Akira Fujimura

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for reticle enhancement technology of a design...
- Patent number 12,248,242
- Issue date Mar 11, 2025
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 12,019,973
- Issue date Jun 25, 2024
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,953,824
- Issue date Apr 9, 2024
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for reticle enhancement technology
- Patent number 11,921,420
- Issue date Mar 5, 2024
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,886,166
- Issue date Jan 30, 2024
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,783,110
- Issue date Oct 10, 2023
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,693,306
- Issue date Jul 4, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,604,451
- Issue date Mar 14, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,592,802
- Issue date Feb 28, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and systems for forming a pattern on a surface using multi-...
- Patent number 11,264,206
- Issue date Mar 1, 2022
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 10,884,395
- Issue date Jan 5, 2021
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped beam lithography including temperature effects
- Patent number 10,460,071
- Issue date Oct 29, 2019
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 10,431,422
- Issue date Oct 1, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sub-resolution assist features in semiconductor pattern writing
- Patent number 10,317,790
- Issue date Jun 11, 2019
- D2S, Inc.
- Leo Pang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming a pattern on a surface using multi-be...
- Patent number 10,290,467
- Issue date May 14, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for forming a pattern on a reticle using charged...
- Patent number 10,101,648
- Issue date Oct 16, 2018
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 10,031,413
- Issue date Jul 24, 2018
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 9,859,100
- Issue date Jan 2, 2018
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming a pattern on a reticle using charged...
- Patent number 9,715,169
- Issue date Jul 25, 2017
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,625,809
- Issue date Apr 18, 2017
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for design of enhanced edge slope patterns for ch...
- Patent number 9,612,530
- Issue date Apr 4, 2017
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming patterns with charged particle beam l...
- Patent number 9,465,297
- Issue date Oct 11, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fracturing and forming a pattern using shaped beam charg...
- Patent number 9,448,473
- Issue date Sep 20, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,400,857
- Issue date Jul 26, 2016
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,372,391
- Issue date Jun 21, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming a pattern on a reticle using charged...
- Patent number 9,341,936
- Issue date May 17, 2016
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MASK OPTIMIZATION PREFERENTIALLY ACCOUNTING FOR OVERLAP REGIONS
- Publication number 20250102899
- Publication date Mar 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GENERATION OF 3-D SHAPES FOR EDA OPERATIONS
- Publication number 20250068809
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GENERATION OF 3-D SHAPES FOR EDA OPERATIONS
- Publication number 20250068810
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS
- Publication number 20250068051
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OV...
- Publication number 20250068053
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS
- Publication number 20250068056
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LA...
- Publication number 20250068052
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT
- Publication number 20250068058
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH ACCURACY PARASITICS EXTRACTION
- Publication number 20250068824
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PARASITICS EXTRACTION BASED ON MULTIPLE MANUFACTURING PROCESS VARIA...
- Publication number 20250068825
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
VARIATION IN TAPER ANGLES OF PREDICTED MANUFACTURED SHAPES FOR PARA...
- Publication number 20250068826
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONCURRENT MASK OPTIMIZATION FOR MULTIPLE LAYERS
- Publication number 20250068057
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240289532
- Publication date Aug 29, 2024
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240210815
- Publication date Jun 27, 2024
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR RETICLE ENHANCEMENT TECHNOLOGY
- Publication number 20240201577
- Publication date Jun 20, 2024
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USING A MACHINE TRAINED NETWORK DURING ROUTING TO ACCOUNT FOR OPC COST
- Publication number 20240119214
- Publication date Apr 11, 2024
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
- Publication number 20240086607
- Publication date Mar 14, 2024
- D2S, INC.
- P. Jeffrey Ungar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USING MACHINE TRAINED NETWORK DURING ROUTING TO PERFORM PARASITIC E...
- Publication number 20230385513
- Publication date Nov 30, 2023
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USING MACHINE TRAINED NETWORK DURING ROUTING TO MODIFY LOCATIONS OF...
- Publication number 20230385514
- Publication date Nov 30, 2023
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USING MACHINE TRAINED NETWORK DURING ROUTING TO MODIFY LOCATIONS OF...
- Publication number 20230351087
- Publication date Nov 2, 2023
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USING MACHINE TRAINED NETWORK DURING ROUTING TO MODIFY LOCATIONS OF...
- Publication number 20230351088
- Publication date Nov 2, 2023
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USING A MACHINE TRAINED NETWORK DURING ROUTING TO ACCOUNT FOR OPC COST
- Publication number 20230351089
- Publication date Nov 2, 2023
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USING TOPOLOGICAL AND GEOMETRIC ROUTERS TO PRODUCE CURVILINEAR ROUTES
- Publication number 20230306177
- Publication date Sep 28, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230289510
- Publication date Sep 14, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230288796
- Publication date Sep 14, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED CIRCUIT WITH NON-PREFERRED DIRECTION CURVILINEAR WIRING
- Publication number 20230282635
- Publication date Sep 7, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROUTING NON-PREFERRED DIRECTION WIRING LAYERS OF AN INTEGRATED CIRC...
- Publication number 20230281374
- Publication date Sep 7, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PERFORMING NON-PREFERRED DIRECTION DETAILED ROUTING FOLLOWED BY PRE...
- Publication number 20230274068
- Publication date Aug 31, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATED CIRCUIT DESIGN WITH NON-PREFERRED DIRECTION CURVILINEAR...
- Publication number 20230274069
- Publication date Aug 31, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING

Akira Fujimura

Person

Patents Grantslast 30 patents

Methods and systems for reticle enhancement technology of a design...

Method and system for determining a charged particle beam exposure...

Method for reticle enhancement technology of a design pattern to be...

Method for reticle enhancement technology of a design pattern to be...

Method and system for reticle enhancement technology

Method and system of reducing charged particle beam write time

Method for reticle enhancement technology of a design pattern to be...

Method and system for determining a charged particle beam exposure...

Method for reticle enhancement technology of a design pattern to be...

Method and system of reducing charged particle beam write time

Method and system of reducing charged particle beam write time

Methods and systems for forming a pattern on a surface using multi-...

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Shaped beam lithography including temperature effects

Method and system for dimensional uniformity using charged particle...

Sub-resolution assist features in semiconductor pattern writing

Method and system for forming a pattern on a surface using multi-be...

Method and system for forming a pattern on a reticle using charged...

Method and system for forming patterns using charged particle beam...

Method and system for dimensional uniformity using charged particle...

Method and system for forming a pattern on a reticle using charged...

Method and system for forming patterns using charged particle beam...

Method and system for design of enhanced edge slope patterns for ch...

Method and system for forming patterns with charged particle beam l...

Method for fracturing and forming a pattern using shaped beam charg...

Method and system for forming patterns using charged particle beam...

Method and system for forming patterns using charged particle beam...

Method and system for forming a pattern on a reticle using charged...

Patents Applicationslast 30 patents

MASK OPTIMIZATION PREFERENTIALLY ACCOUNTING FOR OVERLAP REGIONS

GENERATION OF 3-D SHAPES FOR EDA OPERATIONS

GENERATION OF 3-D SHAPES FOR EDA OPERATIONS

MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS

MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OV...

MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS

MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LA...

ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT

HIGH ACCURACY PARASITICS EXTRACTION

PARASITICS EXTRACTION BASED ON MULTIPLE MANUFACTURING PROCESS VARIA...

VARIATION IN TAPER ANGLES OF PREDICTED MANUFACTURED SHAPES FOR PARA...

CONCURRENT MASK OPTIMIZATION FOR MULTIPLE LAYERS

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

METHOD AND SYSTEM FOR RETICLE ENHANCEMENT TECHNOLOGY

USING A MACHINE TRAINED NETWORK DURING ROUTING TO ACCOUNT FOR OPC COST

MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

USING MACHINE TRAINED NETWORK DURING ROUTING TO PERFORM PARASITIC E...

USING MACHINE TRAINED NETWORK DURING ROUTING TO MODIFY LOCATIONS OF...

USING MACHINE TRAINED NETWORK DURING ROUTING TO MODIFY LOCATIONS OF...

USING MACHINE TRAINED NETWORK DURING ROUTING TO MODIFY LOCATIONS OF...

USING A MACHINE TRAINED NETWORK DURING ROUTING TO ACCOUNT FOR OPC COST

USING TOPOLOGICAL AND GEOMETRIC ROUTERS TO PRODUCE CURVILINEAR ROUTES

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

INTEGRATED CIRCUIT WITH NON-PREFERRED DIRECTION CURVILINEAR WIRING

ROUTING NON-PREFERRED DIRECTION WIRING LAYERS OF AN INTEGRATED CIRC...

PERFORMING NON-PREFERRED DIRECTION DETAILED ROUTING FOLLOWED BY PRE...

INTEGRATED CIRCUIT DESIGN WITH NON-PREFERRED DIRECTION CURVILINEAR...