one embodiment, a system for generating a beam of charged particles, such as an ion beam, is provided. The system may comprise: an interaction chamber configured to support a target; at least one electromagnetic radiation source configured to: provide a probe beam for determining orientation data of the target, wherein the probe beam being configured to irradiate the target at a first energy; and provide a particle-generating beam for producing a beam of charged particles, wherein the particle-generating beam being configured to irradiate the target at a second energy greater than the first energy; a sensor for measuring at least one property of a signal resulting from an interaction between the probe beam and the target; and at least one processor configured to: receive feedback information from the sensor; and cause a change in a relative orientation between the particle-generating beam and the target.

In the system, the at least one electromagnetic radiation source may include a probe beam source for providing the probe beam and a separate particle-generating beam source for providing the particle-generating beam. The probe beam source may be associated with a first range of wavelengths and the particle-generating beam source may be associated with a second, non-overlapping range of wavelengths.

In the system, the at least one electromagnetic radiation source may include a single electromagnetic radiation source configured to provide both the probe beam and the particle-generating beam. The single electromagnetic radiation source may be associated with an optical element for causing at least one difference between the particle-generating beam source and the probe beam. The first energy of the probe beam may be selected to substantially avoid particle generation.

In the system, the at least one processor may be further configured to determine the orientation data from the feedback information, wherein the orientation data is indicative of a difference between an actual location of the target and a desired translational location of the target. The desired translational location of the target may be within a focal volume of the particle-generating beam. The at least one processor may be further configured to determine the orientation data from the feedback information, wherein the orientation data is indicative of a difference between an actual angular position of the target and a desired angular position of the target. The desired angular position may be associated with a predetermined angle of incidence of the particle-generating beam.

In the system, after changing the relative orientation between the particle-generating beam and the target, the sensor may be configured to measure at least one property of an additional signal resulting from an interaction between an additional probe beam and the target, and the at least one processor may be further configured to assess whether the target is oriented in a desired orientation based, at least in part, on the at least one property of the additional signal.

In the system, the at least one processor may be further configured to determine the orientation data from the feedback information and to adjust a relative orientation between the particle-generating beam and the target based, at least in part, on the orientation data. The at least one processor may be further configured to adjust the relative orientation between the particle-generating beam and the target by controlling a deformable mirror. The at least one processor may be further configured to adjust the relative orientation between the particle-generating beam and the target by controlling a motor associated with a movable platform. The movable platform may be configured to adjust the relative orientation of the target by translating the target. The movable platform may be configured to adjust the angular position of the target by rotating the target.

In another embodiment, a method for generating a beam of charged particles, such as an ion beam, is provided. The method may comprise: supporting a target for generating particles; controlling at least one electromagnetic radiation source to supply a probe beam at a first energy; controlling the at least one electromagnetic radiation source to supply a particle-generating beam with a second energy greater than the first energy to thereby cause the target to produce a beam of charged particles; determining orientation data of the target from an interaction between the probe beam and the target; adjusting a relative orientation between the particle-generating beam and the target based, at least in part, on the orientation data.

In the method, adjusting the relative orientation between the particle-generating beam and the target may comprise moving the target to a translational location within a focal volume of the particle-generating beam when the orientation data indicates a difference between an actual translational location of the target and a desired translational location of the target.

In the method, adjusting the relative orientation between the particle-generating beam and the target may comprise adjusting the target to an angular position associated with a predetermined angle of incidence of the particle-generating beam when the orientation data indicates a difference between an actual angular position of the target and a desired angular position of the target.

Consistent with other disclosed embodiments, non-transitory computer-readable storage media may store program instructions that are executed by at least one processing device and perform any of the methods described herein.

The foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the claims.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate certain aspects of the disclosed embodiments and, together with the description, explain the disclosed embodiments. In the drawings:

FIG. 1 is a graph depicting radiation dose correlated to tissue depth.

FIG. 2 is an approximate representation of size of some conventional accelerator-based particle therapy systems, as described above.

FIG. 3 is a diagram of an example of interconnected components of a system for providing proton therapy, consistent with disclosed embodiments.

FIGS. 4A through 4E are examples of particle-generating targets for generating a beam of charged particles, such as ions, consistent with disclosed embodiments.

FIG. 5 is a schematic diagram of an example of a controller for controlling a proton therapy system, consistent with disclosed embodiments.

FIG. 6 is a schematic diagram of an example of an electromagnetic radiation source, consistent with disclosed embodiments.

FIG. 7 is a schematic diagram of an example of a gantry, consistent with disclosed embodiments.

FIG. 8 is a schematic diagram of another example of a gantry, consistent with disclosed embodiments.

FIG. 9 is a flowchart of an example of a proton therapy process, consistent with disclosed embodiments.

FIG. 10 illustrates aspects of an example of an interaction chamber, consistent with disclosed embodiments.

FIG. 11 is a flowchart of an example of a process for controlling proton therapy with proton generation feedback, consistent with disclosed embodiments.

FIG. 12 depicts energy of an exemplary particle beam pulse consistent with disclosed embodiments.

FIGS. 13A and 13B depict an example of a proton energy selection system, consistent with disclosed embodiments.

FIG. 14 is a flowchart of an example of a process for controlling proton therapy treatment in a three dimensional space, based on proton generation feedback, consistent with disclosed embodiments.

FIGS. 15A, 15B, 15C, and 15D depict aspects of an exemplary proton therapy treatment based on the process of FIG. 14.

FIG. 16 is a flowchart of an example of a process for examining and adjusting the location and position of the laser-target, consistent with disclosed embodiments.

FIGS. 17A, 17B, and 17C are schematic diagrams of systems for executing the process described in FIG. 16, consistent with disclosed embodiments.

FIG. 18 is a schematic diagram depicting exemplary peak intensities of a probe beam and a particle-generating beam consistent with disclosed embodiments.

DETAILED DESCRIPTION

Reference is now made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings and disclosed herein. Wherever convenient, the same reference numbers are used throughout the drawings to refer to the same or like parts.

Systems and methods are provided herein for providing particle-beam therapy. The following embodiments are described in relation to proton therapy. As used here, “proton therapy” refers to a particle therapy medical procedure that uses a beam of protons (e.g., hydrogen ions) to irradiate diseased tissue, most often in the treatment of cancer. While this description refers to this therapeutic procedure, it is to be understood that the intended scope of the disclosure herein are not limited to therapy or medical procedures. Rather, it may apply any time a proton beam is generated for any purpose. In addition, the disclosure is not limited to the generation of beams of protons, but also applies to other forms of ion-beam generation and other charged-particle beams, including electron beams.

A system for generating a beam of charged particles, such as an ion beam, in accordance with the present disclosure may comprise one or more sources of electromagnetic radiation. “Electromagnetic radiation,” as used in the present disclosure may refer to any form of electromagnetic radiation having any wavelength, frequency, energy, power, polarization, and/or spatial or temporal profile. In some embodiments, electromagnetic radiation may propagate in the form of a beam. For example, an electromagnetic radiation beam may be any form of electromagnetic radiation suitable for irradiating a desired location. In some embodiments, a system for providing proton therapy system may be configured to provide an electromagnetic radiation beam along a trajectory. An electromagnetic radiation beam may, for example, be configured for irradiating a plurality of patterned features on a particle-generating target (as described in further detail below) or for irradiating one or more knife edges on a particle-generating target (also described in further detail below).

An electromagnetic radiation beam may comprise a defined energy, wavelength, power, energy, polarization (or it may not be polarized), spatial profile, and/or temporal profile. Any of these traits may be fixed or may vary. As an example, an electromagnetic radiation source may be configured to provide a laser beam having traits tailored to properties of a particle-generating target. An electromagnetic radiation beam may be pulsed, to thereby cause a pulsed particle beam, or it may be continuous to thereby cause a continuous particle beam.

A system for generating a beam of charged particles, such as an ion beam, in accordance with the present disclosure may comprise a particle-generating target. As used in the present disclosure, a particle-generating target may refer to any material, apparatus, or combination of elements configured for generating charged particles in response to electromagnetic irradiation. As described below, a particle-generating target may be configured for generating an ion beam; however, an ion beam is merely an example, and the beam may be configured to comprise other charged particles, such as electrons. In some embodiments, a particle-generating target may be provided with a plurality of patterned features. For example, a plurality of patterned features may comprise protrusions extending from a surface of a particle-generating target. In some embodiments, a particle-generating target may be patterned with one or more knife edges. For example, a knife edge of a particle-generating target may include one or more narrow edges, similar to an arête or the edge of a blade.

A system for generating a beam of charged particles, such as an ion beam, in accordance with the present disclosure may comprise optics component(s). As used in the present disclosure, optics component(s) may refer to any one or more components for manipulating and/or controlling an electromagnetic radiation beam in any manner, including, for example, shaping, directing, filtering, splitting, delaying, modulating, absorbing, amplifying, focusing, chopping, and/or reflecting an electromagnetic radiation beam. As an example, optics components may be positioned along a trajectory of an electromagnetic radiation beam, for example between an electromagnetic radiation source and a surface of a particle-generating target. In some embodiments, optics components may be configured to direct the electromagnetic radiation beam at the particle-generating target, for example to thereby cause a resultant beam of charged particles, such as ions or electrons. Further, an electromagnetic radiation source may include one or more optics components to facilitate formation of an electromagnetic radiation beam.

Consistent with the present disclosure, optics components may include one or more adaptive mirror(s). As used in the present disclosure, an adaptive mirror may refer to an element that includes a reflective surface that may be adapted. For example, an adaptive mirror may be a deformable mirror that comprises a plurality of facets, each of the plurality of facets being independently controllable by a digital logic circuitry. As another example, an adaptive mirror may be a plasma mirror that comprises a laser pulse focused onto an anti-reflective coated substrate, one or both of the laser pulse and anti-reflective coated substrate being controllable by a digital logic circuitry. In some embodiments, an adaptive mirror may be configured to direct an electromagnetic radiation beam at a particle-generating target or, in some instances, configured to cooperate with an electromagnetic radiation beam to cause electromagnetic radiation beam to irradiate the particle-generating target, thereby facilitating formation of a beam of charged particles. An adaptive mirror in accordance with the present disclosure may be configured to adjust or control a spatial profile of an electromagnetic radiation beam and/or to adjust or control at least one of a relative position and orientation between an electromagnetic beam and a particle-generating target. In some instances, an adaptive mirror may be configured to direct an electromagnetic radiation beam by adjusting one or more property of the electromagnetic radiation beam. For example, adjustment may be achieved by at least one of adjusting a focus of the electromagnetic radiation beam, diverting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam.

Consistent with the present disclosure, a system for generating a beam of charged particles, such as an ion beam, may be configured to raster an electromagnetic radiation beam, for example over a particle-generating target. As used in the present disclosure, rastering may refer to a pattern of sequential scanning over a surface or volume having any shape. Rastering may, for example, be achieved by one or more motor configured to cause an electromagnetic radiation beam to sequentially scan a surface or volume. In some embodiments, an electromagnetic radiation beam may be rastered over individual patterned features of a particle-generating target or a knife edge of a particle-generating target. In some embodiments, an adaptive mirror may be configured to direct an electromagnetic radiation beam to strike individual features of a particle-generating target.

A system for generating a beam of charged particles, such as an ion beam, in accordance with the present disclosure may comprise particle beam adjustment component(s). As used in the present disclosure, particle beam adjustment component(s) may refer to any one or more components for manipulating and/or controlling a beam of charged particles in any manner, including, for example, accelerating, analyzing, directing, shaping, filtering, splitting, delaying, modulating, absorbing, amplifying, focusing, chopping, and/or reflecting a beam of charged particles. For example, a particle beam adjustment component may include one or more quadrupole lens, cylindrical mirror lens/analyzer (“CMA”), spherical mirror lens/analyzer (“SMA”), collimator, energy degrader, time-of flight control unit, magnetic dipole, or any other component suitable for manipulating charged particles.

A system for generating a beam of charged particles, such as an ion beam, in accordance with the present disclosure may be used in conjunction with a system for treating a treatment volume with protons. In the case of a medical treatment, the volume may be a group of cells or an area of tissue. If employed outside the medical field, the volume may be any area or region for which benefit may be achieved through an application of radiation.

In accordance with the present disclosure, a gantry may be provided. A gantry may refer to any apparatus configured to assist in directing radiation toward a target. The target to be irradiated may be, for example, a treatment volume such as a tumor within a patient's body. Because a system for treating a treatment volume with protons consistent with the present disclosure is just one application of the disclosed systems for generating a beam of charged particles, it should be understood that this is merely an example. A gantry may also be used to direct a beam of charged particles or other radiation beam toward any target to be irradiated.

In accordance with the present disclosure, a patient support platform may be provided. A patient support platform may refer to any surface, foundation, or other structure configured to support a patient during irradiation therapy. A patient support platform may be fixed, or it may be adjustable in any dimension.

Any of the systems in accordance with the present disclosure may comprise at least one processor configured to monitor, control, and/or facilitate the use of any component included in the system. Consistent with the disclosed embodiments, a processor may refer to any one or more processing devices, including, for example, an application specific integrated circuit (ASIC), a digital signal processor (DSP), a programmable logic device (PLD), a field programmable gate array (FPGA), a controller, a microprocessor, or other similar electronic devices and/or combinations thereof. A processor may comprise one or more modules of a control system.

In some embodiments consistent with the present disclosure, at least one processor may be configured to cause an electromagnetic radiation beam to strike individual patterned features that make up a plurality of patterned features a particle-generating target, and to thereby generate a resultant beam of charged particles. In some embodiments consistent with the present disclosure, at least one processor may be configured to cause an electromagnetic radiation beam to strike one or more knife edges of a particle-generating target, and to thereby generate a resultant beam of charged particles.

In some embodiments, at least one processor may control at least one of an electromagnetic radiation source and/or optics components. For example, a processor or group of processors may control at least one of the energy of an electromagnetic radiation beam, the flux of an electromagnetic radiation beam, the polarization of an electromagnetic radiation beam, the spatial profile of an electromagnetic energy beam, the temporal profile of an electromagnetic radiation beam, or other aspects of an electromagnetic radiation beam. More specifically, at least one processor may generate instructions to cause an electromagnetic radiation source to alter a spatial profile of an electromagnetic radiation beam by altering a spot size of the electromagnetic radiation beam. As another example, at least one processor may alter a temporal profile of an electromagnetic radiation beam by altering a chirp of the electromagnetic radiation beam. As a further example, at least one processor may alter a temporal profile of an electromagnetic radiation beam by altering a timing of one or more laser pump sources.

