Patent Grant
10587030
This application is generally related to systems and methods for designing, producing and tuning ceramic and other printed filters. More specifically, this application is related to systems and methods for designing, producing and tuning recessed top ceramic filters.
Base stations for communications operate at power levels on the order of many watts. Implementations of duplex filters located in base stations having a single antenna for both transmit and receive operations typically include air cavity duplex filter designs. Such filter designs include multiple resonators which when tuned properly operate in concert to achieve filter performance needs. Resonators are coupled to each other through parasitic and other paths. Tuning a given resonator can affect the operation of other resonators because of cross coupling inherent in the design of such filters.
Air cavity filters are cost effective to manufacture using well known machining techniques. Air cavity filters can also handle high power levels. However, there are specialized applications where the size and weight of air cavity filters is prohibitive. In the interest of mining scarce bandwidth resources, base station serving areas are becoming much smaller. In fact, customers and operators prefer to minimize the footprint and mounting constraints for base stations. As a result, filters in the base stations need to be smaller.
Planar techniques, such as for example microstrip techniques, stripline techniques or other printed techniques, enable low cost design of printed filters, including ceramic filters with printed surfaces. Many types of printed planar filters or ceramic multi-resonator filters often have lot-to-lot or device-to-device performance variation that can cause performance to fall outside of specified tolerances. This may include shrinkage of the ceramic block, inaccuracies in the ceramic mixture, inaccuracies in the furnace firing, thickness variation of the plating, and errors in pattern positioning each have a large effect on part-to-part and lot-to-lot filter performance. Moreover, each filter must be manually tuned resulting in a laborious and expensive process requiring significant knowledge of the art.
Separately, printed planar filters or ceramic multi-resonator filters can be difficult to design particularly when the design incorporates both bulk field resonances and high E-field couplings. The design process for these filters initially involves simulating the filter resulting in an accurate prediction of the final filter performance. However, this does not provide much instruction on how to achieve the final performance. Conventional methods require the designer to use a laborious and expensive process that requires significant knowledge of the art to design the printed pattern that will yield the originally simulated performance.
What is needed is an automated tuning, design and manufacture method enabling low cost, precision manufacture of printed filters.
What is also needed is a faster and more stepwise approach to tuning filters, during production and post production in the field, which allows a less-trained technician, or an automated robotic system to tune each filter into compliance in a fast and cost-effective way.
What is further needed is a stepwise approach to design filters which guide the designer, technician, or computer in a way that causes the printed pattern to converge to the appropriate final design.
The foregoing needs are met, to a great extent, by the invention, with an apparatus and method for designing, producing and tuning ceramic and other printed filters.
In accordance with an aspect of this application, a method of making a tuned ceramic filter is provided. The method includes a step of printing an oversized pattern of ceramic material on a ceramic filter. The method also includes a step of removing, at a first tune location of the ceramic filter, a first amount of the ceramic material using a laser. The laser may be, for example a femto-second (cold) laser, to shrink the oversized pattern. The method also includes a step of comparing a coupling matrix of the ceramic filter after the removing step with a coupling matrix of a prototype of the ceramic filter. The method further includes a step of generating a tune vector based upon a difference between the coupling matrix of the ceramic filter and the coupling matrix of the prototype filter. The method even further includes a step of iteratively modifying the removing of the ceramic material using the femto-second laser at the first tune location to have a coefficient of the tune vector corresponding to the first tune location to converge toward zero.
In accordance with another aspect of this application, a method for designing a ceramic filter is provided. The method includes a step of printing an oversized pattern of ceramic material on a ceramic filter. The method also includes a step of selecting a first tune location of the ceramic filter based upon simulated data of electrical characteristics of the ceramic filter. The method also includes a step of removing, at the first tune location, an amount of the ceramic material using laser to shrink the oversized pattern. The method also includes a step of measuring actual electrical characteristics of the ceramic filter after the removing step to generate a tune vector for the ceramic filter. The method also includes a step of comparing a tune vector with a simulated tune vector corresponding to the simulated data. Each of the tune vector and the simulated tune vectors are derived from an actual coupling matrix and a simulated coupling matrix, respectively, of the ceramic filter. Further, the method includes a step of iteratively modifying the simulated data and the amount of the ceramic material removed such that the tune vector and the simulated tune vector match.
