Patent Application
20170294298
The present invention disclosed herein relates to a time-of-flight mass spectrometer, and more particularly, to a time-of-flight mass spectrometer using a cold electron beam as an ionization source.
Time-of-flight mass spectrometers can ionize molecules having masses different from each other in a sample and measure current of generated ions. Time-of-flight mass spectrometers may be classified into various types according to methods of separating ions.
A time-of-flight mass spectrometer is one of mass spectrometers. Time-of-flight mass spectrometers can measure masses of ions by using time-of flight of the ions. For an accurate mass spectrometry, a difference in ionizing time is minimized and electrons are thereby allowed to collide with a sample.
The present invention provides a time-of-flight mass spectrometer having a high accuracy.
The present invention also provides a time-of-flight mass spectrometer suitable to be made smaller.
However, the problems to be solved by the present invention are not limited to the above disclosure.
Embodiments of the present invention provide time-of-flight mass spectrometers including: an ionization part receiving electron beams to thereby emit ions; a cold electron supply part injecting the electron beams to the ionization part; an ion detection part detecting the ions emitted from the ionization part; and an ion separation part connecting the ionization part and the ion detection part, wherein the cold electron supply part includes a microchannel plate receiving ultraviolet rays to thereby emit the electron beams, the ions emitted from the ionization part pass through the ion separation part to thereby reach the ion detection part, and the ion separation part has a straight tube shape.
In an embodiment, the cold electron supply part may further include an ultraviolet diode emitting the ultraviolet rays toward the microchannel plate.
In an embodiment, the microchannel plate may include: a front surface plate receiving the ultraviolet rays to thereby generate electrons; and a rear surface plate emitting the electron beams, wherein the electron beams may be electrons multiplied in the microchannel plate.
In an embodiment, the multiplication ratio may be about 104 times to about 109 times.
In an embodiment, the cold electron supply part may further include a channeltron electron multiplier multiplying the electron beams emitted from the microchannel plate.
In an embodiment, the channeltron electron multiplier may multiply the electron beams emitted from the microchannel plate by about 104 times to about 109 times.
In an embodiment, the cold electron supply part further may include an ion lens focusing the electron beams multiplied through the channeltron electron multiplier to thereby emit the electron beams toward the ionization part.
In an embodiment, the cold electron supply part may further include a gate electrode blocking or allowing the electron beams emitted from the ion lens to be injected into the ionization part.
In an embodiment, the ion detection part may receive the ions to thereby generate, amplify, and detect electrons and may include a microchannel plate or channeltron electron multiplier which amplifies the electrons.
In an embodiment, the time-of-flight mass spectrometer may have an inner space in vacuum.
In an embodiment, the time-of-flight mass spectrometer may have a pressure of about 10−10 Torr to about 10−4 Torr in the inner space.
In an embodiment, the ionization part may include: a sample part on which the sample collides with the electron beams to thereby generate ions; and a sample supply part supplying the sample on the sample part.
In an embodiment, the sample supply part may spray a gas sample to the sample part and the gas sample may be adsorbed on an upper surface of the sample part.
In an embodiment, the sample supply part may supply the gas sample on the sample part through a pulse method.
In an embodiment, the sample supply part may spray a gas sample to the sample part and the gas sample may be adsorbed on an upper surface of the sample part.
According to an embodiment of the present invention, a time-of-flight mass spectrometer in which differences in ionization times of ions are small may be provided. Accordingly, the accuracy of the time-of-flight mass spectrometer may be high.
According to an embodiment of the present invention, time-of-flight mass spectrometers which have small power consumption and high accuracy may be provided. Accordingly, time-of-flight mass spectrometers suitable for miniaturization may be provided.
However, the effects of the present invention are not limited to the above disclosure.
For sufficient understanding of the configuration and effects of the present invention, exemplary embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. The present invention may, however, be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present disclosure to those skilled in the art.
Referring to
The ultraviolet diode 110 may radiate ultraviolet rays toward the microchannel plate 120. Since the ultraviolet diode 110 uses current of several to several hundred mA level for several to several hundred micro-seconds, power consumption thereof may be small.
