Abdul Aziz KHAJA

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Heater support kit for bevel etch chamber
- Patent number 11,948,790
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Tuan Anh Nguyen
- B08 - CLEANING
Information Patent Grant
Treatments for controlling deposition defects
- Patent number 11,894,228
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Sudha S. Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber with reduced plasma arc
- Patent number 11,875,969
- Issue date Jan 16, 2024
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for minimizing substrate backside damage
- Patent number 11,756,819
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Liangfa Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform in situ cleaning and deposition
- Patent number 11,742,185
- Issue date Aug 29, 2023
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatment for high-temperature cleans
- Patent number 11,699,577
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck design with improved chucking and arcing perfor...
- Patent number 11,682,574
- Issue date Jun 20, 2023
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of in situ ceramic coating deposition
- Patent number 11,674,222
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber configurations and processes for particle control
- Patent number 11,670,492
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clean processes for boron carbon film deposition
- Patent number 11,613,808
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Jiheng Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF grounding configuration for pedestals
- Patent number 11,569,072
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of reducing chamber residues
- Patent number 11,560,623
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Liangfa Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hardmask tuning by electrode adjustment
- Patent number 11,515,150
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Michael Wenyoung Tsiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma corrision resistive heater for high temperature processing
- Patent number 11,299,805
- Issue date Apr 12, 2022
- Applied Materials, Inc.
- Abdul Aziz Khaja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature electrostatic chuck
- Patent number 11,133,212
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of minimizing wafer backside damage in semiconductor wafer...
- Patent number 10,971,390
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded in-situ charge trapping layers to enable electrostatic chuck...
- Patent number 10,930,475
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of hardmask
- Patent number 10,923,334
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning remote plasma source for enhanced performance having r...
- Patent number 10,916,407
- Issue date Feb 9, 2021
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater support kit for bevel etch chamber
- Patent number 10,903,066
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Tuan Anh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of achieving high input impedance without usin...
- Patent number 10,879,041
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-healing semiconductor wafer processing
- Patent number 10,811,325
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage-current probe for measuring radio-frequency electrical powe...
- Patent number 10,663,491
- Issue date May 26, 2020
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber and method with thermal control
- Patent number 10,636,630
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Hemant P. Mungekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel etch profile control
- Patent number 10,629,427
- Issue date Apr 21, 2020
- Applied Materials, Inc.
- Zonghui Su
- B08 - CLEANING
Information Patent Grant
Critical methodology in vacuum chambers to determine gap and leveli...
- Patent number 10,599,043
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Hiroyuki Ogiso
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bevel etch profile control
- Patent number 10,276,364
- Issue date Apr 30, 2019
- Applied Materials, Inc.
- Zonghui Su
- B08 - CLEANING
Information Patent Grant
Plasma corrosion resistive heater for high temperature processing
- Patent number 10,266,943
- Issue date Apr 23, 2019
- Applied Materials, Inc.
- Abdul Aziz Khaja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning remote plasma source for enhanced performance having r...
- Patent number 10,192,717
- Issue date Jan 29, 2019
- Applied Materials, Inc.
- Abdul Aziz Khaja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Graded in-situ charge trapping layers to enable electrostatic chuck...
- Patent number 10,128,088
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SIDE PUMPING CHAMBER AND DOWNSTREAM RESIDUE MANAGEMENT HARDWARE
- Publication number 20240352580
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Zaoyuan Ge
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND MECHANISMS FOR ADJUSTING CHUCKING VOLTAGE DURING SUBSTR...
- Publication number 20240038601
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Mitesh Sanghvi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM IN SITU CLEANING AND DEPOSITION
- Publication number 20230402261
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THROTTLE VALVE AND FORELINE CLEANING USING A MICROWAVE SOURCE
- Publication number 20230390811
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Khokan Chandra Paul
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR MINIMIZING SUBSTRATE BACKSIDE DAMAGE
- Publication number 20230386883
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Liangfa HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...
- Publication number 20230317411
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIXELATED SHOWERHEAD FOR RF SENSITIVE PROCESSES
- Publication number 20230307228
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DESIGN WITH IMPROVED CHUCKING AND ARCING PERFOR...
- Publication number 20230298922
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL
- Publication number 20230298870
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IN SITU CERAMIC COATING DEPOSITION
- Publication number 20230272525
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Sarah Michelle BOBEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF GROUNDING CONFIGURATION FOR PEDESTALS
- Publication number 20230170190
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Satya THOKACHICHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF REDUCING CHAMBER RESIDUES
- Publication number 20230151487
- Publication date May 18, 2023
- Applied Materials, Inc.
- Liangfa HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOWNSTREAM RESIDUE MANAGEMENT HARDWARE
- Publication number 20230120710
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Zaoyuan Ge
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENTS FOR CONTROLLING DEPOSITION DEFECTS
- Publication number 20230061249
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Sudha S. Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE PROFILING AND TEXTURING OF CHAMBER COMPONENTS
- Publication number 20230023764
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- David W. GROECHEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT FOR HIGH-TEMPERATURE CLEANS
- Publication number 20220384161
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Sarah Michelle Bobek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM IN SITU CLEANING AND DEPOSITION
- Publication number 20220310360
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITION RESIDUE CONTROL
- Publication number 20220165567
- Publication date May 26, 2022
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK TUNING BY ELECTRODE ADJUSTMENT
- Publication number 20220130665
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Michael Wenyoung Tsiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEAN PROCESSES FOR BORON CARBON FILM DEPOSITION
- Publication number 20220127722
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Jiheng Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL
- Publication number 20220122823
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IN SITU CERAMIC COATING DEPOSITION
- Publication number 20220098728
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Sarah Michelle BOBEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBERS USING PLASMA
- Publication number 20220098729
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Fei WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORT WITH WAFER BACKSIDE DAMAGE CONTROL
- Publication number 20210287924
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATER SUPPORT KIT FOR BEVEL ETCH CHAMBER
- Publication number 20210143005
- Publication date May 13, 2021
- Applied Materials, Inc.
- Tuan Anh NGUYEN
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...
- Publication number 20210111000
- Publication date Apr 15, 2021
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR MINIMIZING SUBSTRATE BACKSIDE DAMAGE
- Publication number 20200365441
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Liangfa HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER WITH REDUCED PLASMA ARC
- Publication number 20200365370
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Fei WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF REDUCING CHAMBER RESIDUES
- Publication number 20200362457
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Liangfa HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BEVEL PEELING AND DEFECTIVITY SOLUTION FOR SUBSTRATE PROCESSING
- Publication number 20200365404
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Abdul Aziz KHAJA