In accordance with yet another aspect of this application, a system for laser based tuning of ceramic filters is provided. The system includes a processor, a memory coupled to the processor, the memory having non-transitory computer readable medium on which instructions are stored for laser tuning a recessed top ceramic filter. The instructions when executed by the processor cause the processor to position a femto-second laser source to a first tune location of the recessed top ceramic filter. The first tune location is selected based upon simulated data of electrical characteristics of the recessed top ceramic filter. The first tune location has an oversized pattern of ceramic material. The femto-second laser is turned on to emit a femto-second pulse on the ceramic material of the first tune location. The electrical characteristics of the recessed top ceramic filter are measured after removal of a portion of the ceramic material by the femto-second laser source. This generates a tune vector. The tune vector is compared with a simulated tune vector corresponding to simulated data for the recessed-top ceramic filter. Each of the tune vector and the simulated tune vectors are derived from an actual coupling matrix and a simulated coupling matrix, respectively, of the recessed-top ceramic filter. The simulated data and the amount of the ceramic material removed are iteratively modified such that the tune vector and the simulated tune vector match.
There has thus been outlined, rather broadly, certain embodiments of the invention in order that the detailed description thereof herein may be better understood, and in order that the present contribution to the art may be better appreciated. There are, of course, additional embodiments of the invention that will be described below and which will form the subject matter of the claims appended hereto.
In order to facilitate a fuller understanding of the invention, reference is now made to the accompanying drawings, in which like elements are referenced with like numerals. These drawings should not be construed as limiting the invention and intended only to be illustrative.
In this respect, before explaining at least one embodiment of the invention in detail, it is to be understood that the invention is not limited in its application to the details of construction and to the arrangements of the components set forth in the following description or illustrated in the drawings. The invention is capable of embodiments or embodiments in addition to those described and of being practiced and carried out in various ways. Also, it is to be understood that the phraseology and terminology employed herein, as well as the abstract, are for the purpose of description and should not be regarded as limiting.
Reference in this application to “one embodiment,” “an embodiment,” “one or more embodiments,” or the like means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the disclosure. The appearances of, for example, the phrases “an embodiment” in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Moreover, various features are described which may be exhibited by some embodiments and not by the other. Similarly, various requirements are described which may be requirements for some embodiments but not by other embodiments.
It has been determined by the inventors and described herein that the inventive techniques provide faster and less expensive design, tuning and production of the printed ceramic filters. By virtue of the aspects of this patent application, ceramic filters can further be tuned in in a test fixture. Prior to describing the setup and the process for designing, tuning and producing such ceramic filters, it will be beneficial to discuss certain structural aspects of the ceramic filters.
General Description of a Ceramic Filter
Ceramic filters are typically employed in radio equipment to reduce substantial interference. In particular, duplex ceramic filters including two individual band-pass filters are employed. One filter connects the receiving branch and has a center frequency and bandwidth corresponding to the receiving band. The other filter connects the transmission branch and has a center frequency and bandwidth corresponding to the transmission band.
Conventional ceramic filters include a dielectric ceramic material for the main body upon which metallic materials are applied for producing conducting paths. These paths define the performance of the filter and for realization of pads or other isolated conducting areas that contact the printed circuit board or other interface material.
Ceramic filters generally include a single type of material for all conduction paths, pads and other conductive elements. Typically, conducting-type material is deposited on the device through a process known as electroding. Often, there is a need for soldering or epoxy-attaching given devices to a printed circuit board. The strength of the conducting bond between a device and the board requires using a conducting material containing glass frit material in combination with pure silver conductive material. The conductivity of glass frit/silver material is significantly less than pure silver by about 10 fold, while adhesion of the glass frit/silver material is 10 fold that of pure silver.
Generally, a pattern of metallized and un-metallized areas is defined on a filter. The pattern includes a recessed area of metallization that covers at least a portion of the top surface and areas which cover the bottom and side surfaces, the through-holes, and at least a portion of the walls or posts.
The filter 100 includes four side surfaces. Two of the four side surfaces are minor side surfaces 111. The other two of the four side surfaces are major side surfaces 112. The filter 100 also includes a bottom surface 115 and a top-recessed surface 120 making the filter a recessed-top portion (RTP) type filter. The top surface 120 is generally parallel and opposed to the bottom surface 115. Once fabricated, the bottom surface 115 usually is attached to a printed circuit board (not shown), and is not easily accessible to a filter tuner.
