Claims
- 1. In a method for wet processing a silver halide photosensitive material after development by desilvering the photosensitive material with a processing solution having a desilvering function in a processing tank, the improvement comprising the steps of:
- providing a plurality of compartments partitioned in the processing tank and serially connecting the compartments to define a continuous processing path having an entrance and an exit for the photosensitive material,
- filling the processing path with the processing solution such that the processing solution in at least one compartment has a different composition from the processing solution in at least one of the remaining compartments, and
- successively passing the photosensitive material through the compartments of the processing path without contact with the ambient air.
- 2. The method of claim 1 wherein
- said at least one compartment is filled with a processing solution selected from the group consisting of a processing solution having a substantial bleaching function, a processing solution having a substantial fixing function, and a processing solution having substantial bleaching and fixing functions, and
- said at least one of the remaining compartments is filled with a processing solution selected from said group, but different from the selected solution in said at least one compartment.
- 3. The method of claim 2 wherein said continuous processing path includes at least two regions filled with different processing solutions selected from said group.
- 4. The method of claim 1 wherein said continuous processing path includes a plurality of inlets for respectively replenishing a corresponding plurality of processing solutions having different compositions at different locations.
- 5. The method of claim 2 or 3 wherein said continuous processing path includes a plurality of inlets for respectively replenishing a corresponding plurality of processing solutions having different functions at different locations, the processing solutions being selected from the group consisting of a processing solution having a substantial bleaching function, a processing solution having a substantial fixing function, and a processing solution having substantial bleaching and fixing functions.
- 6. The method of claim 4 wherein said continuous processing path includes
- a first region filled with a processing solution having a substantial bleaching function and
- a second region disposed on the exit side of the first region for the photosensitive material and filled with a processing solution having substantial bleaching and fixing functions.
- 7. The method of claim 6 which includes the steps of:
- providing a first inlet on the entrance side of said first region for the photosensitive material,
- replenishing the processing solution having a substantial bleaching function into said first region through the first inlet,
- providing a second inlet on the entrance side of said second region for the photosensitive material, and
- replenishing the processing solution having a substantial fixing function into said second region through the second inlet.
- 8. The method of claim 7 wherein an outlet is disposed on the exit side of said second region for the photosensitive material for discharging the solution.
- 9. The method of claim 4 wherein said continuous processing path includes
- a first region filled with a processing solution having a substantial bleaching function,
- a second region disposed on the exit side of the first region for the photosensitive material and filled with a processing solution having substantial bleaching and fixing functions, and
- a third region disposed on the exit side of the second region for the photosensitive material and filled with a processing solution having a substantial fixing function.
- 10. The method of claim 9 which includes the steps of:
- providing a first inlet on the entrance side of said first region for the photosensitive material,
- replenishing the processing solution having a substantial bleaching function into said first region through the first inlet,
- providing a second inlet on the exit side of said third region for the photosensitive material, and
- replenishing the processing solution having a substantial fixing function into said third region through the second inlet.
- 11. The method of claim 10 which includes the steps of:
- providing a third inlet on the entrance side of said second region for the photosensitive material, and
- replenishing the processing solution having a substantial fixing function into said second region through the third inlet.
- 12. The method of claim 11 wherein an outlet is disposed in said second region for discharging the solution.
- 13. The method of claim 1 wherein said continuous processing path includes a channel for providing flow communication between the compartments.
- 14. The method of claim 1 wherein at least three processing compartments are partitioned in the tank.
- 15. The method of claim 1 wherein the tank further includes partitions for partitioning the compartments such that little flow of processing solution occurs between the compartments when no photosensitive material is passed.
- 16. The method of any one of claims 6 to 8 wherein said continuous processing path further includes a region disposed on the exit side of said second region for the photosensitive material and filled with a processing solution having a washing and/or stabilizing function.
- 17. The method of any one of claims 9 to 11 wherein said continuous processing path further includes a region disposed on the exit side of said third region for the photosensitive material and filled with a processing solution having a washing and/or stabilizing function.
Priority Claims (1)
Number |
Date |
Country |
Kind |
1-99855 |
Apr 1989 |
JPX |
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Parent Case Info
This application is a continuation-in-part application of a divisional application Ser. No. 592,413 filed Oct. 2, 1990, from copending application Ser. No. 499,746 filed Mar. 27, 1990 U.S. Pat. No. 4,980,714.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
4719173 |
Hahm |
Jan 1988 |
|
4780737 |
Kobayashi et al. |
Oct 1988 |
|
4980714 |
Nakamura et al. |
Dec 1990 |
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Divisions (1)
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Number |
Date |
Country |
Parent |
499746 |
Mar 1990 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
592413 |
Oct 1990 |
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