ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for controlling heating of base within chemica...
- Patent number 10,281,215
- Issue date May 7, 2019
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Baoxia Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus and its cleaning method
- Patent number 10,240,231
- Issue date Mar 26, 2019
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Zhiyou Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High frequency power supply device and high frequency power supplyi...
- Patent number 10,201,069
- Issue date Feb 5, 2019
- Pearl Kogyo Co., Ltd.
- Eiich Hayano
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Coating packaged chamber parts for semiconductor plasma apparatus
- Patent number 9,951,435
- Issue date Apr 24, 2018
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for controlling heating of base within chemica...
- Patent number 9,851,151
- Issue date Dec 26, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Baoxia Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for measuring temperature of film in reaction chamber
- Patent number 9,696,209
- Issue date Jul 4, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Lu Chen
- G01 - MEASURING TESTING
Information Patent Grant
Performance enhancement of coating packaged ESC for semiconductor a...
- Patent number 9,633,884
- Issue date Apr 25, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating packaged chamber parts for semiconductor plasma apparatus
- Patent number 9,617,633
- Issue date Apr 11, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas showerhead, method for making the same and thin film growth rea...
- Patent number 9,534,724
- Issue date Jan 3, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Yong Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for measuring temperature of substrate in vacuum...
- Patent number 9,443,715
- Issue date Sep 13, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Yousen Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ICP source design for plasma uniformity and efficiency enhancement
- Patent number 9,431,216
- Issue date Aug 30, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing device
- Patent number 9,275,870
- Issue date Mar 1, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Lei Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive-coupled plasma processing apparatus and method for proce...
- Patent number 9,230,781
- Issue date Jan 5, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Zhongdu Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 9,208,998
- Issue date Dec 8, 2015
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS COMPONENT AND METHOD TO IMPROVE MOCVD REACTION PROCESS
- Publication number 20190032246
- Publication date Jan 31, 2019
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR HAVING A FUNCTION OF TUNING LOW FREQUENCY RF POWER D...
- Publication number 20190006155
- Publication date Jan 3, 2019
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICA...
- Publication number 20180112919
- Publication date Apr 26, 2018
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Baoxia Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING PACKAGED CHAMBER PARTS FOR SEMICONDUCTOR PLASMA APPARATUS
- Publication number 20170241038
- Publication date Aug 24, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
TEMPERATURE ADJUSTING APPARATUS AND METHOD FOR A FOCUS RING
- Publication number 20170186590
- Publication date Jun 29, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Lei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE FOR ICP ETCHER
- Publication number 20170186585
- Publication date Jun 29, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Rason Zuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE...
- Publication number 20170186592
- Publication date Jun 29, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS THEREOF
- Publication number 20170154780
- Publication date Jun 1, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Ping Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MOCVD GAS SHOWERHEAD PRETREATMENT
- Publication number 20170130331
- Publication date May 11, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Yingbin LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING CHAMBER, COMBINATION OF PROCESSING CHAMBER AND LOADLOCK,...
- Publication number 20160351429
- Publication date Dec 1, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Heng Tao
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
CHEMICAL VAPOR DEPOSITION APPARATUS AND ITS CLEANING METHOD
- Publication number 20160319425
- Publication date Nov 3, 2016
- Advanced Micro-Fabrication Equipment Inc. Shanghai
- Zhiyou DU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20160322205
- Publication date Nov 3, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS COMPONENT AND METHOD TO IMPROVE MOCVD REACTION PROCESS
- Publication number 20160240726
- Publication date Aug 18, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF CHANGING GAS FLOW PATTERN AND A WAFER PROCESSING METHOD A...
- Publication number 20160172204
- Publication date Jun 16, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- TuQiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SHOWER DEVICE, CHEMICAL VAPOR DEPOSITION DEVICE AND METHOD
- Publication number 20150368799
- Publication date Dec 24, 2015
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Yong JIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYI...
- Publication number 20150289355
- Publication date Oct 8, 2015
- PEARL KOGYO CO., LTD.
- Eiich Hayano
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR MEASURING TEMPERATURE OF FILM IN REACTION CHAMBER
- Publication number 20150025832
- Publication date Jan 22, 2015
- Advanced Micro-Fabrication Equipment Inc., Shanghai
- Lu Chen
- G01 - MEASURING TESTING
Information Patent Application
PERFORMANCE ENHANCEMENT OF COATING PACKAGED ESC FOR SEMICONDUCTOR A...
- Publication number 20140118880
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS
- Publication number 20140116338
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING PACKAGED CHAMBER PARTS FOR SEMICONDUCTOR PLASMA APPARATUS
- Publication number 20140120312
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20140120731
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING PACKAGED SHOWERHEAD PERFORMANCE ENHANCEMENT FOR SEMICONDUCT...
- Publication number 20140117120
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20140106572
- Publication date Apr 17, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Lei Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
- Publication number 20140083452
- Publication date Mar 27, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Zheyao Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
- Publication number 20140083451
- Publication date Mar 27, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Zheyao Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
- Publication number 20140083453
- Publication date Mar 27, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Zheyao Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING GAS CONVEYING DEVICE, AND METHOD AND REACTION D...
- Publication number 20130344244
- Publication date Dec 26, 2013
- Advanced Micro-Fabrication Equipment Inc.,Shanghai
- Zhiyou Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR MEASURING TEMPERATURE OF SUBSTRATE IN VACUUM...
- Publication number 20130292370
- Publication date Nov 7, 2013
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Yousen Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROC...
- Publication number 20130062311
- Publication date Mar 14, 2013
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Zhongdu LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS AND METHOD, AND FILM GROWTH REACTION APPARATUS A...
- Publication number 20120255486
- Publication date Oct 11, 2012
- Advanced Micro-Fabrication Equipment Inc., Shanghai
- Yinxin Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI

