TRUMPF Huettinger Sp. z o. o.

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Zielonka, PL

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Patents Grantslast 30 patents

Information Patent Grant
Method of plasma processing a substrate in a plasma chamber and pla...
- Patent number 12,148,601
- Issue date Nov 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Wojciech Gajewski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Balun and amplifier including balun
- Patent number 11,955,947
- Issue date Apr 9, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method of adjusting the output power of a power supply supplying el...
- Patent number 11,929,233
- Issue date Mar 12, 2024
- TRUMPF Huettinger Sp. z o. o.
- Jakub Swiatnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power converter, power supply system and HF plasma system
- Patent number 11,798,786
- Issue date Oct 24, 2023
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc detector for detecting arcs, plasma system and method of detect...
- Patent number 11,674,981
- Issue date Jun 13, 2023
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling multiple plasma processes
- Patent number 11,538,670
- Issue date Dec 27, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling multiple plasma processes
- Patent number 11,430,642
- Issue date Aug 30, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling multiple plasma processes
- Patent number 10,971,342
- Issue date Apr 6, 2021
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting an arc occuring during supplying power to a plasma process
- Patent number 10,431,437
- Issue date Oct 1, 2019
- TRUMPF Huettinger Sp. z o. o.
- Cezary Gapinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma impedance matching for supplying RF power to a plasma load
- Patent number 10,410,835
- Issue date Sep 10, 2019
- TRUMPF Huettinger Sp. z o. o.
- Wojciech Glazek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treating arcs in a plasma process
- Patent number 10,297,431
- Issue date May 21, 2019
- TRUMPF Huettinger Sp. z o. o.
- Marcin Zelechowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monitoring a discharge in a plasma process
- Patent number 10,290,477
- Issue date May 14, 2019
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Gieraltowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generating a highly ionized plasma in a plasma chamber
- Patent number 9,840,770
- Issue date Dec 12, 2017
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reducing stored electrical energy in a lead inductance
- Patent number 9,818,579
- Issue date Nov 14, 2017
- TRUMPF Huettinger Sp. z o. o.
- Pawel Ozimek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-rate reactive sputtering of dielectric stoichiometric films
- Patent number 9,637,814
- Issue date May 2, 2017
- University of West Bohemia in Pilsen
- Rafal Bugyi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for generating and maintaining plasma for plasma processing
- Patent number 9,368,328
- Issue date Jun 14, 2016
- TRUMPF Huettinger Sp. z o. o.
- Pawel Ozimek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Current limiting device for plasma power supply
- Patent number 8,981,664
- Issue date Mar 17, 2015
- TRUMPF Huettinger Sp. zo. o.
- Andrzej Klimczak
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Reducing stored electrical energy in a lead inductance
- Patent number 8,786,263
- Issue date Jul 22, 2014
- TRUMPF Huettinger Sp. z o. o.
- Pawel Ozimek
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240421604
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240421605
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240421606
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240421603
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240420922
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSING ASSEMBLY AND POWER SUPPLY ARRANGEMENT
- Publication number 20230170184
- Publication date Jun 1, 2023
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HV SWITCH UNIT
- Publication number 20230170688
- Publication date Jun 1, 2023
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
HV SWITCH UNIT, PULSING ASSEMBLY AND METHOD OF AVOIDING VOLTAGE IMB...
- Publication number 20230170687
- Publication date Jun 1, 2023
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
METHOD OF PLASMA PROCESSING A SUBSTRATE IN A PLASMA CHAMBER AND PLA...
- Publication number 20220208532
- Publication date Jun 30, 2022
- TRUMPF Huettinger Sp. z o. o.
- Wojciech Gajewski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ADJUSTING THE OUTPUT POWER OF A POWER SUPPLY SUPPLYING EL...
- Publication number 20220115207
- Publication date Apr 14, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jakub Swiatnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER CONVERTER, POWER SUPPLY SYSTEM AND HF PLASMA SYSTEM
- Publication number 20210159050
- Publication date May 27, 2021
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BALUN AND AMPLIFIER INCLUDING BALUN
- Publication number 20210159872
- Publication date May 27, 2021
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
ARC DETECTOR FOR DETECTING ARCS, PLASMA SYSTEM AND METHOD OF DETECT...
- Publication number 20210156893
- Publication date May 27, 2021
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING MULTIPLE PLASMA PROCESSES
- Publication number 20200066498
- Publication date Feb 27, 2020
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING MULTIPLE PLASMA PROCESSES
- Publication number 20200066497
- Publication date Feb 27, 2020
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
CONTROLLING MULTIPLE PLASMA PROCESSES
- Publication number 20200058475
- Publication date Feb 20, 2020
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Impedance Matching for Supplying RF Power to a Plasma Load
- Publication number 20180053633
- Publication date Feb 22, 2018
- TRUMPF Huettinger Sp. z o. o.
- Wojciech Glazek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treating Arcs in a Plasma Process
- Publication number 20170330737
- Publication date Nov 16, 2017
- TRUMPF Huettinger Sp. z o. o.
- Marcin Zelechowski
- G01 - MEASURING TESTING
Information Patent Application
DETECTING AN ARC OCCURING DURING SUPPLYING POWER TO A PLASMA PROCESS
- Publication number 20170287684
- Publication date Oct 5, 2017
- TRUMPF Huettinger Sp. z o. o.
- Cezary Gapiñski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Monitoring a Discharge in a Plasma Process
- Publication number 20160343549
- Publication date Nov 24, 2016
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Gieraltowski
- G01 - MEASURING TESTING
Information Patent Application
HIGH-RATE REACTIVE SPUTTERING OF DIELECTRIC STOICHIOMETRIC FILMS
- Publication number 20150354052
- Publication date Dec 10, 2015
- University of West Bohemia in Pilsen
- Rafal Bugyi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR GENERATING AND MAINTAINING PLASMA FOR PLASMA PROCESSING
- Publication number 20150206711
- Publication date Jul 23, 2015
- TRUMPF Huettinger Sp. z.o.o.
- Pawel Ozimek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Generating a Highly Ionized Plasma in a Plasma Chamber
- Publication number 20140174909
- Publication date Jun 26, 2014
- TRUMPF Huettinger Sp. z.o.o.
- Andrzej Klimczak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

