Claims
- 1. A thermally developable light-sensitive material which has at least one light-sensitive silver halide layer containing a reducing agent and a dye-providing material on a color support and which further contains a compound represented by the general formula (I):
- X((J).sub.m F).sub.n (I)
- wherein X is a development restrainer residue capable of functioning without being released from said compound; J is a divalent linkage; F is an immobilizing group that is capable of reducing the diffusibility of the compound of formula (I) or a silver salt or silver complex thereof during thermal development; m is 0 or 1; and n is an integer of 1 to 3.
- 2. A thermally developable light-sensitive material according to claim 1 wherein the immobilizing group denoted by F in the formula (I) is a ballast group.
- 3. A thermally developable light-sensitive material according to claim 1 wherein the immobilizing group denoted by F in the formula (I) is a polymer residue having a building block derived from an ethylenically unsaturated group or a group having an ethylenically unsaturated group.
- 4. A thermally developable light-sensitive material according to claim 1 wherein the residue of development restrainer denoted by X in formula (I) is the residue of an organic compound represented by one of the following general formulas (1) to (17): ##STR80## (where R.sup.1 and R.sup.2 are each a hydrogen atom, an alkyl group or an aryl group; and M is a hydrogen atom, an alkali metal atom, an ammonium group or an organic amino residue); ##STR81## (where R.sup.1 is an alkyl group, an aryl group or a hydrogen atom; and M has the same meaning as M in formula (1)); ##STR82## (where R.sup.1 is a hydrogen atom, an alkyl group, an aryl group or ##STR83## where n is 1 or 2; R.sup.2 and R.sup.3 are each a hydrogen atom, an alkyl group, an aryl group or a nitro group, provided that R.sup.2 may combine with R.sup.3 to form a 5- or 6-membered ring) ##STR84## (where R.sup.1 is an alkyl group, an aryl group or a hydrogen atom; R.sup.2 and R.sup.3 are each a hydrogen atom, an alkyl group, an aryl group or a nitro group, provided that R.sup.2 may combine with R.sup.3 to form a 5- or 6-membered ring); ##STR85## (where Y is ##STR86## --O-- or --S--; R.sup.1 is an alkyl group, an aryl group or a hydrogen atom; and M has the same meaning as M in formula (1)); ##STR87## (where Y is --O--, --S--, ##STR88## or ##STR89## R.sup.1 and R.sup.4 are each an alkyl group, an aryl group or a hydrogen atom; R.sup.2 and R.sup.3 are each a hydrogen atom, an alkyl group, an aryl group or a nitro group, provided that R.sup.2 may combine with R.sup.3 to form a 5- or 6-membered ring); ##STR90## (where Y has the same meaning as Y in formula (6); R.sup.1 and R.sup.2 have the same meanings as R.sup.2 and R.sup.3 in formula (6); and M has the same meaning as M in formula (1)); ##STR91## (where R.sup.1 and R.sup.2 are each a hydrogen atom, an alkyl group, an aryl group, a nitro group or a halogen atom, provided that R.sup.1 may combine with R.sup.2 to form a 5- or 6-membered ring); ##STR92## (where R.sup.1, R.sup.2 and R.sup.3 are each an alkyl group, an amino group, an alkoxy group, a thioalkoxy group, --SM where M has the same meaning as M in formula (1), a hydroxyl group or a hydrogen atom); ##STR93## (where R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are each a hydrogen atom, an alkyl group, an aryl group, R.sup.6 --NH-- where R.sup.6 is a hydrogen atom, an alkyl grup or an aryl grup, --SM where M has the same meaning as M in formula (1), an alkylthio group, a hydroxyl group or an alkoxy group); ##STR94## (where R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each has the same meaning as R.sup.1 to R.sup.5 in formula (10)); ##STR95## (where R.sup.1 and R.sup.2 are each an alkyl group or a hydrogen atom; and M has the same meaning as M in formula (1)) ##STR96## (where R.sup.1 and R.sup.2 are each an alkyl group, an aryl group or a hydrogen atom, provided that R.sup.1 may combine with R.sup.2 to form a 5- or 6-membered ring); ##STR97## (where R.sup.1, R.sup.2 and R.sup.3 are each an alkyl group, an aryl group or a hydrogen atom, provided that R.sup.1 may combine with R.sup.2 to form a 5- or 6-membered ring; Y is --O--, --S-- or ##STR98## where R.sup.4 is a hydrogen atom or an alkyl group); ##STR99## (where R.sup.1 is an alkyl group, an aryl group or a hydrogen atom; Y is --O--, --S-- or ##STR100## where R.sup.3 is a hydrogen atom or an alkyl group; and M has the same meaning as M in formula (1)); ##STR101## (where Y is ##STR102## or .dbd.N-- where R.sup.3 is a hydrogen atom or an alkyl group; R.sup.1 and R.sup.2 are each an alkyl group, an aryl group or a hydrogen atom, provided that R.sup.1 and R.sup.2 may combine with each other to form a 5- or 6-membered ring; and M has the same meaning as M in formula (1)); ##STR103## (where R.sup.1, R.sup.2 and R.sup.3 have the same meanings as R.sup.1 to R.sup.3 in formula (14) and Y.sup..crclbar. is a counter anion).