The microchannel plate 120 facing the ultraviolet diode 110 may be provided. The microchannel plate 120 may generate, multiply, and emit electron beams ‘e’ by using ultraviolet rays. The microchannel plate 120 may have a front surface plate 122 facing the ultraviolet diode 110 and a rear surface plate 124 disposed on the side opposite to the front surface plate 122. The front surface plate 122 may accommodate ultraviolet rays provided from the ultraviolet diode 110 to thereby generate photoelectrons. The front surface plate 122 may have a negative voltage. For example, the voltage of the front surface plate 122 may be about −3000 V to about −1000V. Photoelectrons may be multiplied inside the microchannel plate. Multiplied photoelectrons may be referred to as electron beams ‘e’. In an example, electron beams ‘e’ may be multiplied about 104 to about 109 times more than photoelectrons. The rear surface plate 124 may emit the multiplied electron beams ‘e’. The rear surface plate 124 may have a negative voltage. For example, the voltage of the rear surface plate 124 may be about −3000 V to about −1000V. The rear surface plate 124 may emit the electron beams ‘e’ toward the channeltron electron multiplier 130.
The channeltron electron multiplier 130 may multiply the electron beams ‘e’ provided from the microchannel plate 120. The channeltron electron multiplier 130 may include an injection port 132, a first electrode 133, a multiflying tube 136, a second electrode 134, and an outlet port 138, which are sequentially disposed in this order. The electron beams ‘e’ may be multiplied through the injection port 132, the multiplying tube 136, and the outlet port 138. In an example, electron beams ‘e’ may be multiplied by about 104 to about 109 times.
The injection port 132 may be disposed adjacent to the rear surface plate 124 of the microchannel plate 120. The injection port 132 may have a conical shape. The injection port 132 may receive the electron beams ‘e’ from the microchannel plate 120. to thereby multiply the electron beams ‘e’. The first electrode 133 may apply a negative voltage to the injection port 132. In an example, the first electrode 133 may apply a voltage substantially the same as the voltage of the rear surface plate 124 of the microchannel plate 120. For example, the voltage which the first electrode 133 applies to the injection port 132 may be about −3000V to about −1000 V. The multiplying tube 136 and the outlet port 138 may multiply the electron beams ‘e’. The second electrode 134 may apply a negative voltage to the outlet port 138. In an example, the second electrode 134 may apply a voltage higher than the voltage of the rear surface plate 124 to the outlet port 138. For example, the voltage which the second electrode 134 applies to the outlet port 138 may be about −200 V to about 0 V.
The inlet electrode 140 may increase the linearity of the electron beams ‘e’ in the channeltron electron multiplier 130 to thereby direct the electron beams ‘e’ toward the outlet port 138. Accordingly, the electron beams ‘e’ in the channeltron electron multiplier 130 may be emitted to the outside of the outlet port 138 without loss. In an example, the voltage of the inlet electrode 140 may be about −200 V to about 0V. The ion lens 150 may focus the electron beams ‘e’ emitted from the outlet port 138. The ion lens 150 may have a negative voltage. In an example, the ion lens 150 may have a voltage higher than the voltage applied to the rear surface plate 124 of the microchannel plate 120. The gate electrode 160 may block or allow the electron beams ‘e’ which have passed through the ion lens 150 to be injected into an ionization part 200. For example, the gate electrode 160 may have on/off states. While the gate electrode 160 is in an on-state, the electron beams ‘e’ having passed through the ion lens 150 may pass through the gate electrode 160 to thereby be injected into the ionization part 200. While the gate electrode 160 is in an off-state, the electron beams ‘e’ having passed through the ion lens 150 may not be injected into the ionization part 200.
An ionization part 200 generating ions I may be provided. Ions I may be generated by using the electron beams ‘e’ injected from the cold electron supply part 100. The ionization part 200 and the cold electron supply part 100 may share an inner space. Accordingly, the ionization part 200 may have a vacuum state substantially the same as the cold electron supply part 100. In an example, the inner space of the ionization part 200 may have a pressure of about 10−10 Torr to about 10−4 Torr. The ionization part 200 may include a sample part 210 in which a sample is disposed; and a mesh part 220 spaced apart from the sample part 210 in the direction perpendicular to the surface of the sample part 210. The mesh part 220 enables ions I emitted from the sample part 210 to have linearity. The mesh part 220 may have a grid shape. The ions I may pass through the mesh part 220.
A positive voltage may be applied to the sample part 210, and a negative voltage may be applied to the mesh part 220. Accordingly, an electric field may be formed between the sample part 210 and the mesh part 220. The electric field may have a direction from the sample part 210 toward the mesh part 220. The electron beams ‘e’ injected into the ionization part 200 may be bent toward the sample part 210 by being forced by an electric field in the direction toward the sample part 210. A sample on the sample part 210 collides with the electron beams ‘e’ to thereby emit ions I.