In embodiments consistent with the present disclosure, at least one processor may be configured to cause an adaptive mirror to direct an electromagnetic radiation beam at predetermined locations on a surface of a particle-generating target. For example, a processor or processors may be configured to cause an electromagnetic radiation beam to raster a particle-generating target. Such rastering may include sequential scanning of the electromagnetic radiation beam over contiguous patterned features making up a plurality of patterned features. Striking the individual patterned features may include, for example, continuously or discontinuously scanning a surface of a particle-generating target. In some embodiments, a processor may be configured to cause an adaptive mirror to adjust an electromagnetic radiation beam so as to strike patterned features individually, or it may be configured to strike individual patterned features simultaneously.

In accordance with the present disclosure, at least one processor may be configured to control multiple aspects of a system independently or simultaneously. For example, at least one processor may be configured to adjust a flux of a particle beam while holding an energy of the particle beam substantially constant, or may be configured to adjust an energy of a particle beam while holding a flux of the particle beam substantially constant. Alternatively, at least one processor may be configured to adjust a flux of a particle beam and an energy of a particle beam simultaneously.

FIG. 3 depicts an exemplary system 300 for providing proton therapy that includes an illustrative system for generating a beam of charged particles, such as an ion beam. System 300 is also one example of a system for treating a treatment volume with protons. In accordance with disclosed embodiments, system 300 may include one or more of an electromagnetic radiation source 302, a particle-generating target 304, optics component(s) 306, particle beam adjustment component(s) 308, a gantry 310, a patient support platform 312, and a control system 314 configured to communicate with any one or more of the above.

A patient may be positioned on patient support platform 312. Patient support platform 312 may be any shape or form suitable for use with the other components of system 300 and conducive to supporting a patient during treatment. Patient support platform 312 may be fixed in place relative to gantry 310, or patient support platform 312 may be configured for translation and/or rotation prior to or during treatment. In some embodiments patient support platform 312 may be adjusted to accommodate patients of different sizes or to position a treatment volume in a path of a particle beam. Further, in some embodiments patient support platform 312 may be adjusted during treatment to reposition the treatment volume relative to the particle beam.

Gantry 310 may be configured to direct the particle beam toward a treatment volume, such as a tumor, within the patient's body. Gantry 310 may be configured to be manipulated in one or more ways to influence the particle beam's path, and may be composed of a number of materials and incorporate numerous components. Examples of gantry 310 consistent with embodiments of the disclosure are discussed in further detail below, which are not intended to be limiting.

Electromagnetic radiation source 302 may emit an electromagnetic radiation beam 316, for example, a laser beam, directed toward particle-generating target 304. In some embodiments, electromagnetic radiation source 302 may comprise one or more gas lasers (e.g., CO₂lasers), diode pumped solid state (DPSS) lasers (e.g., yitterbium lasers, neodymium-doped yttrium aluminium garnet lasers (Nd:YAG), or titanium-sapphire lasers (Ti:Sapphire)), and/or flash lamp pumped solid state lasers (e.g., Nd:YAG or neodymium glass). In a broader sense, any radiation source capable of causing a release of charged particles from a target may be employed.

An electromagnetic radiation source 302 may be selected based on its intensity, i.e. the energy divided by the temporal duration of the pulse and the spot size of the laser on the particle-generating target 304. A variety of combinations of spatial profile (e.g., spot size), wavelength, temporal duration, and energy may be used while still providing the same intensity. For example, in some embodiments, electromagnetic radiation beam 316 may be within an energy range of 1 J to 25,000 J, and a wavelength range of 400 nm to 10,000 nm. Electromagnetic radiation beam 316 may be pulsed, for example with a pulse width range of 10 fs to 100 ns. Electromagnetic radiation beam 316 may have various spot sizes. In some embodiments, a spot size between 1 μm²and 1 cm²may be used. Although spatial profiles of electromagnetic radiation beam 316 may have any beam profile, in some embodiments the spatial profile may include a Gaussian, super-Gaussian, Top Hat, Bessel, or annular beam profile.

In some embodiments, electromagnetic radiation source 302 may be configured to generate a main pulse after one or more pre-pulses. Contrast ratio (i.e., the ratio between the main pulse and the pre-pulses, also called a “pedestal” arriving before the main pulse) may influence proton generation. Contrast ratio may be more specifically defined the higher the intensity of the laser. As an example, on a timescale shorter than 100 ps, contrast ratio may range from 10⁻⁸to 10⁻¹².

As a more specific example, electromagnetic radiation source 302 may be a Ti:Sapphire laser. In the example of the Ti:sapphire laser, electromagnetic radiation beam 316 may be within an energy range of about 1 J to 25 J, and have a wavelength of about 800 nm. In this example, electromagnetic radiation beam 316 may have a pulse width range of about 10 fs to 400 fs, a spot size between about 2 μm²and 1 mm², and a Gaussian or Top Hat spatial profile. These properties are merely exemplary, and other configurations may be employed.

Electromagnetic radiation beam 316 may be directed to particle-generating target 304 by one or more optics component(s) 306 disposed, for example, along a trajectory between electromagnetic radiation source 302 and particle-generating target 304. Optics component(s) 306 may include one or more optical and/or mechanical components configured to alter properties of electromagnetic radiation beam 316, including spectral properties, spatial properties, temporal properties, energy, polarization, contrast ratio, or other properties. Optics component(s) 306 may be involved, for example, in generating, optimizing, steering, aligning, modifying, and or measuring electromagnetic radiation beam 316, or in other aspects of system 300. Optics component(s) 306 may include a wide variety of optical elements, such as lenses, mirrors, laser crystals and other lasing materials, piezo activated mirrors, plates, prisms, beam splitters, filters, light pipes, windows, blanks, optical fibers, frequency shifters, optical amplifiers, gratings, pulse shapers, XPW, Mazzler (or Dazzler) filters, polarizers, Pockels cells, optical modulators, apertures, saturable absorbers, and other optical elements.

Optics component(s) 306 may be fixed or adaptive. For example, optics component(s) 306 may include one or more active, adaptive, or reconfigurable components, such as deformable mirrors, plasma mirrors, Pockels cells, phase shifters, optical modulators, irises, shutters (manually and computer controlled), and other similar components. Adaptive properties may manipulate optic components themselves, as in the case of a deformable mirror or plasma mirror. The orientation of optics component(s) 306 may also be adjustable, such as by translating optics component(s) 306 or rotating optics component(s) 306 about a rotational axis. Adjustments may be manual or automated. As one example, control system 314 may receive a feedback signal and, in response, provide a control signal to a motor connected to optics component(s) 306 located between electromagnetic radiation beam 316 and the particle-generating target 304. Movement of the motor, in turn, may adjust optics component(s) 306 to alter the relative orientation between electromagnetic radiation beam 316 and the particle-generating target 304 (e.g., by repositioning the location of the laser-target interaction).

Examples of deformable mirrors that may be employed in optics component(s) 306 include, for example, segmented mirrors, continuous faceplate mirrors, magnetic mirrors, MEMS mirrors, membrane mirrors, bimorph mirrors, and/or ferrofluidic mirrors. Any number of other mirror technologies capable of altering the wave front of an electromagnetic radiation beam may also be used.

Examples of plasma mirrors that may be employed in optics component(s) 306 include a laser pulse focused onto an anti-reflective coated substrate, which ionizes so as to reflect and separate a high intensity peak from a lower intensity background of the pulse. As an example, a plasma mirror may be established by directing the laser pulse towards a parabolic mirror located in front of the anti-reflective coated substrate. Other ways of implementing a plasma mirror are also known to those of ordinary skill in the art, and are suitable for use with embodiments of the systems and methods described herein.

Optics component(s) 306 may be tailored to parameters related to an intended beam. For example, optics components 306 may be tailored in terms of wavelength, intensity, temporal pulse shape (e.g., pulse width), spatial size and energy distribution, polarization, and other properties of the intended beam. Such beam parameters may relate to an optics substrate material, size (e.g., lateral size or thickness), coating material (if any), shape (e.g., planar, spherical or other), orientation relative to a beam, or other specifications.

Optics component(s) 306 may include one or more corresponding holders configured to hold the element in place while allowing positioning of the element to an appropriate degree of accuracy, for example translation and rotation, as well as other degrees of freedom. In an embodiment, such holders may include opto-mechanical mounts held in place by an optical table or any other mechanical holder. Such degrees of freedom may be manipulated manually or via any appropriate automatic means, such as electric motors.

Optics component(s) 306 may be disposed in specific environmental conditions, such as a vacuum and/or an environment purged by one or more gasses. Furthermore, optics components 306 may be disposed in various places along the path of electromagnetic radiation source 302 between electromagnetic radiation source 302 and particle-generating target 304, or in any other system of system 300 where optical components are desired. Optics component(s) 306 may be configured for various uses, such as laser beam steering, laser beam diagnostics, laser-target interaction diagnostics, and/or particle-generating target viewing and positioning.

In some embodiments, the lifespan of optics component(s) 306 may vary. Some optics component(s) 306 may be long-term equipment, reused numerous times. Alternatively or additionally, some optics component(s) 306 may be consumable, used fewer times and replaced. Such classification may be based on a number of factors such as laser intensity and presence of debris/contamination. In some embodiments debris shielding may be installed proximate expensive or delicate optics to reduce a need for frequent replacements. Periodic examination may be performed for optics suspected to be damaged. Specialized optical systems may be installed to examine optics at risk.

Optics component(s) 306 may be manipulated manually, automatically, or by any combination thereof. Input types for manipulating optics components 306 may include high voltage signals, triggering signals, optical pumping, or any other form of input. Further, optics components 306 may be monitored by one or more cameras, such as CCD cameras. Automatic manipulation of adaptive mirror(s) may occur, for example, in response to one or more signals provided by the control system 314. The control system 314 may, for example, control one or more motor(s), piezoelectric element(s), microelectromechanical (MEMS) element(s), and/or the like associated with a deformable mirror. Alternatively or additionally, the control system 314 may, for example, control one or more laser pulse(s), anti-reflective coated substrate(s), and/or the like associated with a plasma mirror.

In some embodiments, optics component(s) 306 may include an adaptive deformable mirror, such as a deformable mirror having a plurality of facets, each of the plurality of facets being independently controllable. The facets may be controlled by digital control logic circuitry, such as digital control logic circuitry contained in control system 314. As another example, an adaptive mirror may be a plasma mirror that uses a focused laser pulse to ionize an anti-reflective coated substrate, thereby reflecting and separating a high intensity peak from a lower intensity background of the laser pulse. The laser pulse and/or anti-reflective coated substrate may be controlled by digital control logic circuitry, such as digital control logic circuitry contained in control system 314.

An adaptive mirror may be configured to direct the electromagnetic radiation beam 316 by one or more of adjusting a focus of the electromagnetic radiation beam, diverting the electromagnetic radiation beam, and scanning the electromagnetic radiation beam. The adaptive mirror may be configured to adjust focus of electromagnetic radiation beam in any way apparent to those of skill in the art. For example, electromagnetic radiation beam 316 may strike a plurality of facets of a deformable mirror, or electromagnetic radiation beam 316 may strike a plasma mirror. In some configurations, it may be desirable to adjust where electromagnetic radiation beam 316 is directed or to adjust a property of the electromagnetic radiation beam 316. A plurality of facets of a deformable mirror may be controlled to reflect electromagnetic radiation beam 316 such that its spot size at a desired location is smaller, larger, or differently shaped than its spot size just before striking the deformable mirror. Likewise, a plasma mirror may be controlled to reflect electromagnetic radiation beam 316 such that its spot size at a desired location is smaller, larger, or differently shaped than its spot size just before striking the plasma mirror.

The adaptive mirror may also be configured to divert electromagnetic radiation beam 316. For example, system 300 may be configured such that electromagnetic radiation beam 316 will sequentially or simultaneously strike a plurality of locations on particle-generating target 304 or a plurality of particle-generating targets 304 disposed in different locations within system 300. In such configurations, an adaptive mirror or other optics component(s) 306 may alter the path of electromagnetic radiation beam 316 to direct the beam onto the multiple locations and/or plurality of particle-generating targets. For example, an adaptive mirror or other optics component(s) 306 may sequentially divert (e.g., scan) electromagnetic radiation beam 316 from one location to an adjacent location in a pattern continuously or discontinuously, such as in a stepwise manner. In an automated process, control system 314 may be configured to cause the adaptive mirror to direct electromagnetic radiation beam 316 at predetermined locations on the surface of particle-generating target 304. For example, it may be advantageous to scan electromagnetic radiation beam 316 over a patterned array of particle-generating features provided at a surface of particle-generating target 304. It may also be advantageous to scan electromagnetic radiation beam 316 over a particle-generating target 304 that includes a plurality of particle-generating structures substantially oriented along a common axis, such as protrusions substantially extending away from a surface of the particle-generating target 304. It may also be advantageous to scan electromagnetic radiation beam 316 over a particle-generating target 304 patterned with one or more knife edges, such as a particle-generating target that includes one or more features having a narrow edge similar to an arête or the edge of a blade. The adaptive mirror is described as an example. Those of skill in the art will recognize that other optics component(s) 306 may perform the same or similar functions as those described above in reference to the adaptive mirror.

In accordance with the present disclosure, a particle-generating target may be configured to facilitate ion generation. For example, a particle-generating target may include a surface having one or more ion-generating structures or features. Such structures or features may be composed of one or more suitable materials, including ice (also referred to as snow), plastic, silicon, stainless steel or any of a variety of metals, carbon and/or any other material from which a particle beam may be generated. Such structures may be randomly arranged, arranged as defined by a growth or deposition process, and/or arranged in a patterned array. Such structures may alternatively or additionally include one or more narrow edges, similar to an arête or the edge of a blade. The structures may be configured based on one or more attributes of an electromagnetic radiation beam. For example, such structures may have a dimension smaller than a wavelength of an electromagnetic radiation beam, such as a laser.