- 5. A thermally developable light-sensitive material according to claim 4 wherein the residue of development restrainer denoted by X in formula (I) is the residue of a nitrogenous hetero ring having an --SM group where M is a hydrogen atom, an alkali metal, an ammonium group or an organic amino residue.
- 6. A thermally developable light-sensitive material according to claim 2 wherein n in formula (I) is 1.
- 7. A thermally developable light-sensitive material according to claim 6 wherein the ballast group is an organic group having 8-40 carbon atoms.
- 8. A thermally developable light-sensitive material according to claim 6 wherein the ballast group is an alkyl group having 8-30 carbon atoms which is unsubstituted or substituted by a hydrophilic group.
- 9. A thermally developable light-sensitive material according to claim 3 wherein m and n in formula (I) are 0 and 1, respectively.
- 10. A thermally developable light-sensitive material according to claim 9 wherein the ethylenically unsaturated group is represented by the following general formula (18): ##STR104## where R is a hydrogen atom, a carboxyl group or an alkyl group, provided that if R is a carboxyl group, said carboxyl group may form a salt; J.sub.1 and J.sub.2 are each a divalent linkage; X.sub.1 and X.sub.2 are each a divalent hydrocarbon group; k, l.sub.1, m.sub.1 l.sub.1 and m.sub.2 are each 0 or 1.
- 11. A thermally developable light-sensitive material according to claim 1 wherein the residue of development restrainer denoted by X in formula (I) contains a compound represented by the following general formula (19) or (20), said material further containing a compound represented by the following general formula (II), (III) or (IV): ##STR105## where X.sup.1 is --O--, --S--, --SE or >N(L.sub.3).sub.n4 R.sub.9 ; Z.sub.1 represents the nonmetallic atomic group necessary for forming a 5- or 6-membered heterocyclic ring (including the case where unsaturated rings are condensed); L.sub.3 is a divalent group; n.sub.4 is 0 or 1; R.sub.9 is a hydrogen atom, a halogen atom, a mercapto group, a hydroxyl group, a carboxylic acid group or a salt thereof, a sulfonic acid group or a salt thereof, an alkyl group or an aryl group; R.sub.8 is a hydrogen atom, an alkali metal ion, a quaternary ammonium ion or a quaternary phosphonium ion; ##STR106## where X.sub.2 is a carbon or nitrogen atom participating in the formation of an unsaturated ring; Z.sub.2 represents the nonmetallic atomic group necessary for forming a 5- or 6-membered heterocyclic ring (including the case where unsaturated rings are condensed); ##STR107## where Y.sub.1, Yhd 2, Y.sub.3 and Y.sub.4 are each a hydrogen atom, a halogen atom, an acyl group, an acylamido group, an acyloxy group, an alkoxycarbonyl group, an aryloxycarbonyl group, an alkoxycarbonylamino group, a cyano group, a sulfonyl group, an alkyl group or an aryl group, provided that Y.sub.1 and Y.sub.2 (and/or Y.sub.3 and Y.sub.4) may combine with each other to form a naphthodiazole ring; R.sub.1 is a hydrogen atom or an alkyl group; R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each an alkyl or alkenyl group; X.sup..crclbar. is an anion; n1 is 0 or 1, provided that when n1 is 0, R.sub.2, R.sub.3, R.sub.4 or R.sub.5 represents a group capable of forming an intramolecular salt; ##STR108## where R.sub.1 is a halogen atom, an alkyl group, an aryl