Ajit Balakrishna

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for controlling a processing reactor
- Patent number 11,894,220
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Michael Nichols
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bode fingerprinting for characterizations and failure detections in...
- Patent number 11,693,053
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- Tao Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Bode fingerprinting for characterizations and failure detections in...
- Patent number 11,486,927
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Tao Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas box for CVD chamber
- Patent number 11,049,699
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Tejas Ulavi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heater pedestal assembly for wide range temperature control
- Patent number 10,910,238
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Kaushik Alayavalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for reducing particles in semiconductor proce...
- Patent number 10,770,269
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Andrew Nguyen
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for high temperature clean
- Patent number 10,612,135
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,453,656
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with top coil over a ceiling and...
- Patent number 10,131,994
- Issue date Nov 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Recursive pumping for symmetrical gas exhaust to control critical d...
- Patent number 9,909,213
- Issue date Mar 6, 2018
- Applied Materials, Inc.
- Sergio Fukuda Shoji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma source with multiple dielectric windows...
- Patent number 9,896,769
- Issue date Feb 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for reducing particles in semiconductor proce...
- Patent number 9,761,416
- Issue date Sep 12, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Symmetrical inductively coupled plasma source with symmetrical flow...
- Patent number 9,745,663
- Issue date Aug 29, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 9,741,546
- Issue date Aug 22, 2017
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system including a symmetrical remote plasma sour...
- Patent number 9,449,796
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Ankur Agarwal
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma reactor with electron beam plasma source having a uniform ma...
- Patent number 9,269,546
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Ming-Feng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for rapidly responsive heat control in plasma...
- Patent number 9,155,134
- Issue date Oct 6, 2015
- Applied Materials, Inc.
- Chunlei Zhang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and apparatus for controlling plasma in a process chamber
- Patent number 8,980,760
- Issue date Mar 17, 2015
- Applied Materials, Inc.
- Ankur Agarwal
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and apparatus for rapidly responsive heat control in plasma...
- Patent number 8,895,889
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Chunlei Zhang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electron beam plasma source with profiled magnet shield for uniform...
- Patent number 8,894,805
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Kallol Bera
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lower liner with integrated flow equalizer and improved conductance
- Patent number 8,440,019
- Issue date May 14, 2013
- Applied Materials, Inc.
- James D. Carducci
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Tunable gas flow equalizer
- Patent number 8,398,814
- Issue date Mar 19, 2013
- Applied Materials, Inc.
- Ajit Balakrishna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for removing polymer from the wafer backside a...
- Patent number 8,329,593
- Issue date Dec 11, 2012
- Applied Materials, Inc.
- Imad Yousif
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lower liner with integrated flow equalizer and improved conductance
- Patent number 8,282,736
- Issue date Oct 9, 2012
- Applied Materials, Inc.
- James D. Carducci
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lower liner with integrated flow equalizer and improved conductance
- Patent number 8,118,938
- Issue date Feb 21, 2012
- Applied Materials, Inc.
- James D. Carducci
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
MODEL-DRIVEN PRESSURE ESTIMATION
- Publication number 20250140538
- Publication date May 1, 2025
- Applied Materials, Inc.
- Devi Raghavee Veerappan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BODE FINGERPRINTING FOR CHARACTERIZATIONS AND FAILURE DETECTIONS IN...
- Publication number 20230042432
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- Tao Zhang
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID PHYSICS/MACHINE LEARNING MODELING OF PROCESSES
- Publication number 20220245307
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Prashanth Kothnur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW
- Publication number 20220084794
- Publication date Mar 17, 2022
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BODE FINGERPRINTING FOR CHARACTERIZATIONS AND FAILURE DETECTIONS IN...
- Publication number 20210311114
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Tao Zhang
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING A PROCESSING REACTOR
- Publication number 20210020410
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- MICHAEL NICHOLS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
GAS BOX FOR CVD CHAMBER
- Publication number 20200043704
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Tejas ULAVI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Reactor Having Radial Struts for Substrate Support
- Publication number 20190085467
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACTIVE FAR EDGE PLASMA TUNABILITY
- Publication number 20180323039
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Hyungje WOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...
- Publication number 20180142354
- Publication date May 24, 2018
- Applied Materials, Inc.
- Sergio Fukuda SHOJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATER PEDESTAL ASSEMBLY FOR WIDE RANGE TEMPERATURE CONTROL
- Publication number 20180082866
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Kaushik ALAYAVALLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD AND SYSTEM FOR HIGH TEMPERATURE CLEAN
- Publication number 20180023193
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Sanjeev BALUJA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively Coupled Plasma Source with Multiple Dielectric Windows...
- Publication number 20170350018
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...
- Publication number 20170350017
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCE...
- Publication number 20170345623
- Publication date Nov 30, 2017
- Applied Materials, Inc.
- Andrew NGUYEN
- B32 - LAYERED PRODUCTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20170271129
- Publication date Sep 21, 2017
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314940
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314937
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314942
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314936
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM INCLUDING A SYMMETRICAL REMOTE PLASMA SOUR...
- Publication number 20160118223
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- Ankur Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...
- Publication number 20150041061
- Publication date Feb 12, 2015
- Applied Materials, Inc.
- Sergio Fukuda SHOJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCE...
- Publication number 20140272211
- Publication date Sep 18, 2014
- Andrew NGUYEN
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA REACTOR WITH ELECTRON BEAM PLASMA SOURCE HAVING A UNIFORM MA...
- Publication number 20140035458
- Publication date Feb 6, 2014
- Applied Materials, Inc.
- Ming-Feng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH MULTIPLE DIELECTRIC WINDOWS...
- Publication number 20140020837
- Publication date Jan 23, 2014
- ANDREW NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL FLOW...
- Publication number 20140020835
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH PLURAL TOP COILS OVER A CEIL...
- Publication number 20140020836
- Publication date Jan 23, 2014
- ANDREW NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR RAPIDLY RESPONSIVE HEAT CONTROL IN PLASMA...
- Publication number 20130180963
- Publication date Jul 18, 2013
- Applied Materials, Inc.
- CHUNLEI ZHANG
- H01 - BASIC ELECTRIC ELEMENTS

