The present invention relates to the inspection system in general, and more specifically to the uneven area inspection system using pattern reflection.
A touch screen panel is composed of several thin layers and can have various types of defects including particle, stain, scratch, and uneven area (e.g. dent) at any layer. The touch screen panel having some of these defects has to be removed before used in the application devices. Conventionally, the touch screen panel has been inspected manually with human eyes. The manual inspection by human eyes is, however, subject to many errors depending on the training and experience level of each individual inspector and also can be very slow and costly. Especially, detecting the uneven areas on the layers of the touch screen panel is extremely difficult even under the microscope if not impossible since the depth amount of the dent is usually very small. Those dents, however, can still cause problems in touch screen panel operation and have to be detected.
The uneven area inspection system of the present invention are contrived to provide accurate, simple, cost effective uneven area inspection system capable of indentifying the uneven areas and determining geometric properties of the identified uneven areas.
An uneven area inspection system of the present invention comprises a patterned panel comprising a panel, wherein the panel have a surface on which a pattern is formed, an object with at least one surface reflecting light from the patterned panel, an imaging unit optically coupled to the patterned panel and the object and configured to capture an image of the patterned panel reflected by the surface of the object, and an image processing unit configured to process the captured image to compare the pattern in the patterned panel and the pattern in the captured image. The surface of the object can have uneven area. The surface of the object is inspected for the uneven area by comparing the pattern in the patterned panel and the pattern in the captured image.
The panel of the patterned panel can be made of transparent material, translucent material, or opaque material.
The uneven area inspection system can further comprise an illumination unit configured to illuminate the patterned panel to enhance the quality of the image captured by the imaging unit.
The illumination unit can be disposed such that the patterned panel is located between the object and the illumination unit. In another word, the patterned panel is illuminated from the back side of the patterned panel. This configuration is desirable for the transparent panel and the translucent panel.
The illumination unit can be disposed such that the object and the illumination unit are located at the same side of the patterned panel. This configuration is desirable for the translucent panel and the opaque panel.
The patterned panel can have arbitrary patterns including, but not limited to, vertical stripes, horizontal stripes, and lattices.
The object can be opaque, translucent, or transparent.
The surfaces of the object reflecting the light from the patterned panel can be a top surface of the object and a bottom surface of the object, wherein the bottom surface of the object reflects the light from the patterned panel that passes the top surface of the object.
The imaging unit captures the images of the patterned panel reflected by a plurality of the surfaces of the object simultaneously in order to inspect the surfaces of the object for the uneven area.
The object can have a plurality of layers reflecting the light from the patterned panel, wherein each layer can have one or more of the surfaces reflecting the light from the patterned panel. Each layer can have the uneven area. The imaging unit captures the images of the patterned panel reflected by the surfaces of the layers simultaneously in order to inspect the surfaces of the layers for the uneven area.
Conventional cameras and microprocessors can serve as the imaging unit and the image processing unit. Also, human eyes and brain can serve as the imaging unit and the image processing unit, as well. By observing the captured image of the patterned panel reflected by the object, the uneven area in the surface of the object can be readily determined.
These and other features, aspects and advantages of the present invention will become better understood with reference to the accompanying drawings, wherein:
a and 2b are schematic diagrams illustrating one embodiment of an uneven area inspection system using pattern reflection;
a-3c illustrate how the pattern in the captured image is affected by being reflected by a surface with uneven area;
a and 4b show schematic diagrams illustrating embodiments of the present invention equipped with illumination unit; and
a and 5b shows schematic diagrams illustrating an embodiment of uneven area inspection system for an object having a plurality of surfaces.
a and 6b shows schematic diagrams illustrating an embodiment of uneven area inspection system for an object having a plurality of surfaces in a plurality of layers.
The present invention will now be described in detail with reference to embodiments thereof as illustrated in the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art, that the present invention may be practiced without some or all of these specific details. In other instances, well known process steps and/or structures have not been described in detail in order to not unnecessarily obscure the present invention.
a and 2b are schematic diagrams illustrating one embodiment of an uneven area inspection system using pattern reflection. An uneven area inspection system 21 of the present invention comprises a patterned panel 22, an object 23, an imaging unit 24, and an image processing unit 25. The patterned panel 22 comprises a panel having a surface, on which a pattern is formed. The panel can be made of transparent material, translucent material, or opaque material. The panel can have various patterns including, but not limited to, vertical stripes 22A, horizontal stripes 22B, and lattices 22C as shown in
a-3c illustrate how a pattern in the captured image is affected by being reflected by a surface with uneven area. When a considered surface of the object is substantially flat without uneven area, the pattern in the captured image 34A will be a just mirror image of the pattern in the patterned panel as shown in
Referring back to
The uneven area inspection system can further comprise an illumination unit configured to illuminate the patterned panel to enhance the quality of the image captured by the imaging unit.