group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an alkylsulfonyl group, an arylsulfonyl group, an alkylamino group, an arylamino group, a carbamoyl group, an acylamino group, an alkoxy group, a sulfamoyl group, a sulfonic acid group or a salt thereof, a carboxylic acid group or a salt thereof, or a nitro group; R.sub.2 and R.sub.3 are each a hydrogen atom or a protective group that is eliminated upon decomposition; and n is an integer of 1 to 4; ##STR109## where R.sub.4 is a hydrogen atom, an alkyl group, an acyl group, an alkylsulfonyl group, an arylsulfonyl group, an alkylaminosulfonyl group or an arylaminosulfonyl group; R.sub.5 is a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an acylamino group or a sulfamoyl group; R.sub.6 is a hydrogen atom or a protective group that will be eliminated upon decomposition; Z is (R.sub.5).sub.2 or the atomic group necessary for forming a condensed carbon ring, provided that when Z is (R.sub.5).sub.2, R.sub.5 may be the same or different; R.sub.7 is a group having no less than 7 carbon atoms; m is an integer of 0 to 2; and n is 0 or 1.
- 12. A thermally developable light-sensitive material according to claim 1 which further contains an organic silver salt and a binder.
- 13. A thermally developable light-sensitive material according to claim 1, wherein the residue of development restrainer denoted by X in formula (I) is the residue of an organic compound which forms a silver salt having a solubility product (pKsg) of 10 or more in water at 25 C.
- 14. A thermally developable light-sensitive material according to claim 17, wherein the residue of development restrainer denoted by X in formula (I) is the residue of an organic compound which forms a silver salt having a solubility product (pKsg) of 10 or more in water at 25 C.
- 15. A thermally developable light-sensitive material according to claim 2, wherein the residue of development restrainer denoted by X in formula (I) is the residue of an organic compound which forms a silver salt having a solubility product (pksg) of 10 or more in water at 25 C.
- 16. A thermally developable light-sensitive material according to claim 3, wherein the residue of development restrainer denoted by X in formula (I) is the residue of an organic compound which forms a silver salt having a solubility product (pKsg) of 10 or more in water at 25 C.
- 17. The thermally developable light-sensitive material of claim 1 wherein the immobilizing group denoted by F in formula (I) is a hydrophilic group chosen from the group consisting of a hydroxyl group, a carboxyl group or a salt thereof, a sulfo group or a salt thereof, and a sulfinic acid group or a salt thereof.
Priority Claims (5)
Number |
Date |
Country |
Kind |
60-205129 |
Sep 1985 |
JPX |
|
60-218769 |
Oct 1985 |
JPX |
|
60-232263 |
Oct 1985 |
JPX |
|
60-262177 |
Nov 1985 |
JPX |
|
60-263564 |
Nov 1985 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 907,670, filed Sept. 15, 1986, now abandoned.
US Referenced Citations (7)
Number |
Name |
Date |
Kind |
3832186 |
Masuda et al. |
Aug 1974 |
|
4511644 |
Okamura et al. |
Apr 1985 |
|
4546073 |
Bergtholler et al. |
Oct 1985 |
|
4546075 |
Kitaguchi et al. |
Oct 1985 |
|
4584257 |
Okamura et al. |
Apr 1986 |
|
4607004 |
Ikenoue et al. |
Aug 1986 |
|
4610957 |
Kato et al. |
Sep 1986 |
|
Continuations (1)
|
Number |
Date |
Country |
Parent |
907670 |
Sep 1986 |
|