Timbre Technologies, Inc.

Organization

Santa Clara, CA, US

Organizations

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Patents Grantslast 30 patents

Information Patent Grant
Modeling and measuring structures with spatially varying properties...
- Patent number 7,515,282
- Issue date Apr 7, 2009
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Model and parameter selection for optical metrology
- Patent number 7,505,153
- Issue date Mar 17, 2009
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selection of wavelengths for integrated circuit optical metrology
- Patent number 7,474,993
- Issue date Jan 6, 2009
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Grant
In-die optical metrology
- Patent number 7,474,420
- Issue date Jan 6, 2009
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Transforming metrology data from a semiconductor treatment system u...
- Patent number 7,467,064
- Issue date Dec 16, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Examining a structure formed on a semiconductor wafer using machine...
- Patent number 7,453,584
- Issue date Nov 18, 2008
- Timbre Technologies, Inc.
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generic interface for an optical metrology system
- Patent number 7,450,232
- Issue date Nov 11, 2008
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Optimized characterization of wafers structures for optical metrology
- Patent number 7,444,196
- Issue date Oct 28, 2008
- Timbre Technologies, Inc.
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Grant
Adaptive correlation of pattern resist structures using optical met...
- Patent number 7,440,881
- Issue date Oct 21, 2008
- Timbre Technologies, Inc.
- Daniel Edward Engelhard
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Generating simulated diffraction signals for two-dimensional struct...
- Patent number 7,427,521
- Issue date Sep 23, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Optimization of diffraction order selection for two-dimensional str...
- Patent number 7,428,060
- Issue date Sep 23, 2008
- Timbre Technologies, Inc.
- Wen Jin
- G01 - MEASURING TESTING
Information Patent Grant
Split machine learning systems
- Patent number 7,421,414
- Issue date Sep 2, 2008
- Timbre Technologies, Inc.
- Wei Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Azimuthal scanning of a structure formed on a semiconductor wafer
- Patent number 7,414,733
- Issue date Aug 19, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Selecting a hypothetical profile to use in optical metrology
- Patent number 7,394,554
- Issue date Jul 1, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology model optimization for process control
- Patent number 7,395,132
- Issue date Jul 1, 2008
- Timbre Technologies, Inc.
- Daniel Prager
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology optimization for repetitive structures
- Patent number 7,388,677
- Issue date Jun 17, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of single features
- Patent number 7,379,192
- Issue date May 27, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology model optimization for repetitive structures
- Patent number 7,355,728
- Issue date Apr 8, 2008
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Model and parameter selection for optical metrology
- Patent number 7,330,279
- Issue date Feb 12, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Library accuracy enhancement and evaluation
- Patent number 7,302,367
- Issue date Nov 27, 2007
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Examining a structure formed on a semiconductor wafer using machine...
- Patent number 7,280,229
- Issue date Oct 9, 2007
- Timbre Technologies, Inc.
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generation of a library of periodic grating diffraction signals
- Patent number 7,277,189
- Issue date Oct 2, 2007
- Timbre Technologies, Inc.
- Xinhui Niu
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of a structure formed on a semiconductor wafer us...
- Patent number 7,274,465
- Issue date Sep 25, 2007
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Resolution enhanced optical metrology
- Patent number 7,274,472
- Issue date Sep 25, 2007
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Generic interface for an optical metrology system
- Patent number 7,271,902
- Issue date Sep 18, 2007
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Azimuthal scanning of a structure formed on a semiconductor wafer
- Patent number 7,224,471
- Issue date May 29, 2007
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Selection of wavelengths for integrated circuit optical metrology
- Patent number 7,216,045
- Issue date May 8, 2007
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology model optimization based on goals
- Patent number 7,171,284
- Issue date Jan 30, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generation and use of integrated circuit profile-based simulation i...
- Patent number 7,136,796
- Issue date Nov 14, 2006
- Timbre Technologies, Inc.
- Nickhil Jakatdar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Parametric optimization of optical metrology model
- Patent number 7,126,700
- Issue date Oct 24, 2006
- Timbre Technologies, Inc.
- Junwei Bao
- G01 - MEASURING TESTING