Person

Patents Grantslast 30 patents

Heater support kit for bevel etch chamber

Treatments for controlling deposition defects

Process chamber with reduced plasma arc

Methods and apparatus for minimizing substrate backside damage

Uniform in situ cleaning and deposition

Treatment for high-temperature cleans

Electrostatic chuck design with improved chucking and arcing perfor...

Method of in situ ceramic coating deposition

Chamber configurations and processes for particle control

Clean processes for boron carbon film deposition

RF grounding configuration for pedestals

Methods of reducing chamber residues

Hardmask tuning by electrode adjustment

Plasma corrision resistive heater for high temperature processing

High temperature electrostatic chuck

Methods of minimizing wafer backside damage in semiconductor wafer...

Graded in-situ charge trapping layers to enable electrostatic chuck...

Selective deposition of hardmask

Conditioning remote plasma source for enhanced performance having r...

Heater support kit for bevel etch chamber

Method and apparatus of achieving high input impedance without usin...

Self-healing semiconductor wafer processing

Voltage-current probe for measuring radio-frequency electrical powe...

Processing chamber and method with thermal control

Bevel etch profile control

Critical methodology in vacuum chambers to determine gap and leveli...

Bevel etch profile control

Plasma corrosion resistive heater for high temperature processing

Conditioning remote plasma source for enhanced performance having r...

Graded in-situ charge trapping layers to enable electrostatic chuck...

Patents Applicationslast 30 patents

SIDE PUMPING CHAMBER AND DOWNSTREAM RESIDUE MANAGEMENT HARDWARE

METHODS AND MECHANISMS FOR ADJUSTING CHUCKING VOLTAGE DURING SUBSTR...

UNIFORM IN SITU CLEANING AND DEPOSITION

THROTTLE VALVE AND FORELINE CLEANING USING A MICROWAVE SOURCE

METHODS AND APPARATUS FOR MINIMIZING SUBSTRATE BACKSIDE DAMAGE

RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...

PIXELATED SHOWERHEAD FOR RF SENSITIVE PROCESSES

ELECTROSTATIC CHUCK DESIGN WITH IMPROVED CHUCKING AND ARCING PERFOR...

CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

METHOD OF IN SITU CERAMIC COATING DEPOSITION

RF GROUNDING CONFIGURATION FOR PEDESTALS

METHODS OF REDUCING CHAMBER RESIDUES

DOWNSTREAM RESIDUE MANAGEMENT HARDWARE

TREATMENTS FOR CONTROLLING DEPOSITION DEFECTS

SURFACE PROFILING AND TEXTURING OF CHAMBER COMPONENTS

TREATMENT FOR HIGH-TEMPERATURE CLEANS

UNIFORM IN SITU CLEANING AND DEPOSITION

SYSTEMS AND METHODS FOR DEPOSITION RESIDUE CONTROL

HARDMASK TUNING BY ELECTRODE ADJUSTMENT

CLEAN PROCESSES FOR BORON CARBON FILM DEPOSITION

CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

METHOD OF IN SITU CERAMIC COATING DEPOSITION

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBERS USING PLASMA

SEMICONDUCTOR SUBSTRATE SUPPORT WITH WAFER BACKSIDE DAMAGE CONTROL

HEATER SUPPORT KIT FOR BEVEL ETCH CHAMBER

METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...

METHODS AND APPARATUS FOR MINIMIZING SUBSTRATE BACKSIDE DAMAGE

PROCESS CHAMBER WITH REDUCED PLASMA ARC

METHODS OF REDUCING CHAMBER RESIDUES

BEVEL PEELING AND DEFECTIVITY SOLUTION FOR SUBSTRATE PROCESSING