The filter 100 also includes four generally planar walls that extend upwardly from the top surface 120. In one embodiment, the planar walls extend upwardly and/or outwardly along a perimeter of the top-recessed surface 120. In another aspect, the planar walls are unitary portions of the major 112 and minor 111 side surfaces. Planar walls of the minor side surfaces are 113, and planar walls of the major side surfaces are 114.
Walls 113, 114, and top surface 120 define a cavity 125. Top surfaces 113a of wall 113 and top surfaces 114a of wall 113 form a peripheral rim 115 of a predetermined thickness. The thickness of the roof is dependent upon the width and length of the cavity 125.
Inner walls 113b of wall 113 of the minor surface 111, inner walls 114b of wall 114 of the major surface 112, and the top surface 120 can be plated or deposited with a first coating.
In an aspect, outer walls 113c and 114c of walls 113 and 114 are coextensive and coplanar with major 111 and minor 112 surfaces, respectively. In one aspect, the roof 113a, 114a are planar. In another aspect, the roof slopes downward from the inner to outer surfaces of the walls 113, 114. In yet another aspect, the roof slopes upward from the inner to outer surfaces of the walls 113, 114. The slope are be envisaged to be any angle.
As shown in
The top surface 120 may include plural through-holes 150. The through-holes 150 extend from the top surface 120 to the bottom surface 115 (not shown) of the body 100. The through-holes 150 act as resonators. The through-holes are metallized. In an aspect, the through-holes 150 are aligned in a spaced-apart, co-linear relationship and are also equal distances from the side surfaces. Each of through-holes 150 is defined by an inner cylindrical metallized side-wall surface.
Top surface 120 additionally defines a surface-layer recessed pattern of electrically conductive metallized 121 and insulative, un-metallized 122 areas or patterns. The metallized areas 121 are preferably a surface layer of conductive silver-containing material. Recessed pattern 121 defines a wide area or pattern of metallization that covers the surface. In an embodiment, the recessed pattern 121, through-holes 150, and inner walls 113b, 114b are deposited with a first coating including a metal and frit. More specifically, the metal is a precious metal. Even more specifically, the metal is silver (Ag).
Meanwhile, the bottom surface 115, side surfaces 111, 112, outer planar walls 113c, 114c, and top rim 113a, 114a are deposited with a second coating including a metal and frit. The metal may be precious. In particular, the metal is silver. The frit content in the second coating is greater than the first coating. In an aspect, the frit content is at least 20% greater in the second coating. The first coating also extends contiguously within the through-holes 150 from the top surface 120 to the bottom surface 115.
In an aspect, a portion of metallized area 121 is present in the form of resonator pads (121a is representative). Each of these resonator pads partially surrounds a through-hole 150 opening located on the top, recessed surface 120. In an exemplary aspect, each resonator pad entirely surrounds one of through-holes, respectively. The resonator pads are contiguous with the metallization area 121 that extends through the inner surfaces of the through-holes. Resonator pads 121a are shaped to have predetermined capacitive couplings to adjacent resonators and other areas of surface-layer metallization.
An un-metallized area or pattern 122 extends over portions of top surface 120. Unmetallized area 122 surrounds all of the metallized resonator pads 121a. In addition, portions of inner planar walls 113b, 114b and roofs 113a, 114a are un-metalized.
Un-metallized area 122 extends on the top surface 120 in slot 122a (122a is representative). The un-metallized area 122 also extends onto side wall slot portions 122a′, 122a″ (122a′ and 122a″ are representative). Side wall slot portions 122a′ and 122a″ define opposed side walls of the post 135.
In another aspect, un-metallized area 122 also can also extend onto a portion 123 of side surface 112 located below the post 135. Portion 123 can also extend below the slots 130. These un-metallized areas co-extensive or joined or coupled with each other in an electrically non-conducting relationship.
The surface-layer pattern of the filter 100 additionally defines a pair of isolated conductive metallized areas 124a, 124b for input and output connections to filter 100. An input connection area or electrode 124a and an output connection area or electrode 124b are defined on top surface 120 and extend onto a portion of the planar wall 114 and side surface 112. The electrodes can serve as surface mounting conductive connection points or pads or contacts. Electrodes 124a, 124b are located adjacent and parallel to side surfaces 111.
Each of the electrodes is located between two resonator pads 121a-f. Electrodes 124a, 124b are surrounded on all sides by un-metallized areas 122.
