1. Field of the Invention
This invention relates generally to electronic circuits and, more particularly, to temperature sensing and detecting circuits.
2. Description of the Related Art
A wafer fabrication process typically forms many identical integrated circuits upon each of several silicon wafers processed as a group (i.e., lot). Each integrated circuit is formed within a designated area of a wafer, and includes electronic devices electrically coupled by conductive traces called interconnect lines (i.e., interconnects). Interconnects are typically patterned from conductive layers formed on or above the surface of a silicon substrate. Following wafer fabrication, the individual integrated circuit dice are separated from the wafers, and each functional die is typically secured within a protective semiconductor device package.
Integrated circuits dissipate electrical power during operation, transforming electrical energy into heat energy. At the same time, several key operating parameters of an integrated circuit typically vary with temperature, and reliable device operation within specifications occurs only within a defined operating temperature range. For high performance devices, such as microprocessors, specified performance is only achieved when the temperature of the device is below a specified maximum operating temperature. Operation of the device at a temperature above the specified maximum operating temperature, may result in irreversible damage to the device. In addition, it has been established that the reliability of an integrated circuit decreases with increasing operating temperature. The heat energy produced by an integrated circuit during operation must thus be removed from the integrated circuit at a rate which ensures operational and reliability requirements are met.
The continued demand for higher performance microprocessors, aided by advances in integrated circuit fabrication and packaging technologies, has led to higher clock signal frequencies (i.e., increased clock signal speeds) and increased levels of integration. Despite shrinking device sizes, maximum microprocessor power dissipations continue to increase at exponential rates. As a result, it is becoming increasingly more difficult to operate high performance integrated circuits (e.g., microprocessors) such that maximum operating temperatures, specified by manufactures for the operational stability and reliability reasons described above, are not exceeded.
It would thus be beneficial to have a temperature detection circuit for detecting when a temperature exceeds a selected temperature. Such a temperature detection circuit may be, for example, formed on an integrated circuit die and used to keep a temperature of the die below a maximum operating temperature of the integrated circuit.
Temperature sensing circuits are disclosed. One embodiment of a temperature sensing circuit includes a voltage divider and an analog multiplexer. The voltage divider network divides an analog voltage into multiple derived analog voltages. The analog multiplexer receives at least two of the derived analog voltages and a control signal, and is configured to produce one of the received derived analog voltages dependent upon the control signal. Temperature detection circuits including the temperature sensing circuits are also disclosed.
For a more complete understanding of the present invention and the advantages thereof, reference is now made to the following Detailed Description taken in conjunction with the accompanying drawings, in which:
In the following discussion, numerous specific details are set forth to provide a thorough understanding of the present invention. However, those skilled in the art will appreciate that the present invention may be practiced without such specific details. In other instances, well-known elements have been illustrated in schematic or block diagram form in order not to obscure the present invention in unnecessary detail. Additionally, for the most part, details concerning network communications, electro-magnetic signaling techniques, and the like, have been omitted inasmuch as such details are not considered necessary to obtain a complete understanding of the present invention, and are considered to be within the understanding of persons of ordinary skill in the relevant art.
It is further noted that, unless indicated otherwise, all functions described herein may be performed in either hardware or software, or some combination thereof. In a preferred embodiment, however, the functions are performed by a processor, such as a computer or an electronic data processor, in accordance with code, such as computer program code, software, and/or integrated circuits that are coded to perform such functions, unless indicated otherwise.
Turning now to
In one embodiment, the entire temperature detection circuit 100 is formed on and in a surface of a semiconductor substrate of an integrated circuit die or “chip” (e.g., during a wafer fabrication process), and constitutes an “on-chip” thermal detection circuit for detecting when a temperature of the semiconductor substrate is above the selected temperature. The comparator 104 compares the two analog voltages produced by the temperature sensing circuit 102, and produces an output signal “TDET” of the temperature detection circuit 100. In general, the output signal TDET is in one voltage state (e.g., a low voltage state) when the temperature of the semiconductor substrate is below the selected temperature, and in another voltage state (e.g. a high voltage state) when the temperature of the semiconductor substrate is above the selected temperature. Thus the output signal TDET of the temperature detection circuit 100 is basically a digital signal indicative of whether the temperature of the semiconductor substrate is above the selected temperature.
