Micromaterials LLC.

Organization

Wilmington, DE, US

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Methods for controllable metal and barrier-liner recess
- Patent number 11,705,366
- Issue date Jul 18, 2023
- Micromaterials LLC
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for high pressure processing chamber
- Patent number 11,527,421
- Issue date Dec 13, 2022
- Micromaterials, LLC
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-aligned contact and contact over active gate structures
- Patent number 11,437,273
- Issue date Sep 6, 2022
- Micromaterials LLC
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned via
- Patent number 11,437,274
- Issue date Sep 6, 2022
- Micromaterials LLC
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM capacitor module
- Patent number 11,164,938
- Issue date Nov 2, 2021
- Micromaterials LLC
- Uday Mitra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing and reflow of a high quality etch resistant g...
- Patent number 11,114,333
- Issue date Sep 7, 2021
- Micromaterials, LLC
- Srinivas D. Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for controllable metal and barrier-liner recess
- Patent number 11,062,942
- Issue date Jul 13, 2021
- Micromaterials LLC
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal contact landing structure
- Patent number 11,049,695
- Issue date Jun 29, 2021
- Micromaterials LLC
- Sung Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 11,037,825
- Issue date Jun 15, 2021
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating a fully self-aligned via
- Patent number 10,892,187
- Issue date Jan 12, 2021
- Micromaterials LLC
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for removing metal oxides
- Patent number 10,892,183
- Issue date Jan 12, 2021
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 10,790,191
- Issue date Sep 29, 2020
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for high pressure processing chamber
- Patent number 10,720,341
- Issue date Jul 21, 2020
- Micromaterials, LLC
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for creating a fully self-aligned via
- Patent number 10,699,953
- Issue date Jun 30, 2020
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of selective aluminum oxide etch
- Patent number 10,692,728
- Issue date Jun 23, 2020
- Micromaterials LLC
- Qingjun Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of producing self-aligned vias
- Patent number 10,600,688
- Issue date Mar 24, 2020
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively etched self-aligned via processes
- Patent number 10,593,594
- Issue date Mar 17, 2020
- Micromaterials LLC
- Yung-Chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of producing self-aligned grown via
- Patent number 10,573,555
- Issue date Feb 25, 2020
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of producing fully self-aligned vias and contacts
- Patent number 10,553,485
- Issue date Feb 4, 2020
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure wafer processing systems and related methods
- Patent number 10,529,603
- Issue date Jan 7, 2020
- Micromaterials, LLC
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fully self-aligned via
- Patent number 10,522,404
- Issue date Dec 31, 2019
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask scheme for cut pattern flow with enlarged EPE window
- Patent number 10,510,540
- Issue date Dec 17, 2019
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned via
- Patent number 10,410,921
- Issue date Sep 10, 2019
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure wafer processing systems and related methods
- Patent number 10,224,224
- Issue date Mar 5, 2019
- Micromaterials, LLC
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER
- Publication number 20230093374
- Publication date Mar 23, 2023
- Micromaterials, LLC.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20220367270
- Publication date Nov 17, 2022
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULLY SELF-ALIGNED VIA
- Publication number 20220359289
- Publication date Nov 10, 2022
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR DEPOSITING MOLTEN METAL ONTO A FOIL SUBST...
- Publication number 20220298616
- Publication date Sep 22, 2022
- Micromaterials LLC.
- Bernard FREY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR DEPOSITING MOLTEN METAL ONTO A FOIL SUBST...
- Publication number 20220298617
- Publication date Sep 22, 2022
- Micromaterials LLC.
- Bernard FREY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRAM Capacitor Module
- Publication number 20220013624
- Publication date Jan 13, 2022
- Micromaterials LLC.
- Uday Mitra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Controllable Metal And Barrier-Liner Recess
- Publication number 20210305091
- Publication date Sep 30, 2021
- Micromaterials LLC.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fully Self-Aligned Via
- Publication number 20210090952
- Publication date Mar 25, 2021
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR DEPOSITING MOLTEN METAL ONTO A FOIL SUBST...
- Publication number 20210062318
- Publication date Mar 4, 2021
- Micromaterials LLC.
- Bernard FREY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal Process To Create High Aspect Ratio Fully Self-Al...
- Publication number 20200388535
- Publication date Dec 10, 2020
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER
- Publication number 20200350183
- Publication date Nov 5, 2020
- Micromaterials, LLC.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRAM Capacitor Module
- Publication number 20200312953
- Publication date Oct 1, 2020
- Micromaterials LLC.
- Uday Mitra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20200279773
- Publication date Sep 3, 2020
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CONTACT LANDING STRUCTURE
- Publication number 20200168440
- Publication date May 28, 2020
- Micromaterials LLC.
- Sung Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULLY SELF-ALIGNED VIA
- Publication number 20200098633
- Publication date Mar 26, 2020
- Micromaterials LLC.
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Creating A Fully Self-Aligned Via
- Publication number 20190378756
- Publication date Dec 12, 2019
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Creating A Fully Self-Aligned Via
- Publication number 20190355620
- Publication date Nov 21, 2019
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Increasing The Verticality Of Pillars
- Publication number 20190355621
- Publication date Nov 21, 2019
- Micromaterials LLC.
- Christophe Marcadal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fully Self-Aligned Via
- Publication number 20190348323
- Publication date Nov 14, 2019
- Micromaterials LLC.
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal Process To Create High Aspect Ratio Fully Self-Al...
- Publication number 20190348322
- Publication date Nov 14, 2019
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Removing Metal Oxides
- Publication number 20190273019
- Publication date Sep 5, 2019
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING AND REFLOW OF A HIGH QUALITY ETCH RESISTANT G...
- Publication number 20190259625
- Publication date Aug 22, 2019
- Micromaterials LLC.
- Srinivas D. NEMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Controllable Metal And Barrier-Liner Recess
- Publication number 20190198389
- Publication date Jun 27, 2019
- Micromaterials LLC.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE WAFER PROCESSING SYSTEMS AND RELATED METHODS
- Publication number 20190198367
- Publication date Jun 27, 2019
- Micromaterials, LLC.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selectively Etched Self-Aligned Via Processes
- Publication number 20190189510
- Publication date Jun 20, 2019
- Micromaterials LLC.
- Yung-Chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fully Self-Aligned Via
- Publication number 20190189512
- Publication date Jun 20, 2019
- Micromaterials LLC.
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER
- Publication number 20190148178
- Publication date May 16, 2019
- Micromaterials, LLC.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER
- Publication number 20190119769
- Publication date Apr 25, 2019
- Micromaterials, LLC.
- Adib KHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of Selective Aluminum Oxide Etch
- Publication number 20190096666
- Publication date Mar 28, 2019
- Micromaterials LLC.
- Qingjun Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Producing Self-Aligned Vias
- Publication number 20190074219
- Publication date Mar 7, 2019
- Micromaterials LLC.
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Micromaterials LLC.