In another aspect, the recessed surface pattern 120 includes metallized 121 areas and un-metallized 122 areas. As a result, metallized areas are spaced apart from one another and capacitively coupled. The amount of capacitive coupling is roughly related to the size of the metallization areas and the separation distance between adjacent metallized portions as well as the overall core configuration and the dielectric constant of the core dielectric material. Similarly, surface pattern 120 also creates inductive coupling between the metallized areas.
According to another aspect, the filter 100 is illustrated as being mounted to a generally planar rectangular shaped circuit board 210 in
A post of the filter 100 can be attached to the PCB 200 at the connection pad(s) 221 by solder 230. In an aspect, one or both of the input 124a and output 124b electrodes can be attached to the solder 230.
Circuit board 200 has a generally rectangular-shaped ground ring or line 240. It can be disposed on the top surface. The line 240 can be formed around the rim of the filter. The ground ring can be formed from copper. Next, the filter 100 can be placed on top 302 such that input electrode portion 124a and output electrode portion 124b are aligned with connection pads 221. Circuit board 200 and filter 100 may be arranged in a reflow oven to melt and reflow the solders.
As illustrated in
The use of filter 100 with recessed top surface pattern 120 facing and opposite the board provides improved grounding and off band signal absorption, and confines the electromagnetic fields within cavity 125. The arrangement also prevents external electromagnetic fields outside of cavity 125 from causing noise and interference such that the attenuation and zero points of the filter are improved. The technology allows the same footprint to be used across multiple frequency bands. In addition, during solder reflow, filter 100 tends to self-align with the ground ring 240 on the circuit board.
The use of a filter 100 defining a cavity and a recessed top surface pattern 40 facing and opposite the board 200 eliminates the need for a separate external metal shield or other shielding as currently used to reduce spurious electromagnetic interference incurred. However, this means any tuning to be carried out for the filter 100 after attachment to the board 200 cannot be carried out on the top-recessed surface 120 unless the whole filter 100 is taken off the board 200.
Accordingly, the better the filter 100 is designed, fabricated, characterized, and/or tuned prior to attachment to the board 200, the more reliable and cost-efficient the overall operation and use of the filter 100 becomes. Various aspects of this application address these issues and provide efficient and fast methods and systems to design, tune and produce such ceramic filters.
Referring to
The computer 302 includes a processor 304. A memory 306 is coupled to the processor 304, the memory 306 having non-transitory computer readable medium 308 on which are stored instructions/computer code for laser tuning a recessed top ceramic filter, e.g., the filter 100. The instructions when executed by the processor 304 cause the processor 304 to carry out a simulation, design, characterization, tuning and production of the filter 100, as described with respect to
In one aspect of this application, the computer 302 is coupled to a vector network analyzer 310 configured to provide a frequency domain and/or a time domain response of the filter 100 to various signals (e.g., electrical or mechanical test signals) to characterize and test the filter 100. Alternatively, the vector network analyzer 310 may be part of the computer 302.
In one aspect of this application, the computer 302 is coupled to and/or in communication with a robotic arm 312. The robotic arm 312 facilitates opening and closing of the test fixture. When open, the test fixture permits measurement on the vector network analyzer. The robotic arm 312 is coupled to the laser 314. The computer 302 may send control signals to move the robotic arm 312, and hence the laser 314 to one or more precise locations on the filter 100. The computer 302 may then send additional control signals (e.g., a modulation signal) to the laser 314 for outputting laser pulses on to the precise locations on the filter 100 where the ceramic material is to be removed.
In one alternative aspect of this application, the robotic arm 312 may be optional, and the laser 314 may be positioned manually above a desired location on the filter 100. Still alternatively, the laser 314 may not be moved, and instead the filter 100 may be moved using the robotic arm 312. Further, in one aspect, both the laser 314 and the filter 100 may be moveable by the robotic arm 312 to be in a precise orientation relative to each other.
In one aspect of this application, the laser 314 is a femto-second laser. The femto-second laser can emit optical pulses of up to 1 femto-second duration. An exemplary advantage of this duration is that the ceramic material on the filter 100 is ablated but does not burn off or overheat the filter 100. Another exemplary advantage of using the laser 314 is that a high degree of precision removal of the tune material (ceramic material) is possible, as compared to a coarser removal using a drill.
Design Method for a Ceramic Filter
Conventional design process for these filters currently involves first simulating the filter 100, which results in an accurate prediction of the final filter performance but does not provide much instruction how to achieve the final performance. Conventionally, the designer must use a laborious and expensive process that requires significant knowledge of the art to design the printed pattern that will yield the originally simulated performance.