Particle-generating target 304, when struck by electromagnetic radiation beam 316, may emit a variety of particles, including electrons, protons, x-rays, and other particles. Particle-generating target 304 may be composed of a variety of materials. Particle-generating target 304 may be configured such that it includes one or more individual features configured to interact with electromagnetic radiation beam 316. Alternatively or additionally, particle-generating target 304 may include a continuous surface or texture formed from a material favorable for interaction with electromagnetic radiation beam 316. Those of skill in the art will understand that there are numerous configurations that may be employed to emit particles upon interaction with an electromagnetic radiation beam, and that the disclosed embodiments are merely exemplary.

In some embodiments, particle-generating target 304 may be prefabricated. In other embodiments, particle-generating target 304 may be produced in situ within system 300 or an attached sample preparation system. For example, particle-generating target 304 may disposed within an interaction chamber, such as interaction chamber 1000, described below. This may involve forming a particle-generating target from a suitable material, including forming such material on a substrate. Such materials may include any gas, solid, or liquid chemical sources of the types commonly known in techniques such as evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, and the like. For example, in embodiments in which particle-generating target 304 includes ice, materials used to form particle-generating targets may include water vapor (H₂O), hydrogen gas (H₂), and/or oxygen gas (O₂). Further, in embodiments in which particle-generating target 304 includes silicon, materials used to form particle-generating target 304 may include, for example, silane (SiH₄), disilane (Si₂He), trichlorosilane (SiHCl₃), or any other silicon source. Further still, in embodiments in which particle-generating target 304 includes plastic, sources may include, for example, polytetrafluoroethylene (PTFE) polymer source materials or any other PTFE source. As a person of ordinary skill in the art would recognize, these are just a few illustrative examples among many available target materials and target source materials. In addition, the interaction chamber may vary in structure to suit the form of the target employed. For example, when the target is ice, the interaction chamber may be specifically configured to maintain an appropriate temperature to support the ice. Each target material may have differing sustaining requirements, and therefore the structure of the interaction chamber may vary to suit the target.

FIG. 4. depicts illustrative particle-generating targets that may be employed as particle-generating target 304. For example, FIG. 4A shows a particle-generating target 402 including a cap structure 404 located over a hollow, hourglass-shaped cone 406. In one embodiment, a distance between at least two opposing points of the cone may be less than about 15 pm. In particular examples, the distance may be less than about 1 pm. In some embodiments, the features of particle-generating target 402 may be free standing. Such features may include, for example, any number of shapes, including cones, pyramids, hemispheres, and capped structures. The structures of illustrative particle-generating target 402 shown in FIG. 4 (as well as other embodiments of particle-generating target 304) may be formed using lithographic techniques, such as photolithographic techniques. In particular examples, a particle-generating target cone 406 may be fabricated on a silicon wafer 408, then coated with one or more metals 410. In some embodiments, protons may be ejected from a back-side opening 412. FIG. 4B depicts another illustrative particle-generating target suitable as particle-generating target 304 for use with the present disclosure. FIG. 4B depicts a portion of a particle-generating target having one or more micro-cone targets 420 on its surface. Each micro-cone target 420 may be suitable for producing a high energy, low divergence particle beam. In one embodiment, the micro-cone target 420 may include a substantially cone-shaped body 422 having an outer surface 424, an inner surface 426, a generally flat and round, open-ended base 428, and a tip 430 defining an apex. The cone-shaped body 422 may taper along its length from the generally flat and round, open-ended base 428 to tip 430, which defines the apex. Outer surface 424 and inner surface 426 may connect base 428 to tip 430.

FIGS. 4C, 4D, and 4E depict other illustrative particle-generating targets 304 suitable for use with embodiments of the present disclosure. Specifically, FIGS. 4C, 4D, and 4E depict surfaces of snow targets, which may be formed from crystals of ice. Ice may be advantageous for use as a particle-generating target because water is rich in hydrogen. Further, as shown in FIG. 4C, structures on the particle-generating target may exhibit a needle-like shape. Such a shape may enhance an electrical field generated by interaction of electromagnetic radiation beam 316 and particle-generating target 304. Individual needle-like structures on particle-generating target 304 may be approximately the same as a wavelength of electromagnetic radiation beam 316. As an example, structures may be approximately 1 μm to 10 μm.

Individual patterned features on the surface of particle-generating target 304 may be physically arranged on particle-generating target 304 such that they may be sequentially scanned. For example, such structures may be arranged in an array on a generally planar surface. Individual structures may be distributed evenly forming a pattern across an entire surface, as shown in FIG. 4C. Alternatively, structures may be arranged in a repeating pattern with space between the structures, as shown in FIGS. 4D and 4E.

Referring back to FIG. 3, particle beam adjustment component(s) 308 may include one or more components configured to form an ion beam 318 from protons generated by particle-generating target 304 and to direct ion beam 318 to gantry 310 and the treatment volume in the patient. Particle beam adjustment components 308 may include any equipment capable of manipulating charged particles, such as protons. In an embodiment, instead of or in addition to ions, electrons or other charged particles generated by the interaction between electromagnetic radiation beam 316 and particle-generating target 304 may be used in the therapies. In this embodiment, beam 318 may include electrons, and particle beam adjustment components 308 may include equipment configured to manipulate electrons in beam 318. For example, particle beam adjustment component(s) 308 may include electromagnetic components configured to manipulate charged particles, such as protons, electrons, and/or ions. More specifically, particle beam adjustment component(s) 308 may include one or more electromagnetic constituents, such as a quadrupole lens, cylindrical mirror lens/analyzer (“CMA”), spherical mirror lens/analyzer (“SMA”), collimator, energy degrader, time-of flight control unit, magnetic dipole, or any other component suitable for manipulating charged particles. Particle beam adjustment component(s) 308 may also adjust one or more properties of the ion beam 318. In an embodiment, particle beam adjustment component(s) 308 may adjust one or more properties of the charged particles in beam 318. For example, beam adjustment components 308 may manipulate properties such as flux or spot size. Particle beam adjustment component(s) 308 may also filter particles having particular energies or reduce the energy of various particles.

Particle beam adjustment component(s) 308 may be disposed in various locations within system 300, including inside an interaction chamber, along a particle beam line, within gantry 310, or any combination thereof. For example, particle beam adjustment components may be disposed along a beam line extending between particle-generating target 304 and gantry 310. The beamline may be configured to maintain various conditions such as temperature, pressure (e.g., vacuum), or other condition(s) conducive to propagating and/or manipulating ion beam 318. The beam line may further include other components for housing charged particle beams, including, but not limited to, elements such as beam dumps, beam attenuators, and protective shielding.

Control system 314 may monitor and/or control various aspects of system 300. For example, control system 314 may monitor various detectors associated with electromagnetic radiation source 302, optics component(s) 306, particle-generating target 304, particle beam adjustment component(s) 308, gantry 310, and/or patient support platform 312. Control system 314 may also accept input from a user of system 300, such as a technician or other operator. Control system 314 may also accept, store, and execute operations pertaining to system 300, including, for example, initiating and maintaining any functionalities of system 300. Control system 314 may also be configured to implement feedback between one or more detectors and one or more of the various components of system 300. For example, such feedback may improve precision, efficiency, speed, and/or other aspects of system 300 or its operation. Examples of such feedback are described in greater detail below.

FIG. 5 is a diagram of an exemplary controller 500, illustrating a configuration that may be associated with control system 314 and consistent with disclosed embodiments. As a person of ordinary skill will understand, some or all of the functions associated with control system 314 may be executed or facilitated by software, hardware, or any combination thereof, associated with controller 500. In one embodiment, controller 500 may have one or more processors 520, one or more memories 540, and one or more input/output (I/O) devices 530. In some embodiments, controller 500 may take the form of a server, general purpose computer, customized dedicated computer, mainframe computer, laptop, mobile device, or any combination of these components. In certain embodiments, controller 500 (or a system including controller 500) may be configured as a particular apparatus, system, or the like based on the storage, execution, and/or implementation of software instructions that may perform one or more operations consistent with the disclosed embodiments. Controller 500 may be standalone, or it may be part of a subsystem, which may be part of a larger system.

Processor 520 may include one or more known processing devices, such as an application specific integrated circuit (ASIC), a digital signal processor (DSP), a programmable logic device (PLD), a field programmable gate array (FPGA), a processor, a controller, a microprocessor, other electronic units and combination thereof. For example, processor 520 may include a processor from the Pentium™ or Xeon™ family manufactured by Intel™, the Turion™ family manufactured by AMD™, or any of various processors manufactured by Sun Microsystems. Processor 520 may constitute a single core or multiple core processor that executes parallel processes simultaneously. For example, processor 520 may be a single core processor configured with virtual processing technologies. In certain embodiments, processor 520 may use logical processors to simultaneously execute and control multiple processes. Processor 520 may implement virtual machine technologies, or other known technologies to provide the ability to execute, control, run, manipulate, store, etc. multiple software processes, applications, programs, etc. Processor 520 may include a multiple-core processor arrangement (e.g., dual, quad core, etc.) configured to provide parallel processing functionalities to allow controller 500 to execute multiple processes simultaneously. One of ordinary skill in the art would understand that other types of processor arrangements could be implemented that provide for the capabilities disclosed herein. The disclosed embodiments are not limited to any type of processor(s).

Memory 540 may include one or more storage devices configured to store instructions used by processor 520 to perform functions related to the disclosed embodiments. For example, memory 540 may be configured with one or more software instructions, such as program(s) 550 that may perform one or more operations when executed by processor 520. The disclosed embodiments are not limited to separate programs or computers configured to perform dedicated tasks. For example, memory 540 may include a program 550 that performs the functions of controller 500, or program 550 could comprise multiple programs. Additionally, processor 520 may execute one or more programs located remotely from controller 500. For example, controller 314, may, via controller 500 (or variants thereof), access one or more remote programs that, when executed, perform functions related to certain disclosed embodiments. Processor 520 may further execute one or more programs located in a database 570. In some embodiments, programs 550 may be stored in an external storage device, such as a server located outside of controller 500, and processor 520 may execute programs 550 remotely.

Memory 540 may also store data that may reflect any type of information in any format that the system may use to perform operations consistent with the disclosed embodiments. Memory 540 may store instructions to enable processor 520 to execute one or more applications, such as server applications, network communication processes, and any other type of application or software. Alternatively, the instructions, application programs, etc., may be stored in an external storage (not shown) in communication with controller 500 via a suitable network, including a local area network or the internet. Memory 540 may be a volatile or non-volatile, magnetic, semiconductor, tape, optical, removable, non-removable, or other type of storage device or tangible (i.e., non-transitory) computer-readable medium.

Memory 540 may include data 560. Data 560 may include any form of data used by controller 314 in controlling particle (e.g., proton) therapy treatment via system 300. For example, data 560 may include data related to operation of various components of system 300, feedback parameters associated with various components of operating system 300, data gathered from one or more detectors associated with system 300, treatment plans for particular patients or for particular diseases, calibration data for various components of system 300, etc.

I/O devices 530 may include one or more devices configured to allow data to be received and/or transmitted by controller 500. I/O devices 530 may include one or more digital and/or analog communication devices that allow controller 500 to communicate with other machines and devices, such as other components of system 300 shown in FIG. 3. For example, controller 500 may include interface components, which may provide interfaces to one or more input devices, such as one or more keyboards, mouse devices, displays, touch sensors, card readers, biometric readers, cameras, scanners, microphones, wireless communications devices, and the like, which may enable controller 500 to receive input from an operator of controller 314. Further, I/O devices may include one or more devices configured to allow control system 314 to communicate with one or more of the various devices of system 300, such as through wired or wireless communication channels.

Controller 500 may also contain one or more database(s) 570. Alternatively, controller 500 may be communicatively connected to one or more database(s) 570. Controller 500 may be communicatively connected to database(s) 570 via a network such as a wired or wireless network. Database 570 may include one or more memory devices that store information and are accessed and/or managed through controller 500.

FIG. 6 is a general schematic of an exemplary electromagnetic radiation source 302. As shown in FIG. 6, electromagnetic radiation source 302 may include one or more oscillators 602, pump sources 604, optics components 606, diagnostics components 608, stretchers 610, amplifiers 612, compressors 614, and controller 616. The configuration of FIG. 6 is merely an example, and numerous other configurations may be implemented consistent with the disclosed embodiments, incorporating one or more of the components of electromagnetic radiation source 302, system 300, or other components.

Oscillator 602 may include one or more lasers for generating an initial laser pulse 618 to be manipulated (e.g., shaped and/or amplified) to reach requirements for electromagnetic radiation beam 316. A wide variety of lasers or laser systems may be used as oscillator 602, including commercial available laser systems.

Pump source 604 may include independent lasers or laser system(s) configured to transfer energy into laser pulse 618. In some embodiments, pump source 604 may be connected to the output of oscillator 602 by an optical beamline incorporating one or more of optics component(s) 306. Additionally or alternatively, pump source 604 may include other pump mechanisms such as flash lamps, diode lasers, and diode-pumped solid-state (DPSS) lasers, or the like. In some embodiments, pump source 604 may be configured to alter a temporal profile of electromagnetic radiation beam 316. For example, control system 314 may be configured to control a timing of pump source 604, thereby controlling the timing of a pre-pulse and a pedestal of the electromagnetic radiation beam.

Optics components 606 may include any of the components discussed in relation to optics components 306, and may perform any of the roles and/or functions described in relation to optics components 306.

Diagnostics 608 may include optical, opto-mechanical, or electronic components designed to monitor laser pulse 618, such as, for example its temporal and spatial properties, spectral properties, timing, and/or other properties. More specifically, diagnostics 608 may include one or more photodiodes, oscilloscopes, cameras, spectrometers, phase sensors, auto-correlators, cross-correlators, power meters or energy meters, laser position and/or direction sensors (e.g., pointing sensors), dazzlers (or mazzlers), etc. Diagnostics 608 may also include or incorporate any of the components identified above with respect to optics components 606.

Stretcher 610 may be configured to chirp or stretch laser pulse 618. More specifically, stretcher 610 may include diffraction grating(s) or other dispersive components, such as prisms, chirped mirrors, and the like.

Amplifier 612 may comprise an amplification medium such as, for example, titanium sapphire crystal, CO₂gas, or Nd:YAG crystal. Amplifier 612 may also include a holder for the amplification medium. The holder may be configured to be compatible with supporting environmental conditions such as positioning, temperature, and others. Amplifier 612 may be configured to receive energy from pump source 604 and transfer this energy to laser pulse 618.

