Claims
- 1. A radiation-sensitive element comprising
- (A) a support, and
- (B) on the support, a radiation-sensitive layer comprising, in admixture,
- a reducible, radiation-sensitive inert cobalt(III) complex free of a sensitizable anion,
- and a photoreductant capable of forming in the absence of a cobalt(III) complex, upon exposure to activating radiation longer than 300 nanometers in wavelength, a reducing agent which forms a redox couple when associated with the cobalt(III) complex, said photoreductant being selected from the group consisting of disulfides, diazoanthrones, diazophenanthrones, aromatic azides, carbazides, and diazosulfonates.
- 2. A radiation-sensitive element according to claim 1 in which said cobalt(III) complex is not directly reducible by exposure to electromagnetic radiation of a wavelength longer than 300 nanometers.
- 3. A radiation-sensitive element according to claim 1 in which said cobalt(III) complex contains at least five ammine ligands.
- 4. A radiation-sensitive element according to claim 1 in which said cobalt(III) complex contains a hexammine cobalt(III) cationic moiety.
- 5. A radiation-sensitive element according to claim 1 additionally including means for supplying a source of labile hydrogen atoms.
- 6. A radiation-sensitive element according to claim 1 in which from 0.1 to 10 moles of cobalt (III) complex are present per mole of photoreductant.
- 7. A radiation-sensitive element according to claim 1 in which said radiation-sensitive layer incorporates a binder in a concentration of up to 99% by weight.
- 8. A radiation-sensitive element according to claim 7 in which said radiation-sensitive layer incorporates a binder in a concentration of from 50 to 90% by weight.
- 9. A radiation-sensitive composition according to claim 8 in which from 0.1 to 10 moles of cobalt (III) complex are present per mole of photoreductant.
- 10. A radiation-sensitive composition comprising in admixture,
- (A) a reducible, radiation-sensitive inert cobalt(III) complex free of a sensitizable anion; and
- (B) a photoreductant capable of forming in the absence of a cobalt(III) complex, upon exposure to activating radiation longer than 300 nanometers in wavelength, a reducing agent which forms a redox couple when associated with the cobalt(III) complex,
- said photoreductant being selected from the group consisting of disulfides, diazoanthrones, diazophenanthrones, aromatic azides, carbazides, and diazosulfonates.
- 11. The radiation-sensitive composition as defined in claim 10 in which said cobalt(III) complex is not directly reducible by exposure to electromagnetic radiation of a wavelength longer than 300 nanometers.
- 12. A radiation-sensitive element comprising
- (A) a support, and
- (B) on the support, a radiation-sensitive layer comprising, in admixture,
- (1) a reducible, radiation-sensitive inert cobalt(III) complex optionally containing an anion, said anion being selected from the group consisting of halides, sulfite, sulfate, alkyl or aryl sulfonate, nitrate, nitrite, perchloride, carboxylates, hexafluorophosphate, tetrafluoroborate and thiocyanate; and
- (2) a photoreductant capable of forming in the absence of a cobalt(III) complex, upon exposure to activating radiation longer than 300 nanometers in wavelength, a reducing agent which forms a redox couple when associated with the cobalt(III) complex,
- said photoreductant being selected from the group consisting of disulfides, diazoanthrones, diazophenanthrones, aromatic azides, carbazides, and diazosulfonates.
- 13. A radiation-sensitive element according to claim 12 in which said radiation-sensitive layer incorporates a binder in a concentration of up to 99% by weight.
- 14. A radiation-sensitive element according to claim 13 in which said radiation-sensitive layer incorporates a binder in a concentration of from 50 to 90% by weight.
- 15. A radiation-sensitive element comprising
- (A) a support, and
- (B) on the support, a radiation-sensitive layer comprising, in admixture,
- a reducible, radiation-sensitive inert cobalt(III) complex free of a sensitizable anion,
- and a quinone capable of forming in the absence of a cobalt(III) complex, upon exposure to activating radiation longer than 300 nanometers in wavelength, a reducing agent which forms a redox couple when associated with the cobalt(III) complex, said quinone containing one or more labile hydrogen atoms.
