Trenches to reduce charging effects and to control out-of-plane sensitivities in tuning fork gyroscopes and other sensors

Information

  • Patent Grant
  • 5952574
  • Patent Number
    5,952,574
  • Date Filed
    Tuesday, April 29, 1997
    27 years ago
  • Date Issued
    Tuesday, September 14, 1999
    25 years ago
Abstract
Trenches which reduce or eliminate force and sensitivity associated with proof mass motion normal to the substrate as a result of voltage transients is disclosed. The trenches provide increased separation between interleaved comb electrodes and the substrate, and thereby also reduce the comb lift to drive ratio. The trenches are typically formed directly below the interleaved comb electrodes, but may also be formed below other suspended portions. Trench depth is from 6-10 microns and provides a comb electrode to substrate separation of approximately 8.5-12.5 microns.
Description

FIELD OF THE INVENTION
The present invention is related to micromechanical tuning fork gyroscopes, and more particularly to interleaved comb electrodes in micromechanical tuning fork gyroscopes.
BACKGROUND OF THE INVENTION
The basic theories of operation and construction of tuning fork gyroscopes are now fairly well known. Such gyroscopes include a substrate, silicon proof masses with comb electrodes, position sensitive pick-offs, sense electrodes, and inner and outer drives with comb electrodes. The proof masses are suspended above the substrate by a support flexure which permits movement of the proof masses relative to the sense electrode, the drive electrodes and the substrate.
The substrate, which is commonly constructed from glass, has a high electrical resistivity which is partially responsible for voltage transients which can adversely effect gyroscope performance. For example, coupling between comb electrodes is sensitive to such voltage transients. Additionally, the transients impart pick-off sensitivity and undesirable vertical (Z-axis) forces normal to the proof masses. This vertical force and pickoff sensitivity can (a) degrade tuning fork gyroscope performance and (b) prevent the tuning fork gyroscope motor self-oscillator loop from starting.
SUMMARY OF THE INVENTION
In accordance with the present invention, undesirable substrate voltage transient effects are alleviated by increasing the distance between the interleaved comb electrodes and the substrate surface. In a tuning fork gyroscope having drives with interleaved comb electrodes associated therewith, the distance is increased by forming trenches in the substrate below the interleaved comb electrodes. The trenches reduce the comb lift to drive ratio.
Trenches improve drive performance in two areas. First, when a glass substrate is used in a dissolved wafer process, charges accumulate on the surface of the glass as already described. Associated voltages then interact with the proof masses above the exposed glass to adversely effect starting and stability across temperature. When DC excitation of the sense electrodes is used, the charge induced by the voltage transients effectively alters the magnitude of voltage sensed by the motor sense electrodes. The trenches reduce the effects of the transient induced charge by effectively increasing the gap between the comb electrodes and the substrate surface. Second, the interleaved comb electrodes are intended to exert force parallel to the substrate surface. However, a dielectric or conducting substrate result in undesirable electrostatic Z-axis forces which are perpendicular to the substrate surface, and bias stability can thereby be adversely effected. When charging effects are reduced by using a conducting substrate such as silicon, electrostatic lift force from the silicon can be larger than the drive force; a situation where self drive oscillator performance becomes impractical. The trenches reduce the Z-axis lift forces by effectively increasing the gap between the interleaved comb electrodes and the surface of the substrate.
Trenches also offer improved drive performance at a relatively modest cost. It has been found through experimentation that the undesirable effects of substrate voltage transients can be reduced by 50 to 65% in a gyroscope with a comb electrode to substrate surface gap of 2.5 microns by forming trenches with a depth of approximately 6 microns, i.e., increasing the gap in the trench area to 8.5 microns. Advantageously, this improved performance can be achieved without additional electronics using known wafer dissolving processes which are particularly cost efficient.





BRIEF DESCRIPTION OF THE DRAWING
These and other features and advantages of the present invention will be more fully understood from the following detailed description of the invention in which:
FIG. 1 is a plan view of a tuning fork gyroscope in accordance with the present invention;
FIG. 2 is a cross sectional view of the gyroscope of FIG. 1 taken along line 1--1;
FIG. 3 is a plan view of a subsection of the interleaved comb electrodes of FIGS. 1 & 2; and
FIG. 4 is a plan view of an alternative embodiment of the tuning fork gyroscope of FIG. 1.