It is noted that in other embodiments at least the temperature sensing circuit 102 of the temperature detection circuit 100 may be formed on or in, or thermally coupled to, a body, and the temperature detection circuit 100 may be used to detect when a temperature of the body is above the selected temperature.
The temperature sensing circuit 102 includes a differential amplifier 106, a first portion 110, a second portion 120, and a third portion 130. The structure of the temperature sensing circuit 102 will first be described, followed by a description of operation.
The first portion 110 includes a p-channel metal oxide semiconductor (PMOS) transistor 112 and a p-n junction element 114 connected in series. A source terminal of the PMOS transistor 112 is connected to a positive power supply voltage “VDD,” and a drain terminal of the PMOS transistor 112 is connected to a p-type terminal of the p-n junction element 114. An n-type terminal of the p-n junction element 114 is connected to a reference ground power supply voltage.
The PMOS transistor 112 receives an output analog voltage “VA” of the differential amplifier 106 at a gate terminal. The analog voltage VA establishes a current I1 through the series connected PMOS transistor 112 and p-n junction element 114. An analog voltage “VD1” is developed across the forward biased p-n junction element 114, and a current ID1 flows through the p-n junction element 114.
The second portion 120 includes a PMOS transistor 122, a resistor labeled “R1,” and m p-n junction elements 124, where m is generally greater than or equal to 2. The m p-n junction elements 124 are connected in parallel. The PMOS transistor 122 is connected in series with the resistor R1 and the m p-n junction elements 124. A source terminal of the PMOS transistor 122 is connected to the positive power supply voltage VDD, and a drain terminal of the PMOS transistor 122 is connected to one terminal of the resistor R1 at a node 126. The other terminal of the resistor R1 is connected to p-type terminals of the m p-n junction elements 124. N-type terminals of the m p-n junction elements 124 are connected to the reference ground power supply voltage. In one embodiment, the number of p-n junction elements 124 is 10 (m=10). The p-n junction element 114 and the m p-n junction elements 124 may be, for example, diodes. Alternately, the p-n junction element 114 and the m p-n junction elements 124 may be diode-connected bipolar transistors.
Like the PMOS transistor 112 of the first portion 110, the PMOS transistor 122 of the second portion 120 receives the output analog voltage VA of the differential amplifier 106 at a gate terminal. The analog voltage VA establishes a current I2 through the PMOS transistor 122, the resistor R1, and the p-n junction elements 124. In the embodiment of
An analog voltage “VB” is developed at the node 126 of the second portion 120, wherein VB=VR1+VD2. The analog voltage VB is provided to a positive “+” terminal of the differential amplifier 106, and the analog voltage VD1 produced by the first portion 110 is provided to a negative “−” terminal of the differential amplifier 106. In general, the output analog voltage VA of the differential amplifier 106 is stable when VB=VD1.
The third portion 130 includes a PMOS transistor 132 and a resistor labeled R2 connected in series. A source terminal of the PMOS transistor 132 is connected to the positive power supply voltage VDD, and a drain terminal of the PMOS transistor 132 is connected to one terminal of the resistor R2. The other terminal of the resistor R2 is connected to the reference ground power supply voltage.
Like the PMOS transistor 112 of the first portion 110 and the PMOS transistor 122 of the second portion 120, the PMOS transistor 132 of the third portion 130 receives the output analog voltage VA of the differential amplifier 106 at a gate terminal. The analog voltage VA establishes a current I3 through the PMOS transistor 132 and the resistor R2. In the embodiment of
In the embodiment of
Regarding the operation of the temperature sensing circuit 102, the p-n junction element 114 of the first portion 110 is forward biased. The relationship between the analog voltage VD1 across the p-n junction element 114 and the current ID1 through the p-n junction element 114 is given by the well know diode equation:
ID1=(Is)·{exp[(VD1)·(q/ηkT)]−1}
where “Is” is the saturation current, “q” is the electron charge, “η” is an empirical constant, “k” is Boltzmann's constant, and “T” is the absolute temperature of the p-n junction element 114 (in degrees Kelvin).
Assuming (VD1)·(q/ηkT) is much greater than 1, VD1 can be estimated as:
VD1=(ηkT/q)·ln(ID1/Is).
