S. Maeyama et al., Surface Silicon Crystallinity and Anomalous Composition Profiles of Buried SiO.sub.2 and Si.sub.3 N.sub.4 Layers Fabricated by Oxygen and Nitrogen Implantation in Silicone, vol. 21, No. 5 (May 1982) pp. 744-751. |
A. G. Gaind et al., "Physicalchemical Properties of Chemical Vapor-Deposited Silicon Oxynitride from a SiH.sub.4 --CO.sub.2 --NH.sub.3 --H.sub.2 System", Journal of the Electrochemical Society, vol. 25, No. 1 (Jan. 1978) pp. 139-145. |
P. J. Burkhardt, "Composite Silicon Dioxide-Silicon Oxynitride Insulating Layers," IBM Technical Disclosure Bulletin, vol. 13, No. 1, (Jun. 1970) p. 21. |