Claims
- 1. A thermal developing light-sensitive material comprising:
- (a) a support; and
- (b) one or more photographic structural layers provided on the support and including at least one layer containing light-sensitive silver-halide, said one or more photographic structural layers containing
- (i) a reducing agent,
- (ii) a compound represented by formula (1);
- Formula (1)
- X.sub.1 --L.sub.1 --A
- wherein X.sub.1 represents a residual group of a photographic fog restrainer, L.sub.1 is a valency bond or a divalent group, and A is selected from the group consisting of a hydrogen atom, an amino group, a hydroxyl group, a carboxyl group or a salt thereof, a sulfo group or a salt thereof, and a sulfin group or a salt thereof; and
- (iii) a compound represented by formula (2);
- Formula (2)
- X.sub.2 --L.sub.2 --B
- wherein X.sub.2 represents a residual group of a photographic fog restrainer, L.sub.2 is a divalent group selected from the group consisting of an alkylene group having 1 to 7 carbon atoms, an alkenylene group, an arylene group, an imino group, a carbonyl group, a sulfonyl group, an ether group, and mixtures thereof, and B is a ballast group wherein said ballast group is an aliphatic or aromatic hydrocarbon group having at least 8 carbon atoms.
- 2. The thermal developing light-sensitive material of claim 1, wherein said residual group of a photographic fog restrainer is selected from a residual group of an organic compound of which silver salt has a pKsp (-log Ksp) of more than 10, provided that Ksp is a solubility product thereof in water of 25.degree. C.
- 3. The thermal developing light-sensitive material of claim 1, wherein said residual group represented by X.sub.1 or X.sub.2 is a mono-valent residue of a photographic fog restrainer represented by formula (4) or (8) below; ##STR83## wherein R.sup.1 is selected from the group consisting of a hydrogen atoms, an alkyl group having 1 to 7 carbon atoms, and an aryl group, n is 1 or 2, R.sup.2 and R.sup.3 are independently selected from the group consisting of of a hydrogen atom, an alkyl group having 1 to 7 carbon atoms, an aryl group having 1 to 7 carbon atoms and a nitro group provided that R.sup.2 and R.sup.3 may be combined with each other to form a 5- or 6-membered ring; ##STR84## wherein Y is selected from the group consisting of oxygen, sulfur, a ##STR85## group and a ##STR86## group, R.sup.1 is a thiol group or a --NHR.sup.4 group, R.sup.2 and R.sup.3 are independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 7 carbon atoms, an aryl group having 1 to 7 carbon atoms and a nitro group provided that R.sup.2 and R.sup.3 may be combined with each other to form a 5- or 6-membered ring and R.sup.4 is selected from the group consisting of a hydrogen, an alkyl group having 1 to 7 carbon atoms and an aryl group.
- 4. The thermal developing light-sensitive material of claim 1, wherein L.sub.1 in formula (1) and is selected from the group consisting of an alkylene group having 1 to 7 carbon atoms, an alkenylene group, an arylene group, an imino group, a carbonyl group, a sulfonyl group, an ether group and any combination thereof.
- 5. The thermal developing light-sensitive material of claim 1, wherein said compound represented by general formula (1) is selected from the group of compounds represented by formula (19); ##STR87## wherein, L.sub.1 ' and A' respectively have the same meanings as L.sub.1 and A in formula (1) and Y is a nitrogen atom or a carbon atom.
- 6. The thermal developing light-sensitive material of claim 1, wherein said ballast group has 8 to 40 carbon atoms.
- 7. The thermal developing light-sensitive material of claim 1, wherein said ballast group is an alkyl group having 8 to 40 carbon atoms.
- 8. The thermal developing light-sensitive material of claim 1, wherein said ballast group is an alkyl group substituted by a hydrophilic group consisting of a sulfo group and having 8 to 30 carbon atoms.
- 9. The thermal developing light-sensitive material of claim 1, wherein said compound represented by formula (1) is contained in said material in a quantity of 10.sup.-7 to 10.sup.-1 mol with respect to 1 mol of said light-sensitive silver halide.
- 10. The thermal developing light-sensitive material of claim 9, wherein said compound represented by formula (1) is contained in said material in a quantity of 10.sup.-5 to 10.sup.-2 mol with respect to 1 mol o f said light-sensitive silver halide.
- 11. The thermal developing light-sensitive material of claim 1, wherein said compound represented by formula (2) is contained in said material in a quantity of 10.sup.-5 to 10.sup.-1 mol with respect to 1 mol of said light-sensitive silver halide.
- 12. The thermal developing light-sensitive material of claim 11, wherein said compound represented by formula (2) is contained in said material in a quantity of 10.sup.-4 to 10.sup.-2 mol with respect to 1 mol of said light-sensitive silver halide.
Priority Claims (2)
Number |
Date |
Country |
Kind |
61-187089 |
Aug 1986 |
JPX |
|
62-180856 |
Jul 1987 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 07,277,503, filed Nov. 28, 1988, now abandoned, which is a continuation of application Ser. No. 07/082,288, filed Aug. 6, 1987, now abandoned.
US Referenced Citations (13)
Foreign Referenced Citations (1)
Number |
Date |
Country |
0218385 |
Apr 1987 |
EPX |