Beijing NMC Co., Ltd.

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Beijing, CN

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 9,728,379
- Issue date Aug 8, 2017
- Beijing NMC Co., Ltd.
- Fenggang Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled coil and inductively coupled plasma device usin...
- Patent number 9,552,965
- Issue date Jan 24, 2017
- Beijing NMC Co., Ltd.
- Qiaoli Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing equipment and gas distribution apparatus thereof
- Patent number 9,540,732
- Issue date Jan 10, 2017
- Beijing NMC Co., Ltd.
- Liqiang Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate etching method
- Patent number 9,478,439
- Issue date Oct 25, 2016
- Beijing NMC Co., Ltd.
- Zhongwei Jiang
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Magnetron source, magnetron sputtering apparatus and magnetron sput...
- Patent number 9,399,817
- Issue date Jul 26, 2016
- Beijing NMC Co., Ltd.
- Yangchao Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate etching method and substrate processing device
- Patent number 9,187,319
- Issue date Nov 17, 2015
- Beijing NMC Co., Ltd.
- Gang Wei
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma processing equipment and gas distribution apparatus thereof
- Patent number 8,888,949
- Issue date Nov 18, 2014
- Beijing NMC Co., Ltd.
- Liqiang Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,547,021
- Issue date Oct 1, 2013
- Beijing NMC Co. Ltd.
- Gang Wei
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor structure and method for manufacturing the same
- Patent number 8,546,910
- Issue date Oct 1, 2013
- Institute of Microelectronics, Chinese Academy of Sciences
- Haizhou Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for controlling DC bias of RF discharge system
- Patent number 8,217,579
- Issue date Jul 10, 2012
- Beijing NMC Co. Ltd.
- Yi Zhao
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method of online predicting maintenance of an apparatus
- Patent number 8,154,721
- Issue date Apr 10, 2012
- Beijing NMC Co., Ltd.
- Zhuo Chen
- H01 - BASIC ELECTRIC ELEMENTS

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Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR PLASMA TREATMENT AND METHOD OF OPERATING THE APPARATUS
- Publication number 20170301523
- Publication date Oct 19, 2017
- BEIJING NMC CO., LTD
- Jinrong ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTION CHAMBER AND SEMI-CONDUCTOR PROCESSING DEVICE
- Publication number 20170154758
- Publication date Jun 1, 2017
- Beijing NMC Co., Ltd.
- Yanzhao ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR SPUTTERING AND OPERATION METHOD THEREOF
- Publication number 20170114446
- Publication date Apr 27, 2017
- BEIJING NMC CO., LTD
- Yujie YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED COIL AND INDUCTIVELY COUPLED PLASMA DEVICE USIN...
- Publication number 20170092466
- Publication date Mar 30, 2017
- Beijing NMC Co., Ltd.
- Qiaoli SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANICAL CHUCK AND PLASMA MACHINING DEVICE
- Publication number 20170044660
- Publication date Feb 16, 2017
- Beijing NMC Co., Ltd.
- Jue HOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTION CHAMBER AND PLASMA PROCESSING APPARATUS
- Publication number 20170011938
- Publication date Jan 12, 2017
- Beijing NMC Co., Ltd.
- Xingcun LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEARING DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20170011892
- Publication date Jan 12, 2017
- Beijing NMC Co., Ltd.
- Hao GUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON AND MAGNETRON SPUTTERING DEVICE
- Publication number 20170011894
- Publication date Jan 12, 2017
- Beijing NMC Co., Ltd.
- Yujie YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CASSETTE POSITIONING DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20160329228
- Publication date Nov 10, 2016
- Beijing NMC Co., Ltd.
- Meng LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER AND SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20160322206
- Publication date Nov 3, 2016
- Beijing NMC Co., Ltd.
- Feng LV
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER
- Publication number 20160322243
- Publication date Nov 3, 2016
- Beijing NMC Co., Ltd.
- Xuewei WU
- B08 - CLEANING
Information Patent Application
PRE-CLEANING CHAMBER AND A SEMICONDUCTOR PROCESSING APPARATUS CONTA...
- Publication number 20160148789
- Publication date May 26, 2016
- BEIJING NMC CO., LTD
- PENG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE ETCHING METHOD
- Publication number 20150311091
- Publication date Oct 29, 2015
- Beijing NMC Co., Ltd.
- Zhongwei JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRAY DEVICE, REACTION CHAMBER AND MOCVD APPARATUS
- Publication number 20150284846
- Publication date Oct 8, 2015
- Beijing NMC Co., Ltd.
- Ye Tu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE ETCHING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20140363975
- Publication date Dec 11, 2014
- Beijing NMC Co., Ltd.
- Gang Wei
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Semiconductor structure and method for manufacturing the same
- Publication number 20140124859
- Publication date May 8, 2014
- Beijing NMC Co., Ltd.
- Haizhou Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON SOURCE, MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUT...
- Publication number 20130277205
- Publication date Oct 24, 2013
- Beijing NMC Co., Ltd.
- Yangchao Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOUR CHAMBER AND SUBSTRATE PROCESSING EQUIPMENT USING SAME
- Publication number 20130269614
- Publication date Oct 17, 2013
- Beijing NMC Co., Ltd.
- Mengxin Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130256129
- Publication date Oct 3, 2013
- Beijing NMC Co., Ltd.
- Peng Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR APPLYING POWER TO TARGET MATERIAL, POWER SUPPLY FOR TARG...
- Publication number 20130256119
- Publication date Oct 3, 2013
- Beijing NMC Co., Ltd.
- Bai Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor structure and method for manufacturing the same
- Publication number 20130001691
- Publication date Jan 3, 2013
- BEIJING NMC., LTD.
- Haizhou Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20120319181
- Publication date Dec 20, 2012
- Beijing NMC Co., Ltd.
- Haizhou Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20120313158
- Publication date Dec 13, 2012
- Beijing NMC Co., Ltd.
- Haizhou Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20120313149
- Publication date Dec 13, 2012
- Beijing NMC Co., Ltd.
- Haizhou Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND METHOD FOR REMOVING REMAINING CHARGES THEREON
- Publication number 20120200981
- Publication date Aug 9, 2012
- Beijing NMC Co., Ltd.
- Baohui Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEEP-TRENCH SILICON ETCHING AND GAS INLET SYSTEM THEREOF
- Publication number 20120138228
- Publication date Jun 7, 2012
- Beijing NMC Co., Ltd.
- Yang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110162801
- Publication date Jul 7, 2011
- Beijing NMC Co., Ltd.
- Fenggang Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR CONTROLLING DC BIAS OF RF DISCHARGE SYSTEM
- Publication number 20100283446
- Publication date Nov 11, 2010
- Beijing NMC., Ltd.
- Yi Zhao
- H03 - BASIC ELECTRONIC CIRCUITRY

