GLOBALWAFERS JAPAN CO., LTD.

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for pulling single crystal
- Patent number 12,084,785
- Issue date Sep 10, 2024
- Globalwafers Japan Co., Ltd
- Shingo Narimatsu
- C30 - CRYSTAL GROWTH
Information Patent Grant
Manufacturing method for semiconductor silicon wafer
- Patent number 12,046,469
- Issue date Jul 23, 2024
- Globalwafers Japan Co., Ltd
- Takeshi Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing three-dimensional structure, method for produc...
- Patent number 11,887,845
- Issue date Jan 30, 2024
- Globalwafers Japan Co., Ltd
- Kazutaka Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring extremely low oxygen concentration in silicon...
- Patent number 11,754,497
- Issue date Sep 12, 2023
- Globalwafers Japan Co., Ltd
- Hiroyuki Saito
- G01 - MEASURING TESTING
Information Patent Grant
Evaluation method of metal contamination
- Patent number 11,538,721
- Issue date Dec 27, 2022
- Globalwafers Japan Co., Ltd
- Nobue Araki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Thermal processing method for silicon wafer
- Patent number 11,162,191
- Issue date Nov 2, 2021
- Globalwafers Japan Co., Ltd
- Susumu Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method of silicon wafer
- Patent number 11,060,983
- Issue date Jul 13, 2021
- Globalwafers Japan Co., Ltd
- Haruo Sudo
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing epitaxial silicon wafers
- Patent number 10,916,421
- Issue date Feb 9, 2021
- Globalwafers Japan Co., Ltd
- Jun Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective-film forming method for semiconductor substrate
- Patent number 10,840,089
- Issue date Nov 17, 2020
- Globalwafers Japan Co., Ltd
- Shin Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon wafer
- Patent number 10,648,101
- Issue date May 12, 2020
- Globalwafers Japan Co., Ltd
- Susumu Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration curve determination method, carbon concentration measur...
- Patent number 10,330,599
- Issue date Jun 25, 2019
- Globalwafers Japan Co., Ltd
- Satoko Nakagawa
- G01 - MEASURING TESTING
Information Patent Grant
Silicon wafer and method for manufacturing the same
- Patent number 10,141,180
- Issue date Nov 27, 2018
- Globalwafers Japan Co., Ltd
- Koji Araki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration curve formation method, impurity concentration measurem...
- Patent number 9,541,452
- Issue date Jan 10, 2017
- GlobalWafers Japan Co., Ltd.
- Satoko Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single crystal pulling-up apparatus of pulling-up silicon single cr...
- Patent number 8,936,679
- Issue date Jan 20, 2015
- Globalwafers Japan Co., Ltd
- Hironori Banba
- C30 - CRYSTAL GROWTH
Information Patent Grant
Silicon wafer
- Patent number 8,642,449
- Issue date Feb 4, 2014
- Globalwafers Japan Co., Ltd.
- Takashi Watanabe
- C30 - CRYSTAL GROWTH

