Aaron Lynn Routzahn

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Film stack simplification for high aspect ratio patterning and vert...
- Patent number 12,080,592
- Issue date Sep 3, 2024
- Lam Research Corporation
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER ETCHING USING AN INHIBITOR
- Publication number 20250154658
- Publication date May 15, 2025
- LAM RESEARCH CORPORATION
- Aaron Lynn ROUTZAHN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER ETCHING USING BORON TRICHLORIDE
- Publication number 20250125155
- Publication date Apr 17, 2025
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20240387258
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUSES FOR PROCESSING CHALCOGENIDES
- Publication number 20240381790
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- John Hoang
Information Patent Application
ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE...
- Publication number 20230274939
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Thorsten Bernd Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING OF INDIUM GALLIUM ZINC OXIDE
- Publication number 20230274949
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Aaron Lynn Routzahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTION OF CHANNEL LAYER IN THREE-TERMINAL VERTICAL MEMORY STRUC...
- Publication number 20230143057
- Publication date May 11, 2023
- LAM RESEARCH CORPORATION
- John HOANG
Information Patent Application
ATOMIC LAYER ETCHING OF MOLYBDENUM
- Publication number 20230093011
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20220051938
- Publication date Feb 17, 2022
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS

Aaron Lynn Routzahn

Person

Patents Grantslast 30 patents

Film stack simplification for high aspect ratio patterning and vert...

Patents Applicationslast 30 patents

ATOMIC LAYER ETCHING USING AN INHIBITOR

ATOMIC LAYER ETCHING USING BORON TRICHLORIDE

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

TECHNIQUES AND APPARATUSES FOR PROCESSING CHALCOGENIDES

ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE...

ETCHING OF INDIUM GALLIUM ZINC OXIDE

PROTECTION OF CHANNEL LAYER IN THREE-TERMINAL VERTICAL MEMORY STRUC...

ATOMIC LAYER ETCHING OF MOLYBDENUM

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...