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Patents Applicationslast 30 patents

Information Patent Application
OPTICAL METROLOGY OF STRUCTURES FORMED ON SEMICONDUCTOR WAFERS USIN...
- Publication number 20090198635
- Publication date Aug 6, 2009
- Timbre Technologies, Inc.
- Srinivas Doddi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM U...
- Publication number 20090094001
- Publication date Apr 9, 2009
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES
- Publication number 20080285054
- Publication date Nov 20, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY OF SINGLE FEATURES
- Publication number 20080259357
- Publication date Oct 23, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
GENERATION OF A LIBRARY OF PERIODIC GRATING DIFFRACTION SIGNALS
- Publication number 20080249754
- Publication date Oct 9, 2008
- Timbre Technologies, Inc.
- Xinhui Niu
- G02 - OPTICS
Information Patent Application
OPTICAL METROLOGY MODEL OPTIMIZATION FOR REPETITIVE STRUCTURES
- Publication number 20080195342
- Publication date Aug 14, 2008
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY
- Publication number 20080151269
- Publication date Jun 26, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIBRARY ACCURACY ENHANCMENT AND EVALUATION
- Publication number 20080071504
- Publication date Mar 20, 2008
- TIMBRE TECHNOLOGIES INC.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
EXAMINING A STRUCTURE FORMED ON A SEMICONDUCTOR WAFER USING MACHINE...
- Publication number 20080033683
- Publication date Feb 7, 2008
- Timbre Technologies, Inc.
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized characterization of wafers structures for optical metrology
- Publication number 20070250200
- Publication date Oct 25, 2007
- Timbre Technologies, Inc.
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Application
Azimuthal scanning of a structure formed on a semiconductor wafer
- Publication number 20070236705
- Publication date Oct 11, 2007
- TIMBRE TECHNOLOGIES INC.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of multiple patterned layers
- Publication number 20070229854
- Publication date Oct 4, 2007
- Timbre Technologies, Inc.
- Li Wu
- G01 - MEASURING TESTING
Information Patent Application
In-die optical metrology
- Publication number 20070229855
- Publication date Oct 4, 2007
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Library accuracy enhancement and evaluation
- Publication number 20070225940
- Publication date Sep 27, 2007
- TIMBRE TECHNOLOGIES INC.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Optimization of diffraction order selection for two-dimensional str...
- Publication number 20070223011
- Publication date Sep 27, 2007
- Timbre Technologies, Inc.
- Wen Jin
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology model optimization for process control
- Publication number 20070225851
- Publication date Sep 27, 2007
- Timbre Technologies, Inc.
- Dan Prager
- G01 - MEASURING TESTING
Information Patent Application
Weighting function to enhance measured diffraction signals in optic...
- Publication number 20070211260
- Publication date Sep 13, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Selection of wavelengths for integrated circuit optical metrology
- Publication number 20070198211
- Publication date Aug 23, 2007
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Application
Transforming metrology data from a semiconductor treatment system u...
- Publication number 20070185684
- Publication date Aug 9, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology model optimization based on goals
- Publication number 20070135959
- Publication date Jun 14, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modeling and measuring structures with spatially varying properties...
- Publication number 20070002337
- Publication date Jan 4, 2007
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology model optimization for repetitive structures
- Publication number 20060290947
- Publication date Dec 28, 2006
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Split machine learning systems
- Publication number 20060224528
- Publication date Oct 5, 2006
- Timbre Technologies, Inc.
- Wei Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Selecting unit cell configuration for repeating structures in optic...
- Publication number 20060187466
- Publication date Aug 24, 2006
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of single features
- Publication number 20060187468
- Publication date Aug 24, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of a structure formed on a semiconductor wafer us...
- Publication number 20060181713
- Publication date Aug 17, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Examining a structure formed on a semiconductor wafer using machine...
- Publication number 20060119863
- Publication date Jun 8, 2006
- Timbre Technologies, Inc.
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical metrology model optimization based on goals
- Publication number 20060064280
- Publication date Mar 23, 2006
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Controlling critical dimensions of structures formed on a wafer in...
- Publication number 20060046166
- Publication date Mar 2, 2006
- Timbre Technologies, Inc.
- Wenge Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical metrology model optimization for process control
- Publication number 20060009872
- Publication date Jan 12, 2006
- Timbre Technologies, Inc.
- Dan Prager
- G01 - MEASURING TESTING