DETAILED DESCRIPTION OF THE DRAWING
FIG. 1 illustrates a tuning fork gyroscope in accordance with the present invention. The tuning fork gyroscope includes outer drives 3a, 3b with comb electrodes 5a, 5b, an inner drive 7 with comb electrodes 9a, 9b, proof masses 11a, 11b with comb electrodes 13a, 13b, 13c, 13d, trenches 15a, 15b, 15c, 15d, a substrate 17 with an upper surface 19, and a support flexure 21 with drive beams 23, torsion beams 25, base beams 27 and anchors 29. The proof masses are suspended above the substrate, and are connected thereto by the support flexure. The anchors connect the torsion beams to the substrate. The torsion beams support the base beams, which in turn support the drive beams. The proof masses are connected to the base beams by the drive beams.
The tuning fork gyroscope functions electromechanically. In operation, the inner and outer drives 7, 3a, 3b impart a vibratory motion to the proof masses 11a, 11b through the comb electrodes. The comb electrodes 5a, 5b of the outer drives extend outward toward the respective adjacent proof masses 11a, 11b, and are disposed above the surface of the substrate. The comb electrodes of the adjacent proof masses 11a, 11b extend outwardly towards the respective outer drives 3a, 3b such that respective outer drive comb electrodes 5a, 5b and proof mass comb electrodes 13a, 13d are interleaved. Comb electrodes 9a, 9b, 13b, 13c between adjacent proof masses and the inner drive are similarly interleaved. As such, time varying drive signals V.sub.d can be provided to the inner and outer drives to induce electrostatic coupling of the drive and proof mass comb electrodes and thereby impart vibratory motion to the proof masses.
Measurement with the tuning fork gyroscope has been described with detail in copending U.S. patent application Ser. No. 08/219,023, entitled ELECTRONICS FOR CORIOLIS FORCE AND OTHER SENSORS, filed in the name of Paul Ward, which is incorporated herein by reference. Briefly, a DC voltage +.sub.s, -V.sub.s, is applied to sense electrodes 31 to establish a potential difference so that a change in capacitance between the sense electrodes and the adjacent proof masses results in a change in charge on the proof masses. At resonance, proof mass displacement lags drive force by ninety-degrees. In response to an inertial input, and specifically to a rotational rate about an input axis coplanar to the plane of vibration, the proof masses deflect out of the plane of vibration. Such out-of-plane deflection of the proof masses occurs at a frequency corresponding to the resonant frequency of the proof masses and with an amplitude corresponding to the input rotational rate. Thus, detection of out-of-plane deflection of the proof masses provides a measure of the rotational rate.
Voltages applied to the comb electrodes 12a, 12b, 14a, 14b and to the sense electrodes 36 induce both slow transient and AC voltages in the glass substrate, which is a dielectric with loss factor and high, but finite, electrical resistivity. These voltages tend to degrade tuning fork gyroscope bias and scale factor versus time and temperature by injecting current into the proof masses and by applying forces to the proof masses. The trenches reduce the induced voltages and their effects on the proof mass, and hence on gyroscope performance.
The combs are desired to drive or sense motion parallel to the substrate. With conducting or resistive substrates below the combs, the combs affect vertical motion. With conducting substrates, charge transients are not an issue but starting and degraded performance are significant issues. With non-conducting substrates, charge transients, starting and degraded performance are all significant issues. High lift to drive ratio can degrade performance and even prevent the tuning fork gyroscope from starting. Lift to drive ratio is higher in conducting substrates than in dielectric materials. The trenches reduce the comb's lift to drive ratio, a technique which may be applied to both gyroscopes built on nonconducting and conducting (e.g., silicon) to allow larger drive amplitudes.