Although the absolute temperature T is in the numerator of the above equation for the analog voltage VD1, and might suggest that the analog voltage VD1 increases with increasing absolute temperature T of the p-n junction element 114, it is well-known that the saturation current Is increases with increasing temperature. As a result, the analog voltage VD1 across the p-n junction element 114 decreases linearly with increasing absolute temperature T of the temperature sensing circuit 102. In the embodiment of
The m p-n junction elements 124 of the second portion 120 are also forward biased, and similar equations apply. It was noted above that I1=I2=I3. Using:
I1=ID1=(Is)·{exp[(VD1)·(q/ηkT)]−1}, and
I2=m·ID2=m·(Is)·{exp[(VD2)·(q/ηkT)]−1},
it can be shown that:
VD1=ln(m)·(ηkT/q)+VD2.
It was also noted above that the output analog voltage VA of the differential amplifier 106 is stable when VB=VD1, and that the analog voltage VB developed at the node 126 of the second portion 120 is given by VB=VR1+VD2. Thus:
VR1=VB−VD2=ln(m)·(ηkT/q).
It is noted that the analog voltage VR1 developed across the resistor R1 in the second portion 120 is directly proportional to the absolute temperature T of the temperature sensing circuit 102, and is dependent upon m, the number of the p-n junction elements 124. That is, VR1 increases linearly with increasing absolute temperature T of the temperature sensing circuit 102, and VR1 increases with increasing m.
In the third portion 130, VR2=I3·R2. It is also true the I3=I2, I2=VR1/R1, and VR1=ln(m)·(ηkT/q). Thus:
VR2=(VR1/R1)·R2=VR1·(R2/R1)=ln(m)·(ηkT/q)·(R2/R1).
It is noted that the analog voltage VR2 produced across the resistor R2 in the third portion 130 is directly proportional to the analog voltage VR1 developed across the resistor R1 in the second portion 120. Thus like the analog voltage VR1, the analog voltage VR2 increases linearly with increasing absolute temperature T of the temperature sensing circuit 102. The values of the resistors R1 and R2 can advantageously be selected to achieve a desired rate of change of the analog voltage VR2 with the absolute temperature T of the temperature sensing circuit 102. Further, in the embodiment of
In the embodiment of
The comparator 104 produces the output signal TDET having a low voltage state (e.g., substantially the reference ground power supply voltage) when a magnitude of the analog voltage VD1 is greater than a magnitude of the analog voltage VR2 (i.e., when the temperature of the temperature sensing circuit 102 is less than the selected temperature). The output signal TDET is in a high voltage state (e.g., substantially the positive power supply voltage VDD) when the magnitude of the analog voltage VR2 is greater than the magnitude of the analog voltage VD1 (i.e., the temperature of the temperature sensing circuit 102 is greater than the selected temperature). The output signal TDET is basically a digital signal indicative of whether the temperature of the temperature sensing circuit 102 is above the selected temperature.
In the ideal case of
After fabrication of the temperature detection circuit 100 of
Like the temperature detection circuit 100 of
In one embodiment, the entire temperature detection circuit 700 is formed on (and in) a surface of a semiconductor substrate of an integrated circuit die or chip (e.g., during a wafer fabrication process), and constitutes an on-chip thermal detection circuit for detecting when a temperature of the semiconductor substrate is above the selected temperature. The comparator 104 compares the two analog voltages produced by the temperature sensing circuit 702, and produces the output signal TDET such that the output signal TDET is in one voltage state (e.g., a low voltage state) when the temperature of the semiconductor substrate is below the selected temperature, and in another voltage state (e.g. a high voltage state) when the temperature of the semiconductor substrate is above the selected temperature. Thus the output signal TDET of the temperature detection circuit 700 is basically a digital signal indicative of whether the temperature of the semiconductor substrate is above the selected temperature.
It is noted that in other embodiments at least the temperature sensing circuit 702 of the temperature detection circuit 700 may be formed in, or thermally coupled to, a body, and the temperature detection circuit 700 may be used to detect when a temperature of the body is above the selected temperature.
The temperature sensing circuit 702 includes the differential amplifier 106, the first portion 110, the second portion 120, and a third portion 730. The structures and operations of the first portion 110 and the second portion 120 are described above.
