This application is based upon and claims the benefit of priority of the prior Japanese Patent Application No. 2019-21420, filed in Japan on Feb. 8, 2019, the entire contents of which are incorporated herein by reference.
This disclosure relates to a tube body and a pumping device.
In Japanese Laid-open Patent Publication No. H10-61558 1 discloses a chemical supply apparatus including: a flexible tube formed of an elastic material and elastically expandable and contractible in a radial direction; a supply-side flow path connected between one end part of the flexible tube and a chemical storage part and provided with a supply-side open/close valve; a discharge-side flow path connected between the other end part of the flexible tube and a chemical discharge part and provided with a discharge-side open/close valve; a bellows arranged outside the flexible tube and elastically deformable in an axial direction which includes a small-sized bellows part and a large-sized bellows part both of which are formed of elastic members, the large-sized bellows part being larger in volume change per unit displacement amount in the axial direction than the small-sized bellows part; an incompressible medium sealed between the flexible tube and the bellows; and drive means which elastically deforms the flexible tube in the radial direction by elastically deforming the bellows in the axial direction to contract the small-sized bellows and expand the large-sized bellows whereas expanding the small-sized bellows and contracting the large-sized bellows.
An aspect of this disclosure is a tube body for liquid feeding member, which is a hollow tube body used for a liquid feeding member and deformable by pressurization, wherein: an axial cross-section of the tube body has two opposing long side parts and two opposing short side parts; four corner portions formed by the long side parts and the short side parts each have a shape curved to protrude outward; each of the long side parts has a recessed part recessed inward and continuing from the corner portions; and a portion other than the corner portions of each of the short side parts is in a flat shape.
According to this disclosure, the life of the tube body can be improved.
In a photolithography process in a manufacturing process of a semiconductor device, treatment solutions such as a resist solution, a developing solution and the like are used for forming a coating film such as an anti-reflection film and a resist film on a treatment object such as a semiconductor wafer (hereinafter, referred to as a “wafer”) and for developing an exposed resist film.
Each of the treatment solutions is fed in a fixed quantity required for the treatment every time, for example, to a supply nozzle. In the feeding, conventionally, a so-called tubephragm pump, which is configured to guide a treatment solution chemical to the inside of a flexible tube body, is often used.
However, when the tube body is pressurized with, for example, air being pressurizing fluid during the feeding, the tube body is crushed by the pressure at the pressurization, and stress sometimes concentrates at a specific region of the tube body depending on the crushed situation at that time. Since this kind of tubephragm pump is repeatedly used, the aforementioned region at which the stress concentrates is likely to break. Therefore, the improvement in life is a problem.
Hence the technique according to this disclosure suppresses the above-explained concentration of the stress to thereby improve the life of the tube body.
Hereinafter, a tube body according to this embodiment is explained referring to the drawings. Note that in this specification, the same codes are given to components having substantially the same functional configurations to omit duplicated explanation.
<Resist Coating Apparatus>
The resist coating apparatus 10 includes a treatment container 11 whose inside is closable. The treatment container 11 has a side surface formed with a transfer-in/out port (not illustrated) for the wafer W. At a center in the treatment container 11, a spin chuck 12 which holds and rotates the wafer W is provided. The spin chuck 12 has a horizontal upper surface, and the upper surface is provided with, for example, a suction port (not illustrated) for sucking the wafer W. By suction through the suction port, the wafer W can be suction-held on the spin chuck 12.
The spin chuck 12 includes a chuck drive mechanism 13 equipped with, for example, a motor and so on, and can rotate at a predetermined speed by the chuck drive mechanism 13. Further, the chuck drive mechanism 13 is provided with a raising and lowering drive source such as a cylinder so that the spin chuck 12 can move up and down.
Around the spin chuck 12, a cup 14 is provided which receives and collects liquid splashing or dropping from the wafer W. A drain pipe 15 which drains the collected liquid and an exhaust pipe 16 which exhausts the atmosphere in the cup 14 are connected to a lower surface of the cup 14.
A coating nozzle 21 which discharges the resist solution onto the wafer W on the spin chuck 12 is supported by an arm 22 movable in a predetermined direction in the treatment container 11. The coating nozzle 21 is connected to a resist solution supply apparatus 30 which supplies the resist solution as illustrated also in
<Resist Solution Supply Apparatus>
Next, the configuration of the resist solution supply apparatus 30 which supplies the resist solution to the coating nozzle 21 as a treatment solution discharger is explained.
The resist solution supply apparatus 30 includes a resist solution storage tank 31 being a resist solution supply source which stores the resist solution therein, and a buffer tank 32 which temporarily stores the resist solution transported from the resist solution storage tank 31.