Turning now to both FIG. 1 and FIG. 2, trenches provide an increased distance between the silicon parts and the substrate, and thereby reduce or eliminate the normal force and sensitivity. A gap 41 is defined between inner and outer interleaved comb electrodes 43, 45 and the surface 19 of the substrate. The undesirable effects of substrate voltage transients on electrostatic coupling of the comb electrodes is at least in part a function of the magnitude of this gap 41. Thus, in order to reduce the effects of such voltage transients, the gap is increased by forming trenches 15a, 15b, 15c, 15d in the substrate below the interleaved comb electrodes 43, 45. The trenches are disposed on the substrate substantially directly below the interleaved comb electrodes. More particularly, the interleaved comb electrodes have a length 33, and the trenches extend along the substrate for a length 35 which is equal to or greater than the interleaved comb electrode length as shown in FIG. 1.
Further placement details for the trenches are illustrated in FIG. 3. The interleaved comb electrodes 43, 45 have three regions which define width of overlap: region A is an unengaged drive comb electrode region, region B is an engaged comb electrode region, and region C is an unengaged proof mass comb electrode region. Magnitude of region B is directly related to maximum drive amplitude, i.e., greater width affords greater maximum drive amplitude. It should be appreciated, however, that regions A-C vary as the proof mass is vibrated, and this variation is taken into account when determining trench placement. In particular, the trenches are disposed between the substrate and the comb electrodes such that the trenches have a width 47 greater than or equal to a maximum operational width of region B. The term "overlap region" as used herein refers, therefore, to the maximum operational width of region B. Further, the trenches are disposed on the substrate substantially directly below the overlap region.
Turning again to FIGS. 1 & 2, the trenches have a box-like shape with substantially flat walls 37 which are parallel to the Z-axis. The trenches have a width 47 which is substantially greater than or equal to the overlap region. It will be appreciated, however, that the shape and dimensions of the trenches may be varied without loss of the advantages of the present invention provided separation of the interleaved comb electrodes and the surface of the substrate is increased.
Trench excavation in crystal silicon or glass can be done by well known techniques such as isotropic etching. The trench may also be formed by reactive ion etching, chlorine etching, SF.sub.6 etching, or anisotropic etching. In the embodiment described above, the trenches have a depth 39 of approximately 6 .mu.m and the gap between the interleaved comb electrodes and the substrate surface in the trenches is approximately 8.5 .mu.m. This arrangement has been found to reduce the undesirable effects due to substrate voltage transients by as much as 50-65%. However, it has also been found that trench depth can be increased to 10 .mu.m or more in order to further alleviate and even eliminate the effects of substrate charging. The trenches can also be combined with other techniques for additional performance enhancement and flexibility in reconciling performance and cost.
Although the tuning fork gyroscope has been thus far described and illustrated with trenches below each set of interleaved comb electrodes, alternate embodiments are possible and may present a superior solution for some applications. For example, to create a tuning fork gyroscope with variation of 300+ degrees per hour it is sufficient to place trenches below the inner interleaved comb electrodes 43 alone, rather than below both the inner and outer interleaved comb electrodes 43, 45.
FIG. 4 is a plan view of an alternative embodiment of the tuning fork gyroscope of FIG. 1. In this embodiment trenches are formed in the substrate below the support flexure. In particular, first, second and third sets of trenches 51, 53, 55 are formed below the drive beams, torsion beams and base beams, respectively. These additional trenches further alleviate the undesirable effects of substrate voltage transients by providing increased separation between vibrating structures (proof masses, comb electrodes and support flexure) and the substrate.
It should be understood the invention is not limited to the particular embodiments shown and described herein, but that various changes and modifications may be made without departing from the spirit and scope of this novel concept as defined by the following claims.
Claims
  • 1. A drive for imparting a vibratory force to a vibrating member with a driving member, the vibrating member suspended above a surface of a substrate by a support flexure, comprising:
  • first comb electrodes connected to the driving member;
  • second comb electrodes connected to the vibrating member, said second comb electrodes interleaved with said first comb electrodes, an overlap region defined thereby, a gap being defined between the substrate surface and the interleaved comb electrodes; and
  • a trench formed in the substrate substantially between the interleaved comb electrodes and the substrate such that the gap between the substrate surface and the interleaved comb electrodes is increased.
  • 2. The drive of claim 1 wherein said trench has a width dimension which is greater than or equal to said overlap region.
