Adam Dan Ticknor

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dual medium filter for ion and particle filtering during semiconduc...
- Patent number 10,109,505
- Issue date Oct 23, 2018
- International Business Machines Corporation
- John H. Zhang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Dual medium filter for ion and particle filtering during semiconduc...
- Patent number 9,607,864
- Issue date Mar 28, 2017
- STMicroelectronics, Inc.
- John H. Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post metal chemical-mechanical planarization cleaning process
- Patent number 8,920,567
- Issue date Dec 30, 2014
- International Business Machines Corporation
- Vamsi Devarapalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection and characterization of SiCOH-based dielectric materials...
- Patent number 7,556,972
- Issue date Jul 7, 2009
- International Business Machines Corporation
- Manoj Balachandran
- B24 - GRINDING POLISHING
Information Patent Grant
Extended life conditioning disk
- Patent number 7,510,463
- Issue date Mar 31, 2009
- International Business Machines Corporation
- Ben Kim
- B24 - GRINDING POLISHING
Information Patent Grant
Bipolar transistor with raised extrinsic base fabricated in an inte...
- Patent number 6,667,521
- Issue date Dec 23, 2003
- International Business Machines Corporation
- David C. Ahlgren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing pad conditioner
- Patent number 6,500,054
- Issue date Dec 31, 2002
- International Business Machines Corporation
- William H. Ma
- B24 - GRINDING POLISHING
Information Patent Grant
Bipolar transistor with raised extrinsic base fabricated in an inte...
- Patent number 6,492,238
- Issue date Dec 10, 2002
- International Business Machines Corporation
- David C. Ahlgren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Piezo-actuated CMP carrier
- Patent number 6,325,696
- Issue date Dec 4, 2001
- International Business Machines Corporation
- Karl E. Boggs
- B24 - GRINDING POLISHING
Information Patent Grant
Regeneration of chemical mechanical polishing pads in-situ
- Patent number 6,296,717
- Issue date Oct 2, 2001
- International Business Machines Corporation
- Adam D. Ticknor
- B24 - GRINDING POLISHING
Information Patent Grant
Device and method for preventing settlement of particles on a chemi...
- Patent number 5,968,841
- Issue date Oct 19, 1999
- International Business Machines Corporation
- William Francis Landers
- B24 - GRINDING POLISHING
Information Patent Grant
Vertical polishing tool and method
- Patent number 5,897,425
- Issue date Apr 27, 1999
- International Business Machines Corporation
- Thomas Robert Fisher
- B24 - GRINDING POLISHING
Information Patent Grant
Confined water fixture for holding wafers undergoing chemical-mecha...
- Patent number 5,267,418
- Issue date Dec 7, 1993
- International Business Machines Corporation
- James E. Currie
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUC...
- Publication number 20170148647
- Publication date May 25, 2017
- International Business Machines Corporation
- John H. Zhang
- B08 - CLEANING
Information Patent Application
POST METAL CHEMICAL-MECHANICAL PLANARIZATION CLEANING PROCESS
- Publication number 20140256133
- Publication date Sep 11, 2014
- International Business Machines Corporation
- Vamsi Devarapalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUC...
- Publication number 20130312791
- Publication date Nov 28, 2013
- International Business Machines Corporation
- John H. Zhang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
DETECTION AND CHARACTERIZATION OF SiCOH-BASED DIELECTRIC MATERIALS...
- Publication number 20080182335
- Publication date Jul 31, 2008
- International Business Machines Corporation
- Manoj Balachandran
- B24 - GRINDING POLISHING
Information Patent Application
EXTENDED LIFE CONDITIONING DISK
- Publication number 20070287367
- Publication date Dec 13, 2007
- International Business Machines Corporation
- Ben Kim
- B24 - GRINDING POLISHING
Information Patent Application
WAFER REMOVING FORCE REDUCTION ON CMP TOOL
- Publication number 20070190788
- Publication date Aug 16, 2007
- Manoj Balachandran
- B24 - GRINDING POLISHING
Information Patent Application
Bipolar transistor with raised extrinsic base fabricated in an inte...
- Publication number 20030064555
- Publication date Apr 3, 2003
- David C. Ahlgren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR TRANSISTOR WITH RAISED EXTRINSIC BASE FABRICATED IN AN INTE...
- Publication number 20020197783
- Publication date Dec 26, 2002
- David C. Ahlgren
- H01 - BASIC ELECTRIC ELEMENTS

Adam Dan Ticknor

Person

Patents Grantslast 30 patents

Dual medium filter for ion and particle filtering during semiconduc...

Dual medium filter for ion and particle filtering during semiconduc...

Post metal chemical-mechanical planarization cleaning process

Detection and characterization of SiCOH-based dielectric materials...

Extended life conditioning disk

Bipolar transistor with raised extrinsic base fabricated in an inte...

Chemical-mechanical polishing pad conditioner

Bipolar transistor with raised extrinsic base fabricated in an inte...

Piezo-actuated CMP carrier

Regeneration of chemical mechanical polishing pads in-situ

Device and method for preventing settlement of particles on a chemi...

Vertical polishing tool and method

Confined water fixture for holding wafers undergoing chemical-mecha...

Patents Applicationslast 30 patents

DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUC...

POST METAL CHEMICAL-MECHANICAL PLANARIZATION CLEANING PROCESS

DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUC...

DETECTION AND CHARACTERIZATION OF SiCOH-BASED DIELECTRIC MATERIALS...

EXTENDED LIFE CONDITIONING DISK

WAFER REMOVING FORCE REDUCTION ON CMP TOOL

Bipolar transistor with raised extrinsic base fabricated in an inte...

BIPOLAR TRANSISTOR WITH RAISED EXTRINSIC BASE FABRICATED IN AN INTE...