Akio UI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric barrier discharge electrode and dielectric barrier disch...
- Patent number 11,497,110
- Issue date Nov 8, 2022
- Kabushiki Kaisha Toshiba
- Yosuke Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,672,615
- Issue date Jun 2, 2020
- TOSHIBA MEMORY CORPORATION
- Yosuke Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dust collector and air conditioner
- Patent number 10,518,270
- Issue date Dec 31, 2019
- Kabushiki Kaisha Toshiba
- Yosuke Sato
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,388,544
- Issue date Aug 20, 2019
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,381,198
- Issue date Aug 13, 2019
- TOSHIBA MEMORY CORPORATION
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method and method for manufacturing semiconductor device
- Patent number 10,332,906
- Issue date Jun 25, 2019
- TOSHIBA MEMORY CORPORATION
- Kaori Narumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma induced flow electrode structure, plasma induced flow genera...
- Patent number 9,934,944
- Issue date Apr 3, 2018
- Kabushiki Kaisha Toshiba
- Masato Akita
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Device manufacturing apparatus and manufacturing method of magnetic...
- Patent number 9,799,482
- Issue date Oct 24, 2017
- TOSHIBA MEMORY CORPORATION
- Yuichi Ohsawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,583,360
- Issue date Feb 28, 2017
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas processing apparatus
- Patent number 9,468,698
- Issue date Oct 18, 2016
- Kabushiki Kaisha Toshiba
- Akio Ui
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Substrate plasma processing apparatus and plasma processing method
- Patent number 8,821,684
- Issue date Sep 2, 2014
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,821,744
- Issue date Sep 2, 2014
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simulating a chemical reaction phenomenon in a semiconductor process
- Patent number 8,548,787
- Issue date Oct 1, 2013
- Kabushiki Kaisha Toshiba
- Naoki Tamaoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,545,670
- Issue date Oct 1, 2013
- Kabushiki Kaisha Toshiba
- Akihiro Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus of substrate and plasma processing meth...
- Patent number 8,252,193
- Issue date Aug 28, 2012
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma processing a substrate
- Patent number 7,851,367
- Issue date Dec 14, 2010
- Kabushiki Kaisha Toshiba
- Akio Ui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming ring and method of manufacturing semiconductor device
- Patent number 7,247,888
- Issue date Jul 24, 2007
- Kabushiki Kaisha Toshiba
- Hirotaka Ogihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD apparatus with high throughput and cleaning method therefor
- Patent number 6,164,295
- Issue date Dec 26, 2000
- Kabushiki Kaisha Toshiba
- Akio Ui
- B08 - CLEANING
Information Patent Grant
Method of supplying excited oxygen
- Patent number 5,976,992
- Issue date Nov 2, 1999
- Kabushiki Kaisha Toshiba
- Akio Ui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor-phase growth method for forming S.sub.2 O.sub.2 films
- Patent number 5,403,630
- Issue date Apr 4, 1995
- Kabushiki Kaisha Toshiba
- Isao Matsui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition apparatus
- Patent number 5,205,870
- Issue date Apr 27, 1993
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA DISINFECTION DEVICE
- Publication number 20220299221
- Publication date Sep 22, 2022
- Kabushiki Kaisha Toshiba
- Akio UI
- F24 - HEATING RANGES VENTILATING
Information Patent Application
DIELECTRIC BARRIER DISCHARGE DEVICE
- Publication number 20220087002
- Publication date Mar 17, 2022
- Kabushiki Kaisha Toshiba
- Yosuke SATO Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DIELECTRIC BARRIER DISCHARGE ELECTRODE AND DIELECTRIC BARRIER DISCH...
- Publication number 20220087001
- Publication date Mar 17, 2022
- Kabushiki Kaisha Toshiba
- Yosuke SATO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210319986
- Publication date Oct 14, 2021
- Toshiba Memory Corporation
- Yosuke SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS PROCESSING APPARATUS
- Publication number 20190282722
- Publication date Sep 19, 2019
- Kabushiki Kaisha Toshiba
- Akio UI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
PLASMA ACTUATOR AND SURFACE CLEANING DEVICE
- Publication number 20190259579
- Publication date Aug 22, 2019
- Kabushiki Kaisha Toshiba
- Tomonao TAKAMATSU
- B08 - CLEANING
Information Patent Application
DRY ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20180145086
- Publication date May 24, 2018
- Toshiba Memory Corporation
- Kaori NARUMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUST COLLECTOR AND AIR CONDITIONER
- Publication number 20180078950
- Publication date Mar 22, 2018
- Kabushiki Kaisha Toshiba
- Yosuke SATO
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO
- Publication number 20170186589
- Publication date Jun 29, 2017
- Kabushiki Kaisha Toshiba
- Yosuke SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO
- Publication number 20170169996
- Publication date Jun 15, 2017
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INDUCED FLOW ELECTRODE STRUCTURE, PLASMA INDUCED FLOW GENERA...
- Publication number 20170018409
- Publication date Jan 19, 2017
- Kabushiki Kaisha Toshiba
- Masato AKITA
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Gas Processing Apparatus
- Publication number 20170007958
- Publication date Jan 12, 2017
- Kabushiki Kaisha Toshiba
- Akio UI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
DEVICE MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF MAGNETIC...
- Publication number 20160196951
- Publication date Jul 7, 2016
- KABUSHIKI KAISHA TOSHIBA
- Yuichi OHSAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160027619
- Publication date Jan 28, 2016
- Kabushiki Kaisha Toshiba
- Yosuke SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS PROCESSING APPARATUS
- Publication number 20150265740
- Publication date Sep 24, 2015
- Kabushiki Kaisha Toshiba
- Akio UI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150162223
- Publication date Jun 11, 2015
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140083977
- Publication date Mar 27, 2014
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING FILM FORMING APPARATUS
- Publication number 20130061870
- Publication date Mar 14, 2013
- Akio Ui
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20120228263
- Publication date Sep 13, 2012
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20120080408
- Publication date Apr 5, 2012
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MAN...
- Publication number 20110223750
- Publication date Sep 15, 2011
- Hisataka HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20100072172
- Publication date Mar 25, 2010
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090194508
- Publication date Aug 6, 2009
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090078678
- Publication date Mar 26, 2009
- Akihiro Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS OF SUBSTRATE AND PLASMA PROCESSING METH...
- Publication number 20080237185
- Publication date Oct 2, 2008
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus of substrate and plasma processing meth...
- Publication number 20080057222
- Publication date Mar 6, 2008
- Kabushiki Kaisha Toshiba
- Akio Ui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus of substrate and plasma processing meth...
- Publication number 20080053818
- Publication date Mar 6, 2008
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULATION APPARATUS, SIMULATION METHOD, AND COMPUTER PROGRAM PRODUCT
- Publication number 20070118341
- Publication date May 24, 2007
- KABUSHIKI KAISHA TOSHIBA
- Naoki Tamaoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film forming ring and method of manufacturing semiconductor device
- Publication number 20050191811
- Publication date Sep 1, 2005
- Hirotaka Ogihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Dielectric barrier discharge electrode and dielectric barrier disch...