According to an aspect of this application,
In a step 404, a starting printed pattern of the filter 100 may be generated from the design data in the step 402. This may be performed via a software program. The generated starting pattern may be an oversized pattern for the simulated version of the filter 100. The oversized pattern is “oversized” with respect to extra amount of ceramic material deposited on the filter 100. This pattern is best chosen as a first estimate by an experienced designer or, alternatively, a generic pattern that is not particularly close to the correct performance. The oversized pattern may be shown printed on a simulated version of the filter 100. Simulated results in the frequency domain, time domain, or a coupling matrix format may be used to generate the starting pattern. Starting with simulated data, a pseudo vector space, related to either a matrix representation or another (matrix-like) set of data points that represent the items that may need tuning (e.g., resonator center frequencies, complex value or magnitude of coupling coefficients) may be defined. Alternatively or additionally, the oversized pattern may be printed on the filter 100 in real time as the simulation of the oversized pattern is generated.
In a step 406, the design process 400 may simulate removal of small amounts of conductive material at many possible tune locations and iteratively measure to determine each effect on the matrix representations. The goal is to find tune locations that have a strong effect on the center frequency of each resonator of the filter 100 or the simulated filter, and on the strength of each coupling between resonators. In one embodiment, a tune location is sought such that it exhibits a strong effect on the center frequency on one resonator and a minimal effect on the other resonators. In another embodiment, a tune location is sought such that it exhibits a strong effect on the coupling between two particular resonators and a minimal effect of coupling among other resonators, and a minimal effect on the center frequencies of other resonators.
For example,
Ideally, each tune location is chosen such that it has a strong effect on one tune result (e.g., resonator 504 center frequency, or e.g., resonator 502-resonator 504 coupling) and a weak effect on other tune results. This tuning location may be thought of intuitively as an adjustment knob whereby removal of material corresponds to a change in primarily one item of interest. In one aspect, optionally or additionally, a subset of the originally-chosen tune locations that best match an orthogonal vector space into the chosen coupling matrix may be selected as part of the design process 400. More precisely, this tuning location may be thought of as one dimension in a pseudo vector space with total number of dimensions equal to the number of items that require tuning. The selection of tune locations may occur with intervention by a designer or, alternatively, may be originally an over-generalized set of locations. Further, if in the step 404, an actual oversized pattern was printed from based on the simulated pattern, then the removal step maybe performed at the actual tune locations of the filter 100 also.
In a step 408, a tune vector may be calculated based upon observing the difference between the existing performance of the filter 100 and the simulated reference of the filter 100. In one aspect, the calculated tune vector may be compared with an actual tune vector of the filter 100. The tune locations may be chosen from a number of the possible tune locations that compose the vector space. Generally, locations are chosen based on how well they correlate to or match the desired tune vector. Additionally, the coefficients of the tune vector may be weighted so that each location has a specific impact on the overall tune vector space.
Simulated filter performance is used as a reference that shows the expected performance of the finished design. These data can be converted back-and-forth between either the frequency domain or the time domain. Typically, filter specifications are given in the frequency domain and this representation can be used to set goals or limit values to check against during tuning. Important characteristics of a filter are:
(a) low insertion loss 1, within a specified tolerance in the pass-band,
(b) low return loss 3, within a specified tolerance in the pass-band,
(c) low return loss 2, within a specified tolerance in the pass-band,
Other indicators of filter performance are: the level of attenuation of the input signal outside of the pass-band and the return losses
In a step 410, the amount of tune (material removal) needed to reach the goal may be calculated. The calculated amount of tune may be reduced by a scaling factor or similar adjustment, for example, based upon the weight in the tune vector space. The calculated amount of tune material may be removed from the filter 100 and/or the simulated filter at one or more selected tune locations. By successive removal of material and observation of the effect, the set of tune locations can be reduced in number by selecting only those locations that best fit an orthogonal vector space. At this point, it is determined the magnitude and direction of effect that corresponds to a certain amount of material removed. This direction and magnitude is referred to as a pseudo unit vector.
