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"Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 .mu.m" by J. E. Bjorkholm et al., J. Vac. Sci. Technol. B8(6), Nov./Dec. 1990, pp. 1509-1513. |
"High-Precision Soft X-Ray Optics", Proceedings of Workshop, Oct. 5-6, 1989, section on Optical Fabrication, pp. 16-20. |
"Design and Analysis of Multimirror Soft-X-Ray Projection Lithography Systems" by D. L. Shealy et al., OSA Proceedings on Soft-X-Ray Projection Lithography, 1991, vol. 12, Jeffrey Bokor (ed.), Optical Society of America, pp. 22-26. |
"Optics Development for Soft X-Ray Projection Lithography Using a Laser Plasma Source" by R. H. Stulen et al., Nov. 15, 1990, OSA Proceedings on Soft-X-Ray Projection Lithography, 1991, vol. 12, Jeffrey Bokor (ed.), Optical Society of America, pp. 54-57. |
"Design survey of x-ray/XUV projection lithography systems" by D. L. Shealy et al., SPIE Advent Technology Series, vol. AT2, Summer/Fall 1990, (ed., Western Washingon University), SPIE Optical Engineering Press, pp. 320-331. |
"Reflective systems design study for soft x-ray projection lithography" by T. E. Jewell et al., J. Vac. Sci. Technol. B8(6), Nov./Dec. 1990, American Vacuum Society, pp. 1519-1523. |
"Step-and-scan lithography using reduction optics" by J. D. Buckley, J. Vac. Sci. Technol. B, vol. 7, No. 6, Nov./Dec. 1989, American Vacuum Society, pp. 1607-1612. |
"20:1 Projection Soft X-ray Lithography Using Tri-level Resist" by T. E. Jewell et al., 1263-34, 5 pages. |
"Optical imaging for microfabrication" by J. H. Bruning, J. Vac. Sci. Technol., 17(5), Sep./Oct. 1980, American Vacuum Society, pp. 1147-1155. |
"Reflection Mask Technology for X-Ray Projection Lithography", by A. M. Hawrylak et al., presented at 33rd International Conference on Electron, Ion and Photon Beam Technology, May 31, 1989; to be published in J. Vac. Sci. Technol., Nov./Dec. 1989, pp. 1-12. |