- 16. A radiation-sensitive element according to claim 15 in which said labile hydrogen atoms are attached to a carbon atom which is also bonded to the oxygen atom of an oxy substituent or the nitrogen atom of an amine substituent with the further provision that the carbon to hydrogen bond is the third or fourth bond removed from at least one quinone carbonyl bond.
- 17. A radiation-sensitive element according to claim 16 in which said quinone is a 1,4-benzoquinone or 1,4-naphthoquinone and incorporates as 2 or 3 position substituents at least one substituent chosen from the class consisting of 1' or 2'-hydroxyalkyl, hydroxyalkoxy, alkoxy, 1' or 2'-alkoxyalkyl, aralkoxy, 1' or 2'-acyloxyalkyl, 1' or 2'-aryloxyalkyl, aryloxyalkoxy, 1' or 2'-aminoalkyl, 1' or 2'-aroyloxyalkyl, alkylarylamino, dialkylamino, N,N-bis(1-cyanoalkyl)amino, N-aryl-N-(1-cyanoalkyl)amino, N-alkyl-N-(1-cyanoalkyl)amino, N,N-bis(1-carbalkoxyalkyl)amino, N-aryl-N-(1-carbalkoxyalkyl)amino, N-alkyl-N-(1-carbalkoxyalkyl)amino, N,N-bis(1-nitroalkyl)amino, N-alkyl-N-(1-nitroalkyl)amino, N-aryl-N-(1-nitroalkyl)amino, N,N-bis(1-acylalkyl)amino, N-alkyl-N-(1-acylalkyl)amino, N-aryl-N-(1-acylalkyl)amino, pyrrolino, pyrrolidino, piperidino and morpholino substituents.
- 18. A radiation-sensitive composition comprising in admixture,
- (A) a reducible, radiation-sensitive inert cobalt(III) complex free of a sensitizable anion; and
- (B) a quinone containing one or more labile hydrogen atoms, said quinone being capable of forming in the absence of a cobalt(III) complex, upon exposure to activating radiation longer than 300 nanometers in wavelength, a reducing agent which forms a redox couple when association with the cobalt(III) complex.
- 19. A radiation-sensitive element comprising
- (A) a support, and
- (B) on the support, a radiation-sensitive layer comprising, in admixture,
- (1) a reducible, radiation-sensitive inert cobalt(III) complex optionally containing an anion, said anion being selected from the group consisting of halide, sulfite, sulfate, alkyl or aryl sulfonate, nitrate, nitrite, perchlorate, carboxylates, hexafluorophosphate, tetrafluoroborate and thiocyanate; and
- (2) a quinone capable of forming in the absence of a cobalt(III) complex, upon exposure to activating radiation longer than 300 nanometers in wavelength, a reducing agent which forms a redox couple when associated with the cobalt(III) complex, said quinone incorporating one or more labile hydrogen atoms.
