YOUNG CHANG CHEMICAL CO., LTD

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Gyeongsangbuk-do, KR

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Patents Grantslast 30 patents

Information Patent Grant
Highly thick spin-on-carbon hard mask composition and patterning me...
- Patent number 12,105,421
- Issue date Oct 1, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Etching pattern forming method in semiconductor manufacturing process
- Patent number 12,094,719
- Issue date Sep 17, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic-inorganic hybrid photoresist processing liquid composition
- Patent number 12,050,403
- Issue date Jul 30, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid composition for semiconductor wafer and cleaning me...
- Patent number 11,970,672
- Issue date Apr 30, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Chemically amplified positive photoresist composition for improving...
- Patent number 11,906,900
- Issue date Feb 20, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process liquid composition for extreme ultraviolet lithography and...
- Patent number 11,624,984
- Issue date Apr 11, 2023
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Chemically-amplified-type negative-type photoresist composition
- Patent number 11,586,109
- Issue date Feb 21, 2023
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching composition for silicon nitride film
- Patent number 11,555,150
- Issue date Jan 17, 2023
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming silicon or silicon compound pattern in semicondu...
- Patent number 11,488,834
- Issue date Nov 1, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process liquid for extreme ultraviolet lithography and pattern form...
- Patent number 11,487,208
- Issue date Nov 1, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process solution composition for extreme ultraviolet lithography, a...
- Patent number 11,473,035
- Issue date Oct 18, 2022
- YOUNG CHANG CHEMICAL CO., LTD.
- Su Jin Lee
- B08 - CLEANING
Information Patent Grant
Etching method for forming micro silicon pattern in semiconductor m...
- Patent number 11,315,788
- Issue date Apr 26, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist pattern shrinking composition and pattern shrinking method
- Patent number 11,294,287
- Issue date Apr 5, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developer composition, for EUV light source, for forming photosensi...
- Patent number 11,199,779
- Issue date Dec 14, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and composition for improving LWR in patterning step using n...
- Patent number 11,187,985
- Issue date Nov 30, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV developer composition for forming photosensitive photoresist mi...
- Patent number 11,169,442
- Issue date Nov 9, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and composition for improving LWR in patterning step using n...
- Patent number 11,169,444
- Issue date Nov 9, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High etch resistance spin-on carbon hard mask composition and patte...
- Patent number 11,036,134
- Issue date Jun 15, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Gi Hong Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cutting oil composition
- Patent number 11,001,780
- Issue date May 11, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Composition for performing cleaning after chemical/ mechanical poli...
- Patent number 10,844,335
- Issue date Nov 24, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Negative photoresist composition for KRF laser, having high resolut...
- Patent number 10,775,699
- Issue date Sep 15, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflection coating composition and anti-reflection film utiliz...
- Patent number 10,717,878
- Issue date Jul 21, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
I-line negative type photoresist composition having excellent etchi...
- Patent number 10,539,871
- Issue date Jan 21, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Slurry composition for CMP and polishing method using same
- Patent number 10,526,508
- Issue date Jan 7, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative photoresist composition for KrF laser for forming semicond...
- Patent number 10,162,261
- Issue date Dec 25, 2018
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating composition for preventing collapse of capacitor
- Patent number 9,884,970
- Issue date Feb 6, 2018
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning composition for photolithography and method of forming pho...
- Patent number 9,829,797
- Issue date Nov 28, 2017
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERE...
- Publication number 20230350293
- Publication date Nov 2, 2023
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHANT COMPOSITION FOR ADJUSTING ETCHING SELECTIVITY OF TITANIUM N...
- Publication number 20230295500
- Publication date Sep 21, 2023
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAP...
- Publication number 20230266672
- Publication date Aug 24, 2023
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING...
- Publication number 20220342313
- Publication date Oct 27, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PROCESS LIQUID COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMING METH...
- Publication number 20220251472
- Publication date Aug 11, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGHLY THICK SPIN-ON-CARBON HARD MASK COMPOSITION AND PATTERNING ME...
- Publication number 20220179318
- Publication date Jun 9, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING...
- Publication number 20220172955
- Publication date Jun 2, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY COMPOSITION FOR POLISHING SILICON OXIDE FILM, AND POLISHING...
- Publication number 20220145131
- Publication date May 12, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID COMPOSITION FOR SEMICONDUCTOR WAFER AND CLEANING ME...
- Publication number 20220135903
- Publication date May 5, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
ETCHING COMPOSITION FOR SILICON NITRIDE FILM
- Publication number 20220127530
- Publication date Apr 28, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL METHOD FOR FORMING SILICON OR SILICON COMPOUND PATTERN IN SEM...
- Publication number 20220102158
- Publication date Mar 31, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS LIQUID FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND PATTERN FORM...
- Publication number 20220011673
- Publication date Jan 13, 2022
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANIC-INORGANIC HYBRID PHOTORESIST PROCESSING LIQUID COMPOSITION
- Publication number 20210333709
- Publication date Oct 28, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...
- Publication number 20210216013
- Publication date Jul 15, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY, A...
- Publication number 20210214649
- Publication date Jul 15, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PROCESS LIQUID COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND...
- Publication number 20210088910
- Publication date Mar 25, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
NOVEL ETCHING METHOD FOR FORMING MICRO SILICON PATTERN IN SEMICONDU...
- Publication number 20210082701
- Publication date Mar 18, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV DEVELOPER COMPOSITION FOR FORMING PHOTOSENSITIVE PHOTORESIST MI...
- Publication number 20210063887
- Publication date Mar 4, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPER COMPOSITION, FOR EUV LIGHT SOURCE, FOR FORMING PHOTOSENSI...
- Publication number 20200363724
- Publication date Nov 19, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CUTTING OIL COMPOSITION
- Publication number 20200190423
- Publication date Jun 18, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Application
METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING N...
- Publication number 20200183284
- Publication date Jun 11, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PATTERN SHRINKING COMPOSITION AND PATTERN SHRINKING METHOD
- Publication number 20200110339
- Publication date Apr 9, 2020
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PERFORMING CLEANING AFTER CHEMICAL/ MECHANICAL POLI...
- Publication number 20190382698
- Publication date Dec 19, 2019
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
HIGH ETCH RESISTANCE SPIN-ON CARBON HARD MASK COMPOSITION AND PATTE...
- Publication number 20190258163
- Publication date Aug 22, 2019
- YOUNG CHANG CHEMICAL CO., LTD
- Gi Hong KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY-AMPLIFIED-TYPE NEGATIVE-TYPE PHOTORESIST COMPOSITION
- Publication number 20190137871
- Publication date May 9, 2019
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING N...
- Publication number 20190137880
- Publication date May 9, 2019
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUT...
- Publication number 20190101827
- Publication date Apr 4, 2019
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-REFLECTION COATING COMPOSITION AND ANTI-REFLECTION FILM UTILIZ...
- Publication number 20180319994
- Publication date Nov 8, 2018
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHI...
- Publication number 20180246404
- Publication date Aug 30, 2018
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SLURRY COMPOSITION FOR CMP AND POLISHING METHOD USING SAME
- Publication number 20180230334
- Publication date Aug 16, 2018
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- H01 - BASIC ELECTRIC ELEMENTS