The illumination unit 46B can be disposed such that the patterned panel 42 is located between the object 43 and the illumination unit 46A as shown in
The illumination unit can 46B be disposed such that the object 43 and the illumination unit 46B are located at the same side of the patterned panel 42 as shown in
a and 5b show an embodiment of uneven area inspection system for an object having a plurality of surfaces. An uneven area inspection system 51 of the present invention comprises a patterned panel 52, an object 53, an imaging unit 54, and an image processing unit 55. The system 51 can further comprise an illumination unit 56. When the object 53 is transparent or translucent, the object 53 can have a top surface 53A and a bottom surface 53B reflecting the light from the patterned panel 52. The bottom surface 53B of the object 53 reflects the light from the patterned panel that passes the top surface 53A of the object 53. The bottom surface 53B of the transparent or translucent object 53 can have uneven area also. In this case, the imaging unit 54 can be further configured to capture an image of the patterned panel 52 reflected by the bottom surface 53B of the object 53 to determine the uneven area on the bottom surface 53B of the object 53. Since the uneven area on the top surface 53A of the object 53 and the uneven area on the bottom surface 53B of the object 53 can be determined simultaneously, the top and bottom surfaces 53A, 53B of the object 53 can be inspected at the same time.
b illustrates the pattern 52B in the patterned panel 52, the captured image 54A of the patterned panel 52 reflected by the top surface 53A of the object 53, the captured image 54B of the patterned panel 52 reflected by the bottom surface 53B of the object 53, and the captured image 54D of the patterned panel 52 reflected by the top surface 53A of the object 53 and the bottom surface 53B of the object 53, simultaneously, wherein the captured image 54D of the patterned panel 52 reflected by the bottom surface 53B of the object 53 is shifted by λ, from the captured image 54A of the patterned panel 52 reflected by the top surface 53A of the object 53. The image processing unit 55 is configured to identify the uneven areas and the surfaces that the uneven areas are located by using distance information between the surfaces 53A, 53B and the pattern shift amount λ.
a and 6b show an embodiment of uneven area inspection system for an object having a plurality of layers. An uneven area inspection system 61 of the present invention comprises a patterned panel 62, an object 63, an imaging unit 64, and an image processing unit 65. The system 61 can further comprise an illumination unit 66. The object 63 has a plurality of layers 67AB, 67BC reflecting the light from the patterned panel 62. Each layer 67AB, 67BC can have one or more of the surfaces 63A, 63B, 63C reflecting the light from the patterned panel. These surfaces 63A, 63B, 63C in the layers 67AB, 67BC can have the uneven area. The imaging unit 64 captures the images of the patterned panel 62 reflected by the surfaces 63A, 63B, 63C of the layers 67AB, 67BC simultaneously in order to inspect the surfaces 63A, 63B, 63C for the uneven area. The uneven areas at the different surfaces 63A, 63B, 63C of the layers 67AB, 67BC can be detected simultaneously.
b illustrates the pattern 62B in the patterned panel 62, the captured images 64A, 64B, 64C of the patterned panel 62 reflected by the surfaces 63A, 63B, 63C of the layers 67AB, 67BC, and the captured image 64D of the patterned panel 62 reflected by all the surfaces 63A, 63B, 63C of the layers 67AB, 67BC of the object 63, simultaneously, wherein the captured image 64B of the patterned panel 62 reflected by the second surface 63B of the object 63 is shifted by λ1 from the captured image 64A of the patterned panel 62 reflected by the surface 63A and the captured image 64C of the patterned panel 62 reflected by the third surface 63C of the object 63 is shifted by λ2 from the captured image 64A of the patterned panel 62 reflected by the surface 63A. The image processing unit 65 is configured to identify the uneven areas and the surfaces that the uneven areas are located by using distance information between the surfaces 63A, 63B, 63C and the pattern shift amounts λ1, λ2.