Organization

Patents Grantslast 30 patents

Apparatus and method for controlling heating of base within chemica...

Chemical vapor deposition apparatus and its cleaning method

High frequency power supply device and high frequency power supplyi...

Coating packaged chamber parts for semiconductor plasma apparatus

Apparatus and method for controlling heating of base within chemica...

Method for measuring temperature of film in reaction chamber

Performance enhancement of coating packaged ESC for semiconductor a...

Coating packaged chamber parts for semiconductor plasma apparatus

Gas showerhead, method for making the same and thin film growth rea...

Method and device for measuring temperature of substrate in vacuum...

ICP source design for plasma uniformity and efficiency enhancement

Plasma processing method and plasma processing device

Capacitive-coupled plasma processing apparatus and method for proce...

Multi-station decoupled reactive ion etch chamber

Patents Applicationslast 30 patents

PROCESS COMPONENT AND METHOD TO IMPROVE MOCVD REACTION PROCESS

PLASMA REACTOR HAVING A FUNCTION OF TUNING LOW FREQUENCY RF POWER D...

APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICA...

COATING PACKAGED CHAMBER PARTS FOR SEMICONDUCTOR PLASMA APPARATUS

TEMPERATURE ADJUSTING APPARATUS AND METHOD FOR A FOCUS RING

ELECTRODE STRUCTURE FOR ICP ETCHER

MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE...

SUBSTRATE PROCESSING METHOD AND APPARATUS THEREOF

METHOD FOR MOCVD GAS SHOWERHEAD PRETREATMENT

PROCESSING CHAMBER, COMBINATION OF PROCESSING CHAMBER AND LOADLOCK,...

CHEMICAL VAPOR DEPOSITION APPARATUS AND ITS CLEANING METHOD

ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT

PROCESS COMPONENT AND METHOD TO IMPROVE MOCVD REACTION PROCESS

DEVICE OF CHANGING GAS FLOW PATTERN AND A WAFER PROCESSING METHOD A...

GAS SHOWER DEVICE, CHEMICAL VAPOR DEPOSITION DEVICE AND METHOD

HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYI...

METHOD FOR MEASURING TEMPERATURE OF FILM IN REACTION CHAMBER

PERFORMANCE ENHANCEMENT OF COATING PACKAGED ESC FOR SEMICONDUCTOR A...

COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS

COATING PACKAGED CHAMBER PARTS FOR SEMICONDUCTOR PLASMA APPARATUS

ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT

COATING PACKAGED SHOWERHEAD PERFORMANCE ENHANCEMENT FOR SEMICONDUCT...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER

METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER

METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER

METHOD FOR CLEANING GAS CONVEYING DEVICE, AND METHOD AND REACTION D...

METHOD AND DEVICE FOR MEASURING TEMPERATURE OF SUBSTRATE IN VACUUM...

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROC...

CLEANING APPARATUS AND METHOD, AND FILM GROWTH REACTION APPARATUS A...

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