In an example, a gas sample G may be injected on the sample part 210. For example, the gas sample G may be injected on the sample part 210 through a pulse method. The gas sample G may be adsorbed on the surface of the sample part 210. The sample adsorbed on the surface of the sample part 210 may collide with the electron beams ‘e’ injected in the cold electron supply part 100. Accordingly, ions I may be emitted from the sample. Ions I may include ions I having masses different from each other according to the composition of the sample. The ions I assume positive charges and may be forced in the direction from the sample part 210 toward the mesh part 220. The ions I may move to an ion separation part 300 through the mesh part 220. In an example, two or more mesh parts 220 may be provided. At this time, the mesh parts 220 may be disposed parallel to each other.
An ion separation part 300 in which ions I having passed through the mesh part 220 are injected may be provided. The ion separation part 300 may have a straight tube shape. The ion separation part 300 may share an inner space with the ionization part 200 and the cold electron supply part 100 to thereby have a vacuum state. In an example, the inner space of the ion separation part 300 may have a pressure of about 10−10 Torr to about 10−4 Torr. The ions I generated in the ionization part may move to the ion detection part 400 through the ion separation part 300. The ion separation part 300 may extend from the surface of the sample part 210 in the direction perpendicular to the surface. The moving speed of ions I having relatively small masses may be faster than those of ions I having relatively great masses. The ions I having masses different from each other may have ion separation part-passing times different from each other.
An ion detection part 400 detecting the ions I having passed through the ion separation part 300 may be provided. The ion detection part 400 may share an inner space with the ion separation part 300, the ionization part 200 and the cold electron supply part 100 to thereby have a vacuum state. In an example, the inner space of the ion detecting 400 may have a pressure of about 10−10 Torr to about 10−4 Torr. In an example, the ion detecting 400 may include a microchannel plate (not shown) and/or a channeltron electron multiplier (not shown). At this time, the microchannel plate and the channeltron electron multiplier may be substantially the same as the microchannel plate 120 and the channeltron electron multiplier 130 which are included in the cold electron supply part 100. For example, ions I may be injected into the microchannel plate and/or the channeltron electron multiplier to thereby induce electrons. Electrons are amplified in the microchannel plate and/or the channeltron electron multiplier to be thereby detected by a detection circuit (not shown). When ions I having relatively small masses and ions I having relatively great masses simultaneously enter the ion separation part 300, the ions I having relatively small masses may be detected earlier than the ions I having relatively great masses. The longer the length of the ion separation part 300, the greater the difference in times within which the ions I having different masses different from each other be detected.
The smaller the difference in an ionizing time within which molecules having masses different from each other collides with electron beams ‘e’ to emit ions, the higher the accuracy of a time-of-flight mass spectrometer. When cold electrons are used as an ionization source, the differences in the ionizing time of the ions having masses different from each other may be several to several hundred nanoseconds. Accordingly, a time-of-flight mass spectrometer including the cold electron supply part 100 may have a high accuracy.
Even when the length of the ion separation part 300 by using cold electrons as ionization source is formed smaller that that in the case of using an ionization source other than cold electrons, a time-of-flight mass spectrometer having a required accuracy may be obtained. Accordingly, a time-of-flight mass spectrometer suitable for miniaturization may be provided. In addition, the time-of-flight mass spectrometer according to an exemplary embodiment may have small power consumption by using a ultraviolet diode.
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The above description on embodiments of the present invention provides exemplary examples for describing the present invention. Thus, the present invention is not limited to the above-described embodiments, and it would be clarified that various modifications and changes, for example, combinations of the above embodiments, could be made by those skilled in the art within the technical spirit and scope of the present invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10-2014-0194149 | Dec 2014 | KR | national |
| 10-2015-0171695 | Dec 2015 | KR | national |
This application is a 371 of International Patent Application No. PCT/KR2015/013252, filed on Dec. 4, 2015, entitled “TIME-OF-FLIGHT MASS SPECTROMETER”, which claims priority to Korean Patent Application No. 10-2014-0194149, filed on Dec. 30, 2014, and Korean Patent Application No. 10-2015-0171695, filed on Dec. 3, 2015. The above-identified applications are hereby incorporated herein by reference in their entirety.
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/KR2015/013252 | 12/4/2015 | WO | 00 |