- 20. A radiation-sensitive element comprising
- (A) a support, and
- (B) on the support, a radiation-sensitive layer comprising, in admixture,
- (1) a reducible, radiation-sensitive inert cobalt(III) complex free of a sensitizable anion; and
- (2) a quinone selected from the group consisting of
- 5. 8-dihydro-1,4-naphthoquinone,
- 5,8-dihydro-2,5,8-trimethyl-1,4-naphthoquinone,
- 2,5-bis(dimethylamino)-1,4-benzoquinone,
- 2,5-dimethyl-3,6-bis(dimethylamino)-1,4-benzoquinone,
- 2,5-dimethyl-3,6-bispyrrolidino-1,4-benzoquinone,
- 2-ethoxy-5-methyl-1,4-benzoquinone,
- 2,6-dimethoxy-1,4-benzoquinone,
- 2,5-dimethoxy-1,4-benzoquinone,
- 2,6-diethoxy-1,4-benzoquinone,
- 2,5-diethoxy-1,4-benzoquinone,
- 2,5-bis(2-methoxyethoxy)-1,4-benzoquinone,
- 2,5-bis(.beta.-phenoxyethoxy)-1,4-benzoquinone,
- 2,5-diphenethoxy-1,4-benzoquinone,
- 2,5-di-n-propoxy-1,4-benzoquinone,
- 2,5-di-isopropoxy-1,4-benzoquinone,
- 2,5-di-n-butoxy-1,4-benzoquinone,
- 2,5-di-sec-butoxy-1,4-benzoquinone,
- 1,1'-bis(5-methyl-1,4-benzoquinone-2-yl)diethyl ether,
- 2-methyl-5-morpholinomethyl-1,4-benzoquinone,
- 2,3,5-trimethyl-6-morpholinomethyl-1,4-benzoquinone,
- 2,5-bis(morpholinomethyl)-1,4-benzoquinone,
- 2-hydroxymethyl-3,5,6-trimethyl-1,4-benzoquinone,
- 2-(1-hydroxyethyl)-5-methyl-1,4-benzoquinone,
- 2-(1-hydroxy-n-propyl)-5-methyl-1,4-benzoquinone,
- 2-(1-hydroxy-2-methyl-n-propyl)-5-methyl-1,4-benzoquinone,
- 2-(1,1-dimethyl-2-hydroxyethyl)-5-methyl-1,4-benzoquinone,
- 2-(1-acetoxyethyl)-5-methyl-1,4-benzoquinone,
- 2-(1-methoxyethyl)-5-methyl-1,4-benzoquinone,
- 2-(2-hydroxyethyl)-3,5,6-trimethyl-1,4-benzoquinone,
- 2-ethoxy-5-phenyl-1,4-benzoquinone,
- 2-i-propoxy-5-phenyl-1,4-benzoquinone,
- 1,4-dihydro-1,4-dimethyl-9,10-anthraquinone,
- 2-tert-butyl-9,10-anthraquinone,
- 2-methyl-1,4-anthraquinone,
- 2-methyl-9,10-anthraquinone,
- 2-dimethylamino-1,4-naphthoquinone,
- 2-methoxy-1,4-naphthoquinone,
- 2-benzyloxy-1,4-naphthoquinone,
- 2-methoxy-3-chloro-1,4-naphthoquinone,
- 2,3-dimethoxy-1,4-naphthoquinone,
- 2,3-diethoxy-1,4-naphthoquinone,
- 2-ethoxy-1,4-naphthoquinone,
- 2-phenethoxy-1,4-naphthoquinone,
- 2-(2-methoxyethoxy)-1,4-naphthoquinone,
- 2-(2-ethoxyethoxy)-1,4-naphthoquinone,
- 2-(2-phenoxy)ethoxy-1,4-naphthoquinone,
- 2-ethoxy-5-methoxy-1,4-naphthoquinone,
- 2-ethoxy-6-methoxy-1,4-naphthoquinone,
- 2-ethoxy-7-methoxy-1,4-naphthoquinone,
- 2-n-propoxy-1,4-naphthoquinone,
- 2-(3-hydroxypropoxy)-1,4-naphthoquinone,
- 2-isopropoxy-1,4-naphthoquinone,
- 7-methoxy-2-isopropoxy-1,4-naphthoquinone,
- 2-n-butoxy-1,4-naphthoquinone,
- 2-sec-butoxy-1,4-naphthoquinone,
- 2-n-pentoxy-1,4-naphthoquinone,
- 2-n-hexoxy-1,4-naphthoquinone,
- 2-n-heptoxy-1,4-naphthoquinone,
- 2-acetoxymethyl-3-methyl-1,4-naphthoquinone,
- 2-methoxymethyl-3-methyl-1,4-naphthoquinone,