Compressor 614 may include an optical component configured to compress laser pulse 618 temporally, for example to a final temporal duration. Compressor 614 may be constructed from diffraction gratings positioned on holders and positioned in a vacuum chamber. Alternatively, compressor 614 may, for example, be constructed of dispersion fibers or prisms. In addition, the compressor 614 may include mirrors or other optics components 306, as well as motors, and other electronically controlled opto-mechanics.

Controller 616 may include electronic system(s) that control and/or synchronize various components of electromagnetic radiation source 302. Controller 616 may include any combination of controllers, power supplies, computers, processors, pulse generators, high voltage power supplies, and other components. As an example, controller 616 may include one or more controllers 500, which may be dedicated to electromagnetic radiation source 302 or shared with other components of system 300. In some embodiments, some or all of the functions of controller 616 may be performed by controller 314 of system 300.

Controller 616 may interface with various components of electromagnetic radiation source 302 and other components of system 300 via various communication channels. The communication channels may be configured to transmit electrical or other signals to control various optical and opto-mechanical components associated with radiation source 302 or system 300. The communication channels may include a conductor compatible with high voltage, electrical triggers, various wired or wireless communication protocols, optical communications, and other components. Controller 616 may receive input from optical and mechanical diagnostics along electromagnetic radiation source 302, and from diagnostics 608 along other parts of system 300. Further, controller 616 may receive signals from or based on input from a user, for example signals based on a patient treatment plan input by a user.

FIG. 7 depicts an example of a gantry 700, consistent with embodiments of the present disclosure. In some embodiments, gantry 310 (FIG. 3) may be arranged in the form of gantry 700, although this is not intended to be limiting, and other gantry designs may be employed. Gantry 700 may deliver ion beam 318 to an isocenter 712. In some embodiments, isocenter 712 may represent the location of a treatment volume or a location within a treatment volume. Gantry 700 may also be configured for beam adjustment and reconfiguration for appropriately directing ion beam 318 prior to and during a treatment. Gantry 700 may include a solenoid 704, a coupling 706, beam adjustment component(s) 708, collimator(s) 718, and scanning magnet(s) 710. Height 714 and width 716 may vary widely based on numerous possible configurations of gantry 700. In some embodiments either or both of height 714 and width 716 may be as little as 2.5 meters.

In some embodiments, gantry 700 may be separated from other components of system 300 by a wall 702, or other barrier. Wall 702 may include one or more openings (not shown in figures) to allow passage of ion beam 318 and any beamline or other equipment configured to deliver ion beam 318. Location of wall 702 may vary, depending on a number of factors and in some embodiments wall 702 may not be present.

Solenoid 704 may be configured to capture protons emitted by particle-generating target 304. In some embodiments, protons emitted by particle-generating target 304 may exhibit a large divergence. As an example, beam size of protons emitted from particle-generating target 304 may expand by a factor of 100 over a short distance, such as 1 cm. Solenoid 704 may be configured to reduce convergence of ion beam 318.

Solenoid 704 may include a high-field solenoid, such as, for example, a superconducting solenoid at 9 to 15 T. Field strength may be related to solenoid length and resulting beam size. Higher solenoid field strength may result in smaller beam size and aperture required in solenoid 704. Solenoid 704 may vary in length based on field strength and other factors. In some embodiments, solenoid 704 may be between 0.55 m and 0.85 m in length with an aperture between 4 cm and 20 cm. In some embodiments, solenoid 704 may be used in conjunction with one or more collimators. Further, in some embodiments, one or more quadrupoles may be employed in addition to or as an alternative to solenoid 704.

Coupling 706 may be any mechanical and or optical connection configured to facilitate physical movement of gantry 700, such as rotation about an axis of rotation, such as axis 716. Gantry may be configured to be physically moved by any appropriate arrangement of motors and/or actuators, which may be controlled by control system 314. Coupling 706 may include one or more bearings or bushings and may be connected to and/or integrated into a beam line carrying ion beam 318. Therefore, coupling 706 may be configured to maintain a seal or other barrier to prevent loss of a vacuum state or other environmental conditions within the beam line. Further, coupling 706 may include rotationally invariant optics, for example to reduce tune dependence as a function of gantry position.

Gantry 700 may further include beam adjustment component(s) 708. Beam adjustment components 708 may include any of beam adjustment components 308 discussed above, configured to guide ion beam 318 through the gantry. In some embodiments, beam adjustment components 708 may include electromagnets, such as dipoles and/or quadrupoles, configured to divert ion beam 318 through gantry 700. Beam adjustment components 708 may include normal conducting dipoles, superferric superconducting dipoles, stripline dipoles, etc.

In some embodiments, beam adjustment components 708 may include dipole pairs (e.g., each bending ion beam 318 by approximately 45°) to form a rectangle (or any other combinations of angles to form a rectangle or another desired shape). The dipole pairs may operate at about 4.8 T and be about 0.6 m long. Straight sections between dipole pairs may be adjusted independently, providing tuning range, flexibility and therefore customization in the electromagnetic optics. Splitting 90° bends into two may improve reference trajectory control, as each dipole may be adjusted independently, for example via shunts on a single power supply, providing at least 10% variation (20% total relative change considering two). Thus, dipole pairs may facilitate independent trajectory correction on each arm of gantry 700, decreasing tolerances and cost.

Gantry 700 may also include one or more collimators 718. Collimators 718 may be configured to filter ion beam 318 such that only protons traveling in a desired direction and/or having a desired momentum are allowed to pass. Collimators 718 may be disposed in a variety of locations within gantry 700. For example, if beam adjustment components 708 have achromatic properties producing undesired effects on the beam downstream, collimators 718 may be configured to counteract such effects.

Gantry 700 may further include scanning magnet(s) 710. Scanning magnets 710 may include beam adjustment components, such as beam adjustment components 308 or 708, configured to adjust isocenter 712's location in space. Scanning magnets 710 may be controlled by control system 314, for example to adjust location of treatment being provided to a treatment volume. Scanning magnets 710 may be disposed in any of a number of locations within gantry 700. For example, scanning magnets 710 may be upstream from one or more of beam adjustment components 708, downstream of all of beam adjustment components, or a combination of such upstream and downstream locations, as shown in FIG. 7.

System 300 may be configured such that scanning magnets are operated in cooperation with other components in order to control the location of treatment within a patient. For example, control system 314 may control any combination of scanning magnets 710, movement of gantry 700, and movement of patient support platform 312. One or more components may be configured for control of particular dimensions and/or degrees of freedom. For example, patient support platform may be configured to adjust patient position in one dimension, while scanning magnets 710 adjust in another dimension, orthogonal to the first.

Alternatively or additionally, system 300 may be configured such that a coarse adjustment in a given dimension may be performed by a different component than a fine adjustment. For example, a coarse adjustment in a particular dimension may be performed by a motor configured to manipulate patient support platform 312, while fine adjustment may be performed by a scanning magnet 710. Numerous combinations of such adjustments will be apparent to those of skill in the art. In an embodiment, ion beam 318 used in gantry 700 may be a proton beam, electron beam, or other type of beam comprising charged particles.

FIG. 8 depicts a further example of a gantry 800. Gantry 800 may include some or all of the same components as gantry 700, such as solenoid 704, coupling 706, beam adjustment component(s) 708, collimator(s) 718, and scanning magnet(s) 710, and may further include additional quadrupole elements 802. Quadrupole elements 802 are magnetic elements that are part of the magnetic beamline and help deliver the particle beam to the treatment volume. Quadrupole elements 802 are typically used to focus or de-focus a beam of charged particles, as opposed to some larger dipoles that may often be used as bending magnets to bend the particle beam. Quadrupole elements 802 may be permanent magnets (e.g., made of rear-earth elements and/or other magnetic materials), normal-conducting electromagnets, super-conducting electromagnets, pulsed magnets, or other devices capable of providing the appropriate fixed or tunable magnetic field.

FIG. 9 is an exemplary flow chart of a process 900 for particle beam formation. In step 902, an electromagnetic radiation source (e.g., source 302) may emit an electromagnetic radiation beam (e.g., beam 316). In step 904, the electromagnetic radiation beam may strike particle-generating target (e.g., target 304). In step 906, interaction of the electromagnetic radiation beam with the particle-generating target may generate particles, including protons and/or electrons. In step 908, particle beam adjustment component(s) (e.g., components 308) may form a beam of charged particles (e.g., beam 318) from the charged particles and direct the particle beam to the treatment volume in the patient. The steps of process 900 may be carried out automatically, such as by control system 314. The steps of process 900 may also be carried out in response to user input, such as through control system 314 or carried out by a combination of automatic and manual operation of various components. In some embodiments, process 900 may be carried out based on specifications in a treatment plan, which may be customized to varying degrees based on a particular patient, treatment type, and/or treatment volume.

The electromagnetic radiation beam emitted in step 902 may be generated via any components capable of radiation beam generation, such as, for example, various combinations of the components described in relation to FIG. 6.

In step 904, the electromagnetic radiation beam may strike and particle-generating target. For example, particle-generating target 304 may be disposed within an interaction chamber, isolating the particle-generating target from the outside environment. Upon striking particle-generating target 304, an interaction of electromagnetic radiation beam 316 and particle-generating target 304 may generate various particles, including protons that may be used in ion beam 318 or electrons that may be used in an electron beam. In some embodiments, protons may be emitted at a proton energy of about 250 MeV from a location on particle-generating target 304 struck by electromagnetic radiation beam 316 focused to a spot size of about 10 to 100 μm. The two-dimensional divergence angle of protons emitted from particle-generating target 304 may be about 0.2 radians (i.e., about 11 degrees). In addition, proton energy angular distribution ∂Ω/∂E and proton number energy distribution ∂N/∂E may be very small so that the energy angular distribution and proton number energy distribution are reasonably constant. As an example, a pulse of electromagnetic radiation beam may result in the emission of 10⁸protons, and pulses may be repeated at a rate of 10 to 1000 Hz. Accordingly, a pulsed electromagnetic radiation beam 316 may thereby produce a pulsed ion beam 318 of charged particles. A pulse of charged particles, such as ions, protons, or electrons, may also be referred to as a “bunch.”

In accordance with the present disclosure, a particle-generating target may be supported by and/or housed within an interaction chamber. As used in the present disclosure, an interaction chamber may refer to any structure configured to isolate the target from ambient conditions and to provide an appropriate environment for particle generation.

In accordance with the present disclosure, the interaction chamber may, for example, comprise a target stage. As used in the present disclosure, a target stage may refer to any structure configured to support a particle-generating target. In some embodiments, a target stage may be controlled by a processor configured to cause relative movement between the target stage and an electromagnetic radiation beam.

In accordance with the present disclosure, the interaction chamber may comprise one or more detectors. As used herein, a detector may refer to a device that detects one or more properties of a sample chamber condition, an electromagnetic radiation source or beam, a particle beam, and/or a laser-target interaction. A detector may, for example, observe any condition within and/or proximate to the interaction chamber. In some embodiments, a system for generating a beam of charged particles may include other detectors separate from an interaction chamber. As an example, a detector may be configured to measure at least one laser-target interaction property.

As used in the present disclosure, a laser-target interaction may refer to an observable property related to the interaction of an electromagnetic radiation beam with a particle-generating target. Laser-target interaction properties may include, for example, a particle beam property, a secondary electron emission property, an x-ray emission property, a particle beam energy, a particle beam flux, and/or other property indicative of the interaction between an electromagnetic radiation beam and a particle-generating target.

FIG. 10 depicts an example of an interaction chamber 1000. Interaction chamber 1000 may be any size and shape, and may be constructed of any appropriate material or materials capable of housing a target during laser-target interaction. Stainless steel is one example of a material that may be used to construct the interaction chamber 1000.

Interaction chamber 1000 may include one or more stages 1002 configured to support particle-generating target 304 and/or other equipment within interaction chamber 1000, such as optics component(s), beam adjustment component(s), detectors, or the like. Stage(s) 1002 may be fixed or adjustable. An adjustable stage may be configured for translation and/or rotation along one or more axes. Adjustment of stage(s) 1002 may be manual or automated. Automated adjustment may be performed, for example, in response to one or more signals provided by control system 314. Stage(s) 1002 may optionally be configured to heat, cool, or maintain the temperature of particle-generating target 304. Temperature control may be achieved, for example, by monitoring the temperature of particle-generating target 304 and raising, lowering, or maintaining the temperature of particle-generating target 304 in response to the measured temperature. Temperature monitoring can be achieved, for example, with one or more thermocouples, one or more infrared temperature sensors, and/or any other technique used to measure temperature. Temperature adjustment may be made, for example, by adjusting the amount of electric current flowing through a heating element. The heating element may be, for example, a refractory metal such as tungsten, rhenium, tantalum, molybdenum niobium, and/or alloys thereof. Temperature adjustment may also be made, for example, by flowing a coolant, such as water or a cryogenic fluid (e.g., liquid oxygen, liquid helium, liquid nitrogen, etc.) through a conduit directly or indirectly placed in thermal communication with particle-generating target 304. As a person of ordinary skill in the art would appreciate, these exemplary manners of adjusting temperature are compatible and may be combined. Of course, these temperature adjustment methods are not limiting, and any other known method for heating, cooling, and or maintaining the temperature of particle-generating target 304 may be used with the disclosures herein.

Interaction chamber 1000 may include one or more associated vacuum pump(s) 1004. For example, either or both of sample preparation and particle beam formation may have sub-atmospheric atmospheric pressure requirements or may achieve optimal performance within a particular range of sub-atmospheric pressures. Vacuum pump(s) 1004 may be used to influence pressure conditions within interaction chamber 1000 and/or components associated with interaction chamber 1000. For example, vacuum pump(s) 1004 may maintain a vacuum condition or near-vacuum condition in interaction chamber 1000. Examples of vacuum pump(s) 1004 may include one or more turbo-molecular pumps, cryogenic pumps, ion pumps, or mechanical pumps, such as diaphragm or roots pumps. Vacuum pump(s) 1004 may operate in conjunction with one or more pressure regulators (not shown in figures).

Interaction chamber 1000 may include optics components 1006. Any of the components noted above with respect to optics component(s) 306 may be used inside the interaction chamber to further direct electromagnetic radiation beam 316. For example, as shown in FIG. 10, interaction chamber may include mirrors 1006a configured to direct electromagnetic radiation beam 316 toward particle-generating target 304. In an embodiment, interaction chamber 1000 may include a parabolic mirror 1006b configured to focus electromagnetic radiation beam 316 onto particle-generating target 304.

