Optical aspects of catoptric systems

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G03F7/70233

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70233Optical aspects of catoptric systems

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Patents Grantslast 30 patents

Information Patent Grant
Spectrometric metrology systems based on multimode interference and...
- Patent number 12,135,505
- Issue date Nov 5, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 12,105,428
- Issue date Oct 1, 2024
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical objective for operation in EUV spectral region
- Patent number 11,934,105
- Issue date Mar 19, 2024
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Optical objective for operation in EUV spectral region
- Patent number 11,899,371
- Issue date Feb 13, 2024
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
UV lithography system
- Patent number 11,561,476
- Issue date Jan 24, 2023
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 11,467,501
- Issue date Oct 11, 2022
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Imaging optical unit for EUV microlithography
- Patent number 11,422,470
- Issue date Aug 23, 2022
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with curved 1d-patterned mask for use in EUV-ex...
- Patent number 11,300,884
- Issue date Apr 12, 2022
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,281,093
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit for imaging an object field into an image field
- Patent number 11,119,413
- Issue date Sep 14, 2021
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a mirror as an optical component for an optica...
- Patent number 11,092,897
- Issue date Aug 17, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,061,322
- Issue date Jul 13, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-mirror UV-LED optical lithography system
- Patent number 11,042,097
- Issue date Jun 22, 2021
- Soulnano Limited
- Cho Hang Wong
- G02 - OPTICS
Information Patent Grant
Reflective image-forming optical system, exposure apparatus, and de...
- Patent number 10,976,669
- Issue date Apr 13, 2021
- Nikon Corporation
- Yoshio Kawabe
- G02 - OPTICS
Information Patent Grant
Illumination optic for projection lithography
- Patent number 10,928,733
- Issue date Feb 23, 2021
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,908,508
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 10,866,522
- Issue date Dec 15, 2020
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imaging optical unit and projection exposure unit including same
- Patent number 10,656,400
- Issue date May 19, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 10,622,211
- Issue date Apr 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Reflective image-forming optical system, exposure apparatus, and de...
- Patent number 10,599,042
- Issue date Mar 24, 2020
- Nikon Corporation
- Yoshio Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,591,825
- Issue date Mar 17, 2020
- Carl Zeiss SMT GmbH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,558,126
- Issue date Feb 11, 2020
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical unit for imaging an object field into an image f...
- Patent number 10,558,026
- Issue date Feb 11, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical unit for EUV projection lithography
- Patent number 10,545,323
- Issue date Jan 28, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Imaging optical unit and projection exposure apparatus including same
- Patent number 10,527,832
- Issue date Jan 7, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,509,325
- Issue date Dec 17, 2019
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and device manufactu...
- Patent number 10,495,978
- Issue date Dec 3, 2019
- Canon Kabushiki Kaisha
- Yasuhito Sasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical system and projection exposure installation for mic...
- Patent number 10,481,500
- Issue date Nov 19, 2019
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250237963
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT
- Publication number 20250231493
- Publication date Jul 17, 2025
- Carl Zeiss SMT GMBH
- Ralf NOLTEMEYER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITH...
- Publication number 20250224681
- Publication date Jul 10, 2025
- Carl Zeiss SMT GMBH
- Matthias FETZER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM CO...
- Publication number 20250216797
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Sonia Anaelle BISSIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM
- Publication number 20250216792
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Joerg ZIMMERMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY OF AN OPTICAL SYSTEM
- Publication number 20250208376
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Christoph Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...
- Publication number 20250189900
- Publication date Jun 12, 2025
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20250147427
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Carlos Alberto JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20250138228
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE...
- Publication number 20250130503
- Publication date Apr 24, 2025
- Carl Zeiss SMT GMBH
- Michael BREHM
- G02 - OPTICS
Information Patent Application
CHAMBER, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND ELECTRONI...
- Publication number 20250126699
- Publication date Apr 17, 2025
- Gigaphoton Inc.
- Atsushi UEDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS
- Publication number 20250126698
- Publication date Apr 17, 2025
- Carl Zeiss SMT GMBH
- Silvi HAENDEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARA...
- Publication number 20250116939
- Publication date Apr 10, 2025
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE...
- Publication number 20250116940
- Publication date Apr 10, 2025
- Carl Zeiss SMT GMBH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...
- Publication number 20250102926
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM
- Publication number 20250102920
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Malte LANGENHORST
- G02 - OPTICS
Information Patent Application
METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM, AND PROJECTION E...
- Publication number 20250093782
- Publication date Mar 20, 2025
- Carl Zeiss SMT GMBH
- Malte LANGENHORST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...
- Publication number 20250076776
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- SEUNGPYO HONG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...
- Publication number 20250060682
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Armin Bernhard RIDINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20250044686
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Yaeun SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20250044702
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE
- Publication number 20250021009
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Ferry ZIJP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20250013156
- Publication date Jan 9, 2025
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD FOR A RADIATION SOURCE
- Publication number 20250008634
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Andrey Sergeevich TYCHKOV
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...
- Publication number 20240411232
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Jingshi LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT
- Publication number 20240385541
- Publication date Nov 21, 2024
- Carl Zeiss SMT GMBH
- Wilbert KRUITHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING

Optical aspects of catoptric systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Spectrometric metrology systems based on multimode interference and...

Image-forming optical system, exposure apparatus, and device produc...

Optical system with an aperture stop

Optical objective for operation in EUV spectral region

Optical objective for operation in EUV spectral region

UV lithography system

Image-forming optical system, exposure apparatus, and device produc...

Imaging optical unit for EUV microlithography

Illumination system with curved 1d-patterned mask for use in EUV-ex...

Systems and methods using mask pattern measurements performed with...

Imaging optical unit for imaging an object field into an image field

Method for producing a mirror as an optical component for an optica...

Systems and methods using mask pattern measurements performed with...

Multi-mirror UV-LED optical lithography system

Reflective image-forming optical system, exposure apparatus, and de...

Illumination optic for projection lithography

Position measurement of optical elements in a lithographic apparatus

Image-forming optical system, exposure apparatus, and device produc...

EUV exposure apparatus with reflective elements having reduced infl...

Imaging optical unit and projection exposure unit including same

Metal-compound-removing solvent and method in lithography

Reflective image-forming optical system, exposure apparatus, and de...

Projection lens, projection exposure apparatus and projection expos...

Lithographic apparatus and method

Projection optical unit for imaging an object field into an image f...

Projection optical unit for EUV projection lithography

Imaging optical unit and projection exposure apparatus including same

Position measurement of optical elements in a lithographic apparatus

Projection optical system, exposure apparatus, and device manufactu...

Imaging optical system and projection exposure installation for mic...

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESS APPARATUS

METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT

COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITH...

OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM CO...

METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM

ASSEMBLY OF AN OPTICAL SYSTEM

INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

MIRROR FOR A PROJECTION EXPOSURE APPARATUS

IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE...

CHAMBER, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND ELECTRONI...

EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS

METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARA...

IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE...

RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...

METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM

METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM, AND PROJECTION E...

EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...

LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...

METHOD OF FORMING PATTERNS

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

OPTICAL SYSTEM AND METHOD FOR A RADIATION SOURCE

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...