YOUNG CHANG CHEMICAL CO., LTD

Organization

Patents Grantslast 30 patents

Highly thick spin-on-carbon hard mask composition and patterning me...

Etching pattern forming method in semiconductor manufacturing process

Organic-inorganic hybrid photoresist processing liquid composition

Cleaning liquid composition for semiconductor wafer and cleaning me...

Chemically amplified positive photoresist composition for improving...

Process liquid composition for extreme ultraviolet lithography and...

Chemically-amplified-type negative-type photoresist composition

Etching composition for silicon nitride film

Method for forming silicon or silicon compound pattern in semicondu...

Process liquid for extreme ultraviolet lithography and pattern form...

Process solution composition for extreme ultraviolet lithography, a...

Etching method for forming micro silicon pattern in semiconductor m...

Photoresist pattern shrinking composition and pattern shrinking method

Developer composition, for EUV light source, for forming photosensi...

Method and composition for improving LWR in patterning step using n...

EUV developer composition for forming photosensitive photoresist mi...

Method and composition for improving LWR in patterning step using n...

High etch resistance spin-on carbon hard mask composition and patte...

Cutting oil composition

Composition for performing cleaning after chemical/ mechanical poli...

Negative photoresist composition for KRF laser, having high resolut...

Anti-reflection coating composition and anti-reflection film utiliz...

I-line negative type photoresist composition having excellent etchi...

Slurry composition for CMP and polishing method using same

Negative photoresist composition for KrF laser for forming semicond...

Coating composition for preventing collapse of capacitor

Cleaning composition for photolithography and method of forming pho...

Patents Applicationslast 30 patents

I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERE...

ETCHANT COMPOSITION FOR ADJUSTING ETCHING SELECTIVITY OF TITANIUM N...

PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAP...

PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING...

PROCESS LIQUID COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMING METH...

HIGHLY THICK SPIN-ON-CARBON HARD MASK COMPOSITION AND PATTERNING ME...

NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING...

SLURRY COMPOSITION FOR POLISHING SILICON OXIDE FILM, AND POLISHING...

CLEANING LIQUID COMPOSITION FOR SEMICONDUCTOR WAFER AND CLEANING ME...

ETCHING COMPOSITION FOR SILICON NITRIDE FILM

NOVEL METHOD FOR FORMING SILICON OR SILICON COMPOUND PATTERN IN SEM...

PROCESS LIQUID FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND PATTERN FORM...

ORGANIC-INORGANIC HYBRID PHOTORESIST PROCESSING LIQUID COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...

PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY, A...

PROCESS LIQUID COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND...

NOVEL ETCHING METHOD FOR FORMING MICRO SILICON PATTERN IN SEMICONDU...

EUV DEVELOPER COMPOSITION FOR FORMING PHOTOSENSITIVE PHOTORESIST MI...

DEVELOPER COMPOSITION, FOR EUV LIGHT SOURCE, FOR FORMING PHOTOSENSI...

CUTTING OIL COMPOSITION

METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING N...

PHOTORESIST PATTERN SHRINKING COMPOSITION AND PATTERN SHRINKING METHOD

COMPOSITION FOR PERFORMING CLEANING AFTER CHEMICAL/ MECHANICAL POLI...

HIGH ETCH RESISTANCE SPIN-ON CARBON HARD MASK COMPOSITION AND PATTE...

CHEMICALLY-AMPLIFIED-TYPE NEGATIVE-TYPE PHOTORESIST COMPOSITION

METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING N...

NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUT...

ANTI-REFLECTION COATING COMPOSITION AND ANTI-REFLECTION FILM UTILIZ...

I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHI...

SLURRY COMPOSITION FOR CMP AND POLISHING METHOD USING SAME

Trademarklast 30 trademarks