The resist solution storage tank 31 is replaceable, and a first treatment solution supply pipe 33 which transports the resist solution to the buffer tank 32 is provided at the upper portion of the resist solution storage tank 31. The first treatment solution supply pipe 33 is provided with a valve V1 and a flowmeter 34.
On the downstream side of the valve 1 along the first treatment solution supply pipe 33, a flow path 36 is connected which leads to a pressurization source (for example, a nitrogen gas supply source) 35 for draining the resist solution in the buffer tank 32 by pressurizing the inside of the buffer tank 32. The flow path 36 is provided with valves V2, V3. The flow path 36 also leads to a cleaning solution supply source 37 via a valve V4 in a parallel way. By opening/closing operations of the valves V1 to V4, the supply of the resist solution from the resist solution storage tank 31 to the buffer tank 32, the drainage of the resist solution from the buffer tank 32, the supply of a cleaning solution to the buffer tank 32 and so on are performed.
The buffer tank 32 temporarily stores the resist solution transported from the resist solution storage tank 31 and has a pressure-feeding function of pressure-feeding the resist solution stored therein. The buffer tank 32 is composed of, for example, a tubephragm pump and includes a flexible diaphragm 32a, and the diaphragm 32a forms a storage chamber 32b which temporarily stores the resist solution. The capacity inside the storage chamber 32b is variable by deformation of the diaphragm 32a. Accordingly, the contact between the resist solution and gas inside the storage chamber 32b can be minimized also at the replacement of the resist solution storage tank 31.
At an upper portion of the buffer tank 32, a drain pipe 38 is provided which is used in draining the resist solution in the buffer tank 32.
The drain pipe 38 is provided with a valve V5 which functions as a drain valve. Note that also to the first treatment solution supply pipe 33, a drain pipe 39 having a valve V6 is connected.
To the buffer tank 32, an electropneumatic regulator 41 for deforming the diaphragm 32a is connected via an air supply/exhaust pipe 42. The air supply/exhaust pipe 42 is provided with a flowmeter 43. To the electropneumatic regulator 41, not-illustrated pressurization source and depressurization source are connected. An operation of switching between the pressurization source and the depressurization source can deform the diaphragm 32a.
At a lower portion of the buffer tank 32, a second treatment solution supply pipe 51 is provided. The second treatment solution supply pipe 51 branches off into a cleaning flow path 53 having a filter 52 and a flow path 54 leading to a later-explained pumping device 100. The filter 52 is intended for removing small bubbles in the resist solution. The removed bubbles are drained from a drain pipe 55 to the outside of the system. Note that the second treatment solution supply pipe 51 is provided with a valve V11, and the cleaning flow path 53 is provided with a valve V12 and a bubble detector 56.
The flow path 54 is provided with the pumping device 100 including the tube body according to the embodiment. The pumping device 100 has a tubephragm configuration. To the pumping device 100, an air supply/exhaust pipe 60 is connected. The air supply/exhaust pipe 60 is provided with a flowmeter 61 and an electropneumatic regulator 62. The electropneumatic regulator 62 controls pressurization and depressurization for the pumping device 100. Before and after the pumping device 100 along the flow path 54, valves V14, V15 and a pressure gauge 63 are provided.
The cleaning flow path 53 and the flow path 54 join again on the downstream side of the pressure gauge 63 and thereafter constitute a third treatment solution supply pipe 71, which leads to the coating nozzle 21. The third treatment solution supply pipe 71 is provided with a flowmeter 72 and a valve V21.
<Pumping Device>
The configuration of the pumping device 100 is explained in detail based on
Each of the outside tube body 110 and the tube body 120 has a hollow shape and made of a flexible synthetic resin. The outside tube body 110 and the tube body 120 are fixed to each other at their both end parts by welding or the like, and a space S is formed between the outside tube body 110 and the tube body 120. The outside tube body 110 is formed with a hole 103 leading to the space S so that the aforementioned air supply/exhaust pipe 60 is connected to the hole 103.
The long side parts 121, 122 have recessed parts 121a, 122a recessed inward, respectively. In this embodiment, the recessed parts 121a, 122a of the long side parts 121, 122 each have a flat shape, and the portion having the flat shape becomes a flat part. Further, portions of the short side parts 123, 124 other than the corner portions 131, 132, 133, 134 are in a flat shape.