Interaction chamber 800 may include any number of particle beam adjustment component(s) 308. For example, as shown in FIG. 8, interaction chamber 1000 may include a collimator 1010. Those of skill in the art will appreciate that alternatively or additionally, other particle beam adjustment component(s) 308 may be included in interaction chamber 800. In various embodiments, any of the beam adjustment component(s) 308 may be incorporated into interaction chamber 1000.

Interaction chamber 1000 may include or interface with a beam line 1012, as described above in association with particle beam adjustment component(s) 308. Beam line 1012 may include a conduit maintained at sub-atmospheric pressures to facilitate propagation of ion beam 318. Beam line 1012 may include particle beam adjustment components, such as any of the elements referenced above with respect to particle beam adjustment component(s) 308. Beam line 1012 may also include vacuum pumps, such as any of the pumps described in relation to vacuum pump(s) 1004, to achieve and/or maintain sub-atmospheric conditions.

Interaction chamber 1000 may include one or more valve(s) 1014. Any suitable valve(s) may be used, and may be located, for example, between various portions of interaction chamber 1000 or between interaction chamber 1000 and other components of system 300 or its ambient environment. Valve(s) 1014 may be configured, for example, to isolate vacuum pump(s) 1004 or beam line 1012. Valve(s) 1014 may be manual or automatic. Automatic valves may be, for example, pneumatic and/or electronic. Valve(s) 1014 may be simple open/close valves, such as a two-position gate valve, or valve(s) 1014 may be configured to be partially open. Valve(s) 1014 associated with vacuum pump(s) 1004 may, for example, include one or more butterfly valve(s) that can vary continuously between open and closed states. Valve(s) 1014 may be configured to maintain pressure, retain or release materials, and/or allow access to interaction chamber 800 for maintenance of parts or replacement of particle-generating targets.

Interaction chamber 1000 may include one or more shutter(s) 1016. Shutter(s) 1016 may be configured, for example, to block or allow electromagnetic radiation beam 1016 into chamber 1000. Shutter(s) 1016 may be, for example, a simple open/close shutter. Shutter(s) 1016 may also be configured to chop electromagnetic radiation beam 316 if desired. Operation of shutter(s) 1016 may be manual or automated. Automated operation may occur, for example, in response to one or more signals provided by control system 314.

Interaction chamber 1000 may include one or more windows 1018. Windows 1018 may be composed of any material suitable for the pressure, temperature, and other environmental factors associated with interaction chamber 1000.

As described above, interaction chamber 1000 may be configured for forming a particle-generating target in situ. System 300 may also include a separate or substantially separate preparation chamber (not shown in FIG. 6 or 10) connected to interaction chamber 1000 and configured for target preparation and/or conditioning. The preparation chamber may include various equipment and instrumentation for preparing particle-generating targets, such as equipment that may be found in systems for performing evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, and the like. The preparation chamber may also include one or more stage(s) for holding particle-generating target 304 or a target substrate that will serve as a template to form particle-generating target 304. The preparation chamber may also include mechanisms for transferring the particle-generating target into place in the interaction chamber following preparation. Alternatively or in addition to using a separate or substantially separate preparation chamber, interaction chamber 1000 may be similarly equipped so that sample preparation or conditioning may take place within interaction chamber 1000 (not shown in FIG. 6 or 10).

The preparation chamber may also include temperature control elements (as described above with respect to stages 1002), one or more sample transfer mechanisms, such as a transfer arm or any other transfer device well known by those familiar with vacuum systems. System 300 may also include a load lock between sample preparation chamber and interaction chamber 1000.

Interaction chamber 1000 may further include heating and or cooling elements (not shown in FIG. 10). Either or both of sample preparation and particle beam formation may have temperature requirements or may achieve optimal performance within a particular range of temperatures. Interaction chamber may include heating elements and/or cooling elements configured to achieve and maintain such temperature conditions. The heating and cooling elements may comprise any of the temperature control equipment and/or methods described in relation to stage(s) 1002 but configured to control temperature conditions of other portions of interaction chamber 1000 or of interaction chamber 1000 at large.

Interaction chamber 1000 may include one or more detectors 1020. Detectors 1020 may be configured to measure conditions associated with interaction chamber 1000. In some embodiments, measurements may be taken on a single-shot basis. That is, detectors 1020 may be configured to measure properties associated with an individual interaction between electromagnetic radiation beam 316 and particle-generating target 304. Detectors 1020 may also measure the same or different properties on a more continuous basis, for example, providing results after processing.

Placement of detectors 1020 may vary based on a number of factors, including space constraints and optimal location for measurement. As shown in FIG. 10, detectors 1020 may be located along an outer wall of interaction chamber 1000 (such as detector 1020a), proximate to particle-generating target 304 (such as detectors 1020b and 1020c), or in line with ion beam 318 (such as 1020d).

For some detectors 1020, there may be an advantage to detection proximate to particle-generating target 304, and thus to interaction between electromagnetic radiation beam 316 and particle-generating target 304 (laser-target interaction). In an embodiment, system 300 may be stabilized over time, after which such proximity may be unnecessary. In some embodiments, one or more detectors 1020 may be mounted outside of interaction chamber 1000. For example, FIG. 10 depicts detector 1020e outside interaction chamber 1000 proximate to window 1018. Detectors 1020 may be disposed such that they are inherently subject to properties intended to be measured or conditions within interaction chamber 1000 may be altered to facilitate measurement. For example, optics component(s) 1006 may include a steering mirror configured to temporarily or intermittently deflect a signal from an interaction area to a detector, such as detector 1020e through window 1018. The above detector placements are merely exemplary, and numerous others may be apparent to those of skill in the art.

In some embodiments, one or more detectors 1020 may be configured to measure one or more laser-target interaction properties of electromagnetic radiation beam 316 or ion beam 318. In some embodiments, detectors 1020 may include quadrupole analyzers, spherical mirror analyzers (“SMAs”), cylindrical mirror analyzers (“CMAs”), secondary electron detectors, photomultipliers, scintillators, solid-state detectors, time-of-flight detectors, laser-on-target optical diagnostic detectors, x-ray detectors, cameras, Faraday cups, or other detectors. Detectors 1020 may detect properties such as absorption or reflection, a secondary electron emission property, a plasma property such as electron temperature and/or density, and/or an x-ray emission property. Secondary emissions, such as emission of electrons and/or x-rays may be indicative of laser-target interaction properties and/or properties of ion beam 318. For example, the energy spectrum and/or flux of electrons and/or x-rays may indicate particle beam properties. These signals may then be used as input in a feedback loop for modifying the laser-target interaction, for example, by adjusting one or more of electromagnetic radiation source 302, optics component(s) 306, particle beam adjustment component(s) 308, and the position/orientation of particle-generating target 304, as described in greater detail below.

Detectors 1020 may be configured to detect particle beam direction, spatial spread, intensity, flux, energy, proton energy, and/or energy spread. For example, in some embodiments, a Thompson parabola may be employed. In such embodiments, ion beam 318 may be directed into an area in which magnetic and electric fields deflect the protons to locations on a detection screen. The location at which the protons contact the screen may indicate proton energy. For such a screen, any proton sensitive device may be used, such as CR-39 plates, image plates, and/or scintillators (coupled to a imaging device such as a CCD camera). As another example spatial particle beam distribution may be detected with a screen sensitive to protons, such as CR-39 and image plate or a scintillator with a detection device (such as a camera) may be used.

Detectors 1020 may also include a time-of-flight detector. The time of flight detector may measure average proton energy. In some embodiments, the time of flight detector may include a proton scintillator and a detector with adequate temporal resolution, such as a photo-multiplier-tube (PMT). The time when the proton signature is detected on the PMT may indicate proton velocity and thus proton energy.

Detectors 1020 may also include instruments configured for plasma diagnostics, such as x-ray spectrometers configured to detect electron temperature and density, or interferometers configured to detect plasma density. Optical diagnostics may include imaging of the reflected laser beam to measure the laser absorption efficiency. These detectors may be used during initial system design, calibration, and testing, and they may optionally be included in the final system.

Referring back to FIG. 9, in step 906 interaction of an electromagnetic radiation beam (e.g., 316) with particle-generating target (e.g., 304) may generate particles, including protons and/or electrons. In some embodiments, the surface of particle-generating target 304 may be scanned by electromagnetic radiation beam 316. For example, the electromagnetic beam 316 may be sequentially scanned over the surface of particle-generating target 304 by continuous or discontinuous rastering, stepwise scanning, or any other scanning waveform desired. Alternatively, the electromagnetic beam 316 may be non-sequentially scanned over the surface of particle-generating target 304. Electromagnetic radiation beam scanning may be achieved by manually or automatically adjusting one or more optics component(s) 306 located between electromagnetic radiation source 302 and particle-generating target 304. Automatic adjustment of optics component(s) 306 may be achieved, for example, in response to one or more signals provided by control system 314. The one or more control signals provided by control system 314 may be predetermined by a program, such as a program stored in controller 500, or they may be provided in response to one or more feedback signals received from various elements of system 300, such as one or more detectors. For example, information from the one or more detectors in system 300 may indicate that altering the location of the laser-target interaction site is desirable. This and other examples of feedback are discussed in greater detail below.

In step 908, system 300 may form a beam of charged particles, such as ion beam 318, from the particles and direct the beam to the treatment volume. Particles generated in step 906 may not initially be disposed in a useful configuration or trajectory. The particles may be formed into a particle beam, for example by one or more beam adjustment component(s) 308. Properties of the particle beam may vary based on the configuration of system 300 and from use to use. In an embodiment where the particles are protons, the particle energies may be about 250 MeV, as noted above, and may range, for example, from 60 to 250 MeV. Proton flux may be about 2 Gy/min, and proton pulse duration may be less than 100 psec. Particles generated by system 300 may also have a symmetric phase space profile, allowing improvements in beam steering and filtering over accelerator-based particle generation systems, thereby improving the accuracy and the efficiency of particle beam delivery and treatments. Of course, the above ranges are only examples, and the specific energies and flux may vary based on particulars of the configuration. In an embodiment, particles generated in step 906 may be electrons used to form an electron beam in step 908.

In accordance with the present disclosure, feedback may be used to adjust one or more properties of a particle beam. As used in the present disclosure, feedback may refer to a control protocol in which one or more system output is routed back into the system (i.e., fed back into the system) as one or more input as part of a cause-and-effect chain. For example, a processor (as described above) may be configured to produce a feedback signal to control aspects of an electromagnetic radiation beam, a particle beam, and/or a laser-target interaction. Such a feedback signal may, for example, be based on one or more property of an electromagnetic radiation beam, a particle beam, and/or a laser-target interaction. In some embodiments, a feedback signal may alter a particle beam by adjusting at least one of an electromagnetic radiation source, one or more optics components, and/or a position or orientation of an electromagnetic radiation beam relative to a particle-generating target. Feedback may, in some instances, be used to determine a structure of a particle-generating target.

Feedback signals may be configured to alter aspects of an electromagnetic radiation beam. For example, a processor may generate one or more feedback signal configured to adjust an electromagnetic radiation source to alter a temporal profile of an electromagnetic radiation beam. Further, an electromagnetic radiation source may be configured to generate a main pulse and a pre-pulse of an electromagnetic radiation beam, and a processor may be configured to cause the electromagnetic radiation source to alter a contrast ratio of the pre-pulse to the main pulse in response to a feedback signal.

Moreover, a processor may be configured to generate a feedback signal to alter an energy of an electromagnetic radiation beam or a spatial or temporal profile of an electromagnetic radiation beam. For example, one or more optics component(s) may alter a spot size of an electromagnetic radiation beam in response to a feedback signal. In some embodiments, a motor may alter a relative orientation between an electromagnetic radiation beam and a particle-generating target in response to a feedback signal. The relative orientation may be a relative orientation in X, Y, Z coordinates (translational) between the electromagnetic radiation beam and the particle-generating target and/or a relative orientation in θ orientation (rotational) between the electromagnetic radiation beam and the particle-generating target. And in some embodiments, an adaptive mirror may direct an electromagnetic radiation beam at a particle-generating target in response to a feedback signal.

In some embodiments, feedback may be used to adjust properties of ion beam 318. FIG. 11 depicts a process flow in an exemplary process 1100 for employing such feedback. At step 1102, system 300 may determine or be programmed with a desired value of a laser-target interaction property. The laser-target interaction property may be based on any of the properties detected by any of detectors 1020 described above. The desired value may be based, for example, on a nominal value related to a quality desired in ion beam 318, a value based on a desired property in a treatment plan, an optimal operating state of system 300, etc.

At step 1104, system 300 may generate one or more feedback signal(s) based on the detected laser-target interaction property. Feedback may be received and/or processed by control system 314. For example, control system 314 may calculate adjustments to various components of system 300 by comparing a laser-target interaction property to the desired value of the laser-target interaction property established at step 1102. In some embodiments, adjustment and comparison may be carried out according to a feedback control algorithm, such as a PID (proportioning-integrating-differentiating) control loop. The relationship(s) defined by the feedback signal(s) may be linear (e.g., an increase of pulse duration may affect proton energy inversely (E_p˜1/t)). The feedback signal may, at times (e.g., during startup or idle periods), be set to zero, set to an initial value indicating no adjustment is necessary, or set to a default value indicating an initial state.

At step 1106, system 300 may adjust one or more system components based on the feedback signal. For example, in some embodiments control system 314 may be configured to adjust a property of electromagnetic radiation beam 316 based on the feedback signal. The generated feedback may cause a motor to adjust a path of electromagnetic radiation beam 316. The motor may, for example adjust one or more of optics component(s) 306. Such adjustments may, for example, cause electromagnetic radiation beam 316 to strike particle-generating target 304 at a more desirable location or locations, thereby altering a property of ion beam 318 resulting from electromagnetic radiation beam 316 striking particle-generating target 304. Such adjustments may also cause electromagnetic radiation beam to sequentially strike a plurality of contiguous features of particle-generating target 304, such that the features are irradiated at a desired rate. Additionally, optics component(s) 306 may be configured to scan electromagnetic radiation beam 316 over a surface of particle-generating target 304. As another example, particle-generating target 304 may be manipulated by a motor based on the feedback signal to move particle-generating target 304 in any of six degrees of freedom.