Ajit Balakrishna

Person

Patents Grantslast 30 patents

Method and apparatus for controlling a processing reactor

Bode fingerprinting for characterizations and failure detections in...

Bode fingerprinting for characterizations and failure detections in...

Symmetric plasma process chamber

Gas box for CVD chamber

Heater pedestal assembly for wide range temperature control

Apparatus and methods for reducing particles in semiconductor proce...

Symmetric plasma process chamber

Method and system for high temperature clean

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Inductively coupled plasma source with top coil over a ceiling and...

Recursive pumping for symmetrical gas exhaust to control critical d...

Inductively coupled plasma source with multiple dielectric windows...

Apparatus and methods for reducing particles in semiconductor proce...

Symmetrical inductively coupled plasma source with symmetrical flow...

Symmetric plasma process chamber

Plasma processing system including a symmetrical remote plasma sour...

Plasma reactor with electron beam plasma source having a uniform ma...

Methods and apparatus for rapidly responsive heat control in plasma...

Methods and apparatus for controlling plasma in a process chamber

Methods and apparatus for rapidly responsive heat control in plasma...

Electron beam plasma source with profiled magnet shield for uniform...

Lower liner with integrated flow equalizer and improved conductance

Tunable gas flow equalizer

Method and apparatus for removing polymer from the wafer backside a...

Lower liner with integrated flow equalizer and improved conductance

Lower liner with integrated flow equalizer and improved conductance

Patents Applicationslast 30 patents

MODEL-DRIVEN PRESSURE ESTIMATION

BODE FINGERPRINTING FOR CHARACTERIZATIONS AND FAILURE DETECTIONS IN...

SYMMETRIC PLASMA PROCESS CHAMBER

HYBRID PHYSICS/MACHINE LEARNING MODELING OF PROCESSES

PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW

BODE FINGERPRINTING FOR CHARACTERIZATIONS AND FAILURE DETECTIONS IN...

METHOD AND APPARATUS FOR CONTROLLING A PROCESSING REACTOR

SYMMETRIC PLASMA PROCESS CHAMBER

GAS BOX FOR CVD CHAMBER

Plasma Reactor Having Radial Struts for Substrate Support

ACTIVE FAR EDGE PLASMA TUNABILITY

RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...

HEATER PEDESTAL ASSEMBLY FOR WIDE RANGE TEMPERATURE CONTROL

A METHOD AND SYSTEM FOR HIGH TEMPERATURE CLEAN

Inductively Coupled Plasma Source with Multiple Dielectric Windows...

Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...

APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCE...

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

PLASMA PROCESSING SYSTEM INCLUDING A SYMMETRICAL REMOTE PLASMA SOUR...

RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...

APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCE...

PLASMA REACTOR WITH ELECTRON BEAM PLASMA SOURCE HAVING A UNIFORM MA...

INDUCTIVELY COUPLED PLASMA SOURCE WITH MULTIPLE DIELECTRIC WINDOWS...

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL FLOW...

INDUCTIVELY COUPLED PLASMA SOURCE WITH PLURAL TOP COILS OVER A CEIL...

METHODS AND APPARATUS FOR RAPIDLY RESPONSIVE HEAT CONTROL IN PLASMA...