Next, the percentage of the size in the embodiment is explained based on
Further, the straight line length of the recessed part 121a, 122a of the long side part 121, 122 is set to 100 to 140% of the length of a portion 123a in a flat shape of the short side part 123, 124. Explaining the above in line with
Further, the length of the long side part 121, 122, namely, the distance between the short side parts 123 and 124 is set to 150 to 190% of the distance between the recessed parts 121a and 122a of the long side parts 121, 122. Explaining the above in line with
The above-explained percentages of the size have been found by the inventors through experiments and simulations. By selecting suitable percentages in the above ranges, for example, depending on the material and thickness of the tube body 120, the viscosity of the treatment solution fed by the tube body 120 or the like, a good result, namely, an improved life of the tube body 120 can be obtained.
<Action>
The pumping device 100 according to the embodiment has the above configuration, so that when a predetermined quantity of the treatment solution from the buffer tank 32, for example, the resist solution is supplied into the tube body 120 of the pumping device 100, the valve V14 is closed and the valve V15 and the valve V21 are opened. When fluid, for example, air at a predetermined pressure is supplied into the space S between the outside tube body 110 and the tube body 120 from the air supply/exhaust pipe 60 via the electropneumatic regulator 62 in the above state, the pressure is applied inward to the long side parts 121, 122 of the tube body 120 as illustrated in
In this event, the long side parts 121, 122 are longer than the short side parts 123, 124 and have the recessed parts 121a, 122a, and therefore are likely to be crushed by the pressure. On the other hand, the short side parts 123, 124 of the tube body 120 are shorter than the long side parts 121, 122 and are in the flat shape at portions excluding the corner portions 131 to 134, and therefore unlikely to be deformed due to the pressurization.
Thus, the resist solution in the tube body 120 is appropriately pushed out of the inside of the tube body 120 and fed to the coating nozzle 21 through the third treatment solution supply pipe 71.
In this case, since the axial cross-section of the tube body 120 is a rectangle with rounded corners as a whole, namely, the four corner portions 131, 132, 133, 134 between the long side parts 121, 122 and the short side parts 123, 124 each have a shape curved to protrude outward and the long side parts 121, 122 are provided with the recessed parts 121a, 122a as explained above, the tube body 120 is likely to crush starting from the recessed parts 121a, 122a. On the other hand, the short side parts 123, 124 are shorter than the long side parts 121, 122 and are in the flat shape at portions excluding the corner portions 131 to 134, and therefore unlikely to be deformed due to pressurization. Since the corner portions 131, 132, 133, 134 each have a shape curved to protrude outward, a portion at which the stress concentrates is suppressed as a whole.
Accordingly, even in repeated use, deterioration and breakage of a specific region because of the concentration of the stress can be suppressed, and the life of the tube body 120 can be improved. Further, the employment of the above-explained shape makes it possible to easily predict the way of crush of the tube body 120 at pressurization. This also enables appropriate control of the way of crush (deformation) of the tube body at pressurization by appropriately changing the above-explained size percentages according to the material and thickness of the tube body 120, the viscosity of the treatment solution fed by the tube body 120 or the like.
Further, the short side parts 123, 124 are in the flat shape at portions excluding the corner portions 131 to 134 and are thus unlikely to be deformed during the feeding under pressure, so that the degree of the short side parts 123, 124 swelling outward during the feeding under pressure is small and can prevent their contact with the outside tube body 110. Also from this point, the life of the tube body 120 can be improved.
The technique according to this disclosure is not limited to the above shape. All of tube bodies in shapes illustrated in
In a tube body 120 illustrated in
In a tube body 120 illustrated in
In a tube body 120 illustrated in
A tube body 120 illustrated in
A tube body 120 illustrated in
A tube body 120 illustrated in
The embodiments disclosed herein are only examples in all respects and should not be considered to be restrictive. The above embodiments may be abbreviated, replaced, or changed in various forms without departing from the scope and spirit of the attached claims.
Further, it should be understood that those skilled in the art may arrive at various changes and modifications within the scope of the spirit as set forth in claims, and those should also belong to the technical scope of the claims of this application.
Number | Date | Country | Kind |
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JP2019-021420 | Feb 2019 | JP | national |
Number | Name | Date | Kind |
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6789579 | Ryhman | Sep 2004 | B1 |
7677271 | Boettner | Mar 2010 | B2 |
7896033 | Hallot | Mar 2011 | B2 |
9052054 | Nobileau | Jun 2015 | B2 |
20080072983 | Wu | Mar 2008 | A1 |
20090320951 | Witz | Dec 2009 | A1 |
20160116845 | Sasa | Apr 2016 | A1 |
Number | Date | Country |
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H10-061558 | Mar 1998 | JP |
Number | Date | Country | |
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20200256330 A1 | Aug 2020 | US |