In some embodiments, at step 1106, control system 314 may cause electromagnetic radiation source 302 to alter an energy, wavelength, or temporal or spatial profile of electromagnetic radiation beam 316 in response to the feedback signal. Control system 314 may also cause electromagnetic radiation source 302 to alter a contrast ratio of a pre-pulse to a main pulse in response to the feedback signal. Such adjustments to electromagnetic radiation beam 316 via electromagnetic radiation source 302 may be achieved, for example, by adjusting one or more of the oscillator(s) 602, pump source(s) 604, optics 606, stretcher(s) 610, amplifier(s) 612, and compressor(s) 614 via controller(s) 616. In some embodiments, any optical element or other component of electromagnetic radiation source 302 or optics component(s) 306 may be changed, moved, oriented, or otherwise configured based on the feedback signal, resulting in any number of changes. The examples above are not intended to be limiting.

At step 1108, system 300 may direct electromagnetic radiation beam 316 to strike particle-generating target 304, for example as described above in relation to steps 902 and 904 of process 900, shown in FIG. 9.

At step 1110, system 300 may detect a laser-target interaction property. The detected laser-target interaction property may include any one or more of the properties described above in relation to detectors 1020 and/or any property detected in relation to electromagnetic radiation beam 316, ion beam 318, the laser-target interaction, fault conditions, or any other signal generated by any component of the system.

The laser-target interaction property detected at step 1110 may be passed back to step 1104, and process 1100 may repeat any number of times. For example, process 1100 may repeat a standard, fixed number of times, a number of times preset by control system 314, a number of times defined by a treatment plan, or a variable number of times determined in real-time.

In some embodiments, a probe (or an initial) beam source may be used in steps 1102, 1104, and 1106 to generate the feedback signal. The probe beam source can be any electromagnetic radiation source for providing a probe electromagnetic radiation beam that is used to determine orientation data of particle-generating target 304. An energy level of the probe electromagnetic radiation beam may be controlled to substantially avoid particle generation at particle-generating target 304. In an embodiment, the orientation data may include information indicative of X, Y, Z coordinates (or translational information) of particle-generating target 304. In another embodiment, the orientation data my include information indicative of θ orientation (or rotational information) of particle-generating target 304. In another embodiment, the orientation data include both the information indicative of X, Y, Z coordinates of particle-generating target 304 and the information indicative of the θ orientation of particle-generating target 304.

In some embodiments, selection of protons of a particular energy and/or flux may be desired. For example, as described above with respect to the advantages of proton therapy, treatment of a treatment volume of a particular depth within a patient may be desired. Treatment depth may be specified by selectively emitting protons of a particular energy level or range of energy levels. The dose of radiation delivered to the treatment volume depends in part of the flux of the particle beam. Accordingly, it may be desirable to adjust the particle flux and particle energy produced by system 300.

In accordance with the present disclosure, a system for directing a pulsed beam of charged particles may include a particle source. As used in the present disclosure, a particle source may refer to any structure or device configured to produce a continuous or pulsed particle beam. A pulsed particle beam may refer to any group of charged particles that includes at least one particle bunch (e.g., a cluster of particles). In some embodiments, a particle source may include at least a radiation beam and a particle-generating target as described above; however, this example is not limiting. For example, a system for directing a pulsed beam of charged particles consistent with the present disclosures may be used with any beam of charged particles generated by any method or device (including, for example, a cyclotron, synchrotron, or other particle accelerator).

Further, in accordance with the present disclosure, a system for directing a pulsed beam of charged particles may include at least one electromagnet. As used herein, an electromagnet may refer to any device controllable to generate an electromagnetic field. In some embodiments, the at least one electromagnet may include a plurality of electromagnets in series along a trajectory of a pulsed particle beam.

Further, consistent with the present disclosure, a system for directing a pulsed beam of charged particles may include at least a zone proximate an electromagnet. As used in the present disclosure, a zone proximate to an electromagnet may refer to any location in which an electromagnetic field generated by the electromagnet is capable of altering the trajectory of a charged particle located within the zone. For example, a zone proximate to an electromagnet may include any location oriented such that a beam of charged particles may traverse therethrough. In some embodiments, the zone may include a location within an electromagnetic field created by activation of an electromagnet. The size of the zone may vary depending on a number of factors; however, in some embodiments, the zone may have a dimension smaller than about one inch.

In accordance with the present disclosure, a system for directing a pulsed beam of charged particles may include at least one automated switch. As used in the present disclosure, an automated switch may refer to a device configured to be electrically connected to an electromagnet and configured to selectively activate or deactivate the at least one electromagnet when triggered by a signal. An automated switch may be any switch that may be selectively activated or deactivated. For example, the automated switch may include a photoconductive semiconductor switch or a spark switch. In some embodiments, the at least one automated switch may include a plurality of automated switches. Individual automated switches may be associated with different electromagnets or with the same electromagnet. In some embodiments, a first electromagnet may be configured to divert a portion of a pulsed particle beam from an original trajectory to a diverted trajectory. Some embodiments may further include a second electromagnet in series with the first electromagnet and configured to re-divert at least part of the diverted portion of the pulsed particle beam from the diverted trajectory to a path substantially parallel to the original trajectory.

In accordance with the present disclosure, a system for directing a pulsed beam of charged particles may include a radiation trigger source. As used in the present disclosure, a radiation trigger source may include any structure capable of producing radiation trigger to activate or deactivate at least one automated switch. For example, a radiation trigger source may include one or more of a particle source, an x-ray source, an electron source, and a light source (e.g., a laser). In some embodiments, a radiation trigger produced by a radiation trigger source may be configured to activate or deactivate an automated switch and to irradiate a particle-generating target to thereby generate the pulsed particle beam.

In accordance with the present disclosure, at least one processor may be configured to activate least one electromagnet as a particle bunch traverses a zone proximate to the electromagnet. The at least one processor may include any of the processors described above and may be configured to activate a plurality of automated switches in sequence as the particle bunch traverses a series of electromagnets.

In accordance with the present disclosure, a controlled delay line may be provided. As used in the present disclosure, a controlled delay line may refer to a pathway configured to extend the time it takes for a beam of radiation or charged particles to traverse it. For example, a controlled delay line may be used to delay the time at which a particle bunch traverses a zone proximate to an electromagnet. As another example, a controlled delay line may be used to delay the time at which a radiation beam activates an automated switch. In some embodiments the controlled delay line may be configured to synchronize the time at which the radiation beam activates an automated switch of an electromagnet with the time at which a pulsed beam of charged particles traverses a zone proximate to the electromagnet.

FIG. 12 is an exemplary graph of a proton energy profile for a particle bunch, for example a proton bunch within ion beam 318. Pulse (i.e., “bunch”) 1202, shown in FIG. 12, may be generated as described above in relation to system 300 and particle-generating target 304. Use of particle-generating target 304, however, is merely an example, and is not intended to be limiting. Other particle sources and types of ions may also be used.

In the context of proton therapy, to irradiate a treatment volume located at a particular depth within a patient, protons of certain energies may be desired. To isolate protons of the desired energies, system 300 may filter ion beam 318 to deliver protons having the desired energies to the patient, eliminating protons having other energies from the ion beam. For example, to deliver protons 1204 having energies between energy 1206 and energy 1208, system 300 may filter proton bunch 1202 by removing any protons having energies less than energy 1206 and greater than energy 1208.

Such filtering may be achieved by combining certain particle beam adjustment components 308. For example, particle beam adjustment components 308 may manipulate ion beam 318 such that protons having certain energies are diverted along a different trajectory than protons having other energies. This may be achieved in a number of ways. For example, particle beam adjustment components 308 may be configured as a band pass filter to isolate protons having energies between energy 1206 and energy 1208. In another embodiment, particle beam adjustment components 308 may be configured as a high pass filter to isolate protons having energies greater than an energy cut-off, such as energy 1206 or 1208. In another embodiment, particle beam adjustment components 308 may be configured as a low pass filter to isolate protons having energies less than an energy cut-off, such as energy 1206 or 1208.

The above embodiments may be combined, and more than one filter may be used. A low pass filter and a high pass filter may be combined in series, for example, to create a band pass filter. In such an embodiment, the low pass filter may be configured to isolate protons having energies less than energy 1208, and the high pass filter may be configured to isolate protons having energies greater than energy 1206. This may be particularly advantageous for selecting protons within a narrow energy band, especially an energy band narrower than a stand-alone band pass filter can accommodate.

To achieve proton energy filtering, one or more of particle beam adjustment components 308 may be selectively activated and/or controlled by one or more automated switches, such as a spark switch or photoconductive switch. Selective activation may be governed by controller 314, which may have interfaces with the automated switch and the particle beam adjustment components 308. The automated switch may be activated or deactivated by a signal generated by controller 314. The signal may be generated based on feedback, such as any of the forms of feedback described above.

Additionally or alternatively, in some embodiments the automated switch may be configured for activation or deactivation by electromagnetic radiation, such as a laser or another light source. For example, the automated switch may comprise a photoconductive semiconductor switch disposed along a path of electromagnetic radiation beam 316. Alternatively, electromagnetic radiation beam 316 may be diverted by one or more of optics components 306 or split into a plurality of beams by optics components 306, one or more of the plurality of beams being delivered to the automated switch. In such embodiments, the automated switch may be activated or deactivated when struck by electromagnetic radiation beam 316. Thus, electromagnetic radiation beam may be configured both to activate the automated switch and to irradiate particle-generating target 304 to generate the ion beam 318.

In other embodiments, a switching electromagnetic radiation source may not be associated with electromagnetic radiation source 302 or electromagnetic radiation beam 316. For example, control system 314 may cause a separate switching electromagnetic radiation source to irradiate one or more photoconductive semiconductor switch or spark switch, thereby activating or deactivating the particle beam adjustment components 308 of the proton energy filter(s).

Timing associated with activating the automated switch in a proton energy filter may be influenced, at least in part, by a time-of-flight control unit, such as a controlled delay line configured to adjust a time at which the radiation beam activates the automated switch. For example, the controlled delay line may be configured to synchronize timing of the automated switch with the radiation beam. Additionally, or in the alternative, the timing associated with activating the automated switch in a proton energy filter may be controlled by control system 314, for example in response to a user command, a feedback signal from system 300, or in accordance with a predetermined program.

Although the above discussion contemplates an application in which protons are filtered in a proton therapy system, a person of ordinary skill in the art would appreciate that these filtering systems and methods have broad applicability. For example, these methods and systems described in the context of filtering protons may also be used to filter any variety of other charged particles used in any variety of other systems and applications.

FIG. 13 depicts an example of a configuration of particle beam adjustment components 308 configured to achieve proton energy selection as described above. Such a configuration may include one or more particle beam adjustment components 1302 and 1306, and a beam dump 1304.

In some embodiments, beam adjustment components 1302 and 1306 may include a plurality of electromagnets disposed in series along a trajectory of ion beam 318. A plurality of automated switches may be associated with one or more different magnets or groups of magnets. Control system 314 may be configured to activate such a plurality of switches in various combinations to manipulate ion beam 318. For example, control system 314 may activate the automated switches in sequence as a proton bunch traverses magnets of the plurality of electromagnets. In an embodiment, beam adjustment component 1302 may be configured to divert a portion of ion beam 318 from an original trajectory to a diverted trajectory. Beam adjustment component 1302 may be configured to redivert at least part of the diverted portion of the pulsed particle beam from the diverted trajectory to a path substantially parallel to the original trajectory.

As shown in FIG. 13, ion beam 318 may pass through a zone proximate to particle beam adjustment component 1302. The zone may be of any size, but in some embodiments may have a dimension of less than one inch. The zone proximate to particle beam adjustment component 1302 may be configured and/or oriented for an ion beam 318 (e.g., a continuous beam or a pulsed beam including pulses such as pulse 1202) to traverse the zone. Particle beam adjustment component 1302 may include any of particle beam adjustment components 308, for example, an electromagnet such as a dipole, CMA, SMA, or time-of flight analyzer. As ion beam 318 traverses the zone proximate to particle beam adjustment component 1302, the automated switch may activate particle beam adjustment component 1302 such that protons having the desired energy are diverted along a trajectory 1310 toward beam adjustment component 1306, as shown in FIG. 13A. As protons having energies to be filtered out of ion beam 318 traverse the zone proximate to particle beam adjustment component 1302, the automated switch may not be activated, or an alternative switch may be activated, and the protons may travel along trajectory 1308 toward beam dump 1304, as shown in FIG. 13B. Protons having the desired energy may pass beam adjustment component 1306, where they are redirected back along a beam line trajectory 1312 and eventually toward the treatment volume.

In some embodiments (not shown), a proton energy filter may include only a single beam adjustment component and a beam dump. Instead of diverting protons having the desired energy towards a second electromagnetic element, protons having the desired energy may be allowed to pass through the zone proximate to particle beam adjustment component without being diverted. As protons having energies to be filtered out of the particle beam pass through the zone proximate to particle beam adjustment component, they may be diverted along a trajectory towards the beam dump.

In some embodiments, a particle energy filter may include an energy degrader. For example, an energy degrader may be used as part of beam dump 1304. Additionally, an energy degrader may be used to reduce energy and/or flux of the protons that are not diverted to the beam dump. To filter a particle beam using an energy degrader, particles may be diverted through the degrader, where they interact with the degrader. Particles transmitted through the degrader along the trajectory of the particle beam then have reduced energies, thereby lowering the energy of the particle beam. Other particles may either be absorbed by the energy degrader or diverted from the trajectory of the particle beam, no longer forming part of the transmitted particle beam and thereby reducing the flux of the transmitted particle beam. An energy degrader may include, for example, carbon, plastics, beryllium, metals such as copper or lead, or any material that is effective at reducing the energy or flux of the particle beam. An energy degrader may also consist of any shape effective at reducing the energy or flux of the particle beam, including a wedge, a double wedge separated by a gap (which may be filled with air or another material), a cylinder, a rectangle, or any other material or configuration capable of degrading the beam.

Those having ordinary skill in the art will recognize that the particle beam filter configurations described above are only illustrative, and that other configurations are contemplated consistent embodiments described herein.

In accordance with the present disclosure, a system for treating a treatment volume with protons may include a proton source. As used in the present disclosure, a proton source may refer to any material, system or subsystem that has releasable protons or that is capable of releasing protons. A proton source may be configured to provide an ion beam having a plurality of proton energies within a proton energy spread.