  • 3. The drive of claim 2 wherein said trench has a depth dimension which is from 6 .mu.m to 10 .mu.m, inclusive.
  • 4. The drive of claim 3 wherein said trench is formed by a dissolved wafer process.
  • 5. The drive of claim 2 wherein said trench has a depth dimension which is greater than 10.mu.m.
  • 6. The drive of claim 5 wherein said trench is formed by a technique selected from the group consisting of reactive ion etching, chlorine etching, SF.sub.6 etching and anisotropic etching.
  • 7. A tuning fork gyroscope comprising:
  • a substrate with a surface;
  • an outer drive with comb electrodes;
  • an inner drive with comb electrodes;
  • proof masses with inner and outer comb electrodes, said proof masses suspended above said substrate by support flexure, said inner comb electrodes interleaved with said inner drive comb electrodes and said outer comb electrodes interleaved with said outer drive comb electrodes, an overlap region defined by said interleaved comb electrodes, a gap being defined between the substrate surface and the interleaved comb electrodes; and
  • trenches formed in said substrate substantially between said inner interleaved comb electrodes and said substrate such that the gap between said substrate surface and said inner interleaved comb electrodes is increased.
  • 8. The tuning fork gyroscope of claim 7 wherein said trenches have a width dimension which is greater than or equal to said overlap region.
  • 9. The tuning fork gyroscope of claim 8 wherein said trenches have a depth dimension which is from 6 .mu.m to 10 .mu.m, inclusive.
  • 10. The tuning fork gyroscope of claim 8 wherein said trenches have a depth dimension which is greater than 10 .mu.m.
  • 11. The tuning fork gyroscope of claim 9 wherein said gap is increased by said trenches from about 2.5 .mu.m to a gap from 8.5 .mu.m to 12.5 .mu.m, inclusive.
  • 12. The tuning fork gyroscope of claim 8 wherein trenches are also formed in said substrate substantially between the outer interleaved comb electrodes and the substrate.
  • 13. The tuning fork gyroscope of claim 12 wherein said trenches have a depth dimension which is from 6 .mu.m to 10 .mu.m, inclusive.
  • 14. The tuning fork gyroscope of claim 12 wherein said trenches have a depth dimension which is greater than 10 .mu.m.
  • 15. The tuning fork gyroscope of claim 13 wherein said gap is increased by said trenches from about 2.5 .mu.m to a gap from 8.5 .mu.m to 12.5 .mu.m, inclusive.
  • 16. The tuning fork gyroscope of claim 7 wherein trenches are also formed in said substrate substantially between the support flexure and the substrate.
  • 17. In a tuning fork gyroscope having interleaved comb electrodes defining an overlap region and a substrate surface with a gap defined therebetween, a method for alleviating undesirable effects of substrate voltage transients on gyroscope operation comprising the step of:
  • increasing the gap between the interleaved comb electrodes and the substrate surface by forming a trench in the substrate substantially between the interleaved comb electrodes and the substrate in the overlap region of the interleaved comb electrodes.
  • 18. In a tuning fork gyroscope having interleaved comb electrodes and a substrate surface with a gap defined therebetween, and a support flexure, a method for alleviating undesirable effects of substrate voltage transients on gyroscope operation comprising the step of:
  • increasing the gap between the interleaved comb electrodes and the substrate surface by forming trenches below the interleaved comb electrodes and forming trenches below the support flexure.
  • 19. The method of claim 17 wherein said step of forming the trench is accomplished by a technique selected from the group consisting of reactive ion etching, chlorine etching, SF.sub.6 etching and anisotropic etching.