For example, removal of conductive material between resonator 502 and resonator 504 may be found to primarily affect coupling between resonator 502 and resonator 504, yet have little effect on coupling between other resonators and little effect on the center frequencies of other resonators. This would therefore be a good tune location for resonator 1-2 coupling. Continuing in this example, removal of about 2-3 microns of conductive material has an effect of adjusting resonator 502 resonator 504 coupling by a unit value. For example, this unit value could be a reduction in the height of the time-domain response by 1 division on the vector network analyzer 310. As an alternate example (using a coupling matrix representation), this unit value could be chosen as a change in the resonator 502-resonator 504 matrix element by a minimum the desired final value. Multiple transformations of the data may be carried out to correctly determine each resonator frequency and each coupling value, due to the interrelationships among these items. In other words (considering a time domain representation), an initially poorly-tuned resonator 502 resonator 504 coupling will have the tendency to mask the measurement of resonators 506, 508, etc., that follow that location, leading to inaccuracies in those measurements, until the resonator 502 resonator 504 coupling is more properly tuned. Time gating these measurements and reconfiguring the vector network analyzer 310 can allow accurate measurement of, say, resonator 506 but inaccurate measurement of resonator 502. Reconfiguring the measurement would then allow accurate measurement of resonator 502 but not resonator 506, etc.
Removal of the ceramic material may be done for the filter 100 using the laser 314 for precise removal. Alternatively, for coarser removal during initial iterations, a drill cutter may be used. Selection of which resonator(s) or coupling(s) should be tuned first and which should be tuned next and so on may be performed by the computer 302 using multiple transformations of the data to correctly determine each resonator frequency and each coupling value, due to the interrelationships among these items. A property to tune is chosen by comparison of the filter 100 under design to a reference filter. A location (optionally, multiple simultaneous locations) to tune is then chosen which best correlates or matches the desired property to tune. Optionally, a step-by-step method may be used to inform or to weight the selection since tuning one item may affect another item and since the measurement of one desired item may be inaccurate due to a masking effect of another item.
The amount of tune material is then calculated based on a vector or pseudo-vector derived from the pseudo unit vector from the step 408 multiplied by an amount required to change the desired response from the existing performance to the reference filter. This amount is then reduced by a scaling factor or a subtracted amount that ensures the approach will converge in one direction only (by removal of ceramic material, not addition).
In a step 412, the filter 100 and the simulated filter with the ceramic material removed may be tested again to determine how close the filter 100 and/or the simulated filter is/are to the design goals. For example, various coupling matrix coefficients may be measured. The overall performance of the filter 100 may also be shown in the time domain as illustrated in
Measurement and comparison of the filter 100 against the reference filter and against other design goals (possibly in the frequency domain). If the filter 100 passes requirements, the process 400 is complete. Otherwise, the iterative approach is followed by returning to step 408. Optionally, the process may return to step 410, which allows for a less ideally orthogonal tune vector space but may improve convergence time to the desired result. For example, the steps 402-412 may be repeated iteratively for modifying the simulated data and the amount of the ceramic material removed such that the tune vector and the simulated tune vector match. For example, the difference between the tune vector of the filter 100 and the simulated tune vector may converge to zero.
According to an aspect of this application, the iterative design process 400 operates on a printed filter, including a ceramic RTP duplex filter (duplexer), e.g., the filter 100. To carry out the iterative design process 400, various pieces of information are taken into consideration such as: (i) design data describing achievable electrical performance of the finished design. (i.e., simulated S-parameters converted to time-domain representation); (ii) an initial engineering estimated design of the printed pattern; (iii) the ability to simultaneously measure and tune the filter, or the ability to go between measurement and tune steps in quick succession; (iv) the computer 302 for running software for calculations; and (v) means of displaying calculated results (e.g., the display 330).
Tuning Method for a Ceramic Filter
Referring to
In a step 704, a selection of possible tune locations of the filter 100 to be tuned is carried out. The goal is to find locations that have a strong effect on the center frequency of resonators 502-510 and the coupling between the resonators 502-510. Ideally, a tune location is chosen that has a strong effect on one tune result and a weak effect on other tune results. This tuning location may be thought of intuitively as an adjustment knob whereby removal of material corresponds to a change in primarily one item of interest. More precisely, this tuning location may be thought of as one dimension in a pseudo vector space with total number of dimensions equal to the number of items that require tuning. The selection of tune locations may occur with intervention by a designer or, alternatively, may be originally an over-generalized set of locations. Then, by successive removal of material and observation of the effect, the set of tune locations can be reduced in number by selecting only those locations that best fit an orthogonal vector space. At this point, it is determined the magnitude and direction of effect that corresponds to a certain amount of material removed, referred to as a pseudo unit vector. Multiple transformations of the data may be carried out to correctly determine each resonator frequency and each coupling value, due to the interrelationships among these items.