- 2-(.beta.-acetoxyethyl)-1,4-naphthoquinone,
- 2-N,N-bis(cyanomethyl)aminomethyl-3-methyl-1,4-naphthoquinone,
- 2-methyl-3-morpholinomethyl-1,4-naphthoquinone,
- 2-hydroxymethyl-1,4-naphthoquinone,
- 2-hydroxymethyl-3-methyl-1,4-naphthoquinone,
- 2-(1-hydroxyethyl)-1,4-naphthoquinone,
- 2-(2-hydroxyethyl)-1,4-naphthoquinone,
- 2-(1,1-dimethyl-2-hydroxyethyl)-1,4-naphthoquinone,
- 2-bromo-3-isopropoxy-1,4-naphthoquinone,
- 2-ethoxy-3-methyl-1,4-naphthoquinone,
- 2-chloro-3-piperidino-1,4-naphthoquinone,
- 2-morpholino-1,4-naphthoquinone,
- 2,3-dipiperidino-1,4-naphthoquinone,
- 2-dibenzylamino-3-chloro-1,4-naphthoquinone,
- 2-methyloxycarbonylmethoxy-1,4-naphthoquinone,
- 2-(N-ethyl-N-benzylamino)-3-chloro-1,4-naphthoquinone,
- 2-morpholino-3-chloro-1,4-naphthoquinone,
- 2-pyrrolidino-3-chloro-1,4-naphthoquinone,
- 2-diethylamino-3-chloro-1,4-naphthoquinone,
- 2-diethylamino-1,4-naphthoquinone,
- 2-piperidino-1,4-naphthoquinone,
- 2-pyrrolidino-1,4-naphthoquinone,
- 2-(2-hexyloxy)-1,4-naphthoquinone,
- 2-neo-pentyloxy-1,4-naphthoquinone,
- 2-(2-n-pentyloxy)-1,4-naphthoquinone,
- 2-(3-methyl-n-butoxy)-1,4-naphthoquinone,
- 2-(6-hydroxy-n-hexoxy)-1,4-naphthoquinone,
- 2-ethoxy-3-chloro-1,4-naphthoquinone,
- 2-di(phenyl)methoxy-1,4-naphthoquinone,
- 2-(2-hydroxyethoxy)-3-chloro-1,4-naphthoquinone,
- 2-methyl-3-(1-hydroxymethyl)ethyl-1,4-naphthoquinone,
- 2-azetidino-3-chloro-1,4-naphthoquinone,
- 2-(2-hydroxyethyl)-3-bromo-1,4-naphthoquinone,
- 2,3-dimorpholino-1,4-naphthoquinone,
- 2-ethylamino-3-piperidino-1,4-naphthoquinone,
- 2-ethoxymethyl-1,4-naphthoquinone, and
- 2-phenoxymethyl-1,4-naphthoquinone.
RELATION TO OTHER APPLICATIONS
This is a continuation application of U.S. Ser. No. 846,239, filed on Oct. 27, 1977, now abandoned which is a continuation-in-part application of U.S. Ser. No. 618,186 filed on Sept. 30, 1975; which itself is a continuation-in-part application of U.S. Ser. No. 461,057 filed on Apr. 15, 1974.
US Referenced Citations (16)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1026357 |
Apr 1966 |
GBX |
Non-Patent Literature Citations (2)
Entry |
Kosar, J., Light Sensitive Systems, Wiley & Sons, 1965, p. 330. |
"Stabilization of Semiquinoine . . . ", Mayer et al., Photochemistry and Photobiology, 1969, vol. 10, Great Britain, pp. 247-271. |
Continuations (1)
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Number |
Date |
Country |
Parent |
846239 |
Oct 1977 |
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Continuation in Parts (2)
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Number |
Date |
Country |
Parent |
618186 |
Sep 1975 |
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Parent |
461057 |
Apr 1974 |
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