S&S TECH CO., LTD.

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Daegu-si, KR

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Patents Grantslast 30 patents

Information Patent Grant
Phase shift blankmask and photomask for EUV lithography
- Patent number 11,940,725
- Issue date Mar 26, 2024
- S&S TECH CO., LTD.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift blankmask and photomask for EUV lithography
- Patent number 11,927,880
- Issue date Mar 12, 2024
- S&S TECH Co., Ltd.
- Yong-Dae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective type blankmask and photomask for EUV
- Patent number 11,815,801
- Issue date Nov 14, 2023
- S&S TECH Co., Ltd.
- Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective type blankmask and photomask for EUV
- Patent number 11,579,521
- Issue date Feb 14, 2023
- S&S TECH Co., Ltd.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask for extreme ultraviolet lithography
- Patent number 11,467,485
- Issue date Oct 11, 2022
- S&S TECH Co., Ltd.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective type blankmask for EUV, and method for manufacturing the...
- Patent number 11,435,661
- Issue date Sep 6, 2022
- S&S TECH Co., Ltd.
- Chul-Kyu Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Half-tone attenuated phase shift blankmask and photomask for EUV li...
- Patent number 11,360,377
- Issue date Jun 14, 2022
- S&S TECH Co., Ltd.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask, and methods of fabricating the same
- Patent number 10,942,445
- Issue date Mar 9, 2021
- S&S TECH Co., Ltd.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV lithography and method of fabricating the same
- Patent number 10,859,901
- Issue date Dec 8, 2020
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV lithography and method of fabricating the same
- Patent number 10,768,523
- Issue date Sep 8, 2020
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask using the same
- Patent number 10,036,947
- Issue date Jul 31, 2018
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift blankmask and photomask
- Patent number 10,018,905
- Issue date Jul 10, 2018
- S & S TECH CO., LTD
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift blankmask and photomask
- Patent number 9,851,632
- Issue date Dec 26, 2017
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask using the same
- Patent number 9,551,925
- Issue date Jan 24, 2017
- S&S TECH CO., LTD.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask
- Patent number 9,482,940
- Issue date Nov 1, 2016
- S&S TECH CO., LTD.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, photomask, and method for manufacturing same
- Patent number 9,389,500
- Issue date Jul 12, 2016
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift blankmask and method for fabricating the same
- Patent number 9,256,119
- Issue date Feb 9, 2016
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and method for fabricating photomask using the same
- Patent number 9,229,317
- Issue date Jan 5, 2016
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask using the same
- Patent number 8,846,276
- Issue date Sep 30, 2014
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

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Patents Applicationslast 30 patents

Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240126162
- Publication date Apr 18, 2024
- S&S TECH CO., LTD.
- Yong-Dae KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240126163
- Publication date Apr 18, 2024
- S&S TECH CO., LTD.
- Yong-Dae KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20240036461
- Publication date Feb 1, 2024
- S&S TECH Co., Ltd.
- Ju-Hee HONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20220269160
- Publication date Aug 25, 2022
- S&S TECH CO., LTD.
- Yong-Dae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20220236635
- Publication date Jul 28, 2022
- S&S TECH CO., LTD.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKMASK AND PHOTOMASK
- Publication number 20220075258
- Publication date Mar 10, 2022
- S&S TECH CO., LTD.
- Cheol SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE TYPE BLANKMASK FOR EUV, AND METHOD FOR MANUFACTURING THE...
- Publication number 20220066311
- Publication date Mar 3, 2022
- S&S TECH CO., LTD.
- Chul-Kyu YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKMASK WITH BACKSIDE CONDUCTIVE LAYER, AND PHOTOMASK MANUFACTURE...
- Publication number 20220066310
- Publication date Mar 3, 2022
- S&S TECH CO., LTD.
- Gyeong-Won SEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20220043336
- Publication date Feb 10, 2022
- S&S TECH CO., LTD.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV
- Publication number 20210208495
- Publication date Jul 8, 2021
- S&S TECH Co., Ltd.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV
- Publication number 20210208496
- Publication date Jul 8, 2021
- S&S TECH CO., LTD.
- Cheol SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20210132487
- Publication date May 6, 2021
- S&S TECH CO., LTD.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALF-TONE ATTENUATED PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LI...
- Publication number 20210124254
- Publication date Apr 29, 2021
- S&S TECH CO., LTD.
- Cheol SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210096458
- Publication date Apr 1, 2021
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK
- Publication number 20200379337
- Publication date Dec 3, 2020
- S&S TECH CO., LTD.
- Cheol SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK, AND METHODS OF FABRICATING THE SAME
- Publication number 20200019053
- Publication date Jan 16, 2020
- S&S TECH CO., LTD.
- Cheol SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME
- Publication number 20190146324
- Publication date May 16, 2019
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK
- Publication number 20180335692
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME
- Publication number 20180335691
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME
- Publication number 20180259845
- Publication date Sep 13, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK USING THE SAME
- Publication number 20170023854
- Publication date Jan 26, 2017
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK
- Publication number 20160291451
- Publication date Oct 6, 2016
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND PHOTOMASK
- Publication number 20160054650
- Publication date Feb 25, 2016
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK USING THE SAME
- Publication number 20150268552
- Publication date Sep 24, 2015
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING SAME
- Publication number 20150212403
- Publication date Jul 30, 2015
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK
- Publication number 20150093689
- Publication date Apr 2, 2015
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND METHOD FOR FABRICATING THE SAME
- Publication number 20130288165
- Publication date Oct 31, 2013
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK USING THE SAME
- Publication number 20130095415
- Publication date Apr 18, 2013
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

S&S TECH CO., LTD.

Organization

Patents Grantslast 30 patents

Phase shift blankmask and photomask for EUV lithography

Phase shift blankmask and photomask for EUV lithography

Reflective type blankmask and photomask for EUV

Reflective type blankmask and photomask for EUV

Blankmask and photomask for extreme ultraviolet lithography

Reflective type blankmask for EUV, and method for manufacturing the...

Half-tone attenuated phase shift blankmask and photomask for EUV li...

Blankmask and photomask, and methods of fabricating the same

Pellicle for EUV lithography and method of fabricating the same

Pellicle for EUV lithography and method of fabricating the same

Blankmask and photomask using the same

Phase shift blankmask and photomask

Phase-shift blankmask and photomask

Blankmask and photomask using the same

Blankmask and photomask

Mask blank, photomask, and method for manufacturing same

Phase-shift blankmask and method for fabricating the same

Blankmask and method for fabricating photomask using the same

Blankmask and photomask using the same

Patents Applicationslast 30 patents

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

PELLICLE FOR EUV LITHOGRAPHY

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

BLANKMASK AND PHOTOMASK

REFLECTIVE TYPE BLANKMASK FOR EUV, AND METHOD FOR MANUFACTURING THE...

BLANKMASK WITH BACKSIDE CONDUCTIVE LAYER, AND PHOTOMASK MANUFACTURE...

PELLICLE FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING THE SAME

REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV

REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV

BLANKMASK AND PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

HALF-TONE ATTENUATED PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LI...

PELLICLE FOR EUV LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME

BLANKMASK AND PHOTOMASK

BLANKMASK AND PHOTOMASK, AND METHODS OF FABRICATING THE SAME

PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME

PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME

BLANKMASK AND PHOTOMASK USING THE SAME

PHASE SHIFT BLANKMASK AND PHOTOMASK

PHASE-SHIFT BLANKMASK AND PHOTOMASK

BLANKMASK AND PHOTOMASK USING THE SAME

MASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING SAME

BLANKMASK AND PHOTOMASK

PHASE-SHIFT BLANKMASK AND METHOD FOR FABRICATING THE SAME

BLANKMASK AND PHOTOMASK USING THE SAME