KOMATSU ELECTRONIC METALS CO., LTD.

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Hiratsuka-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for determining concentration of impurity element
- Patent number 8,090,544
- Issue date Jan 3, 2012
- Komatsu Electronic Metals Co., Ltd.
- Kiyoshi Nagai
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring impurity metal concentration
- Patent number 7,141,992
- Issue date Nov 28, 2006
- Komatsu Electronic Metals Co., Ltd.
- Ryuuji Ohno
- G01 - MEASURING TESTING
Information Patent Grant
Marking method for semiconductor wafer
- Patent number 6,877,668
- Issue date Apr 12, 2005
- Komatsu Electronic Metals Co., LTD
- Satoshi Kitagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for manufacturing single-crystal ingot
- Patent number 6,858,076
- Issue date Feb 22, 2005
- Komatsu Electronic Metals Co., Ltd.
- Hirotaka Nakajima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor wafer
- Patent number 6,777,820
- Issue date Aug 17, 2004
- Komatsu Electronic Metals Co., Ltd.
- Teiichirou Chiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for polishing a semiconductor wafer
- Patent number 6,517,667
- Issue date Feb 11, 2003
- Komatsu Electronic Metals Co., Ltd.
- Yuichi Nakayoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Method for appraising the condition of a semiconductor polishing cloth
- Patent number 6,495,465
- Issue date Dec 17, 2002
- Komatsu Electronic Metals Co., Ltd.
- Yuichi Nakayoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Silicon wafer for hydrogen heat treatment and method for manufactur...
- Patent number 6,273,944
- Issue date Aug 14, 2001
- Komatsu Electronic Metals Co., Ltd.
- Toshiaki Saishoji
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus and a method of manufacturing a crystal
- Patent number 6,270,575
- Issue date Aug 7, 2001
- Komatsu Electronic Metals Co., Ltd.
- Shoei Kurosaka
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for manufacturing semiconductor wafers
- Patent number 6,245,678
- Issue date Jun 12, 2001
- Komatsu Electronic Metals Co., Ltd.
- Hiroaki Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor mirror-polished surface wafers and method for manufac...
- Patent number 6,234,873
- Issue date May 22, 2001
- Komatsu Electronic Metals Co., Ltd.
- Hiroaki Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial-wafer fabricating process
- Patent number 6,217,650
- Issue date Apr 17, 2001
- Komatsu Electronic Metals Co., Ltd.
- Takeshi Hirose
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for manufacturing silicon single crystals and wafers adapted...
- Patent number 6,179,910
- Issue date Jan 30, 2001
- Komatsu Electronic Metals Co., LTD
- Takashi Yokoyama
- C30 - CRYSTAL GROWTH
Information Patent Grant
Seed crystal and method of manufacturing single crystal
- Patent number 6,171,393
- Issue date Jan 9, 2001
- Komatsu Electronic Metals Co., Ltd.
- Shoei Kurosaka
- C30 - CRYSTAL GROWTH
Information Patent Grant
Wafer holding structure for semiconductor wafer containers
- Patent number 6,168,025
- Issue date Jan 2, 2001
- Komatsu Electronic Metals Co., Ltd.
- Youichi Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor wafers
- Patent number 6,162,730
- Issue date Dec 19, 2000
- Komatsu Electronic Metals Co., Ltd.
- Fumitaka Kai
- C30 - CRYSTAL GROWTH
Information Patent Grant
Suspender for polycrystalline material rods
- Patent number 6,139,630
- Issue date Oct 31, 2000
- Komatsu Electronic Metals Co., Ltd.
- Tatsuhiro Fujiyama
- C30 - CRYSTAL GROWTH
Information Patent Grant
Device for manufacturing single crystals
- Patent number 6,117,402
- Issue date Sep 12, 2000
- Komatsu Electronic Metals Co., Ltd.
- Toshirou Kotooka
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus for feeding raw material into a quartz crucible
- Patent number 6,106,617
- Issue date Aug 22, 2000
- Komatsu Electronic Metals Co., Ltd.
- Yoshifumi Yatsurugi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus for pulling up single crystals and single crystal clampin...
- Patent number 6,099,642
- Issue date Aug 8, 2000
- Komatsu Electronic Metals Co., Ltd.
- Shoei Kurosaka
- C30 - CRYSTAL GROWTH
Information Patent Grant
Silicon crystal, and device and method for manufacturing same
- Patent number 6,096,128
- Issue date Aug 1, 2000
- Toshiba Ceramics Co., Ltd.
- Hideo Nakanishi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for fabricating an SOI substrate
- Patent number 6,090,688
- Issue date Jul 18, 2000
- Komatsu Electronic Metals Co., Ltd.
- Tadashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single crystal pulling apparatus and droppage preventing device
- Patent number 6,077,347
- Issue date Jun 20, 2000
- Komatsu Electronic Metals Co., Ltd.
- Naritoshi Ohtsukasa
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus for fabricating single-crystal silicon
- Patent number 6,071,341
- Issue date Jun 6, 2000
- Komatsu Electronic Metals Co., Ltd.
- Yoshiyuki Shimanuki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus for fabricating semiconductor single crystal
- Patent number 6,068,699
- Issue date May 30, 2000
- Komatsu Electronic Metals Co., Ltd.
- Hideki Tsuji
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of manufacturing a semiconductor wafer
- Patent number 6,066,565
- Issue date May 23, 2000
- Komatsu Electronic Metals Co., Ltd.
- Hideyo Kuroki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single crystal pulling method
- Patent number 6,042,644
- Issue date Mar 28, 2000
- Komatsu Electronic Metals Co., Ltd.
- Shoei Kurosaka
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and device for manufacturing single crystals
- Patent number 6,036,776
- Issue date Mar 14, 2000
- Komatsu Electronic Metals Co., Ltd.
- Toshiro Kotooka
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of fabricating a silicon single crystal
- Patent number 6,030,450
- Issue date Feb 29, 2000
- Komatsu Electronic Metals Co., Ltd.
- Toshiaki Saishouji
- C30 - CRYSTAL GROWTH
Information Patent Grant
Air blow apparatus for a semiconductor wafer
- Patent number 6,018,884
- Issue date Feb 1, 2000
- Komatsu Electronic Metals Co., Ltd.
- Hisaya Fukunaga
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETERMINING CONCENTRATION OF IMPURITY ELEMENT
- Publication number 20090198452
- Publication date Aug 6, 2009
- KOMATSU ELECTRONIC METALS CO., LTD
- Kiyoshi Nagai
- G01 - MEASURING TESTING
Information Patent Application
Semiconductor wafer inspection device and method
- Publication number 20090040512
- Publication date Feb 12, 2009
- KOMATSU ELECTRONIC METALS CO., LTD.
- Fumi Nabeshima
- G01 - MEASURING TESTING
Information Patent Application
Silicon Semiconductor Substrate Heat-Treatment Method and Silicon S...
- Publication number 20070252239
- Publication date Nov 1, 2007
- KOMATSU ELECTRONIC METALS CO., LTD
- Susumu Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Inspecting Semiconductor Wafer
- Publication number 20070229815
- Publication date Oct 4, 2007
- Komatsu Electronic Metals Co., Ltd.
- Fumi Nabeshima
- G01 - MEASURING TESTING
Information Patent Application
NITORGEN DOPED SILICON WAFER AND MANUFACTURING METHOD THEREOF
- Publication number 20070218570
- Publication date Sep 20, 2007
- KOMATSU ELECTRONIC METALS CO., LTD
- Kouzo Nakamura
- C30 - CRYSTAL GROWTH
Information Patent Application
Polishing method for semiconductor wafer
- Publication number 20070059935
- Publication date Mar 15, 2007
- KOMATSU ELECTRONIC METALS CO., LTD.
- Kazuaki Kozasa
- B24 - GRINDING POLISHING
Information Patent Application
Method for measuring impurity metal concentration
- Publication number 20060066324
- Publication date Mar 30, 2006
- KOMATSU ELECTRONIC METALS CO., LTD.
- Ryuuji Ohno
- G01 - MEASURING TESTING

