Number | Name | Date | Kind |
---|---|---|---|
3573190 | Bloom | Mar 1971 | |
3780255 | Boom | Dec 1973 | |
4115184 | Poulsen | Sep 1978 | |
4141811 | Yerkes et al. | Feb 1979 |
Entry |
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H. M. Gartner et al., In Situ Thermal Control/Monitor System for Reactive Ion Etch Process, IBM Technical Disclosure Bulletin vol. 20 No. 3 (8/77) p. 994 |