In a step 706, an oversized pattern that was determined from starting with the reference is printed on the filter 100 and the size of the pattern at experimentally determined possible tune locations from the previous step 704 is increased. Step 706 may occur before or after step 704. A starting point is selected where the pattern to be adjusted starts out larger than needed, at least in the locations that will be later tuned by removal of material from the filter 100. The starting pattern originates as the pattern of the reference, which is the result of an earlier design process, e.g., the design process 400.
In a step 708, a tune vector based on observing the difference between the existing performance and the measured reference is calculated. Such calculating includes a comparison of the existing measured filter performance against the reference. This comparison is ideally in the form of a difference between one of several matrix representations of the filter 100 but may be based on a format that is derived from the graphical time-domain representation of the filter 100 (e.g., that shown in
In a step 710, selection of which resonator(s) or coupling(s) should be tuned first and which should be tuned next and so on is carried out. Multiple transformations of the data may be carried out to correctly determine each resonator frequency and each coupling value, due to the interrelationships among these items. A property to tune is chosen by comparison of the filter 100 under design to the reference. A location (optionally multiple simultaneous locations) to tune is then chosen which best correlates or matches the desired property to tune. Optionally, a step-by-step method taught may be used to inform or to weight the selection since tuning one item may affect another item and since the measurement of one desired item may be inaccurate due to a masking effect of another item.
In a step 712, the amount of tune is calculated based on a vector or pseudo-vector derived from the pseudo unit vector from the step 710 multiplied by the amount required to change the desired response from the existing performance to the reference. This amount is then reduced by a scaling factor or a subtracted amount that ensures the approach will converge in one direction only (by removal of material, not addition).
In a step 714, removal of material at the calculated locations and in the calculated amount is carried out by the laser 314 following the guided computer executable instructions given by the computer 302. Alternatively, a technician may perform such removal using instructions and numerical values from the computer 302.
In a step 716, measurement and comparison of the filter 100 against the reference and against any design goals (e.g., in the frequency domain) is carried out. If the filter 100 passes these requirements, the process 700 is complete. Otherwise, an iterative approach is followed by returning to step 708. Optionally, the process 700 may return to step 706, which allows for a less ideally orthogonal tune vector space and may improve convergence to the desired result. For example, the difference between the tune vector of the filter 100 and the reference filter may converge to zero.
While the system and method have been described in terms of what are presently considered to be specific embodiments, the disclosure need not be limited to the disclosed embodiments. It is intended to cover various modifications and similar arrangements included within the spirit and scope of the claims, the scope of which should be accorded the broadest interpretation so as to encompass all such modifications and similar structures. The present disclosure includes any and all embodiments of the following claims.
This application claims the benefit of priority of U.S. Provisional Application No. 62/418,967 filed Nov. 8, 2016, entitled, “Methods of Tuning, Designing and Producing Ceramic Filters” the contents of which is incorporated by reference in its entirety herein.
| Number | Name | Date | Kind |
|---|---|---|---|
| 5528204 | Hoang | Jun 1996 | A |
| 6437655 | Andoh et al. | Aug 2002 | B1 |
| 6504446 | Ishihara et al. | Jan 2003 | B1 |
| 7042314 | Wang | May 2006 | B2 |
| 7605343 | Lei | Oct 2009 | B2 |
| 20010016982 | Blair et al. | Aug 2001 | A1 |
| 20120012758 | Kajikawa | Jan 2012 | A1 |
| Entry |
|---|
| Lisi et al. “Additive Manufacturing Enables Microwave Components for Space Applications”, p. 8, paragraphs 1-2, Jun. 13, 2017. (Year: 2017). |
| KMLabs,“Femtosecond Laser”, first published on https://www.kmlabs.com/femtosecond, on Jun. 22, 2018. (Year: 2018). |
| Abdelmoneum et al., “Post-Fabrication Laser Trimming of Micromechanical Filters”, Technical Digest, IEEE Int. Electron Devices Mtg., San Francisco, California, Dec. 13-15, 2004, pp. 39-42. |
| Number | Date | Country | |
|---|---|---|---|
| 20180131069 A1 | May 2018 | US |
| Number | Date | Country | |
|---|---|---|---|
| 62418967 | Nov 2016 | US |
