DUPONT ELECTRONIC MATERIALS HOLDING, INC

Organization

  • NEWARK, DE, US

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    Functionalized Carbon Particle CMP Slurry

    • Publication number 20250223467
    • Publication date Jul 10, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Arthur W. MARTIN
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    Functionalized Carbon Particle CMP Slurry Dispersion

    • Publication number 20250223468
    • Publication date Jul 10, 2025
    • DuPont Electronic Materials Holdings, Inc.
    • Arthur W. MARTIN
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    PAD FOR CHEMICAL MECHANICAL POLISHING

    • Publication number 20250222556
    • Publication date Jul 10, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Matthew R. Gadinski
    • B24 - GRINDING POLISHING
  • Information Patent Application

    Chemical Mechanical Polishing Pad

    • Publication number 20250178156
    • Publication date Jun 5, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Philip J. SCOTT
    • B24 - GRINDING POLISHING
  • Information Patent Application

    Chemical Mechanical Polishing Pad

    • Publication number 20250178155
    • Publication date Jun 5, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Philip J. SCOTT
    • B24 - GRINDING POLISHING
  • Information Patent Application

    METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD

    • Publication number 20250100100
    • Publication date Mar 27, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Fengji YEH
    • B24 - GRINDING POLISHING
  • Information Patent Application

    CHEMICAL MECHANICAL POLISHING PAD

    • Publication number 20250100099
    • Publication date Mar 27, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Fengji YEH
    • B24 - GRINDING POLISHING
  • Information Patent Application

    POLISHING PAD FORMED FROM DUAL CURATIVE

    • Publication number 20250033161
    • Publication date Jan 30, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Fengji Yeh
    • B24 - GRINDING POLISHING
  • Information Patent Application

    CMP POLISHING PAD

    • Publication number 20250025983
    • Publication date Jan 23, 2025
    • DuPont Electronic Materials Holding, Inc.
    • Bainian Qian
    • B24 - GRINDING POLISHING

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