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Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SILICON WAFERS
- Publication number 20240339315
- Publication date Oct 10, 2024
- GlobalWafers Japan Co., Ltd.
- Susumu MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER AND METHOD FOR PRODUCING SILICON WAFER
- Publication number 20230243062
- Publication date Aug 3, 2023
- GLOBALWAFERS JAPAN CO., LTD.
- Haruo SUDO
- C30 - CRYSTAL GROWTH
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER
- Publication number 20230073641
- Publication date Mar 9, 2023
- GlobalWafers Japan Co., Ltd.
- Takeshi SENDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER
- Publication number 20230061427
- Publication date Mar 2, 2023
- GlobalWafers Japan Co., Ltd.
- Takeshi SENDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER
- Publication number 20230055929
- Publication date Feb 23, 2023
- GlobalWafers Japan Co., Ltd.
- Takeshi SENDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PULLING SINGLE CRYSTAL
- Publication number 20220364258
- Publication date Nov 17, 2022
- GlobalWafers Japan Co., Ltd.
- Shingo NARIMATSU
- C30 - CRYSTAL GROWTH
Information Patent Application
LAMINATION WAFERS AND METHOD OF PRODUCING BONDED WAFERS USING THE SAME
- Publication number 20220319835
- Publication date Oct 6, 2022
- GlobalWafers Japan Co., Ltd.
- Tatsuhiko AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING THREE-DIMENSIONAL STRUCTURE, METHOD FOR PRODUC...
- Publication number 20220093396
- Publication date Mar 24, 2022
- GlobalWafers Japan Co., Ltd.
- Kazutaka KAMIJO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING EXTREMELY LOW OXYGEN CONCENTRATION IN SILICON...
- Publication number 20220018761
- Publication date Jan 20, 2022
- GlobalWafers Japan Co., Ltd.
- Hiroyuki SAITO
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR HEAT-TREATING SILICON WAFER
- Publication number 20210348302
- Publication date Nov 11, 2021
- GlobalWafers Japan Co., Ltd.
- Aya USHIODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD OF METAL CONTAMINATION
- Publication number 20210082774
- Publication date Mar 18, 2021
- GlobalWafers Japan Co., Ltd.
- Nobue ARAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD OF SILICON WAFER
- Publication number 20210055232
- Publication date Feb 25, 2021
- GlobalWafers Japan Co., Ltd.
- Haruo SUDO
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PRODUCING THREE-DIMENSIONAL STRUCTURE, METHOD FOR PRODUC...
- Publication number 20200211840
- Publication date Jul 2, 2020
- GlobalWafers Japan Co., Ltd.
- Kazutaka KAMIJO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE-FILM FORMING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20200203159
- Publication date Jun 25, 2020
- GLOBALWAFERS JAPAN CO., LTD.
- Shin SAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING METHOD FOR SILICON WAFER
- Publication number 20200181802
- Publication date Jun 11, 2020
- GLOBALWAFERS JAPAN CO., LTD.
- Susumu MAEDA
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF MANUFACTURING EPITAXIAL SILICON WAFERS
- Publication number 20190393032
- Publication date Dec 26, 2019
- GlobalWafers Japan Co., Ltd.
- Jun YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER
- Publication number 20190119828
- Publication date Apr 25, 2019
- GLOBALWAFERS JAPAN CO., LTD.
- Susumu MAEDA
- C30 - CRYSTAL GROWTH
Information Patent Application
CALIBRATION CURVE DETERMINATION METHOD, CARBON CONCENTRATION MEASUR...
- Publication number 20180231468
- Publication date Aug 16, 2018
- GLOBALWAFERS JAPAN CO., LTD.
- Satoko NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SILICON WAFER
- Publication number 20160293446
- Publication date Oct 6, 2016
- GlobalWafers Japan Co., Ltd.
- Haruo SUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION CURVE FORMATION METHOD, IMPURITY CONCENTRATION MEASUREM...
- Publication number 20150338276
- Publication date Nov 26, 2015
- GLOBALWAFERS JAPAN CO., LTD.
- Satoko NAKAGAWA
- G01 - MEASURING TESTING
Information Patent Application
SILICON WAFER AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20150044422
- Publication date Feb 12, 2015
- GLOBALWAFERS JAPAN CO., LTD.
- Koji ARAKI
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON SINGLE CRYSTAL AND METHOD FOR MANUFACTURE THEREOF
- Publication number 20150017086
- Publication date Jan 15, 2015
- GlobalWafers Japan Co., Ltd.
- Yuta NAGAI
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON WAFER
- Publication number 20130251950
- Publication date Sep 26, 2013
- GlobalWafers Japan Co., Ltd.
- Yuri Kaneda
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR MANUFACTURING SILICON WAFER
- Publication number 20130175726
- Publication date Jul 11, 2013
- GlobalWafers Japan Co., Ltd.
- Toshiro MINAMI
- C30 - CRYSTAL GROWTH

GLOBALWAFERS JAPAN CO., LTD.

Organization

Patents Grantslast 30 patents

Method and apparatus for pulling single crystal

Manufacturing method for semiconductor silicon wafer

Method for producing three-dimensional structure, method for produc...

Method for measuring extremely low oxygen concentration in silicon...

Evaluation method of metal contamination

Thermal processing method for silicon wafer

Evaluation method of silicon wafer

Method of manufacturing epitaxial silicon wafers

Protective-film forming method for semiconductor substrate

Silicon wafer

Calibration curve determination method, carbon concentration measur...

Silicon wafer and method for manufacturing the same

Calibration curve formation method, impurity concentration measurem...

Single crystal pulling-up apparatus of pulling-up silicon single cr...

Silicon wafer

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SILICON WAFERS

SILICON WAFER AND METHOD FOR PRODUCING SILICON WAFER

MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER

MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER

MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER

METHOD AND APPARATUS FOR PULLING SINGLE CRYSTAL

LAMINATION WAFERS AND METHOD OF PRODUCING BONDED WAFERS USING THE SAME

METHOD FOR PRODUCING THREE-DIMENSIONAL STRUCTURE, METHOD FOR PRODUC...

METHOD FOR MEASURING EXTREMELY LOW OXYGEN CONCENTRATION IN SILICON...

METHOD FOR HEAT-TREATING SILICON WAFER

EVALUATION METHOD OF METAL CONTAMINATION

EVALUATION METHOD OF SILICON WAFER

METHOD FOR PRODUCING THREE-DIMENSIONAL STRUCTURE, METHOD FOR PRODUC...

PROTECTIVE-FILM FORMING METHOD FOR SEMICONDUCTOR SUBSTRATE

THERMAL PROCESSING METHOD FOR SILICON WAFER

METHOD OF MANUFACTURING EPITAXIAL SILICON WAFERS

SILICON WAFER

CALIBRATION CURVE DETERMINATION METHOD, CARBON CONCENTRATION MEASUR...

METHOD FOR MANUFACTURING A SILICON WAFER

CALIBRATION CURVE FORMATION METHOD, IMPURITY CONCENTRATION MEASUREM...

SILICON WAFER AND METHOD FOR MANUFACTURING THE SAME

SILICON SINGLE CRYSTAL AND METHOD FOR MANUFACTURE THEREOF

SILICON WAFER

METHOD FOR MANUFACTURING SILICON WAFER