Trademarklast 30 trademarks

Information Trademark
75061121 - ITOX
- Serial number 75061121
- Registration number 2164393
- Filing date Feb 22, 1996
- Komatsu Electronic Metals Co., Ltd.
- 9 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments

KOMATSU ELECTRONIC METALS CO., LTD.

Organization

Patents Grantslast 30 patents

Method for determining concentration of impurity element

Method for measuring impurity metal concentration

Marking method for semiconductor wafer

Method and apparatus for manufacturing single-crystal ingot

Semiconductor wafer

Apparatus for polishing a semiconductor wafer

Method for appraising the condition of a semiconductor polishing cloth

Silicon wafer for hydrogen heat treatment and method for manufactur...

Apparatus and a method of manufacturing a crystal

Method for manufacturing semiconductor wafers

Semiconductor mirror-polished surface wafers and method for manufac...

Epitaxial-wafer fabricating process

Method for manufacturing silicon single crystals and wafers adapted...

Seed crystal and method of manufacturing single crystal

Wafer holding structure for semiconductor wafer containers

Method for fabricating semiconductor wafers

Suspender for polycrystalline material rods

Device for manufacturing single crystals

Apparatus for feeding raw material into a quartz crucible

Apparatus for pulling up single crystals and single crystal clampin...

Silicon crystal, and device and method for manufacturing same

Method for fabricating an SOI substrate

Single crystal pulling apparatus and droppage preventing device

Apparatus for fabricating single-crystal silicon

Apparatus for fabricating semiconductor single crystal

Method of manufacturing a semiconductor wafer

Single crystal pulling method

Method and device for manufacturing single crystals

Method of fabricating a silicon single crystal

Air blow apparatus for a semiconductor wafer

Patents Applicationslast 30 patents

METHOD FOR DETERMINING CONCENTRATION OF IMPURITY ELEMENT

Semiconductor wafer inspection device and method

Silicon Semiconductor Substrate Heat-Treatment Method and Silicon S...

Apparatus and Method for Inspecting Semiconductor Wafer

NITORGEN DOPED SILICON WAFER AND MANUFACTURING METHOD THEREOF

Polishing method for semiconductor wafer

Method for measuring impurity metal concentration

Trademarklast 30 trademarks

75061121 - ITOX