TRUMPF Huettinger Sp. z o. o.

Organization

Patents Grantslast 30 patents

Method of plasma processing a substrate in a plasma chamber and pla...

Balun and amplifier including balun

Method of adjusting the output power of a power supply supplying el...

Power converter, power supply system and HF plasma system

Arc detector for detecting arcs, plasma system and method of detect...

Controlling multiple plasma processes

Controlling multiple plasma processes

Controlling multiple plasma processes

Detecting an arc occuring during supplying power to a plasma process

Plasma impedance matching for supplying RF power to a plasma load

Treating arcs in a plasma process

Monitoring a discharge in a plasma process

Generating a highly ionized plasma in a plasma chamber

Reducing stored electrical energy in a lead inductance

High-rate reactive sputtering of dielectric stoichiometric films

Apparatus for generating and maintaining plasma for plasma processing

Current limiting device for plasma power supply

Reducing stored electrical energy in a lead inductance

Patents Applicationslast 30 patents

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

PULSING ASSEMBLY AND POWER SUPPLY ARRANGEMENT

HV SWITCH UNIT

HV SWITCH UNIT, PULSING ASSEMBLY AND METHOD OF AVOIDING VOLTAGE IMB...

METHOD OF PLASMA PROCESSING A SUBSTRATE IN A PLASMA CHAMBER AND PLA...

METHOD OF ADJUSTING THE OUTPUT POWER OF A POWER SUPPLY SUPPLYING EL...

POWER CONVERTER, POWER SUPPLY SYSTEM AND HF PLASMA SYSTEM

BALUN AND AMPLIFIER INCLUDING BALUN

ARC DETECTOR FOR DETECTING ARCS, PLASMA SYSTEM AND METHOD OF DETECT...

CONTROLLING MULTIPLE PLASMA PROCESSES

CONTROLLING MULTIPLE PLASMA PROCESSES

CONTROLLING MULTIPLE PLASMA PROCESSES

Plasma Impedance Matching for Supplying RF Power to a Plasma Load

Treating Arcs in a Plasma Process

DETECTING AN ARC OCCURING DURING SUPPLYING POWER TO A PLASMA PROCESS

Monitoring a Discharge in a Plasma Process

HIGH-RATE REACTIVE SPUTTERING OF DIELECTRIC STOICHIOMETRIC FILMS

APPARATUS FOR GENERATING AND MAINTAINING PLASMA FOR PLASMA PROCESSING

Generating a Highly Ionized Plasma in a Plasma Chamber

Trademarklast 30 trademarks