Plasma processing apparatus and plasma processing method

Dust collector and air conditioner

Substrate processing apparatus and substrate processing method

Plasma processing apparatus and plasma processing method

Dry etching method and method for manufacturing semiconductor device

Plasma induced flow electrode structure, plasma induced flow genera...

Device manufacturing apparatus and manufacturing method of magnetic...

Substrate processing apparatus and substrate processing method

Gas processing apparatus

Substrate plasma processing apparatus and plasma processing method

Substrate processing method and substrate processing apparatus

Simulating a chemical reaction phenomenon in a semiconductor process

Plasma processing apparatus and plasma processing method

Plasma processing apparatus of substrate and plasma processing meth...

Method for plasma processing a substrate

Film forming ring and method of manufacturing semiconductor device

CVD apparatus with high throughput and cleaning method therefor

Method of supplying excited oxygen

Vapor-phase growth method for forming S.sub.2 O.sub.2 films

Vapor deposition apparatus

Patents Applicationslast 30 patents

PLASMA DISINFECTION DEVICE

DIELECTRIC BARRIER DISCHARGE DEVICE

DIELECTRIC BARRIER DISCHARGE ELECTRODE AND DIELECTRIC BARRIER DISCH...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

GAS PROCESSING APPARATUS

PLASMA ACTUATOR AND SURFACE CLEANING DEVICE

DRY ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

DUST COLLECTOR AND AIR CONDITIONER

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO

PLASMA INDUCED FLOW ELECTRODE STRUCTURE, PLASMA INDUCED FLOW GENERA...

Gas Processing Apparatus

DEVICE MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF MAGNETIC...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

GAS PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD OF CLEANING FILM FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MAN...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS OF SUBSTRATE AND PLASMA PROCESSING METH...

Plasma processing apparatus of substrate and plasma processing meth...

Plasma processing apparatus of substrate and plasma processing meth...

SIMULATION APPARATUS, SIMULATION METHOD, AND COMPUTER PROGRAM PRODUCT

Film forming ring and method of manufacturing semiconductor device