for drying etching

Industry

CPC
H01L21/67069

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67069for drying etching

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,571
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Resonant filter for solid state RF impedance matching network
- Patent number 12,272,522
- Issue date Apr 8, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, substrate processing apparatus, rec...
- Patent number 12,255,072
- Issue date Mar 18, 2025
- Kokusai Electric Corporation
- Masato Kawanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for etching a substrate using a hybrid wet atomic layer etc...
- Patent number 12,243,752
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system including temperature controller
- Patent number 12,237,183
- Issue date Feb 25, 2025
- Samsung Electronics Co., Ltd.
- Kyoungsik Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom and middle edge rings
- Patent number 12,237,154
- Issue date Feb 25, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and sub...
- Patent number 12,237,173
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Keiko Hada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymerization protective liner for reactive ion etch in patterning
- Patent number 12,237,175
- Issue date Feb 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 12,230,479
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods of control for plasma processing
- Patent number 12,230,475
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching apparatus
- Patent number 12,230,505
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Akihiro Tsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,230,474
- Issue date Feb 18, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of forming micro interconnect struc...
- Patent number 12,230,559
- Issue date Feb 18, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Francis J. Carney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of separating electronic devices having a back layer and app...
- Patent number 12,224,208
- Issue date Feb 11, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Gordon M. Grivna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature manifold assembly for substrate processing systems
- Patent number 12,224,161
- Issue date Feb 11, 2025
- Lam Research Corporation
- Gabriel De Jesus Soto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,224,157
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for non-destructive inspection of cell etch redeposition
- Patent number 12,218,014
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- I-Che Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for pulse width modulated dose control
- Patent number 12,215,421
- Issue date Feb 4, 2025
- Lam Research Corporation
- Mariusch Gregor
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,218,222
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,211,695
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Nobuhiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Stage, film-forming apparatus, and film-processing apparatus
- Patent number 12,211,710
- Issue date Jan 28, 2025
- NHK Spring Co., Ltd.
- Toshihiko Hanamachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL ETCHING OF MOLYBDENUM FILMS
- Publication number 20250112057
- Publication date Apr 3, 2025
- ASM IP HOLDING B.V.
- Patricio Eduardo Romero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
- Publication number 20250087462
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW ETCHING PROCESS CHAMBER
- Publication number 20250087467
- Publication date Mar 13, 2025
- VM Inc.
- Sang Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
- Publication number 20250087493
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Ryota UENO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL
- Publication number 20250079199
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND MATERIAL SYSTEM FOR HIGH STRENGTH SELECTIVE DIELECTRIC I...
- Publication number 20250079356
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Tyler Sherwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave-Enhanced Atomic Layer Etching
- Publication number 20250079182
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Charles Dezelah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...
- Publication number 20250079200
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- MING-YING PEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20250079173
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Daisuke YOSHIKOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER COATING FOR CORROSION RESISTANCE
- Publication number 20250069857
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Amir H. Tavakoli
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...
- Publication number 20250069866
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Changyou JING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20250069885
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS
- Publication number 20250054738
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dan MAROHL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20250046629
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...
- Publication number 20250046577
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Syam Parayil VENUGOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20250029843
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Hiroto FUJIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250029817
- Publication date Jan 23, 2025
- JUSUNG ENGINEERING CO., LTD.
- WOONG KYO OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20250022724
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Masanori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20250022755
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
GAS CLUSTER ASSISTED PLASMA PROCESSING
- Publication number 20250022689
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250022706
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS SYSTEM, METHOD, AND SUBSTRATE CHUCK
- Publication number 20250022739
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Matthew Charles Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR ETCHING SILICON OXIDE
- Publication number 20250014906
- Publication date Jan 9, 2025
- Central Glass Company, Limited
- Shoi SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROCESS PLATFORM
- Publication number 20250014931
- Publication date Jan 9, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Haiwei LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED TUNGSTEN GALVANIC CORROSION IN WET CLEANING FOR ADVANCED SE...
- Publication number 20250006554
- Publication date Jan 2, 2025
- Intel Corporation
- Ramanan Ehamparam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS
- Publication number 20240429038
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE
- Publication number 20240429070
- Publication date Dec 26, 2024
- SK HYNIX INC.
- Jin Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO CREATE AIR GAPS
- Publication number 20240429091
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Patrick A. Van Cleemput
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAS TREATMENT METHOD AND GAS TREATMENT DEVICE
- Publication number 20240412978
- Publication date Dec 12, 2024
- Tokyo Electron Limited
- Kimihiko DEMICHI
- H01 - BASIC ELECTRIC ELEMENTS

for drying etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer chuck structure with holes in upper surface to improve temper...

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Resonant filter for solid state RF impedance matching network

Plasma processing apparatus and method for venting a processing cha...

Method and apparatus for revitalizing plasma processing tools

Plasma processing apparatus

Method of processing substrate, substrate processing apparatus, rec...

Method for manufacturing semiconductor wafer with wafer chuck havin...

Systems for etching a substrate using a hybrid wet atomic layer etc...

Semiconductor processing system including temperature controller

Bottom and middle edge rings

Substrate processing method, substrate processing apparatus and sub...

Polymerization protective liner for reactive ion etch in patterning

Processing chamber with multiple plasma units

Systems and methods of control for plasma processing

Etching apparatus

Substrate processing apparatus, method of manufacturing semiconduct...

Semiconductor device and method of forming micro interconnect struc...

Method of separating electronic devices having a back layer and app...

Low temperature manifold assembly for substrate processing systems

Plasma processing apparatus and plasma processing method

Method for non-destructive inspection of cell etch redeposition

Systems and methods for pulse width modulated dose control

FinFET device and method of forming same

Etching method and etching apparatus

Systems and methods for metastable activated radical selective stri...

Stage, film-forming apparatus, and film-processing apparatus

Rating substrate support assemblies based on impedance circuit elec...

Method and apparatus for anisotropic pattern etching and treatment

Patents Applicationslast 30 patents

CHEMICAL ETCHING OF MOLYBDENUM FILMS

RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE

SHALLOW ETCHING PROCESS CHAMBER

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...

ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL

METHOD AND MATERIAL SYSTEM FOR HIGH STRENGTH SELECTIVE DIELECTRIC I...

Microwave-Enhanced Atomic Layer Etching

SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

MULTILAYER COATING FOR CORROSION RESISTANCE

IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS

ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...

METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE SUPPORT

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

GAS CLUSTER ASSISTED PLASMA PROCESSING

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PROCESS SYSTEM, METHOD, AND SUBSTRATE CHUCK

METHOD AND DEVICE FOR ETCHING SILICON OXIDE

PROCESS PLATFORM

REDUCED TUNGSTEN GALVANIC CORROSION IN WET CLEANING FOR ADVANCED SE...

SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS

SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE

METHOD TO CREATE AIR GAPS

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

GAS TREATMENT METHOD AND GAS TREATMENT DEVICE