Organization

Patents Grantslast 30 patents

Methods for controllable metal and barrier-liner recess

Gas delivery system for high pressure processing chamber

Self-aligned contact and contact over active gate structures

Fully self-aligned via

DRAM capacitor module

Method for depositing and reflow of a high quality etch resistant g...

Methods for controllable metal and barrier-liner recess

Metal contact landing structure

Selective removal process to create high aspect ratio fully self-al...

Method for creating a fully self-aligned via

Methods for removing metal oxides

Selective removal process to create high aspect ratio fully self-al...

Gas delivery system for high pressure processing chamber

Method for creating a fully self-aligned via

Use of selective aluminum oxide etch

Methods of producing self-aligned vias

Selectively etched self-aligned via processes

Methods of producing self-aligned grown via

Methods of producing fully self-aligned vias and contacts

High pressure wafer processing systems and related methods

Fully self-aligned via

Mask scheme for cut pattern flow with enlarged EPE window

Fully self-aligned via

High pressure wafer processing systems and related methods

Patents Applicationslast 30 patents

GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

FULLY SELF-ALIGNED VIA

APPARATUS AND METHODS FOR DEPOSITING MOLTEN METAL ONTO A FOIL SUBST...

APPARATUS AND METHODS FOR DEPOSITING MOLTEN METAL ONTO A FOIL SUBST...

DRAM Capacitor Module

Methods For Controllable Metal And Barrier-Liner Recess

Fully Self-Aligned Via

APPARATUS AND METHODS FOR DEPOSITING MOLTEN METAL ONTO A FOIL SUBST...

Selective Removal Process To Create High Aspect Ratio Fully Self-Al...

GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER

DRAM Capacitor Module

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

METAL CONTACT LANDING STRUCTURE

FULLY SELF-ALIGNED VIA

Method For Creating A Fully Self-Aligned Via

Method For Creating A Fully Self-Aligned Via

Method For Increasing The Verticality Of Pillars

Fully Self-Aligned Via

Selective Removal Process To Create High Aspect Ratio Fully Self-Al...

Methods for Removing Metal Oxides

METHOD FOR DEPOSITING AND REFLOW OF A HIGH QUALITY ETCH RESISTANT G...

Methods For Controllable Metal And Barrier-Liner Recess

HIGH PRESSURE WAFER PROCESSING SYSTEMS AND RELATED METHODS

Selectively Etched Self-Aligned Via Processes

Fully Self-Aligned Via

GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER

GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER

Use of Selective Aluminum Oxide Etch

Methods Of Producing Self-Aligned Vias

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