Further, in accordance with the present disclosure, a system for treating a treatment volume with protons may include at least one processor configured to control a relative movement between an ion beam and a treatment volume in two dimensions of a three-dimensional coordinate system. The at least one processor may, for example, include any of the processors described above. In some embodiments, a processor may be configured to control a proton energy spread to adjust a depth of the treatment volume in the third dimension of the three-dimensional coordinate system while maintaining substantially fixed coordinates in the other two dimensions. For example, a third dimension of a three-dimensional coordinate system may refer to an approximate direction of an ion beam trajectory, and the other two dimensions refer to the plane orthogonal to the third dimension.

Controlling a relative movement between an ion beam and a treatment volume in two dimensions of a three-dimensional coordinate system may be achieved in numerous ways. For example, controlling relative movement between the ion beam and the treatment volume may be achieved by rotating a gantry. Alternatively or additionally, controlling relative movement between the ion beam and a treatment volume may be achieved by directing an ion beam with an electromagnet and/or moving a patient support platform.

Likewise, controlling an energy spread and distribution or protons may be achieved in a variety of ways. In accordance with the present disclosure, controlling energy spread may be achieved, for example, via one or more of a magnetic analyzer, a time-of-flight control unit, and an energy degrader.

System 300 may be configured to vary of one or more properties of ion beam 318 as others remain substantially fixed. In some embodiments, such variation may be achieved via feedback, such as described above in relation to process 1100. For example, control system 314 may hold a flux of ion beam 318 substantially constant while independently adjusting an energy of ion beam 318, or hold the energy of ion beam 318 substantially constant while independently adjusting its flux. Such independent adjustment may not be feasible in accelerator-based systems because of their large sizes and slow response times. The systems and methods disclosed herein, however, may achieve independent energy and flux control by coupling feedback (as described above) with the adjustable components of system 300 (also described above) to reconfigure properties of electromagnetic radiation beam 316 and the laser-target interaction, thereby adjusting the energy and flux of ion beam 318 separately. Thus, precise treatment may be delivered more quickly than traditional systems, reducing time spent by patients in treatment and increasing patient throughput. Further, treatments can be provided more accurately and with less damage to healthy tissue. As an alternative, the systems and methods disclosed herein may achieve simultaneous energy and flux control by coupling feedback (as described above) with the adjustable components of system 300 (also described above) to reconfigure properties of electromagnetic radiation beam 316 and the laser-target interaction, thereby adjusting the energy and flux of ion beam 318 together.

In an embodiment, the energy and flux of ion beam 318 may be adjusted according to the intensity of electromagnetic radiation beam 316, the location of electromagnetic radiation beam on particle-generating target 304, the temporal profile of electromagnetic radiation beam 316, the spatial profile of radiation beam 316, the settings and choice of particle beam adjustment component(s) 308. As an example, the energy of ion beam 318 may be proportional to the intensity of electromagnetic radiation beam 316, and the flux of ion beam 318 may be proportional to the energy of electromagnetic radiation beam 316. This can be expressed by the following relationships:

$\begin{matrix} E_{p} \sim I_{L} = \frac{E_{L}}{Δτ \cdot A} and & (1) \\ \emptyset_{p} \sim E_{L} & (2) \end{matrix}$

in which I_Lis the intensity of electromagnetic radiation beam 316, E_Lis the intensity of electromagnetic radiation beam 316, A represents the spatial profile (e.g., a spot size) of electromagnetic radiation beam 316, Δτ represents the temporal profile (e.g., pulse duration) of electromagnetic radiation beam 316, E_pis the energy of ion beam 318, and Ø_pis the flux of ion beam 318. Accordingly, the energy of ion beam 318 may be held substantially constant while the flux of ion beam 318 varies, and vice versa, by properly adjusting one or more of the energy, spatial profile, and temporal profile of electromagnetic radiation beam 316. For example, to alter proton energy of ion beam 318 without changing proton flux, the energy of electromagnetic radiation beam 316 may be held constant at about 1 MeV while changing pulse duration and/or spot size at particle-generating target 304.

Alternatively or additionally, the energy and flux of ion beam 318 may be independently varied, for example, by choosing or adjusting particle beam adjustment component(s) 308 as appropriate. For example, this may be achieved by using one of the filtering systems and methods described above with respect to FIG. 13 or by using one or more energy degraders, for example.

When independently adjusting the flux of ion beam 318, the usable variation in the energy of ion beam 318 may be as large as ±25% or more where ion beam 318 is initially formed, and system 300 may be capable of reducing such fluctuations to about ±5% or less further down the beamline. Similarly, when independently adjusting the energy of ion beam 318, the usable variation in the flux of ion beam 318 may be as large as ±25% or more where ion beam 318 is initially formed, and system 300 may be capable of reducing such fluctuations to about ±5% or less further down the beamline.

As an alternative to independently adjusting the energy and flux of ion beam 318, the energy and flux of ion beam 318 may be simultaneously varied, for example, by choosing or adjusting particle beam adjustment component(s) 308 as appropriate. For example, this may be achieved by using one of the filtering systems and methods described above with respect to FIG. 13 or by using one or more energy degraders, for example.

Because process variables may fluctuate during operation, independent variance of the energy and flux of ion beam 318 benefits significantly from the feedback adjustments described above with respect to FIG. 11. For example, as the detected laser-target interaction property varies in step 1108 during operation, control system 314 may automatically adjusts system 300 accordingly at step 1104 via feedback signals determined at step 1110.

System 300 may be configured to employ such variation of one or more properties of ion beam 318 while holding other properties of ion beam 318 fixed in a process for systematic treatment of a treatment volume. FIG. 14 depicts an example of a process 1400 for such systematic treatment. At step 1402, control system 314 may position the particle beam (e.g., ion beam 318) relative to the treatment volume in two dimensions of a three dimensional coordinate system. For example, the third dimension may be defined by the trajectory of the particle beam as it exits a gantry (e.g., gantry 310), and the two dimensions of the three dimensional coordinate system may be defined by the plane normal to the trajectory of ion beam 318 as it exits gantry 310. Relative movement between ion beam 318 and the treatment volume in the two dimensions may be controlled by one or more components of system 300. For example, relative movement may be controlled by any combination of one or more motors and/or magnets associated with gantry 310 and/or one or more motors associated with patient support platform 312. More specifically, control system 314 may be configured to control relative movement between ion beam 318 and a treatment volume by controlling one or more of a rotation of gantry 310, an adjustment of scanning magnets 710, and a repositioning of patient support platform 312.

At step 1404, control system (e.g., system 314) may be configured to control a relative movement between the particle beam (e.g., ion beam 318) and the treatment volume in a third dimension of the three-dimensional coordinate system. Control system 314 may be configured to control such relative movement in the third dimension while maintaining substantially fixed coordinates in the other two dimensions. For example, control system 314 may control proton energies to adjust a depth of the treatment while leaving the position of ion beam 318 in the other two dimensions fixed. Controlling the proton energies at step 1404 may be achieved via one or more of the techniques described above (with or without reference to the particular structure described above). For example, at least one of the energy, temporal profile, and spatial profile of electromagnetic radiation beam 316 may be adjusted in accordance with equation 1 above, a particle energy selection as in FIGS. 12 and 13 may be used, and/or one or more of a magnetic analyzer, a time-of-flight control unit, and an energy degrader may be used.

An example of step 1404 is shown in FIGS. 15A, 15B, and 15C, which depict ion beam 318 penetrating skin 1502 of a patient 1504, to provide treatment to a treatment volume 1506. FIGS. 15A, 15B, and 15C may represent a sequence of locations of treatment consistent with the disclosed embodiments. System 300 may be configured to treat an area 1508, shown in FIG. 15A, of a greater distance in the third dimension (i.e. further from patient 1504's skin 1502) before treating an area 1510 by reducing the energy of ion beam 318, as shown in FIG. 15B, and then treating an area 1512, shown in FIG. 15C, by further reducing the energy of ion beam 318. Alternatively, the sequence may be reversed, treating area 1512 of FIG. 15C, then increasing the energy of ion beam 318 to treat area 1510 of FIG. 15B, then further increasing the energy of ion beam 318 to treat area 1508 of FIG. 15A.

Additional locations of treatment may be included at step 1404 before, after, or intermediate to the areas 1508, 1510, and 1512 shown in FIGS. 15A, 15B, and 15C. Control system 314 may also be configured to optimize treatment to take into account effects of a particular sequence. For example, protons passing through treatment volume 1506 that are intended to treat area 1508 (i.e., as shown in FIG. 15A) may provide some collateral treatment to areas 1510 and 1512 before reaching 1508. Control system 314 may account for collateral doses administered to areas 1510 and 1512 by adjusting dosages in a patient's treatment plan accordingly. For example, control system 314 may be configured to integrate all of the collateral doses that will be delivered to areas 1510 and 1512 while directly treating other areas, such as area 1508, and to subtract those collateral doses from the direct dose appropriate to treat areas 1510 and 1512. Thus, a more accurate treatment can be achieved.

At step 1406, a control system (e.g., control system 314) may determine whether another position requires treatment or whether treatment is complete. If treatment is complete (step 1006; YES), process 1400 may end. If treatment is not complete (step 1006; NO), process 1000 may return to step 1002, repositioning ion beam 318 relative to the two dimensions, as shown in FIG. 15D, and repeating the process of scanning the depth in the third dimension by varying the energy of ion beam 318.

Consistent with embodiments of the present disclosure, system 300 may be configured to employ a process for examining and adjusting the location and position of the laser-target. FIG. 16 depicts an example of a process 1600 for examining and adjusting the location of the laser-target. At step 1602, a control system (e.g., control system 314) may cause particle-generating target 304 to be illuminated by a light source. In one embodiment, particle-generating target 304 may be illuminated by electromagnetic radiation source 302 configured to project a probe (or an initial) electromagnetic radiation beam toward particle-generating target 304 at an energy level that would not substantially cause particle-generating target 304 to emit charged particles. The probe electromagnetic radiation beam is used to determine orientation data of particle-generating target 304. In an embodiment, the orientation data may include information indicative of X, Y, Z coordinates (or translational information) of particle-generating target 304. In another embodiment, the orientation data my include information indicative of θ orientation (or rotational information) of particle-generating target 304. Still, in another embodiment, the orientation data include both the information indicative of X, Y, Z coordinates of particle-generating target 304 and the information indicative of the θ orientation of particle-generating target 304.

In some embodiments, particle-generating target 304 may be illuminated by an additional light source that provides additional probe electromagnetic radiation beam. The additional light source may include any device configured to emit electromagnetic radiation that would not substantially cause particle-generating target 304 to emit particles. For example, the additional light source may include light emitting diodes, solid-state lasers, with wavelength in ultraviolet to infrared (200-2000 nm). A wavelength of the additional probe electromagnetic radiation beam may be the same as or different from a wavelength of the probe electromagnetic radiation beam.

At step 1604, the control system may receive measurements from at least one sensor and determine an offset of the location and/or the position of particle-generating target 304 relative to a desired location and/or a desired position. Consistent with the present embodiment, the desired location of particle-generating target 304 may be the X-Y-Z location that is expected to be in the focal volume of the electromagnetic beam that generates the particles. In one example, the desired location may be a location in the focal volume of the electromagnetic radiation beam. Similarly, the desired position of particle-generating target 304 may be the θ orientation of the target that is used to improve the angle of incidence of the input laser pulse, which in turn is expected to influence the particle beam direction.

In one embodiment, the at least one sensor may include an imaging system (e.g., a camera) for monitoring and recording an area of interest (AOI) associated with particle-generating target 304. In another embodiment, the at least one sensor may include a light sensor for monitoring the direction (e.g., the Poynting vector) of the specular reflection of light hitting particle-generating target 304. Using the measurements from the at least one sensor, the control system can determine the current location (translational) and position (rotational) of particle-generating target 304 and calculate the offset of the current location of particle-generating target 304 from the desired location and the offset of the current position of particle-generating target 304 from the desired position.

At step 1606, the control system may be configured to instruct an adjustable target holder to correct at least one of the X, Y, Z coordinates of particle-generating target 304 and/or the θ orientation of particle-generating target 304 so that particle-generating target 304 will be at the desired location and at the desired position. In some embodiments, the control system may be configured to change a relative orientation between a particle-generating beam and particle-generating target 304. The relative orientation may be a relative orientation in X, Y, Z coordinates (translational) between the particle-generating beam and particle-generating target 304 and/or a relative orientation in θ orientation (rotational) between the particle-generating beam and particle-generating target 304. The change of the relative orientation between the particle-generating beam and particle-generating target 304 may be achieved by adjusting at least one property among the following group of properties: X, Y, Z coordinates (translational) of particle-generating target 304; θ orientation (rotational) of particle-generating target 304; X, Y, Z coordinates (translational) of a particle-generating beam source; or θ orientation (rotational) of the particle-generating beam source.

At step 1608, a control system (e.g., control system 314) may check if particle-generating target 304 is in the desired location and/or the desired position by repeating steps 1602 and 1604. In one embodiment, step 1608 is performed by the same light source and/or sensor as used in steps 1602 and 1604. In another embodiment, step 1608 is performed by a different light source and/or sensor that was used in steps 1602 and 1604. Examples of different configurations of light sources and sensors are illustrated in FIGS. 17A-17C. If particle-generating target 304 is in the desired location and position (i.e., YES in step 1610), process 1600 may end. If particle-generating target 304 is not in the desired location and position (i.e., NO in step 1610), process 1600 may return to step 1602 for determining the new current location and/or position of particle-generating target 304 and to correct the location and/or position again.

Example of a system 1700 that can execute process 1600 is shown in FIGS. 17A, 17B, and 17C. In the configuration illustrated in FIG. 17A, system 1700 may include an imaging system for monitoring and recording the area of interest (AOI) associated with the particle-generating target; in the configuration illustrated in FIG. 17B, system 1700 may include a light sensor for measuring reflections of light hitting the particle-generating target; and in the configuration illustrated in FIG. 17C, system 1700 may include an imaging system and a light sensor.