Timbre Technologies, Inc.

Organization

Patents Grantslast 30 patents

Modeling and measuring structures with spatially varying properties...

Model and parameter selection for optical metrology

Selection of wavelengths for integrated circuit optical metrology

In-die optical metrology

Transforming metrology data from a semiconductor treatment system u...

Examining a structure formed on a semiconductor wafer using machine...

Generic interface for an optical metrology system

Optimized characterization of wafers structures for optical metrology

Adaptive correlation of pattern resist structures using optical met...

Generating simulated diffraction signals for two-dimensional struct...

Optimization of diffraction order selection for two-dimensional str...

Split machine learning systems

Azimuthal scanning of a structure formed on a semiconductor wafer

Selecting a hypothetical profile to use in optical metrology

Optical metrology model optimization for process control

Optical metrology optimization for repetitive structures

Optical metrology of single features

Optical metrology model optimization for repetitive structures

Model and parameter selection for optical metrology

Library accuracy enhancement and evaluation

Examining a structure formed on a semiconductor wafer using machine...

Generation of a library of periodic grating diffraction signals

Optical metrology of a structure formed on a semiconductor wafer us...

Resolution enhanced optical metrology

Generic interface for an optical metrology system

Azimuthal scanning of a structure formed on a semiconductor wafer

Selection of wavelengths for integrated circuit optical metrology

Optical metrology model optimization based on goals

Generation and use of integrated circuit profile-based simulation i...

Parametric optimization of optical metrology model

Patents Applicationslast 30 patents

OPTICAL METROLOGY OF STRUCTURES FORMED ON SEMICONDUCTOR WAFERS USIN...

TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM U...

OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES

OPTICAL METROLOGY OF SINGLE FEATURES

GENERATION OF A LIBRARY OF PERIODIC GRATING DIFFRACTION SIGNALS

OPTICAL METROLOGY MODEL OPTIMIZATION FOR REPETITIVE STRUCTURES

MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY

LIBRARY ACCURACY ENHANCMENT AND EVALUATION

EXAMINING A STRUCTURE FORMED ON A SEMICONDUCTOR WAFER USING MACHINE...

Optimized characterization of wafers structures for optical metrology

Azimuthal scanning of a structure formed on a semiconductor wafer

Optical metrology of multiple patterned layers

In-die optical metrology

Library accuracy enhancement and evaluation

Optimization of diffraction order selection for two-dimensional str...

Optical metrology model optimization for process control

Weighting function to enhance measured diffraction signals in optic...

Selection of wavelengths for integrated circuit optical metrology

Transforming metrology data from a semiconductor treatment system u...

Optical metrology model optimization based on goals

Modeling and measuring structures with spatially varying properties...

Optical metrology model optimization for repetitive structures

Split machine learning systems

Selecting unit cell configuration for repeating structures in optic...

Optical metrology of single features

Optical metrology of a structure formed on a semiconductor wafer us...

Examining a structure formed on a semiconductor wafer using machine...

Optical metrology model optimization based on goals

Controlling critical dimensions of structures formed on a wafer in...

Optical metrology model optimization for process control