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Trademarklast 30 trademarks

Information Trademark
79208007 - NAURA
- Serial number 79208007
- Registration number 5450583
- Filing date Nov 29, 2016
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- 7 - Machines and machine tools
Information Trademark
79207360 - NAURA
- Serial number 79207360
- Registration number 5455657
- Filing date Nov 29, 2016
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- 7 - Machines and machine tools

Beijing NMC Co., Ltd.

Organization

Patents Grantslast 30 patents

Plasma processing apparatus

Inductively coupled coil and inductively coupled plasma device usin...

Plasma processing equipment and gas distribution apparatus thereof

Substrate etching method

Magnetron source, magnetron sputtering apparatus and magnetron sput...

Substrate etching method and substrate processing device

Plasma processing equipment and gas distribution apparatus thereof

Plasma processing apparatus

Semiconductor structure and method for manufacturing the same

Device and method for controlling DC bias of RF discharge system

Method of online predicting maintenance of an apparatus

Patents Applicationslast 30 patents

APPARATUS FOR PLASMA TREATMENT AND METHOD OF OPERATING THE APPARATUS

REACTION CHAMBER AND SEMI-CONDUCTOR PROCESSING DEVICE

APPARATUS FOR SPUTTERING AND OPERATION METHOD THEREOF

INDUCTIVELY COUPLED COIL AND INDUCTIVELY COUPLED PLASMA DEVICE USIN...

MECHANICAL CHUCK AND PLASMA MACHINING DEVICE

REACTION CHAMBER AND PLASMA PROCESSING APPARATUS

BEARING DEVICE AND PLASMA PROCESSING APPARATUS

MAGNETRON AND MAGNETRON SPUTTERING DEVICE

CASSETTE POSITIONING DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS

PROCESS CHAMBER AND SEMICONDUCTOR PROCESSING APPARATUS

CHAMBER

PRE-CLEANING CHAMBER AND A SEMICONDUCTOR PROCESSING APPARATUS CONTA...

SUBSTRATE ETCHING METHOD

TRAY DEVICE, REACTION CHAMBER AND MOCVD APPARATUS

SUBSTRATE ETCHING METHOD AND SUBSTRATE PROCESSING DEVICE

Semiconductor structure and method for manufacturing the same

MAGNETRON SOURCE, MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUT...

VAPOUR CHAMBER AND SUBSTRATE PROCESSING EQUIPMENT USING SAME

PLASMA PROCESSING APPARATUS

METHOD FOR APPLYING POWER TO TARGET MATERIAL, POWER SUPPLY FOR TARG...

Semiconductor structure and method for manufacturing the same

SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

ELECTROSTATIC CHUCK AND METHOD FOR REMOVING REMAINING CHARGES THEREON

DEEP-TRENCH SILICON ETCHING AND GAS INLET SYSTEM THEREOF

PLASMA PROCESSING APPARATUS

DEVICE AND METHOD FOR CONTROLLING DC BIAS OF RF DISCHARGE SYSTEM

Trademarklast 30 trademarks

79208007 - NAURA

79207360 - NAURA