In the embodiment of
Like the PMOS transistor 112 of the first portion 110 and the PMOS transistor 122 of the second portion 120, the PMOS transistor 732 of the third portion 730 receives the output analog voltage VA of the differential amplifier 106 at a gate terminal. The analog voltage VA establishes a current I3 through the PMOS transistor 732 and the n resistors of the voltage divider network 734. In the embodiment of
The voltage divider network 734 divides the analog voltage VR2 into n analog voltages signals “VREF1,” “VREF2,” . . . “VREFn.” The analog voltage signal VREF1 is produced at a node where the drain terminal of the PMOS transistor 732 is connected to the terminal of the resistor R21 of the voltage divider network 734, and VREF1=VR2. The analog voltage signal VREF2 is produced at a node between the other terminal of the resistor R21 and a terminal of the resistor R22 of the voltage divider network 734. The analog voltage signal VREFn is produced at a node between a terminal of a resistor R2(n-1) and a terminal of the resistor R2n.
In one embodiment, the resistances of the resistors R21, R22, . . . , R2n are substantially equal, and an analog voltage VREFk produced by the voltage divider network 734 is substantially equal to VR2·[(n−k−1)/n] where k is between 1 and n. In other embodiments the resistors R21, R22, . . . , R2n may have different values. In one particular embodiment, the resistances of the resistors R21, R22, . . . , R2(n-1) are substantially equal, and the resistor R2n is a base resistor having a value that differs from the other resistors.
In the embodiment of
In the embodiment of
Again, as the total resistance of the voltage divider network 734 is R2, the analog voltage VR2 developed across the voltage divider network 734 is given by VR2=I3·R2. It is also true the I3=I2, I2=VR1/R1, and VR1=ln(m)·(ηkT/q). Thus:
VR2−(VR1/R1)·R2=VR1·(R2/R1)=ln(m)·(ηkT/q)·(R2/R1).
Accordingly, in the embodiment where the resistances of the resistors R21, R22, . . . , R2n are substantially equal, the analog voltage signal VREFk produced by the voltage divider network 734 is substantially equal to ln(m)·(ηkT/q)·[(n−k−1)/n] where k is between 1.
It is noted that the values of the resistor R1 and the total resistance R2 of the voltage divider network 734 can advantageously be selected to achieve a desired rate of change of the analog voltage VR2 with the absolute temperature T of the temperature sensing circuit 702. Further, in the embodiment of
In the embodiment of
In one embodiment, the SEL control signal provided to the analog multiplexer 736 is a digital signal including int[log2(n)] bits, wherein the “int” operation returns the smallest integer “i” wherein 2i is greater than or equal to n. The bit(s) of the SEL control signal are ordered, and specify a corresponding value. In general, the SEL control signal has a corresponding value between 0 and 2i−1. For example, a 4-bit SEL control signal may be denoted “SEL<0:3>,” where bit SEL<0> is the most significant bit, and SEL<3> is the least significant bit. The corresponding value of the SEL<0:3> control signal is: (SEL<0>)·23+(SEL<1>)·22+(SEL<2>)·21+(SEL<3>). Thus the 4-bit SEL control signal SEL<0:3> specifies a value between 0 and 15.
During the design of the temperature detection circuit 700 of
n={[(TE+)+(TE−)]/(desired accuracy)−1}.
For example, assume the temperature detection circuit 700 of
n={[(16)+(14)]/(2)−1}=14.
The SEL control signal is to have i bits, where:
i=int[log2(14)]=4.
After fabrication of the temperature detection circuit 700 of
Having thus described the present invention by reference to certain of its preferred embodiments, it is noted that the embodiments disclosed are illustrative rather than limiting in nature and that a wide range of variations, modifications, changes, and substitutions are contemplated in the foregoing disclosure and, in some instances, some features of the present invention may be employed without a corresponding use of the other features. Many such variations and modifications may be considered desirable by those skilled in the art based upon a review of the foregoing description of preferred embodiments. Accordingly, it is appropriate that the appended claims be construed broadly and in a manner consistent with the scope of the invention.
This application relates to co-pending U.S. patent applications Ser. No. 10/982,019 entitled “INTEGRATED CIRCUIT DIE INCLUDING A TEMPERATURE DETECTION CIRCUIT, AND SYSTEM AND METHODS FOR CALIBRATING THE TEMPERATURE DETECTION CIRCUIT,” Docket No. AUS920040412US1, filed Nov. 5, 2004, and to “METHOD AND APPARATUS FOR ON-CHIP DYNAMIC TEMPERATURE TRACKING,” Docket No. AUS920041094US1, filed concurrently herewith.