Consistent with the present disclosure, system 1700 includes an adjustable target holder 1701 with horizontal (X-Y), vertical (Z), and azimuthal (θ) degrees of freedom. In FIG. 17A and FIG. 17B, particle-generating target 304 is represented by target 1703. For example, target 1703 may include a surface having one or more particle-generating structures or features. Such structures or features may be composed of one or more suitable materials, including ice (also referred to as snow), plastic, silicon, stainless steel or any of a variety of metals, carbon and/or any other material from which an beam of charged particles may be generated. In accordance with step 1602, target 1703 may be illuminated by light source 1704. In one embodiment, light source 1704 may be a multi-spectral radiation source to illuminate target 1703 for image capturing and tracking. In another embodiment, light source 1704 may include guiding optics for focusing high intensity laser pulse on target 1703. In another embodiment, light source 1704 may include an array of individual light sources for illuminating target 1703 from different directions. In some embodiments, light source 1704 may include a probe (or an initial) beam source for providing a probe electromagnetic radiation beam that is used to determine orientation data of target 1703. In an embodiment, an energy of the probe electromagnetic radiation beam may be controlled to substantially avoid particle generation at target 1703 when the probe electromagnetic radiation beam illuminates target 1703. In an embodiment, particle generation by an energy of the probe electromagnetic radiation beam is substantially avoided when an amount of the particles generated by the probe electromagnetic radiation beam is equal to or less than about 5% of the amount of the particles, equal to or less than about 1% of the amount of the particles, or equal to or less than about 0.1% of the amount of the particles generated by an energy of the particle-generating electromagnetic radiation beam. In some embodiments, light source 1704 may further include a particle-generating beam source. The particle-generating electromagnetic radiation beam may strike target 1703 at an energy level sufficient to cause target 1703 to emit particles, such as ions. In an embodiment, an energy of the particle-generating electromagnetic radiation beam may be less than about 1 J. In another embodiment, an energy of the particle-generating electromagnetic radiation beam may be more than about 1 J. In some embodiments, the probe beam source may be associated with a first range of wavelengths and the particle-generating beam source may be associated with a second, non-overlapping range of wavelengths. In some embodiments, light source 1704 may be a single electromagnetic radiation source configured to provide both the probe electromagnetic radiation beam and the particle-generating electromagnetic radiation beam. The single electromagnetic radiation source may be associated with an optical element for causing at least one difference between the particle-generating electromagnetic radiation beam and the probe electromagnetic radiation beam. In the configuration illustrated in FIG. 17A, system 1700 includes an imaging system 1708 and in the configuration illustrated in FIG. 17B, system 1700 includes a light sensor 1709. Both imaging system 1708 and light sensor 1709 may provide information indicative of a current location (translational) and a current position (rotational) of target 1703.

The information may be received by a signal processor 1710 that determines the current location (translational) and the current position (rotational), compares it to the desired location and the desired position, and sends a feedback signal to target holder 1701. This feedback is used to correct at least one of the X, Y, Z coordinates of target 1703 and/or the θ orientation of target 1703 so that target 1703 remains in the focus of the high intensity laser system, with the normal direction of the target's surface being substantially parallel to Z-axis. In some embodiments, signal processor 1710 may be configured to determine orientation data of target 1703 based on the information received from imaging system 1708 and/or light sensor 1709. In an embodiment, the orientation data may include information indicative of a difference between an actual translational location of target 1703 and a desired translational location of target 1703. In an embodiment, a desired translational location of target 1703 may be a location of the target at which an incident particle-generating electromagnetic radiation beam strikes a center of the target. In another embodiment, a desired translational location of target 1703 may be a location of the target at which a projection of an incident particle-generating electromagnetic radiation beam entirely falls within the target. The desired translational location of target 1703 may be within a focal volume of the particle-generating electromagnetic radiation beam. In another embodiment, the orientation data may include information indicative of a difference between an actual angular position of target 1703 and a desired angular position of target 1703. The desired angular position of target 1703 may be associated with a predetermined angle of incidence of the particle-generating electromagnetic radiation beam. In an embodiment, signal processor 1710 may be configured to adjust a relative orientation between the particle-generating electromagnetic radiation beam and target 1703 based, at least in part, on the determined orientation data of target 1703.

In an embodiment, signal processor 1710 may adjust the relative orientation between the particle-generating electromagnetic radiation beam and target 1703 by controlling a deformable mirror. The deformable mirror may reflect the particle-generating electromagnetic radiation beam such that a spot size of the particle-generating electromagnetic radiation beam can become smaller, larger, or differently shaped, comparing with a spot size without using the deformable mirror. In another embodiment, signal processor 1710 may adjust the relative orientation between the particle-generating electromagnetic radiation beam and target 1703 by controlling a motor associated with a movable platform of target 1703. The movable platform may be configured to adjust the relative orientation of target 1703 by translating target 1703 and/or rotating target 1703.

FIG. 17C depicts a specific example where target 1703 is a snow target. In this configuration, system 1700 may also include a target block with a cooling arrangement and provision for holding a sapphire substrate for snow growth. In one embodiment, the sapphire substrate with snow may have surface roughness of at least 1 micron. In another embodiment, the sapphire substrate with snow may have surface roughness of less than 1 micron. System 1700 may also include two light sources 1704A and 1704B for illuminating target 1703. Light source 1704A may be a light emitting diode for imaging system 1708, and light source 1704B may be a dedicated laser with a similar optical path as the electromagnetic radiation beam generated by electromagnetic radiation source 302. Alternatively, light source 1704B may be electromagnetic radiation source 302 configured to project an initial laser beam toward target 1703 at an energy level that would not cause target 1703 to emit particles. In an embodiment, light source 1704A may provide a first probe electromagnetic radiation beam for target 1703, and light source 1704B may provide a second probe electromagnetic radiation beam for target 1703.

The configuration illustrated in FIG. 17C also includes an infinity corrected microscope 1714 configured to collect scattered illumination radiation for imaging of the area of interest (AOI) on the snow surface. The focus of the infinity corrected microscope 1714 may be co-located with the focus of electromagnetic radiation beam generated by electromagnetic radiation source 302. Signal processor 1710 may be configured to receive input from both imaging system 1708 and light sensor 1709 to determine the current X, Y, Z coordinates (translational) of target 1703 and/or the current position (rotational) of target 1703. In an embodiment, imaging system 1708 and/or light sensor 1709 are configured to measure at least one property of a signal resulting from an interaction between the first probe electromagnetic radiation beam and target 1703. Optionally, the imaging system 1708 and/or light sensor 1709 may measure at least one property of an additional signal resulting from an interaction between the second probe electromagnetic radiation beam and target 1703. Signal processor 1710 may further assess whether target 1703 is oriented in a desired orientation based, at least in part, on the at least one property of the additional signal. Based on the measurement(s), imaging system 1708 and/or light sensor 1709 may provide information indicative of a current location (translational) and a current position (rotational) of target 1703 to signal processor 1710. Signal processor 1710 may change a relative orientation (translational and/or rotational) between a particle-generating beam and target 1703 based on the information received from imaging system 1708 and/or light sensor 1709.

FIG. 18 is a schematic diagram depicting intensities of a probe beam and a particle-generating beam consistent with the present disclosure. Lasers may be classified as continuous wave (CW) lasers or pulsed lasers. As shown in FIG. 18, a peak intensity 1806 of a CW laser may be a line, indicating stable or continuous output power, while peak intensities 1802, 1804, and 1808 of pulsed lasers may be sharp peaks with short durations of power output. In an embodiment, a CW laser may be used as a probe beam source such that a peak intensity of a probe electromagnetic radiation beam is continuous (e.g., peak intensity 1806). In another embodiment, a pulsed laser may be used as a probe beam source such that a peak intensity of a probe electromagnetic radiation beam is a sharp peak (e.g., peak intensities 1802 and 1804). A pulsed laser may be used as a particle-generating beam source such that a peak intensity of a particle-generating electromagnetic radiation beam may be a sharp peak (e.g., peak intensity 1808). In some embodiments, the probe electromagnetic radiation beam may have a first range of intensity, and the particle-generating electromagnetic radiation beam may have a second range of intensity that is non-overlapping and greater than the first range. A person skilled in the art would recognize from FIG. 18 that the probe beam irradiates the target at a first energy, and the particle-generating electromagnetic radiation beam irradiates the target at a second energy greater than the first energy. For example, as shown in FIG. 18, a maximum peak intensity 1808 of the particle-generating electromagnetic radiation beam (the second energy) is greater than the maximum peak intensity 1802 of the probe electromagnetic radiation beam (the first energy). The lower intensity of the probe electromagnetic radiation beam may substantially avoid undesired generation of particles by an energy of the probe electromagnetic radiation beam. In some embodiments, the first energy of the probe electromagnetic radiation beam does not modify or damage the target 1703. In some embodiments, the intervals of the pulsed laser beams may be ranged between milliseconds and femtoseconds.

While illustrative embodiments have been described herein, the scope thereof includes any and all embodiments having equivalent elements, modifications, omissions, combinations (e.g., of aspects across various embodiments), adaptations and/or alterations as would be appreciated by those in the art based on the present disclosure. For example, the number and orientation of components shown in the exemplary systems may be modified. Further, with respect to the exemplary methods illustrated in the attached drawings, the order and sequence of steps may be modified, and steps may be added or deleted.

Aspects of the disclosure may include a system for generating a beam of charged particles, such as an ion beam, the system comprising an interaction chamber configured to support a particle-generating target at a target location; an electromagnetic radiation source configured to provide an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, a polarization, a spatial profile, and a temporal profile; one or more optics components positioned along the trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and a surface of the particle-generating target, the one or more optics components being configured to cooperate with the electromagnetic radiation beam to cause the electromagnetic radiation beam to irradiate the particle-generating target, thereby facilitating formation of a beam of charged particles having an energy and a flux; and at least one processor configured to control at least one of the electromagnetic radiation source and the one or more optics components to thereby alter at least one of the energy of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, the spatial profile of the electromagnetic radiation beam, and the temporal profile of the electromagnetic radiation beam, in order to adjust at least one of: the flux of the particle beam while holding the energy of the particle beam substantially constant; and the energy of the particle beam while holding the flux of the particle beam substantially constant.

Further, aspects of the disclosure may include a system for generating a beam of charged particles, such as an ion beam, the system comprising an interaction chamber configured to support a particle-generating target at a target location; an electromagnetic radiation source configured to provide an electromagnetic radiation beam along a trajectory, the electromagnetic radiation beam having an energy, a polarization, a spatial profile, and a temporal profile; one or more optics components positioned along the trajectory of the electromagnetic radiation beam between the electromagnetic radiation source and a surface of the particle-generating target, the one or more optics components being configured to cooperate with the electromagnetic radiation beam to cause the electromagnetic radiation beam to irradiate the particle-generating target, thereby facilitating formation of a beam of charged particles having an energy and a flux; and at least one processor configured to control at least one of the electromagnetic radiation source and the one or more optics components to thereby alter at least one of the energy of the electromagnetic radiation beam, the polarization of the electromagnetic radiation beam, the spatial profile of the electromagnetic radiation beam, and the temporal profile of the electromagnetic radiation beam, in order to adjust at least one of: the flux of the particle beam while varying the energy of the particle beam; and the energy of the particle beam while varying the flux of the particle beam.

The at least one processor may be configured to alter the spatial profile of the electromagnetic radiation beam by altering a spot size of the electromagnetic radiation beam. The at least one processor may be configured to alter the temporal profile of the electromagnetic radiation beam by altering a chirp of the electromagnetic radiation beam. The at least one processor may be configured to alter the temporal profile of the electromagnetic radiation beam by altering a timing of one or more pump sources. The electromagnetic radiation beam may not be polarized. The electromagnetic radiation source may be configured to provide a pulsed electromagnetic radiation beam and to thereby cause a pulsed beam of charged particles. The at least one processor may be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the temporal profile of the electromagnetic radiation beam. The at least one processor may also be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam. The at least one processor may also be configured to cause the electromagnetic radiation source to change the energy of the electromagnetic radiation beam, and to cause the one or more optics components to change the spatial profile of the electromagnetic radiation beam. The at least one processor may also be configured to cause the one or more optics components to change the energy of the electromagnetic radiation beam and the spatial profile of the electromagnetic radiation beam.

The specification and claims may refer to elements in the singular, such as “a processor” or “a detector.” It is to be understood that this syntax is intended to be inclusive of multiple of such elements. That is, a particular function may be split over multiple processors located on a same board or system, or located remotely on another board or in another system. It is to be understood that reference to a processor is to be interpreted as “at least one processor,” meaning that the function recited may occur across multiple processors and still be considered within the scope of the disclosure and claims. The same is true for detectors and other elements described or referenced in the singular throughout the specification and claims.

Moreover, the foregoing description has been presented for purposes of illustration. It is not exhaustive and is not limiting to the precise forms or embodiments disclosed. Modifications and adaptations will be apparent to those skilled in the art from consideration of the specification and practice of the disclosed embodiments. For example, where generation of protons is described above with respect to a laser striking a particle-generating target, other proton generation processes may be used, such as a radio-frequency coupling. Further, while some description above relates to use of protons in medicine as a radiotherapy treatment, systems and methods described herein may be used in other applications of a beam of charged particles and in applications involving charged particles other than protons.

Number	Name	Date	Kind
8389954	Zigler et al.	Mar 2013	B2
9236215	Zigler et al.	Jan 2016	B2
9238216	Kim	Jan 2016	B2
9455113	Zigler et al.	Sep 2016	B2
9530605	Nahum et al.	Dec 2016	B2
9711319	Zigler et al.	Jul 2017	B2
9937360	Papeer et al.	Apr 2018	B1
10039935	Papeer et al.	Aug 2018	B1
10076675	Johnstone et al.	Sep 2018	B2
10395881	Papeer et al.	Aug 2019	B2
10847340	Papeer et al.	Nov 2020	B2
20130181142	Houde et al.	Jul 2013	A1
20150123009	Shin	May 2015	A1
20150314137	Maurer et al.	Nov 2015	A1

Number	Date	Country
2016162692	Sep 2016	JP
WO-2016143450	Sep 2016	WO

Systems and methods for providing a beam of charged particles

Information

Patent Number

Date Filed

Date Issued

Inventors

Original Assignees

Examiners

Agents

CPC

Field of Search

CPC

International Classifications

Term Extension

Abstract

Description

Claims

CROSS-REFERENCE TO RELATED APPLICATIONS

PCT Information

US Referenced Citations (14)

Foreign Referenced Citations (2)

Non-Patent Literature Citations (1)

Related Publications (1)

Provisional Applications (1)