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4431473 | Okano et al. | Feb 1984 | |
5000225 | Murdoch | Mar 1991 | |
5391260 | Makino et al. | Feb 1995 |
Number | Date | Country |
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0405668 | Jan 1991 | EPX |
6437021 | Feb 1989 | JPX |
4070610 | Mar 1992 | JPX |
5269361 | Oct 1993 | JPX |
Entry |
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Samukawa, "Perfect Selective, Highly Anisotropic, and High Rate ECR Plasma Etching for N.sup.+ Poly-Si and WSI/Poly-Si", Extended Abstracts of the 22nd (1990 International) Conference on Solid State Devices and Materials, Sendai, pp. 207-210, 1990. |