US Referenced Citations (111)
Number Name Date Kind
RE32931 Staudte May 1989
RE33479 Juptner et al. Dec 1990
3053095 Koril et al. Sep 1962
3251231 Hunt et al. May 1966
3370458 Dillon Feb 1968
3696429 Tressa Oct 1972
3913035 Havens Oct 1975
4044305 Oberbeck Aug 1977
4122448 Martin Oct 1978
4144764 Hartzell, Jr. Mar 1979
4155257 Wittke May 1979
4234666 Gursky Nov 1980
4321500 Paros et al. Mar 1982
4336718 Washburn Jun 1982
4342227 Petersen et al. Aug 1982
4381672 O'Connor et al. May 1983
4406992 Kurtz et al. Sep 1983
4411741 Janata Oct 1983
4414852 McNeill Nov 1983
4447753 Ochiai May 1984
4468584 Nakamura et al. Aug 1984
4478076 Bohrer Oct 1984
4478077 Bohrer et al. Oct 1984
4483194 Rudolf Nov 1984
4484382 Kawashima Nov 1984
4490772 Blickstein Dec 1984
4495499 Richardson Jan 1985
4499778 Westhaver et al. Feb 1985
4502042 Wuhrl et al. Feb 1985
4522072 Sulouff et al. Jun 1985
4524619 Staudte Jun 1985
4538461 Juptner et al. Sep 1985
4585083 Nishiguchi Apr 1986
4590801 Merhav May 1986
4592242 Kempas Jun 1986
4596158 Strugach Jun 1986
4598585 Boxenhorn Jul 1986
4600934 Aine et al. Jul 1986
4619001 Kane Oct 1986
4621925 Masuda et al. Nov 1986
4628283 Reynolds Dec 1986
4629957 Walters et al. Dec 1986
4639690 Lewis Jan 1987
4644793 Church Feb 1987
4651564 Johnson et al. Mar 1987
4653326 Danel et al. Mar 1987
4654663 Alsenz et al. Mar 1987
4665605 Kempas May 1987
4670092 Motamedi Jun 1987
4671112 Kimura et al. Jun 1987
4674180 Zavracky et al. Jun 1987
4674319 Muller et al. Jun 1987
4679434 Stewart Jul 1987
4680606 Knutti et al. Jul 1987
4699006 Boxenhorn Oct 1987
4705659 Bernstein et al. Nov 1987
4706374 Murkami Nov 1987
4712439 North Dec 1987
4727752 Peters Mar 1988
4735506 Pavlath Apr 1988
4736629 Cole Apr 1988
4743789 Puskas May 1988
4744248 Stewart May 1988
4744249 Stewart May 1988
4747312 Herzl May 1988
4750364 Kawamura et al. Jun 1988
4761743 Wittke Aug 1988
4764244 Chitty et al. Aug 1988
4776924 Delapierre Oct 1988
4783237 Aine et al. Nov 1988
4789803 Jacobsen et al. Dec 1988
4792676 Hojo et al. Dec 1988
4805456 Howe et al. Feb 1989
4808948 Patel et al. Feb 1989
4815472 Wise et al. Mar 1989
4834538 Heeks et al. May 1989
4851080 Howe et al. Jul 1989
4855544 Glenn Aug 1989
4869107 Murakami Sep 1989
4881410 Wise et al. Nov 1989
4882933 Petersen et al. Nov 1989
4884446 Ljung Dec 1989
4890812 Chechile et al. Jan 1990
4893509 MacIver et al. Jan 1990
4898032 Voles Feb 1990
4899587 Staudte Feb 1990
4900971 Kawashima Feb 1990
4901586 Blake et al. Feb 1990
4916520 Kurashima Apr 1990
4922756 Henrion May 1990
4929860 Hulsing, II et al. May 1990
4981359 Tazartes et al. Jan 1991
5001383 Kawashima Mar 1991
5013396 Wise et al. May 1991
5016072 Greiff May 1991
5025346 Tang et al. Jun 1991
5038613 Takenaka et al. Aug 1991
5055838 Wise et al. Oct 1991
5060039 Weinberg et al. Oct 1991
5090809 Ferrar Feb 1992
5094537 Karpinski, Jr. Mar 1992
5138883 Paquet et al. Aug 1992
5195371 Grieff Mar 1993
5203208 Bernstein Apr 1993
5205171 O'Brien et al. Apr 1993
5216490 Greiff et al. Jun 1993
5226321 Varnham et al. Jul 1993
5233874 Putty et al. Aug 1993
5241861 Hulsing, II Sep 1993
5392650 O'Brien et al. Feb 1995
5576250 Diem et al. Nov 1996
Foreign Referenced Citations (1)
Number Date Country
55-121728 Sep 1980 JPX