MES AFTY Corporation

Follow

Organization

Tokyo, JP

Organizations

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
ECR plasma source and ECR plasma device
- Patent number 7,485,204
- Issue date Feb 3, 2009
- MES AFTY Corporation
- Seitaro Matsuo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Trademarklast 30 trademarks